• 제목/요약/키워드: AlAs co-deposition

검색결과 96건 처리시간 0.021초

P-형 ZnO 박막 특성 안정성 향상에 대한 연구 (Study on Stability Enhancement of P-type ZnO Thin Film Properties)

  • 남형진;차경환
    • 한국산학기술학회논문지
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    • 제8권3호
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    • pp.472-476
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    • 2007
  • 본 연구에서는 p-형 ZnO 박막 증착법 및 특성의 안정화 방안에 대하여 조사하였다. p-형 ZnO는 AlAs와 ZnO target을 사용하여 RF magnetron sputtering 기법으로 co-deposition하여 제작하였으며 특성 변화를 조사하기 위해 $250^{\circ}C$에서 144시간까지 스트레스 인가 시간을 변화하며 Photoluminescence 및 Hall 측정을 수행하였다. 연구 결과 co-deposition 은 p-형 박막을 제작하기 위해 유효한 방법인 것으로 밝혀졌으며, 특히 고온에서 이루어지는 과정을 수행하기 전 30% H2O2용액에 1분간 처리하는 것이 이후의 열처리 과정 중 발생하는 특성 변화를 크게 억제하는 것으로 관찰되었다.

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선택적 CO 산화 반응을 위한 Ru/$\alpha-Al_2O_3$ 촉매 고분산 제조 방법에 관한 연구 (Preparation of Highly Dispersed Ru/$\alpha-Al_2O_3$ Catalyst for Preferential CO Oxidation)

  • 엄현지;구기영;정운호;이영우;윤왕래
    • 한국수소및신에너지학회논문집
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    • 제21권5호
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    • pp.390-397
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    • 2010
  • 0.5wt% Ru/$\alpha-Al_2O_3$ catalysts are prepared by deposition-precipitation method for the preferential CO oxidation In order to investigate the effect of pH on the Ru dispersion and particle size, the pH of precursor solution is adjusted to between 5.5 and 9.5. 0.5wt% Ru/$\alpha-Al_2O_3$ catalyst prepared at the pH of 6.5 has high Ru dispersion of 17.9% and small particle size of 7.7nm. In addition, 0.5wt% Ru/$\alpha-Al_2O_3$ catalyst prepared at the pH 6.5 is easily reduced at low temperatures below $150^{\circ}C$ due to high dispersion of $RuO_2$ particle and shows high CO conversion over 90% in the wide temperature range between $100^{\circ}C$ and $160^{\circ}C$. Moreover, the deposition-precipitation is a feasible method to improve the Ru dispersion as compared to the impregnation method. The 0.5wt% Ru/$\alpha-Al_2O_3$ catalyst prepared by deposition-precipitation exhibits higher CO conversion than 0.5wt% Ru/$\alpha-Al_2O_3$ catalysts prepared by impregnation due to higher metal dispersion and better reducibility at low temperature.

Influence of Deposition Temperature on the Film Growth Behavior and Mechanical Properties of Chromium Aluminum Nitride Coatings Prepared by Cathodic Arc Evaporation Technique

  • Heo, Sungbo;Kim, Wang Ryeol
    • 한국표면공학회지
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    • 제54권3호
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    • pp.139-143
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    • 2021
  • Cr-Al-N coatings were deposited onto WC-Co substrates using a cathodic arc evaporation (CAE) system. CAE technique is recognized to be a very useful process for hard coatings because it has many advantages such as high packing density and good adhesion to metallic substrates. In this study, the influence of deposition temperature as a key process parameter on film growth behavior and mechanical properties of Cr-Al-N coatings were systematically investigated and correlated with microstructural changes. From various analyses, the Cr-Al-N coatings prepared at deposition temperature of 450℃ in the CAE process showed excellent mechanical properties with higher deposition rate. The Cr-Al-N coatings with deposition temperature around 450℃ exhibited the highest hardness of about 35 GPa and elastic modulus of 442 GPa. The resistance to elastic strain to failure (H/E ratio) and the index of plastic deformation (H3/E2 ratio) were also good values of 0.079 and 0.221 GPa, respectively, at the deposition temperature of 450℃. Based on the XRD, SEM and TEM analyses, the Cr-Al-N coatings exhibited a dense columnar structure with f.c.c. (Cr,Al)N multi-oriented phases in which crystallites showed irregular shapes (50~100nm in size) with many edge dislocations and lattice mismatches.

Support Effect of Catalytic Activity on 3-dimensional Au/Metal Oxide Nanocatalysts Synthesized by Arc Plasma Deposition

  • Jung, Chan Ho;Naik, B.;Kim, Sang Hoon;Park, Jeong Y.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제45회 하계 정기학술대회 초록집
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    • pp.140.2-140.2
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    • 2013
  • Strong metal-support interaction effect is an important issue in determining the catalytic activity for heterogeneous catalysis. In this work, we report the catalytic activity of $Au/TiO_2$, $Au/Al_2O_3$, and $Au/Al_2O_3-CeO_2$ nanocatalysts under CO oxidation fabricated by arc plasma deposition (APD), which is a facile dry process with no organic materials involved. These catalytic materials were characterized by transmission electron microscopy (TEM), energy-dispersive X-ray spectroscopy (EDS) and $N_2$-physisorption. Catalytic activity of the materials has measured by CO oxidation using oxygen, as a model reaction, in a micro-flow reactor at atmospheric pressure. Using APD, the catalyst nanoparticles were well dispersed on metal oxide powder with an average particle size (3~10 nm). As for catalytic reactivity, the result shows $Au/Al_2O_3-CeO_2$ nanocatalyst has the highest catalytic activity among three samples in CO oxidation, and $Au/TiO_2$, and $Au/Al_2O_3$ in sequence. We discuss the effects of structure and metal-oxide interactions of the catalysts on catalytic activity.

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Ni-Al2O3 복합코팅의 마이크로 경도에 대한 공정변수의 영향 (Effect of Process Parameters on Microhardness of Ni-Al2O3 Composite Coatings)

  • 진영준
    • 한국산업융합학회 논문집
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    • 제25권6_2호
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    • pp.1037-1045
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    • 2022
  • In this study, nanoscale Al2O3 ceramic particles were used due its exceptionally high hardness characteristics, chemical stability, and wear resistance properties. These nanoparticles will be used to investigate the optimal process conditions for the electro co-deposition of the Ni-Al2O3 composite coatings. A Watts bath electrolytic solution of a controlled composition along with a fixed agitation speed was used for this study. Whereas the current density, the pH value, temperature and concentration of the nano Al2O3 particles of the electrolyte were designated as the manipulative variables. The experimental design method was based on the orthogonal array to find the optimum processing parameters for the electro co-deposition of Ni-Al2O3 composite coatings. The result of confirmation experimental based on the optimal processing condition through the analysis of variance ; EDX analysis found that the ratio of alumina increased to 8.65 wt.% and subsequently the overall hardness increased to 983 Hv. Specially, alumina were evenly distributed on Nickel matrix and particles were embedded more firmly and finely in Nickel matrix.

하이브리드 증착 시스템에 의해 합성된 나노복합체 Ti-Al-Si-N 박막의 미세구조와 기계적 특성 (Microstructural and Mechanical Characterization of Nanocomposite Ti-Al-Si-N Films Prepared by a Hybrid Deposition System)

  • 박인욱;최성룡;김광호
    • 한국표면공학회지
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    • 제36권2호
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    • pp.109-115
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    • 2003
  • Quaternary Ti-Al-Si-N films were deposited on WC-Co substrates by a hybrid deposition system of arc ion plating (AIP) method for Ti-Al source and DC magnetron sputtering technique for Si incorporation. The synthesized Ti-Al-Si-N films were revealed to be composites of solid-solution (Ti, Al, Si)N crystallites and amorphous Si3N4 by instrumental analyses. The Si addition in Ti-Al-N films affected the refinement and uniform distribution of crystallites by percolation phenomenon of amorphous silicon nitride, similarly to Si effect in TiN film. As the Si content increased up to about 9 at.%, the hardness of Ti-Al-N film steeply increased from 30 GPa to about 50 GPa. The highest microhardness value (~50 GPa) was obtained from the Ti-Al-Si-N film haying the Si content of 9 at.%, the microstructure of which was characterized by a nanocomposite of nc-(Ti,Al,Si) N/a$-Si_3$$N_4$.

OLED Barrier와 Encapsulation을 위한 원자층 증착 Polymer / Al2O3 다층 필름의 온습도 신뢰도 평가 분석 (Reliability Evaluation of Atomic layer Deposited Polymer / Al2O3 Multilayer Film for Encapsulation and Barrier of OLEDs in High Humidity and Temperature Environments)

  • 이사야;송윤석;김현;류상욱
    • 반도체디스플레이기술학회지
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    • 제16권4호
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    • pp.1-4
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    • 2017
  • Encapsulation of organic based devices is essential issue due to easy deterioration of organic material by water vapor. Atomic layer deposition (ALD) is a promising solution because of its low temperature deposition and quality of the deposited film. Moisture permeation has a mechanism to pass through defects, Thin Film Encapsulation using inorganic / organic / inorganic hybrid film has been used as promising technology. $Al_2O_3$ / Polymer / $Al_2O_3$ multilayer film has shown excellent environmental protection characteristics despite of thin thicknesses of the films.

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1.55 $\mu\textrm{m}$ 광증폭기용 Er/Al 첨가 광도파막의 제조 (The Fabrication of Er/Al Co-doped Silica Films for 1.55 $\mu\textrm{m}$ Optical Amplifier)

  • 노성인;김재선;정용순;신동욱;송국현
    • 한국세라믹학회지
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    • 제38권12호
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    • pp.1144-1149
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    • 2001
  • 본 연구에서는 화염가수분해증착법(Flame Hydrolysis Deposition : FHD)을 이용하여 실리콘(Si)/실리카(SiO$_2$) 광도파막을 제조하고, 이 박막에 Solution Doping 법을 이용해 Er/Al을 복합 첨가하여 광증폭 매질을 제작하는 연구를 수행하였다. 형광 측정을 통해 Al의 복합첨가에 의한 형광효율의 감소 방지 및 형광 스펙트럼의 반치폭 증가를 확인할 수 있었다. 즉, Al가 0.48wt%가 첨가된 경우, Er가 0.14wt% 첨가되는 경우에도 형광세기가 감소하지 않음을 확인하였으며, $1.5mu extrm{m}$ 대역의 형광스펙트럼의 대역폭이 약 5nm 정도 증가됨을 관찰하였다.

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합성가스 연소 매체순환식 가스연소기 적용을 위한 최적 산소공여입자 선정 (Selection of the Best Oxygen Carrier Particle for Syngas Fueled Chemical-Looping Combustor)

  • 류호정;김지웅;조완근;박문희
    • Korean Chemical Engineering Research
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    • 제45권5호
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    • pp.506-514
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    • 2007
  • 합성가스 연소 매체순환식 가스연소기 적용을 위한 최적 산소공여입자를 선정하기 위해 네 가지 산소공여입자(NiO/bentonite, $NiO/LaAl_{11}O_{18}$, $Co_xO_y/CoAl_2O_4$, $NiO/NiAl_2O_4$)에 대해 환원반응기체로 모사 합성가스($H_2,\;CO2$, CO 각각 30, 10, 60%)를 사용하여 열중량 분석기(TGA)에서 환원반응특성 및 탄소침적특성을 측정 및 해석하였다. 환원반응온도가 증가함에 따라 최대전환율, 산소전달능력이 증가하였고 산소전달속도 측면에서 $900^{\circ}C$가 합성가스 연소반응에 적합한 조건으로 나타났으며 높은 환원반응온도(${\geq}800^{\circ}C$)에서는 네 가지 입자 모두에 대해 탄소침적현상이 나타나지 않았다. 네 가지 산소공여입자 중 NiO 계 산소공여입자가 CoO 계 산소공여입자에 비해 반응성이 높게 나타났으며 NiO/bentonite 입자가 산소전달속도, 탄소침적도 면에서 가장 좋은 반응성을 나타내었다. NiO/bentonite 입자에 포함된 금속산화물의 함량이 증가함에 따라 산소전달능력과 산소전달속도가 증가하는 것으로 나타나 금속산화물의 함량이 높은 산소공여입자가 매체순환식 가스연소기의 안정적인 조업에 유리한 것으로 나타났다.

Effect of Negative Substrate Bias Voltage on the Microstructure and Mechanical Properties of Nanostructured Ti-Al-N-O Coatings Prepared by Cathodic Arc Evaporation

  • Heo, Sungbo;Kim, Wang Ryeol;Park, In-Wook
    • 한국표면공학회지
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    • 제54권3호
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    • pp.133-138
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    • 2021
  • Ternary Ti-X-N coatings, where X = Al, Si, Cr, O, etc., have been widely used for machining tools and cutting tools such as inserts, end-mills, and etc. Ti-Al-N-O coatings were deposited onto silicon wafer and WC-Co substrates by a cathodic arc evaporation (CAE) technique at various negative substrate bias voltages. In this study, the influence of substrate bias voltages during deposition on the microstructure and mechanical properties of Ti-Al-N-O coatings were systematically investigated to optimize the CAE deposition condition. Based on results from various analyses, the Ti-Al-N-O coatings prepared at substrate bias voltage of -80 V in the process exhibited excellent mechanical properties with a higher compressive residual stress. The Ti-Al-N-O (-80 V) coating exhibited the highest hardness around 30 GPa and elastic modulus around 303 GPa. The improvement of mechanical properties with optimized bias voltage of -80 V can be explained with the diminution of macroparticles, film densification and residual stress induced by ion bombardment effect. However, the increasing bias voltage above -80 V caused reduction in film deposition rate in the Ti-Al-N-O coatings due to re-sputtering and ion bombardment phenomenon.