• Proceedings of the Korean Vacuum Society Conference
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• 2016.02a
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• pp.255-255
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• 2016

Resistive random access memory (ReRAM)는 낮은 동작 전압, 빠른 동작 속도, 고집적화 등의 장점으로 인해 차세대 비휘발성 메모리 소자로써 많은 관심을 받고 있다. 최근에 ReRAM 절연막으로 NiOx, TiOx, AlOx TaOx, HfOx와 같은 binary metal oxide 물질들을 적용하는 연구가 활발히 진행되고 있다. 특히, HfOx는 안정적인 동작 특성을 나타낸다는 점에서 ReRAM 절연막 물질로 적합하다고 보고되고 있다. ReRAM 절연막을 형성할 때, 물리 기상 증착 방법 (PVD)이나 화학 기상 증착법 (CVD)과 같은 방법이 많이 이용된다. 이러한 증착 방법들은 고품질의 박막을 형성시킬 수 있는 장점이 있다. 하지만, 높은 온도에서의 공정과 고가의 진공 장비가 이용되기 때문에 경제적인 문제가 있으며, 기판 또는 금속에 플라즈마 손상으로 인한 문제가 발생할 수 있다. 따라서 이러한 문제점들을 개선하기 위해 용액 공정이 많은 관심을 받고 있다. 용액 공정은 공정과정이 간단할 뿐만 아니라 소자의 대면적화가 가능하고 공정온도가 낮으며 고가의 진공장비가 필요하지 않은 장점을 가진다. 따라서 본 연구에서는, 용액공정을 이용하여 HfOx 기반의 ReRAM 제작하였고 $25^{\circ}C$와 $85^{\circ}C$에서 ReRAM의 동작특성에 미치는 compliance current의 영향을 평가하였다. 실험 방법으로는, hafnium chloride (0.1 M)를 2-methoxyethanol에 충분히 용해시켜서 precursor를 제작하였다. 이후, p-type Si 기판 위에 습식산화를 통하여 300 nm 두께의 SiO2 절연층을 성장시킨 후, 하부전극을 형성하기 위해 electron beam evaporation을 이용하여 10/100 nm 두께의 Ti/Pt 전극을 증착하였다. 순차적으로, 제작된 산화물 precursor를 이용하여 Pt 위에 spin coating 방법으로 1000 rpm 10 초, 6000 rpm 30초의 조건으로 두께 35 nm의 HfOx 막을 증착하였다. 최종적으로, solvent 및 불순물을 제거하기 위해 $180^{\circ}C$의 온도에서 10 분 동안 열처리를 진행하였으며, 상부 전극을 형성하기 위해 electron beam evaporation을 이용하여 Ti와 Al을 각각 50 nm, 100 nm의 두께로 증착하였다. ReRAM 동작에서 compliance current가 미치는 영향을 평가하기 위하여 compliance current를 10mA에서 1mA까지 변화시키면서 측정한 결과, $25^{\circ}C$에서는 compliance current의 크기와 상관없이 일정한 메모리 윈도우와 우수한 endurance 특성을 얻는 것을 확인하였다. 한편, $85^{\circ}C$의 고온에서 측정한 경우에는 1mA의 compliance current를 적용하였을 때, $25^{\circ}C$에서 측정된 메모리 윈도우 크기를 비슷하게 유지하면서 더 우수한 endurance 특성을 얻는 것을 확인하였다. 결과적으로, 용액공정 방법으로 제작된 ReRAM을 측정하는데 있어서 compliance current를 줄이면 보다 우수한 endurance 특성을 얻을 수 있으며, ReRAM 소자의 전력소비감소에 효과적이라고 기대된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.344-344
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• 2014

Transparent amorphous oxide semiconductors such as a In-Ga-Zn-O (a-IGZO) have advantages for large area electronic devices; e.g., uniform deposition at a large area, optical transparency, a smooth surface, and large electron mobility >10 cm2/Vs, which is more than an order of magnitude larger than that of hydrogen amorphous silicon (a-Si;H).1) Thin film transistors (TFTs) that employ amorphous oxide semiconductors such as ZnO, In-Ga-Zn-O, or Hf-In-Zn-O (HIZO) are currently subject of intensive study owing to their high potential for application in flat panel displays. The device fabrication process involves a series of thin film deposition and photolithographic patterning steps. In order to minimize contamination, the substrates usually undergo a cleaning procedure using deionized water, before and after the growth of thin films by sputtering methods. The devices structure were fabricated top-contact gate TFTs using the a-IGZO films on the plastic substrates. The channel width and length were 80 and 20 um, respectively. The source and drain electrode regions were defined by photolithography and wet etching process. The electrodes consisting of Ti(15 nm)/Al(120 nm)/Ti(15nm) trilayers were deposited by direct current sputtering. The 30 nm thickness active IGZO layer deposited by rf magnetron sputtering at room temperature. The deposition condition is as follows: a rf power 200 W, a pressure of 5 mtorr, 10% of oxygen [O2/(O2+Ar)=0.1], and room temperature. A 9-nm-thick Al2O3 layer was formed as a first, third gate insulator by ALD deposition. A 290-nm-thick SS6908 organic dielectrics formed as second gate insulator by spin-coating. The schematic structure of the IGZO TFT is top gate contact geometry device structure for typical TFTs fabricated in this study. Drain current (IDS) versus drain-source voltage (VDS) output characteristics curve of a IGZO TFTs fabricated using the 3-layer gate insulator on a plastic substrate and log(IDS)-gate voltage (VG) characteristics for typical IGZO TFTs. The TFTs device has a channel width (W) of $80{\mu}m$ and a channel length (L) of $20{\mu}m$. The IDS-VDS curves showed well-defined transistor characteristics with saturation effects at VG>-10 V and VDS>-20 V for the inkjet printing IGZO device. The carrier charge mobility was determined to be 15.18 cm^2 V-1s-1 with FET threshold voltage of -3 V and on/off current ratio 10^9.

• Journal of the Korean Electrochemical Society
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• v.4 no.3
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• pp.125-131
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• 2001

A long-term variation of electrode polarization in the MCFC has been analyzed successfully using a single cell with a Au, $CO_2/O_2$ reference electrode Four different cells with different components were operated and their electrode polarizations were analyzed. As published in the literatures, the cathode polarization was larger than that of the anode. The more stable operation of a single cell with the Al-coated cell frame up to 6,000hrs indicates that the corrosion at the cell frame, particularly wet seal area, plays an important role to determine the lifetime of a MCFC. At the initial stage of the cell operation, the voltage of the cell using a cathode stabilized by the $LiCoO_2$ coating was relatively low due to the high cathode polarization. As the cell was operated and the stabilized cathode was lithiated sufficiently, the cathode polarization decreased and the cell voltage was recovered. It was observed that the voltage of the cell using the $Li_2CO_3/Na_2CO_3$ electrolyte fluctuated with operation time and the cathode polarization fluctuated along with the cell voltage quite similarly. Although the mechanisms of the voltage fluctuation were not clear yet, the results imply that the voltage fluctuation was related with a reaction in the cathode side. After testing every single cell, the cathode polarization increased with the steep decrease in the cell voltage. Thus, the cathode should be improved in order to develop more durable MCFC.

• Proceedings of the Korean Vacuum Society Conference
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• 2012.02a
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• pp.96-97
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• 2012

In nitride and oxide film deposition, sputtered metals react with nitrogen or oxygen gas in a vacuum chamber to form metal nitride or oxide films on a substrate. The physical properties of sputtered films (metals, oxides, and nitrides) are strongly influenced by magnetron plasma density during the deposition process. Typical target power densities on the magnetron during the deposition process are ~ (5-30) W/cm2, which gives a relatively low plasma density. The main challenge in reactive sputtering is the ability to generate a stable, arc free discharge at high plasma densities. Arcs occur due to formation of an insulating layer on the target surface caused by the re-deposition effect. One current method of generating an arc free discharge is to use the commercially available Pinnacle Plus+ Pulsed DC plasma generator manufactured by Advanced Energy Inc. This plasma generator uses a positive voltage pulse between negative pulses to attract electrons and discharge the target surface, thus preventing arc formation. However, this method can only generate low density plasma and therefore cannot allow full control of film properties. Also, after long runs ~ (1-3) hours, depends on duty cycle the stability of the reactive process is reduced due to increased probability of arc formation. Between 1995 and 1999, a new way of magnetron sputtering called HIPIMS (highly ionized pulse impulse magnetron sputtering) was developed. The main idea of this approach is to apply short ${\sim}(50-100){\mu}s$ high power pulses with a target power densities during the pulse between ~ (1-3) kW/cm2. These high power pulses generate high-density magnetron plasma that can significantly improve and control film properties. From the beginning, HIPIMS method has been applied to reactive sputtering processes for deposition of conductive and nonconductive films. However, commercially available HIPIMS plasma generators have not been able to create a stable, arc-free discharge in most reactive magnetron sputtering processes. HIPIMS plasma generators have been successfully used in reactive sputtering of nitrides for hard coating applications and for Al2O3 films. But until now there has been no HIPIMS data presented on reactive sputtering in cluster tools for semiconductors and MEMs applications. In this presentation, a new method of generating an arc free discharge for reactive HIPIMS using the new Cyprium plasma generator from Zpulser LLC will be introduced. Data (or evidence) will be presented showing that arc formation in reactive HIPIMS can be controlled without applying a positive voltage pulse between high power pulses. Arc-free reactive HIPIMS processes for sputtering AlN, TiO2, TiN and Si3N4 on the Applied Materials ENDURA 200 mm cluster tool will be presented. A direct comparison of the properties of films sputtered with the Advanced Energy Pinnacle Plus + plasma generator and the Zpulser Cyprium plasma generator will be presented.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2007.11a
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• pp.279-279
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• 2007

비휘발성 메모리 Fe-RAM은 빠른 정보처리 속도와 전원공급이 차단되었을 때도 계속 정보를 유지할 수 있는 비휘발성 특징과 더불어 저전압, 저전력 구동의 장점이 있어서, 차세대 메모리로 많은 주목을 받고 있다. FeRAM에 사용되는 강유전체는 주로 Pb(Zr,Ti)$O_3$가 적용되었는데, 최근에는 비납계 강유전체의 연구도 활발히 이루어지고 있다. 이러한 비납계 강유전체 중에서 가장 특성이 우수한 물질은 $(Bi,La)_4Ti_3O_{12}$ (BLT) 이다. 그런데 BLT는 결정 방향에 따른 강한 이방성의 강유전 특성을 나타내기 때문에 BLT 박막을 이용하여 Fe-RAM 소자 등을 제작하기 위해서는 결정의 방향성을 세심하게 제어하는 것이 매우 중요하다. 지금까지 연구된 BLT 박막의 방향성 조절결과를 보면, BLT 박막을 스핀 코팅 법 (spin coating method)으로 증착하고, 핵생성 열처리 단계를 조절하여 무작위 방향성을 갖는 박막을 제조하는 방법이 일반적이었다. 그런데 이러한 스핀 코팅법에서의 핵생성 단계의 제어는 공정 조건 확보가 너무 어려운 단점이 있다. 이러한 어려움을 극복할 수 있는 대안은 스퍼터링 증착법(sputtering deposition method), PLD (pulsed laser deposition)법 등과 같은 PVD (physical vapor deposition) 법의 증착방법을 적용하는 것이다. PVD 법으로 증착하는 경우에는 이미 박막 내에 무수한 결정핵이 존재하기 때문에 핵생성 단계가 필요가 없게 된다. PVD 증착법의 적용을 위해서는 타겟의 제조 및 평가 실험이 선행되어야 한다. 그런데 벌크 BLT 재료의 소결공정 조건과 전기적 특성에 관한 연구 결과는 거의 발표가 되지 않고 있다. 본 실험에서는 $Bi_2O_3,\;TiO_2,\;La_2O_3,\;Nb_2O_5\;and\;Al_2O_3$ 분말들을 이용하여 최적의 조성을 구하기 위하여 $Nb^{+5}$ 와 $Al^{+3}$을 $Ti^{+4}$ 자리에 소량 치환시켜 제조하였다. 혼합된 분말을 하소 후 pellet 형태로 성형하여 소결을 실시하였다. 시편을 1mm 두께로 연마하고, 양면에 silver 전극을 인쇄하여 전기적 특성을 측정하였다. 측정결과 $Ti^{+4}$ 자리에 $Nb^{+5}$를 치환하여 제조한 시편에서 $2P_r{\sim}31\;{\mu}c/cm^2$정도의 매우 우수한 특성을 얻었다.

• Corrosion Science and Technology
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• v.6 no.4
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• pp.206-210
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• 2007

Aerospace aluminum alloys such as Al alloy 2024-T3 and 7075-T6 are subject to localized corrosion due the existence of intermetallics containing Cu, Mg or Zn. Chromate is currently widely used in the aerospace industry as the corrosion inhibitor for these alloys. However, chromate needs to be replaced due to its strong carcinogenicity. In this study, an extensive pigment screening has been performed to find replacements for chromates. Different categories of inhibitors were evaluated by immersion tests, DC polarization tests and other methods. Phosphates, zinc salts, cerium salts, vanadates and benzotriazole were found to be effective inhibitors for AA7075. Among those inhibitors, zinc phosphate was found to be the most effective in our novel, silane-based, one-step aqueous primer system. The performance of this primer is comparable to that of currently used chromate primers in accelerated corrosion tests, while it is completely chromate-free and its VOC is about 80% less than that of current primers. Studies by SEM/EDS showed that the unique structure of the superprimer accounts for the strong anti-corrosion performance of the zinc phosphate pigment. The self-assembled stratified double-layer structure of the superprimer is characterized by a less-penetrable hydrophobic layer at the top and a hydrophilic layer accommodating the inhibitors underneath. The top layer functions as the physical barrier against water ingress, while the lower layer functions as a reservoirfor the inhibitor, which is leached out only if the coating is damaged by a scratch or scribe. The presence of a silane in the primer further improves the adhesion and anti-corrosion performance of the primer.

• Proceedings of the KAIS Fall Conference
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• 2010.11a
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• pp.488-490
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• 2010

최근 심각한 환경오염 문제와 화석 에너지 고갈로 차세대 청정 에너지 개발에 대한 중요성이 증대되고 있다. 그중에서 태양정지는 공해가 적고, 자원이 무한적이며 반 영구적인 수명을 가지고 있어 미래에너지 문제를 해결할 수 있는 에너지원으로 기대되고 있다. 본 연구에서는 P3HT(regioregular poly(3-hexylthiophene))와 PCBM(fullerene derivative [6,6]-phenyl-C61-butyric acid methyl ester)을 전자 도너와 억셉터 물질을 하나의 브랜드로 광 활성층을 형성하는 BHJ(bulk hetero junction)구조를 갖는 고분자 유기 박막 태양전지를 각각 Toluene, Mono-Chlorobenzene, Dichlorobenzene에 $60^{\circ}C$, 200rpm으로 약 12시간동안 1wt%로 교반(Stirring)한 후에 중량비(1:1 wt%)로 혼합하여 스핀코팅(Spin-coating)으로 제작하였고, 완성된 소자의 광활성층 면적은 0.04cm2이며, $150^{\circ}C$에서 후속 열처리 공정을 통해 특성 향상이 측정 되었다. 태양전지 소자 구조는 Glass / ITO / PEDOT:PSS / P3HT : PCBM / Al이다. 전류-전압, FF(Fill Factor), 변환효율 측정을 위해 solar simulator를 AM1.5 조건(100 mW/cm2)으로 이용하였으며, 소자의 최대 전류밀도는 12mA/$cm^2$, 개방전압은 0.566V이고 F.F(Fill Factor)는 55.2%이고 변환효율은 3.7%이다. 후속 열처리후 더욱 좋은 성능을 갖게 되었고, 최대 효율은 Dichl orobenzene일 때 이다.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.16 no.3
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• pp.2131-2134
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• 2015

In this study, It has been demonstrated a new and realizable possibility of the ferroelectric random access memory devices by all solution processing method with paper substrates. Organic ferroelectric poly(vinylidene fluoride-trifluoroethylene) (P(VDF-TrFE)) thin films were formed on paper substrate with Al electrode for the bottom gate structure using spin-coating technique. Then, they were subjected to annealing process for crystallization. The fabricated PVDF-TrFE thin films were observed by scanning electron microscopy (SEM) and atomic force microscopy (AFM). It was found from polarization versus electric field (P-E) measurement that a PVDF-TrFE thin film on paper substrate showed very good ferroelectric property. This result agree well with that of a PVDF-TrFE thin film fabricated on the rigid Si substrate. It anticipated that these results will lead to the emergence of printable electron devices on paper. Furthermore, it could be fabricated by a solution processing method for ferroelectric random access memory device, which is reliable and very inexpensive, has a high density, and can be also fabricated easily.

• Journal of Astronomy and Space Sciences
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• v.20 no.4
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• pp.327-338
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• 2003

The aim of this paper is to describe the results of the study on the extreme-ultra-violet (EUV) solar telescope, which is designed to. a possible satellite mission. Since the EUV band can not be observed on the ground, the observation in EUV should be performed in space using a satellite or a rocket. Design of the Extreme-Ultra-Violet solar Telescope (BUVT) in this study is based on "Designing a small-sized engineering model of solar EUV telescope for a Korean satellite" (Han et al. 2001). Our EUVT design is satisfied with the requirements for a satellite in size and input voltage. The major goal of the study is to confirm if we can detect the specific wavelength (58.4nm to 62.9nm) with the EUVT. We describe re-designing of the EUVT to decrease a shelter ratio. Also we describe the technics in the optic system and the detector, which were used to manufacture the EUVT. We explain the detective program, which is to calculate the amount of the solar radiation, and the image data processing system.ng system.

• Structural Monitoring and Maintenance
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• v.2 no.1
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• pp.35-48
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• 2015

The main objective of this study is to evaluate the long-term performance of various concrete composites in natural marine environment prevailing in the Gulf region. Durability assessment studies of such nature are usually carried out under aggressive environments that constitute seawater, chloride and sulfate laden soils and wind, and groundwater conditions. These studies are very vital for sustainable development of marine and off shore reinforced concrete structures of industrial design such as petroleum installations. First round of testing and evaluation, which is presented in this paper, were performed by standard tests under laboratory conditions. Laboratory results presented in this paper will be corroborated with test outcome of ongoing three years field exposure conditions. The field study will include different parameters of investigation for high performance concrete including corrosion inhibitors, type of reinforcement, natural and industrial pozzolanic additives, water to cement ratio, water type, cover thickness, curing conditions, and concrete coatings. Like the laboratory specimens, samples in the field will be monitored for corrosion induced deterioration signs and for any signs of failureover initial period ofthree years. In this paper, laboratory results pertaining to microsilica (SF), ground granulated blast furnace slag (GGBS), epoxy coated rebars and calcium nitrite corrosion inhibitor are very conclusive. Results affirmed that the supplementary cementing materials such as GGBS and SF significantly impacted and enhanced concrete resistivity to chloride ions penetration and hence decrease the corrosion activities on steel bars protected by such concretes. As for epoxy coated rebars applications under high chloride laden conditions, results showed great concern to integrity of the epoxy coating layer on the bar and its stability. On the other hand corrosion inhibiting admixtures such as calcium nitrite proved to be more effective when used in combination with the pozzolanic additives such as GGBS and microsilica.