• 한국세라믹학회지
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• 제32권7호
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• pp.809-816
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• 1995

Ti1-xAlxN films were successfully deposited on high speed steel and silicon wafer by plasma-assisted chemical vapor deposition using a TiCl4/AlCl3/N2/Ar/H2 gas mixture. Plasma process enabled N2 gas to nitride AlCl3, which is not possible in sense of thermodynamics. XPS analyses revealed that the deposited layer contained Al-N bond as well as Ti-N bond. Ti1-xAlxN films were polycrystalline and had single phase, B1-NaCl structure of TiN. Interplanar distance, d200, of (200) crystal plane of Ti1-xAlxN was, however, decreased with Al content, x. Al incorporation into TiN caused the grain size to be finer and changed strong (200) preferred orientation of TiN to random oriented microstructure. Those microstructural changes with Al addition resulted in the increase of micro-hardness of Ti1-xAlxN film up to 2800Kg/$\textrm{mm}^2$ compared with 1400Kg/$\textrm{mm}^2$ of TiN.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2003년도 하계학술대회 논문집 Vol.4 No.1
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• pp.282-285
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• 2003

Single crystal $CuAlSe_2$ layers were grown on thoroughly etched semi-insulating GaAs(100) substrate at $410\;^{\circ}C$ with hot wall epitaxy (HWE) system by evaporating $CuAlSe_2$ source at $680\;^{\circ}C$. The crystalline structure of the single crystal thin films was investigated by the photoluminescence and double crystal X-ray diffraction (DCXD). The carrier density and mobility of single crystal $CuAlSe_2$ thin films measured with Hall effect by van der Pauw method are $9.24{\times}10^{16}\;cm^{-3}\;and\;295\;cm^2/V{\cdot}s$ at 293 K, respectively. The temperature dependence of the energy band gap of the $CuAlSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)\;=\;2.8382\;eV\;-\;(8.68\;{\times}\;10^{-4}eV/K)T^2/(T\;+\;155\;K)$. The crystal field and the spin-orbit splitting energies for the valence band of the $CuAlSe_2$ have been estimated to be 0.2026 eV and 0.2165 eV at 10 K, respectively, by means of the photocurrent spectra and the Hopfield quasicubic model. These results indicate that the splitting of the $\Delta$so definitely exists in the ${\Gamma}_5$ states of the valence band of the $CuAlSe_2$. The three photocurrent peaks observed at 10 K are ascribed to the $A_1-$, $B_1-$, and $C_1$-exciton peaks for n = 1.

• 한국결정성장학회지
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• 제6권3호
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• pp.309-317
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• 1996

Al2O3 thin films were deposited on Si-wafer (100) using organo-aluminum compounds at low pressure by chemical vapor deposition (CVD) method. The vapor of the organo-metallic precursor was carried by pure N2 gas. The deposition rate increased and then saturated as Tsub increased with increasing the AIP flow rate. The main contamination didn't found in deposited films except carbon. The H-O(H2O) IR absorption band decreased in intensity as the deposition temperature increased, and completely disappeared through annealing.

• 한국결정성장학회지
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• 제6권4호
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• pp.558-563
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• 1996

첨가된 소결조제가 다른 $Si_{3}N_{4}/20$ vol% SiC 초미립복합재료의 파괴강도를 측정하였다. 소결조제로서 6 wt% $Y_{2}O_{3}$와 2 wt% $Al_{2}O_{3}$를 사용한 시편의 실온강도는 높았지만 낮은 입계상의 연화온도에 기인하여 급격한 강도저하가 나타났다. 소결조제로서 8 wt% $Y_{2}O_{3}$만을 사용한 시편의 $1400^{\circ}C$에서의 고온강도가 높았는데 이는 높은 입계상 연화온도와 입계유리상의 결정화에 기인하는 것으로 판단하였다.

• 한국전기전자재료학회논문지
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• 제23권5호
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• pp.424-428
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• 2010

This paper describes the design and analysis of AlN piezoelectric micro energy harvester. The harvester was designed to convert ambient vibration energy to electrical power as a AlN piezoelectric material compatible with CMOS (complementary metal oxide semiconductor) process. To cut off the leakage current, AlN was used as the insulating layer. Also, Mo was used for the excellent c-axis crystal growth as the bottom electrode. The AlN harvester which it has the low operating frequency was designed by using the ANSYS FEA (finite element analysis). From the simulation results, the resonance frequency of designed model is about 360 Hz and analyzed the bending mode, displacement and expectation output.

• 한국표면공학회지
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• 제25권5호
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• pp.223-233
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• 1992

(Ti, Al)N films were deposited on 304 stainless steel by D.C. magnetron sputtering using Al target and Ti plate. The properties of (Ti, Al)N films such as composition, microhardness, grain size, crystal structure were investigated. The chemical composition of (Ti, Al)N films was similar to the sputter area ratio of titanium to aluminum target by means of EDS and AES survey. The higher bias voltage to substrate and the smaller input of N2 gas showedthe increased microhardness and the finer grain size of the films. The results obtained from this study show, it is belived, that the (Ti, Al)N film by D.C.magne-tron sputtering is promising in the wear resistance use.

• 한국세라믹학회지
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• 제46권3호
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• pp.288-294
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• 2009

The platelet AlO(OH) nano colloids were prepared by hydrothermal reaction of the $\gamma-Al_2O_3$ obtained with dehydration of $\gamma$-AlO(OH) and dilute $CH_3COOH$ solution. In hydrothermal reaction process, reversible reaction was accompanied between $\gamma-Al_2O_3$ and AlO(OH), and hydrothermal reaction temperature, hydrothermal reaction time and $CH_3COOH$ concentration had an effect on the crystal structure, surface chemical property, surface area, pore characteristics and crystal morphology of the AlO(OH) nano colloid particles. In this study, it was investigated to the hydrothermal reaction condition of the AlO(OH) nano colloid for using catalyst support, heat resisting agent, adsorbents, binder, polishing agent and coating agent. The crystal structure, surface area, pore volume and pore size of the platelet AlO(OH) nano colloids were investigated by XRD, TEM, TG/DTA, FT-IR and $N_2$ BET method in liquid nitrogen temperature.

• 한국진공학회지
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• 제19권1호
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• pp.58-65
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• 2010

먼저 RF 마그네트론 스퍼터링법을 이용하여 사파이어 기판 위에 AlN 박막을 증착하였다. AlN 공급원으로는 분말소결된 AlN 타겟을 적용하였다. 플라즈마 파워를 50에서 110 W로 증가시켰을 때 AlN 층의 두께는 선형적으로 증가하였다. 그러나 동작압력을 3에서 10 mTorr로 증가시켰을 때는 동작기체인 아르곤 양이 증가함에 따라 AlN 타겟으로부터 스퍼터링되어 나온 AlN 입자들의 평균자유행정의 거리가 감소하기 때문에 AlN 층의 두께는 약간 감소하였다. 질소 기체를 아르곤과 섞어주었을 때는 질소의 낮은 스퍼터링 효율에 의해서 AlN의 두께는 크게 감소하였다. 다음으로는 ZnO 형판 위에 AlN를 증착하였다. 그러나 700도 이상의 열처리에 의해서 AlN와 ZnO의 계면이 약간 분리되어 계면의 열적 안정성이 낮다는 결과를 얻었다. 게다가 스퍼터링으로 증착한 AlN 박막의 나쁜 결정성으로 인하여 700도에서 MOCVD의 반응기 기체인 수소와 암모니아에 의해서 AlN 밑의 ZnO 층이 분해되는 현상도 관찰하였다. 그리고 900도 이상에서는 ZnO가 완전히 분해되어 AlN 박막이 완전히 분리되었다.

• 한국결정학회지
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• 제11권3호
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• pp.176-181
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• 2000

Computer-based atomistic simulation methods are applied to address quantitatively the crystal defect chemistry of strontium hexaaluminate, SrAl/sub 12/O/sub 19/. Our calculations show that oxygen Frenkel disorder is the dominant intrinsic defect mode to be expected in the multi-component oxide, though Schottky disorder may also exist. When La and Mg enter into SrAl/sub 12/O/sub 19/. Mg prefers to occupy Al(3)4f tetrahedral sites in the magnetoplumbite structure. Our calculations also indicate that O/sub Sr/ defect is improbable in the structure.

• 한국결정성장학회지
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• 제19권6호
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• pp.298-304
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• 2009

고온 열수송시스템용 구조재료인 Inconel 617의 표면 처리에 따른 고온물성 개선에 대한 연구를 수행하였다. 표면처리 방법으로는 Inconel 617 기판 상에 급속가열(RTP) 및 수열처리를 통한 균질산화물 형성과 물리적 기상증착법(Arc discharge)법에 의한 TiAlN(두께 약 $2{\mu}m$ 박막 코팅을 적용하였다. 불균질 산화물($Cr_2O_3$) 형성 억제에 미치는 표면처리의 효과 및 표면 미세구조가 물성에 미치는 영향에 대해 알아보기 위해 표면처리된 Inconel 617 시편들을 $1000^{\circ}C$, 대기중에서 열처리 하였으며, 열처리된 시편들에 대해 고온 상형성 및 미세구조를 비교 분석하였다. RTP와 수열처리를 통한 표면산화물 형성보다는 TiAlN 박막 증착을 통한 보호피막의 형성이 Inconel 617 표면에서 생성되는 불균일 $Cr_2O_3$ 막의 성장을 효과적으로 억제할 수 있어서 더 균질한 미세구조와 가장 우수한 내마모 특성을 나타내었다.