• Title/Summary/Keyword: AlGaAs

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Review of Low Level Laser Therapy on The Growth of Epiphyseal Plate (성장판의 성장에 저단계 레이저가 미치는 영향에 대한 고찰)

  • Choi, Ji Won;Jang, In Soo;Jeong, Min Jeong
    • The Journal of Pediatrics of Korean Medicine
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    • v.29 no.4
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    • pp.29-38
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    • 2015
  • Objectives We aimed to identify the effectiveness of photobiomodulation using low level laser therapy (LLLT), light emitting diode (LED) and others on the growth of the length of the growth plate by reviewing literatures. Methods We searched literatures using PubMed, Science Direct, CINAHL, Korea Traditional Knowledge Portal (KTKP), Oriental Medicine Advanced Searching Integrated System (OASIS), China Knowledge Resource Integrated Database (CNKI), Japan Science and Technology Information Aggregator, Electronic (J STAGE), and Japan National Institute of Informatics Scholarly and Academic Information Navigator (CiNii) using the keywords "Growth plate" "Epiphyseal growth" "Epiphyseal plate" and "Laser", "light emitting diode (LED)", "near-infrared light", and "photobiomodulation". Search range included only original article which provided English abstract were selected. The search strategy contained no language limitation. Results A total 556 studies were found. Then, 551 were excluded by scanning titles and abstracts and finally 5 articles were selected. Five articles were RCTs using rodents. Two of the 5 articles used InGaAlP Laser (630-685 nm), and the other 3 articles used GaAlAs Laser (780, 820, and 870 nm) to investigated the effects of LLLT on the growth of the length of the epiphyseal cartilage and the number of chondrocytes and thickness of each zone of the epiphyseal cartilage. Two articles concluded that LLLT had a beneficial effect on the longitudinal growth of the growth plate. In growth of the epiphyseal plate, there were no significant differences in others. Conclusions It is might that LLLT influenced on the growth of epiphyseal plate by positive affect. However, further rigorous RCTs are warranted.

Microtube Light-Emitting Diode Arrays with Metal Cores

  • Tchoe, Youngbin;Lee, Chul-Ho;Park, Junbeom;Baek, Hyeonjun;Chung, Kunook;Jo, Janghyun;Kim, Miyoung;Yi, Gyu-Chul
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.287.1-287.1
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    • 2016
  • Three-dimensional (3-D) semiconductor nanoarchitectures, including nano- and micro- rods, pyramids, and disks, are emerging as one of the most promising elements for future optoelectronic devices. Since these 3-D semiconductor nanoarchitectures have many interesting unconventional properties, including the use of large light-emitting surface area and semipolar/nonpolar nano- or micro-facets, numerous studies reported on novel device applications of these 3-D nanoarchitectures. In particular, 3-D nanoarchitecture devices can have noticeably different current spreading characteristics compared with conventional thin film devices, due to their elaborate 3-D geometry. Utilizing this feature in a highly controlled manner, color-tunable light-emitting diodes (LEDs) were demonstrated by controlling the spatial distribution of current density over the multifaceted GaN LEDs. Meanwhile, for the fabrication of high brightness, single color emitting LEDs or laser diodes, uniform and high density of electrical current must be injected into the entire active layers of the nanoarchitecture devices. Here, we report on a new device structure to inject uniform and high density of electrical current through the 3-D semiconductor nanoarchitecture LEDs using metal core inside microtube LEDs. In this work, we report the fabrications and characteristics of metal-cored coaxial $GaN/In_xGa_{1-x}N$ microtube LEDs. For the fabrication of metal-cored microtube LEDs, $GaN/In_xGa_{1-x}N/ZnO$ coaxial microtube LED arrays grown on an n-GaN/c-Al2O3 substrate were lifted-off from the substrate by wet chemical etching of sacrificial ZnO microtubes and $SiO_2$ layer. The chemically lifted-off layer of LEDs were then stamped upside down on another supporting substrates. Subsequently, Ti/Au and indium tin oxide were deposited on the inner shells of microtubes, forming n-type electrodes of the metal-cored LEDs. The device characteristics were investigated measuring electroluminescence and current-voltage characteristic curves and analyzed by computational modeling of current spreading characteristics.

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Effect of Electrolyte-Additives on the Performance of Al-Air Cells (전해질 첨가제가 알루미늄-공기전지의 성능에 미치는 영향)

  • Park, Gwun Pil;Chun, Hai Soo
    • Applied Chemistry for Engineering
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    • v.9 no.1
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    • pp.52-57
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    • 1998
  • The effects of additives such as zinc compounds in 4M KOH electrolyte of Al-air cell have been studied. Zinc compounds in electrolyte increased hydrogen evolution overpotential and TPC(tripotasium citrate)/CaO formed fine film on aluminum surface, and these additives decreased hydrogen evolution rate and corrosion rate of aluminum. These additives shifted the OCP in the positive direction on high purity aluminum(purity, 99.999%) and in the negative direction on Al No 1050(purity,99.5%). Addition of two or more additives resulted in the prevention or the reduction of corrosion rate and hydrogen evolution at OCP. As the overpotential on Al electrode increased, the hydrogen evolution rate decreased and the utilization of aluminum increased. At high current density$(>100mA/cm^2)$, TPC/CaO/ZnO additives increased the utilization of high purity aluminum up to that of aluminum alloys containing indium, gallium and thallium.

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Synthesis of p-Type ZnO Thin Film Prepared by As Diffusion Method and Fabrication of ZnO p-n Homojunction

  • Kim, Deok Kyu
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.30 no.6
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    • pp.372-375
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    • 2017
  • ZnO thin films were deposited by RF magnetron sputtering and then diffused by using an As source in the ampouletube. Also, the ZnO p-n homojunction was made by using As-doped ZnO thin films, and its properties were analyzed. After the As doping, the surface roughness increased, the crystal quality deteriorated, and the full width at half maximum was increased. The As-doped ZnO thin films showed typical p-type properties, and their resistivity was as low as $2.19{\times}10^{-3}{\Omega}cm$, probably because of the in-diffusion from an external As source and out-diffusion from the GaAs substrate. Also, the ZnO p-n junction displayed the typical rectification properties of a p-n junction. Therefore, the As diffusion method is effective for obtaining ZnO films with p-type properties.

Effects of Interfacial Dielectric Layers on the Electrical Performance of Top-Gate In-Ga-Zn-Oxide Thin-Film Transistors

  • Cheong, Woo-Seok;Lee, Jeong-Min;Lee, Jong-Ho;KoPark, Sang-Hee;Yoon, Sung-Min;Byun, Chun-Won;Yang, Shin-Hyuk;Chung, Sung-Mook;Cho, Kyoung-Ik;Hwang, Chi-Sun
    • ETRI Journal
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    • v.31 no.6
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    • pp.660-666
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    • 2009
  • We investigate the effects of interfacial dielectric layers (IDLs) on the electrical properties of top-gate In-Ga-Zn-oxide (IGZO) thin film transistors (TFTs) fabricated at low temperatures below $200^{\circ}C$, using a target composition of In:Ga:Zn = 2:1:2 (atomic ratio). Using four types of TFT structures combined with such dielectric materials as $Si_3N_4$ and $Al_2O_3$, the electrical properties are analyzed. After post-annealing at $200^{\circ}C$ for 1 hour in an $O_2$ ambient, the sub-threshold swing is improved in all TFT types, which indicates a reduction of the interfacial trap sites. During negative-bias stress tests on TFTs with a $Si_3N_4$ IDL, the degradation sources are closely related to unstable bond states, such as Si-based broken bonds and hydrogen-based bonds. From constant-current stress tests of $I_d$ = 3 ${\mu}A$, an IGZO-TFT with heat-treated $Si_3N_4$ IDL shows a good stability performance, which is attributed to the compensation effect of the original charge-injection and electron-trapping behavior.

Effect of the Crystalline Phase of Al2O3 Nanoparticle on the Luminescence Properties of YAGG:Ce3+ Phosphor under Vacuum UV Excitation (진공자외선 여기에 의한 YAGG:Ce3+ 형광체의 광발광 특성에 미치는 Al2O3 나노입자 원료의 결정상의 영향)

  • Wu, Mi-Hye;Choi, Sung-Ho;Jung, Ha-Kyun
    • Korean Journal of Materials Research
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    • v.22 no.4
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    • pp.195-201
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    • 2012
  • $Ce^{3+}$-doped yttrium aluminum gallium garnet (YAGG:$Ce^{3+}$), which is a green-emitting phosphor, was synthesized by solid state reaction using ${\alpha}$-phase or ${\gamma}$-phase of nano-sized $Al_2O_3$ as the Al source. The processing conditions and the chemical composition of phosphor for the maximum emission intensity were optimized on the basis of emission intensity under vacuum UV excitation. The optimum heating temperature for phosphor preparation was $1550^{\circ}C$. Photoluminescence properties of the synthesized phosphor were investigated in detail. From the excitation and emission spectra, it was confirmed that the YAGG:$Ce^{3+}$ phosphors effectively absorb the vacuum UV of 120-200 nm and emit green light positioned around 530 nm. The crystalline phase of the alumina nanoparticles affected the particle size and the luminescence property of the synthesized phosphors. Nano-sized ${\gamma}-Al_2O_3$ was more effective for the achievement of higher emission intensity than was nano-sized ${\alpha}-Al_2O_3$. This discrepancy is considered to be because the diffusion of $Al^{3+}$ into $Y_2O_3$ lattice is dependent on the crystalline phase of $Al_2O_3$, which affects the phase transformation of YAGG:$Ce^{3+}$ phosphors. The optimum chemical composition, having the maximum emission intensity, was $(Y_{2.98}Ce_{0.02})(Al_{2.8}Ga_{1.8})O_{11.4}$ prepared with ${\gamma}-Al_2O_3$. On the other hand, the decay time of the YAGG:$Ce^{3+}$ phosphors, irrespective of the crystalline phase of the nano-sized alumina source, was below 1 ms due to the allowed $5d{\rightarrow}4f$ transition of the $Ce^{3+}$ activator.

A study on the preparation of phthalocyanine optoelectric thin films (프탈로시아닌계 광전도성 유기박막의 제조에 관한 연구)

  • 박구범;조기선;이덕출
    • Electrical & Electronic Materials
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    • v.7 no.5
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    • pp.409-416
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    • 1994
  • A double layered photoreceptor using phthalocyanine dye was made by dip-coating method. The under cutting layer(UCL) was coated with A1$\_$2/O$\_$3/ or polyamide, and the charge generation layer(CGL) was formed by .tau.-type metal-free phthalocyanine. The oxadiazole was used as a charge transport layer(CTL) and polycarbonate and poly(vinyl butyral) was employed as a host polymer. The .tau.-H$\_$2/Pc had an absorption peak around 780nm, which coincided with the emitting wavelengths of GaAlAs diode lasers. Maximum charge acceptance of CTL that gives thickness of 12.mu.m was -900V by corona charge of -6.0kV. In photo-induced discharge measurements, residual potential was less than -20V and sufficient for ordinary use, and sample films using of poly(vinyl butyral) was showed good charge retention. In printing test, drum that was employed polycarbonate as a host polymer showed the good print quality.

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High-performance 94 GHz Single Balanced Mixer Based On 70 nm MHEMT And DAML Technology (70 nm MHEMT와 DAML 기술을 이용한 우수한 성능의 94 GHz 단일 평형 혼합기)

  • Kim Sung-Chan;An Dan;Lim Byeong-Ok;Beak Tae-Jong;Shin Dong-Hoon;Rhee Jin-Koo
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.43 no.4 s.346
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    • pp.8-15
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    • 2006
  • In this paper, the 94 GHz, low conversion loss, and high isolation single balanced mixer is designed and fabricated using GaAs-based metamorphic high electron mobility transistors (MHEMTs) with 70 nm gate length and the hybrid ring coupler with the micromachined transmission lines, dielectric-supported air-gapped microstrip lines (DAMLs). The 70 nm MHEMT devices exhibit DC characteristics with a drain current density of 607 mA/mm an extrinsic transconductance of 1015 mS/mm. The current gain cutoff frequency ($f_T$) and maximum oscillation frequency ($f_{max}$) are 320 GHz and 430 GHz, respectively. The fabricated hybrid ring coupler shows wideband characteristics of the coupling loss of $3.57{\pm}0.22dB$ and the transmission loss of $3.80{\pm}0.08dB$ in the measured frequency range of 85 GHz to 105 GHz. This mixer shows that the conversion loss and isolation characteristics are $2.5dB{\sim}>2.8dB$ and under -30 dB, respectively, in the range of $93.65GHz{\sim}94.25GHz$. At the center frequency of 94 GHz, this mixer shows the minimum conversion loss of 2.5 dB at a LO power of 6 dBm To our knowledge, these results are the best performances demonstrated from 94 GHz single balanced mixer utilizing GaAs-based HEMTs in terms of conversion loss as well as isolation characteristics.

Effect of Degraded Al-doped ZnO Thin Films on Performance Deterioration of CIGS Solar Cell (고온 및 고온고습 환경 내에서 ZnO:Al 투명전극의 열화가 CIGS 박막형 태양전지의 성능 저하에 미치는 영향)

  • Kim, Do-Wan;Lee, Dong-Won;Lee, Hee-Soo;Kim, Seung-Tae;Park, Chi-Hong;Kim, Yong-Nam
    • Journal of the Korean Ceramic Society
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    • v.48 no.4
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    • pp.328-333
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    • 2011
  • The influence of Al-doped ZnO (AZO) thin films degraded under high temperature and damp heat on the performance deterioration of Cu(In,Ga)$Se_2$ (CIGS) solar cells was investigated. CIGS solar cells with AZO/CdS/CIGS/Mo structure were prepared on glass substrate and exposed to high temperature ($85^{\circ}C$) and damp heat ($85^{\circ}C$/85% RH) for 1000 h. As-prepared CIGS solar cells had 64.91% in fill factor (FF) and 12.04% in conversion efficiency. After exposed to high temperature, CIGS solar cell had 59.14% in FF and 9.78% in efficiency, while after exposed to damp heat, it had 54.00% in FF and 8.78% in efficiency. AZO thin films in the deteriorated CIGS solar cells showed increases in resistivity up to 3.1 times and 4.4 times compared to their initial resistivity after 1000 h of high temperature and damp heat exposure, respectively. These results can be explained by the decreases in carrier concentration and mobility due to diffusion or adsorption of oxygen and moisture in AZO thin films. It can be inferred that decreases in FF and conversion efficiency were caused by an increase in series resistance, which resulted from an increase in resistivity of AZO thin films degraded under high temperature and damp heat.

Optimization of Process Parameters of Incremental Sheet Forming of Al3004 Sheet Using Genetic Algorithm-BP Neural Network (유전 알고리즘-BP신경망을 이용한 Al3004 판재 점진성형 공정변수에 대한 최적화 연구)

  • Yang, Sen;Kim, Young-Suk
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.21 no.1
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    • pp.560-567
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    • 2020
  • Incremental Sheet Forming (ISF) is a unique sheet-forming technique. The process is a die-less sheet metal manufacturing process for rapid prototyping and small batch production. In the forming process, the critical parameters affecting the formability of sheet materials are the tool diameter, step depth, feed rate, spindle speed, etc. This study examined the effects of these parameters on the formability in the forming of the varying wall angle conical frustum model for a pure Al3004 sheet with 1mm in thickness. Using Minitab software based on Back Propagation Neural Network (BPNN) and Genetic Algorithm (GA), a second order mathematical prediction model was established to predict and optimize the wall angle. The results showed that the maximum forming angle was 87.071° and the best combination of these parameters to give the best performance of the experiment is as follows: tool diameter of 6mm, spindle speed of 180rpm, step depth of 0.4mm, and feed rate of 772mm/min.