• 한국진공학회지
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• 제6권S1호
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• pp.137-140
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• 1997

A cathodic arc with beam filter is employed for the deposition of metallic and hydrogen-free amorphous carbon films. A solenoid filter is used to prevent macropaticles and nonionized atoms from reaching the substrate. The detail transport characters of the filter are presented in the paper. With an optmum filter arrangement we are able to obtain a filter output of 18.4% of the total number of ions produced by the vacuum arc discharge. The deposited amorphous cabon thin film contains no hydrogen and a high fraction of $sp^3$ is determined by XPS. A dense Ti film deposited on H13 steel improves the corrosion resistance of the H13 steel and significant improvements of corrosion resistance were observed by implanting Ti, C in the film.

• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.381.1-381.1
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• 2014

In this study, we investigated the deposition behavior and the etch resistivity of plasma polymerized carbon hardmask (ppCHM) film with the variation of process temperature. The etch resistivity of deposited ppCHM film was analyzed by thickness measurement before and after direct contact reactive ion etching process. The physical and chemical properties of films were characterized on the Fourier transform infrared (FT-IR) spectroscope, Raman spectroscope, stress gauge, and ellipsometry. The deposition behavior of ppCHM process with the variation of temperature was correlated refractive index (n), extinction coefficient (k), intrinsic stress (MPa), and deposition rate (A/s) with the hydrocarbon concentration, graphite (G) and disordered (D) peak by analyzing the Raman and FT-IR spectrum. From this experiment we knew an optimal deposition condition for structure of carbon hardmask with the higher etch selectivity to oxide. It was shown the density of ppCHM film had 1.6~1.9 g/cm3 and its refractive index was 1.8~1.9 at process temperature, $300{\sim}600^{\circ}C$. The etch selectivity of ppCHM film was shown about 1:4~1:8 to undoped siliconoxide (USG) film (etch rate, 1300 A/min).

• Tribology and Lubricants
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• 제38권3호
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• pp.101-108
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• 2022

The structure and properties of tetrahedral amorphous carbon (ta-C) coatings depend on the main process parameters and bending angles of the magnetic field filter used in the filtered cathodic vacuum arc (FCVA). During the process, it is possible to effectively control the plasma flux of carbon ions incident on the substrate by controlling the arc discharge current, thereby influencing the mechanical properties of the coating film. Furthermore, we can control the size and amount of large particles mixed during carbon film formation while conforming with the bending angle of the mechanical filter mounted on the FCVA; therefore, it also influences the mechanical properties. In this study, we consider tribological characteristics for filtered bending angles of 45° and 90° as a function of arc discharge currents of 60 and 100 A, respectively. Experiment results indicate that the frictional behavior of the ta-C coating film is independent of the bending angle of the filter. However, its sliding wear behavior significantly changes according to the bending angle of the FCVA filter, unlike the effect of the discharge current. Further, upon changing the bending angle from 45° to 90°, abrasive wear gets accelerated, thereby changing the size and mixing amount of macro particles inside the coating film.

• 한국전기전자재료학회논문지
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• 제20권8호
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• pp.706-710
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• 2007

Ti-containing amorphous carbon (a-C:Ti) films shows attractive mechanical properties such as low friction coefficient, good adhesion to various substrate and high wear resistance. The incorporation of titanium in a-C films is able to improve the electrical conductivity, friction coefficient and adhesion to various substrates. In this study, a-C:Ti films were depositied on Si wafer by closed-field unbalanced magnetron (CFUBM) sputtering system composed two targets of carbon and titanium. The tribological properties of a-C:Ti films were investigated with the increase of DC bias voltage from 0 V to - 200 V. The hardness and elastic modulus of films increase with the increase of DC bias voltage and the maximum hardness shows 21 GPa. Also, the coefficient of friction exhibites as low as 0.07 in the ambient. In the result, the a-C:Ti film obtained by CFUBM sputtering method improved the tribological properties with the increase of DC bias volatage.

• 한국전기전자재료학회논문지
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• 제20권8호
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• pp.701-705
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• 2007

The incorporation of N in a-C film is able to improve the friction coefficient and the adhesion to various substrates. In this study, a-C:N films were deposited on Si and steel substrates by closed-field unbalanced magnetron (CFUBM) sputtering system in $Ar/N_2$ plasma. The lubricant characteristics was investigated for a-C:N deposited with total working pressure from 4 to 7 mTorr. We obtained high hardness up to 24GPa, friction coefficient lower than 0.1 and the smooth surface of having the extremely low roughness (0.16 nm). The physcial properties of a-C:N thin film are related to the increase of cross-linked $sp^2$ bonding clusters in the film. However, the decrease of hardness, elastic modulus and the increase of surface roughness, friction coefficient with the increase of $N_2$ partial pressrue might be due to the effect of energetic ions as a result of the increase of ion bombardment with the increase of ion density in the plasma.

• 반도체디스플레이기술학회지
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• 제18권2호
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• pp.48-52
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• 2019

Virtual metrology, which is one of APC techniques, is a method to predict characteristics of manufactured films using machine learning with saving time and resources. As the photoresist is no longer a mask material for use in high aspect ratios as the CD is reduced, hard mask is introduced to solve such problems. Among many types of hard mask materials, amorphous carbon layer(ACL) is widely investigated due to its advantages of high etch selectivity than conventional photoresist, high optical transmittance, easy deposition process, and removability by oxygen plasma. In this study, VM using different machine learning algorithms is applied to predict the thickness of ACL and trained models are evaluated which model shows best prediction performance. ACL specimens are deposited by plasma enhanced chemical vapor deposition(PECVD) with four different process parameters(Pressure, RF power, $C_3H_6$ gas flow, $N_2$ gas flow). Gradient boosting regression(GBR) algorithm, random forest regression(RFR) algorithm, and neural network(NN) are selected for modeling. The model using gradient boosting algorithm shows most proper performance with higher R-squared value. A model for predicting the thickness of the ACL film within the abovementioned conditions has been successfully constructed.

• 한국진공학회지
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• 제7권3호
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• pp.242-247
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• 1998

DC saddle-field-plasma-enhanced chemical-vapor deposition(PECVD) 장치를 이용 하여 상온에서 p-type Si(100)기판위에 hydrogenated amorphous carbon nitride [a-C:H(N)] 박막을 증착하였다. 원료가스인 $CH_4$과 $N_2$의 전체압력은 90mTorr로 고정하고 $N_2/CH_4$비를 0 에서 4까지 변화하면서 제작한 a-C:H(N)박막의 미세구조의 변화를 연구하였다. 진공조의 도달 진공도는 $1\times10^{-6}$Torr이고, 본 실험시 $N_2+CH_4$가스의 유량은 5sccm으로 고정하고 배 기량을 조절하여 진공조의 가스 압력을 90mTorr로 고정하였으며 기판에 200V의 직류 bias 전압을 인가하였다. $\alpha$-step과 X-ray photoelectron spectroscopy(XPS)를 이용한 분석결과 $N_2/CH_4$비가 0에서 0.5로 증가함에 따라 박막 두께는 4840$\AA$에서 2600$\AA$으로 급격히 감소하 였으며, 박막내의 탄소에 대한 질소함유량(N/C비)는 N2/CH4비가 4일 때 최대 0.25로 증가하 는 것을 확인하였다. 또한 XPS 스펙트럼의 fitting 결과 $N_2/CH_4$비가 증가할수록 CN결합이 증가하였다. Fourier Transformation Infrared(FT-IR) 분석결과 $N_2/CH_4$비가 증가함에 따라 박막내의 C-H결합은 감소하고, N-H, C≡N결합은 증가하였다. Optical bandgap 측정 결과 $N_2/CH_4$비가 0에서 4로 증가함에 따라 a-C:H(N)박막의 bandgap 에너지는 2.53eV에서 2.3eV 로 감소하는 것을 확인하였다.

• 한국건설순환자원학회논문집
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• 제6권4호
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• pp.357-364
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• 2018

플라이애시는 콘크리트의 혼화재로서 사용되는 재료로, 이를 콘크리트 제조에 사용할 경우 시멘트 사용량 감소 및 내화학성 증가와 같은 성능 향상을 기대할 수 있다. 하지만 플라이애시는 미연탄소 함유량 및 표면에 존재하는 유리질의 박막과 같은 문제점이 지적되고 있다. 다량의 미연탄소를 함유하는 플라이애시를 사용하여 콘크리트를 제조할 경우, AE제의 흡착 현상에 의해 슬럼프가 저하되는 문제점이 동반된다. 또한, 입자 표면에 존재하는 유리질 박막은 플라이애시로부터 반응성 물질이 용출되는 것을 방해하여 화학 반응이 일어나지 못하게 만드는 역할을 한다. 지금까지 이러한 플라이애시의 문제점을 해결하기 위하여 플라즈마를 이용한 표면개질 방안이 연구되었으나, 플라즈마는 $O_2$가 활성기체로서 사용될 경우 $O_3$를 발생시키는 문제점을 지니고 있다. 따라서 본 연구에서는 아크방전을 이용해 플라이애시의 표면을 개질하는 방안에 관한 연구를 진행하였으며, 그에 따른 플라이애시의 물리 화학적 특성 변화를 확인하였다. 실험 결과, 아크방전을 이용해 플라이애시의 표면을 개질할 경우 미연탄소가 제거되며 유리질 박막이 파괴되는 것을 확인하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2002년도 하계학술대회 논문집
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• pp.147-150
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• 2002

The electron field emission properties of amorphous carbon (a-C) films deposited using a RF magnetron sputtering system have been improved by introducing a simple method of argon plasma treatment at room temperature. Surface morphologies and structural properties of the a-C films were investigated by scanning electron microscopy and Raman spectroscope, respectively. Structural properties and surface morphologies of the a-C films were changed by argon plasma treatment. The emission properties improved with the plasma treatment.

• 한국전기전자재료학회논문지
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• 제31권7호
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• pp.475-480
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• 2018

We investigated the tribological properties of amorphous carbon (a-C) films deposited with CrC interlayers of various thicknesses as the adhesive layer. A-C and CrC thin films were deposited using the unbalanced magnetron (UBM) sputtering method with graphite and chromium as the targets. CrC films as the interlayer were fabricated under a-C films, and various structural, surface, and tribological properties of a-C films deposited with various CrC interlayer thicknesses were investigated. With various CrC interlayer thicknesses under a-C films, the tribological properties of CrC/a-C films were improved; the increased film thickness exhibited a maximum high hardness of over 27.5 GPa, high elastic modulus of over 242 GPa, critical load of 31 N, residual stress of 1.85 GPa, and a smooth surface below 0.09 nm at the condition of 30-nm CrC thickness.