• 한국진공학회:학술대회논문집
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• 한국진공학회 2014년도 제46회 동계 정기학술대회 초록집
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• pp.192.2-192.2
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• 2014

Among various dopant candidates, nitrogen (N) atoms are considered as the most effective dopants to improve the diverse properties of graphene. Unfortunately, recent experimental and theoretical studies have revealed that different N-doped graphene (NGR) conformations can result in both p- and n-type characters depending on the bonding nature of N atoms (substitutional, pyridinic, pyrrolic, and nitrilic). To overcome this obstacle in achieving reliable graphene doping, we have carried out density functional theory calculations and explored the feasibility of converting p-type NGRs into n-type by introducing additional dopant candidates atoms (B, C, O, F, Al, Si, P, S, and Cl). Evaluating the relative formation energies of various binary-doped NGRs and the change in their electronic structure, we conclude that B and P atoms are promising candidates to achieve robust n-type NGRs. The origin of such p- to n-type change is analyzed based on the crystal orbital Hamiltonian population analysis. Implications of our findings in the context of electronic and energy device applications will be also discussed.

• Korean Chemical Engineering Research
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• 제45권3호
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• pp.209-214
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• 2007

Sr hexaaluminate($Sr_{1-x}La_xMnAl_{11}O_{19-\alpha}$)와 금속 alkoxide를 전구체로, 1-butanol과 ethylene glycol을 각각 용매로 사용한 sol-gel 법으로 합성하였다. 용매 변화에 따른 Sr hexaaluminate의 물리적 특성을 TG/DTA, XRD 및 $N_2$ adsorption을 이용하여 분석하였다. 합성 후 건조한 시료에 대한 열분해 거동을 분석한 결과는 1-butanol을 용매로 사용하여 합성한 hexaaluminate와 비교할 때, ethylene glycol을 용매로 이용한 경우 용매의 분해반응과 dehydroxylation 반응이 관찰되었고, 결정생성 온도도 상승하였다. Dehydroxylation 반응과 결정생성온도의 상승은 hexaaluminate의 소결현상을 가속시켜 낮은 비표면적의 원인이 되었다. 메탄에 대한 연소 반응으로 표면적 차이가 촉매 활성에 영향을 주었음을 확인하였다.

• Bulletin of the Korean Chemical Society
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• 제31권1호
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• pp.112-115
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• 2010

Transparent conducting undoped and Al impurity doped ZnO films were deposited on glass substrate by spin coat technique using 24 days aged ZnO precursor solution with solution of ethanol and diethanolamine. The films were characterized by UV-Visible spectroscopy, X-ray diffraction (XRD), scanning electron microscope (SEM), electrical resistivity ($\rho$), carrier concentration (n), and hall mobility ($\mu$) measurements. XRD data show that the deposited film shows polycrystalline nature with hexagonal wurtzite structure with preferential orientation along (002) crystal plane. The SEM images show that surface morphology, porosity and grain sizes are affected by doping concentration. The Al doped samples show high transmittance and better resistivity. With increasing Al concentration only mild change in optical band gap is observed. Optical properties are not affected by aging of parent solution. A lowest resistivity ($8.5 \times 10^{-2}$ ohm cm) is observed at 2 atomic percent (at.%) Al. With further increase in Al concentration, the resistivity started to increase significantly. The decrease resistivity with increasing Al concentration can be attributed to increase in both carrier concentration and hall mobility.

• E2M - 전기 전자와 첨단 소재
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• 제16권9호
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• pp.63.1-63
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• 2003

Catalytic chemical vapor deposition (Cat-CVD) has been developed to deposit alumina(Al$_2$O$_3$) thin films on silicon (Si) crystal using N$_2$ bubbled tir-methyl aluminium [Al(CH$_3$)$_3$, TMA] and molecular oxygen (O$_2$) as source species and tungsten wires as a catalyzer. The catalyzer dissociated TMA at approximately 600$^{\circ}C$ The maximum deposition rate was 18 nm/min at a catalyzer temperature of 1000 and substrate temperature of 800$^{\circ}C$. Metal oxide semiconductor (MOS) diodes were fabricated using gates composed of 32.5-nm-thick alumina film deposited as a substrate temperature of 400oC. The capacitance measurements resulted in a relatively dielectric constant of 7, 4, fixed charge density of 1.74*10e12/$\textrm{cm}^2$, small hysteresis voltage of 0.12V, and very few interface trapping charge. The leakage current was 5.01*10e-7 A/$\textrm{cm}^2$ at a gate bias of 1V.

• 반도체디스플레이기술학회지
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• 제9권4호
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• pp.77-81
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• 2010

The AZO thin films were deposited on the corning 1737 glass plate by the RF magnetron sputtering and effects of working pressure and oxygen contents on the electrical properties were investigated. XRD spectra showed a preferred orientation along the c-axis and a minimum FWHM for the 70mTorr. From the surface analysis (AFM), the number of crystal grain of AZO thin film increased as working pressure increased. The film deposited with 70mTorr of working pressure showed n-type semiconductor characteristic having suitable resistivity $-1.59{\times}10^{-2}{\Omega}cm$, carrier concentration $-10.1{\times}10^{19}cm^{-3}$, and mobility $-4.35cm^2V^{-1}s^{-1}$ while other films by 7 mTorr, 20 mTorr of working pressure closed to metallic films. The films including the oxygen represent stoichiometric composition similar to the oxide. The transmittance of the film was over 85% in the visible light range regardless of the changes in working pressure and oxygen contents.

• 한국분말야금학회:학술대회논문집
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• 한국분말야금학회 2006년도 Extended Abstracts of 2006 POWDER METALLURGY World Congress Part 1
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• pp.682-683
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• 2006

Thermoelectric conversion efficiency of thermoelectric elements can be increased by using a structure combining n-type and p-type semiconductors. From the above point of view, attention was directed at ZnO as a candidate n-type semiconductor material and investigations were made. As the result, a dimensionless figure of merit ZT close to 0.28 (1073K) was obtained for specimens produced by the PCS (Pulse Current Sintering) method with addition of specified quantities of $TiO_2$, CoO, and $Al_2O_3$ to ZnO. It was found that the interstitial $TiO_2$ in the ZnO restrains the grain growth and CoO acts onto the bond between grains. The influence of the inclusion of $TiO_2$ and CoO onto the sintering behavior also was investigated.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.205-206
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• 2005

PRAM (Phase change Random Access Memory) is one of the most promising candidates for next generation Non-volatile Memories. The Phase change material has been researched in the field of optical data storage media. Among the phase change materials, $Ge_2Sb_2Te_5$(GST) is very well known for its high optical contrast in the state of amorphous and crystalline. However, the characteristics required in solid state memory are quite different from optical ones. In this study, the structural properties of GST thin films with bottom electrode were investigated for PRAM. The 100-nm thick GST films were deposited on TiN/Si and TiAlN/Si substrates by RF sputtering system. In order to characterize the crystal structure and morphology of these films, we performed x-ray diffraction (XRD) and atomic force microscopy (AFM).

• 한국결정학회지
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• 제6권1호
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• pp.1-13
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• 1995

융액인상법에 의해 Cr:A12O3 및 Ti:A12O3 단결정을 육성한 후 인상속도, 회전속도, 주입이온 및 결정육성 분위기와 같은 결정육성요소가 결정의 품질에 미치는 영향을 조사하고, 육성된 결정의 레이저 효율과 분광학적 물성을 측정하였다. 직경 20mm, 길이 100-135mm 크기의 결정을 <001>방위로 육성하였다. Cr:A12O3의 주입농도 0.5w/o, 인상속도 2.0mm/hr, 회전속도 30rpm으로 할 때 질소기체에 의한 비활성 분위기하에서 양질의 Cr:A12O3 결정이 얻어졌다. Ti:A12O3 단결정은 TiO2를 0.25w/o 주입하고 인상속도 1.5mm/hr, 회전속도 30rpm으로 육성할 때, 수소기체에 의한 환원성 분위기하에서 양질의 결정이 얻어졌다. 원자가가 변화하지 않는 Cr3+이온은 원자가가 변화하는 Ti4+이온을 주입할 때보다 효과적으로 탈포되었으며, Fe3+이온은 Ti3+이온에 대해 탈포를 촉진하는 효과가 있었다. Ti:A12O3 단결정 육성시 90% N2 - 10% H2 혼합기체를 사용하여 환원성 분위기를 조성하는 것이 원자가 변화 및 탈포에 좋은 효과를 나타내었다. 흡수 및 형광방출 스펙트럼 조사 결과 Cr:A12O3 단결정에서 4A2 → 4F2 및 4F1 천이에 의한 흡수와 E→4A2(R1) 및 2A→4A2(R2) 천이에 의한 형광방출 천이를 확인하였다. R1 및 R2 천이의 레이저 주파장은 각각 696±5nm 및 692 ±5nm이고, 각 천이의 형광선폭은 12A, 형광수명은 152 μsec로 측정되었다. Ti:A12O3 단결정에서는 4T2→ 4E의 흡수천이와 4E→4T2의 천이에 의해 650nm-1050nm 범위에서 파장가변이 가능한 형광방출천이가 일어남을 확인하였으며 형광수명은 147μsec, figure of merit는 125.4로 측정되었다. Ti:A12O3 단결정으로부터 제조한 레이저봉을 이용하여 레이저 공진한 결과 레이저 발진효율은 9%로 측정되었다.

• 한국정밀공학회지
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• 제17권1호
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• pp.145-152
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• 2000

X-ray diffraction method detects change of crystal lattice distance under material surface using diffraction angle 2$\theta$. This technique can be applied to the behavior on slip band and micro crack due to material degradation. The relation between half-value breadth and number of cycle has three stages which constitute rapid decrease in initial number of cycles, slight decrease in middle number of cycles and rapid decrease in final number of cycles. The ratio of half-value breadth takes a constant value on B/B$_{0}$-N diagram with loading condition except early part of fatigue life. The ratio of half-value breadth B/B$_{0}$ with respect to number of cycle to failure N$_{f}$ has linear behavior on B/B$_{0}$-log N$_{f}$ diagram. Therefore, in this paper the estimation of fatigue life by average gradient method has much less estimated mean error than the estimation of fatigue life by log B/B$_{0}$-log N/N$_{f}$ relation.elation.ation.

• 한국재료학회지
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• 제11권10호
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• pp.889-894
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• 2001

2wt% $Al_2O_3-doped$ ZnO (AZO) thin films were deposited on sapphire (0001) single crystal substrate by parellel type rf magnetron sputtering at 55$0^{\circ}C$. The as-grown AZO thin films was polycrystalline and showed only broad deep defect-level photoluminescence (PL). In order to examine the change of PL property, AZO thin films were annealed in $N_2$ (N-AZO) and $H_2$ (H-AZO) at the temperature of $600^{\circ}C$~$1000^{\circ}C$ through rapid thermal annealing. After annealed at $800^{\circ}C$, N-AZO shows near band edge emission (NBE) with very small deep-level emission, and then N-AZO annealed at $900^{\circ}C$ shows only sharp NBE with 219 meV FWHM. In Comparison with N-AZO, H-AZO exhibits very interesting PL features. After $600^{\circ}C$ annealing, deep defect-level emission was quire quenched and NBE around 382 nm (3.2 eV) was observed, which can be explained by the $H_2$passivation effect. At elevated temperature, two interesting peaks corresponding to violet (406 nm, 3.05 eV) and blue (436 nm, 2.84 eV) emission was firstly observed in AZO thin films. Moreover, peculiar PL peak around 694 nm (1.78 eV) is also firstly observed in all the H-AZO thin films and this is believed good evidence of hydrogenation of AZO. Based on defect-level scheme calculated by using the full potential linear muffin-tin orbital (FP-LMTO), the emission 3.2 eV, 3.05 eV, 3.84 eV and 1.78 eV of H-AZO are substantially deginated as exciton emission, transition from conduction band maximum to $V_{ Zn},$ from $Zn_i$, to valence band maximum $(V_{BM})$ and from $V_{o} to V_BM}$, respectively.