• Title/Summary/Keyword: Al-Si-SiC

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Studies on the formation of CrN surface layer by chromizing and plasma nitriding (Chromizing과 이온 질화에 의한 CrNvyaus층 형성에 관한연구)

  • Park, H. J.;Lee, S. Y.;Yang, S. C.;Lee, S. Y.;Kim, S. S.;Han, J. G.
    • Journal of Surface Science and Engineering
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    • v.31 no.6
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    • pp.334-344
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    • 1998
  • Yew coating pmccss t.o form a surface layer ol CrN phasc on mild steel (A81 1020!, AlSI Hi3, 1Cr-0.5Mo steel (ASTM A213 and Nickrl-base superalloy (Inconel 718) was developed. Surlaces of various alloys t,n.ateii by chromizing for the formation ol Cr diffusion layer was subsequently trcaled by plasma nitriding in order t.o form the hard CrS coating layer on the surfaces. This duplex plasma surface tri-atments of chromizing and plasma nitriding have induced a lormation of a duplex-lrcated surfacr hyer of approximat~ls 70-80 $\mu\textrm{m}$thickncss with a iargcly improved microiiardnrss up to approxiniateW 1500Hv(50gf). The main cause for the lage improvment in the surface hardncss is altribilted to [.he fact that CrN and $Fe_xN$ phases are created successfully by ccliromizins and plasma nilriding treatment. High tenipera1,urc wear resislance of the duplex-treated mild steel and HI3 steels at $600^{\circ}C$ was examined. Comparing the duplex-treated specimens with the specimens treated only by chromizing, the rcsults shovmi that, thc wear volume of the duplex-treated mild skcl and 1113 stcel aSt.er a wear test, at $600^{\circ}C$ were reduced hy a Iactor of 8 and 3, respectively. Characteristics of the CrS phase by duplrx treatment were compared with $CrN_x$,/TEX> film by ion plating and the wear behaviors of CrN film lormed by two different nroccsses arc nea.riy identical.

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Crystal Structure of Nitrogen Adsorption of $Cd^{2+}$ ion Exchanged Zeolite-X (카드늄으로 이온교환된 제올라이트 X의 질소 흡착 결정구조)

  • Lee, Seok-Hee;Jeong, Gyoung-Hwa;Kim, Nam-Seok
    • Journal of the Korean Applied Science and Technology
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    • v.22 no.3
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    • pp.204-211
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    • 2005
  • The structure of nitrogen adsorption complex of fully dehydrated $Cd^{2+}$ ion exchanged zeolite-X, $|Cd_{46}(N)_{18}|[Si_{100}Al_{92}O_{384}]$, was determined in the cubic space group $Fd\overline{3}$ at 21(1) $^{\circ}C$ [a = 24.863(4) ] by single crystal X-ray diffraction analysis. The crystal was prepared by ion exchange in a flowing steam of 0.05 M aqueous solution $Cd(NO_3)_2$ : $Cd(O_2CCH_3)_2$ = 1:1 for five days, followed by dehydration at $500^{\circ}C$ and $2{\times}10^{-6}$ Tor. for two days, and exposured to 100 Tor. zeolitically dry nitrogen gas at 21(1) $^{\circ}C$. The structure was determined in atmosphere, and was refined within $F_0$ > $4{\sigma}(F_0)$ using reflection for which the final error can appear in indices $R_1$ = 0.097 and $wR_2$ = 0.150. In this structure, $Cd^{2+}$ ions occupied four crystallographic sites. Nine $Cd^{2+}$ ions filled the octahedral site I at the centers of hexagonal prisms (Cd-O = 2.452(16) ${\AA}$). Eight $Cd^{2+}$ ions filled site I' (Cd-O = 2.324(19) ${\AA}$). The remaining 29 $Cd^{2+}$ ions are found at two nonequivalent sites II (in the supercages) with occupancy of 11 and 18 ions. Each of these $Cd^{2+}$ ions coordinated to three framework oxygens, either at 2.159(15) or 2.147(14) ${\AA}$, respectively. Eighteen nitrogen molecules were adsorbed per unit cell and three per supercage.

Micro Structure and Surface Characteristics of NiCr Thin films Prepared by DC Magnetron Sputter according to Annealing Conditions (DC 마그네트론 스퍼터링 NiCr 박막의 열처리 조건에 따른 미세구조 및 표면특성)

  • Kwon, Yong;Kim, Nam-Hoon;Choi, Dong-You;Lee, Woo-Sun;Seo, Yong-Jin;Park, Jin-Seong
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.18 no.6
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    • pp.554-559
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    • 2005
  • Ni/Cr thin film is very interesting material as thin film resistors, filaments, and humidity sensors because their relatively large resistivity, more resistant to oxidation and a low temperature coefficient of resistance (TCR). These interesting properties of Ni/Cr thin films are dependent upon the preparation conditions including the deposition environment and subsequent annealing treatments. Ni/Cr thin films of 250 nm were deposited by DC magnetron sputtering on $Al_2O_3/Si$ substrate with 2-inch Ni/Cr (80/20) alloy target at room temperature for 45 minutes. Annealing treatments were performed at $400^{\circ}C,\;500^{\circ}C,\;and\;600^{\circ}C$ for 6 hours in air or $H_2$ ambient, respectively. The clear crystal boundaries without crystal growth and the densification were accomplished when the pores were disappeared in air ambient. Most of surface was oxidic including NiO, $Ni_2O_3$ and $Cr_xO_y$(x=1,2, y=2,3) after annealing in air ambient. The crystal growth in $H_2$ ambient was formed and stabilized by combination with each other due to the suppression of oxidized substance on film surface. Most oxidic Ni was restored when the oxidic Cr was present due to its stability in high-temperature $H_2$ ambient.

Status of Tribology Coating Technology (트라이볼로지 코팅 기술의 현황 및 개발 방향)

  • Kim, Jong-Guk;Gang, Yong-Jin;Kim, Do-Hyeon;Jang, Yeong-Jun
    • Proceedings of the Korean Institute of Surface Engineering Conference
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    • 2017.05a
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    • pp.91-91
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    • 2017
  • 트라이볼로지란? 상대운동을 하면서 서로 영향을 미치는 두면 및 이와 관련된 문제로 마찰, 마모, 윤활에 대한 것을 말한다. 트라이볼로지는 1960대에 조사 연구되기 시작하면서 학문적으로 많은 정리가 이루어졌고, 현재 현대사회에서 문제가 되고 있는 에너지 및 환경 문제를 해결할 수 있는 핵심 요소로 떠오르고 있다. 특히 4차 산업혁명시대를 맞이하여 많은 부분에서는 인공지능, 클라우딩, 빅 데이터 및 로봇 등을 이야기하고 이에 대한 투자 및 개발을 이야기하고 있지만, 이 4차 산업을 뒷받침할, 강인한 제조업이 없으면 불가능한 혁명이라고 말 할 수 있다. 특히 트라이볼로지는 제조업의 무인 자동화 및 무인 로봇 등 이를 필요로 하는 산업 기기와 같은 전반적인 부품 및 소재의 마모를 감소시켜, 기계 장치의 신뢰성을 증가시킬 수 있다. 마찰은 두 물체 상호간의 열 발생을 억제 시키고, 마모는 물체의 표면 경도가 높으면 높을수록 마모량이 적어진다고 알려져있다. 따라서 트라이볼로지와 관련한 표면 처리의 경우, 고온 환경에서의 사용성 증대 및 고경도화 그리고 저마찰을 위한 방향으로 개발 발전되어져 왔다. 트라이볼로지 코팅 중 내마모 코팅의 경우, 티타늄 원소를 기본으로 알루미늄(Al) 및 실리콘(Si)를 합금화하면서, 고경도화 및 내열성을 증대시키는 방향으로 발전되어 왔다. 그에 따라 표면경도의 경우, 4000 Hv, 내열성 $1200^{\circ}C$에 도달였다. 하지만 여전히 철계와의 마찰계수는 0.3 이상으로 이를 낮추는 방법이 요구되고 있다. 최근 트라이볼로지 코팅 중 카본을 함유한 비정질 다이아몬드상 카본 막 (Diamond like Carbon Film : DLC) 이나, Diamond 막의 수요 증가는 마찰을 낮추어 융착마모를 줄이려는 노력으로 볼 수 있다. 특히 수소를 포함하지 않는 고경도 탄소막인 ta-C(tetrahedral amorphous-Carbon)의 수요는 증대되고 있으며, 이에 대한 후막화 및 양산화 기술의 개발의 현재 isssu로 대두되고 있다.

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코어-쉘 나노 입자를 포함한 고분자 박막으로 제작한 비휘발성 메모리 소자의 메모리 윈도우와 기억시간에 미치는 영향

  • Lee, Min-Ho;Yun, Dong-Yeol;Jeong, Jae-Hun;Kim, Tae-Hwan;Kim, Seong-U;Kim, Sang-Uk
    • Proceedings of the Korean Vacuum Society Conference
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    • 2011.02a
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    • pp.117-117
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    • 2011
  • 유기물과 무기물이 결합한 나노 복합체를 사용하여 제작한 비휘발성 메모리 소자는 공정이 간단하고 저렴할 뿐만 아니라 휘어짐이 가능하다는 장점 때문에 많은 연구가 진행되고 있다. 코어-쉘 나노 입자를 포함한 고분자 박막으로 제작한 비휘발성 메모리 소자에서 쉘의 종류와 유무에 따른 메모리 윈도우와 기억시간에 미치는 영향에 대한 연구는 아주 적다. 본 연구에서는 CdTe-CdSe 코어-쉘 나노 입자 및 CdTe 나노 입자가 Poly(9-vinylcarbazol) (PVK) 박막에 분산되어 있는 나노복합체를 기억 매체로 사용하는 비휘발성 메모리 소자들을 제작하여 쉘의 유무에 따른 메모리 윈도우와 기억시간의 변화를 관찰하였다. 소자를 제작하기 위해 두 가지의 나노 입자를 각각 PVK와 함께 톨루엔에 용해시킨 후에 초음파 교반기를 사용하여 나노입자가 PVK가 고르게 섞인 두 가지의 나노복합체를 형성하였다. 두 가지 용액을 p-Si 기판위에 스핀 코팅 방법으로 도포한 후, 열을 가해 용매를 제거하여 CdTe-CdSe 나노 입자가 PVK에 분산되어 있는 나노복합체 박막과 CdTe 나노 입자가 PVK에 분산되어 있는 나노복합체 박막을 각각 형성하였다. 나노 입자가 분산된 각각의 나노복합체 박막 위에 Al을 게이트 전극으로서 열증착하여 소자를 완성하였다. 제작된 두 소자의 정전용량-전압 (C-V) 측정을 하여 CdSe의 유무에 따른 메모리 소자에 대한 C-V 곡선의 다른 평탄 전압 이동을 관찰 하였다. 정전용량-시간 측정을 하여 CdSe 쉘의 유무에 따라 포획된 전하를 유지하는 능력에 차이가 있는 것을 관찰하였다. 측정 결과 모두 CdSe 쉘이 존재하는 메모리 소자에서 우수한 메모리 윈도우와 기억시간 특성이 나타났다. 에너지 대역도를 사용하여 소자의 전하 수송 메커니즘과 CdSe 쉘의 존재에 의해 소자의 메모리 윈도우와 기억시간 특성이 향상되는 원인을 설명 할 것이다.

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A Study on the Replacement of a Light Burnt Dolomite with a Waste MgO-C Refractory Material for a Steel-Making Flux in Electric Arc Furnace (폐 MgO-C계 내화재의 전기로(EAF) 제강 Flux용 경소돌로마이트 대체 사용 연구)

  • Hyun-Jong Kim;Jong-Deok Lim;Hang-Goo Kim;Jei-Pil Wang
    • Resources Recycling
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    • v.31 no.6
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    • pp.44-51
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    • 2022
  • In the steelmaking process using an electric arc furnace (EAF), light-burnt dolomite, which is a flux containing MgO, is used to protect refractory materials and improve desulfurization ability. Furthermore, a recarburizing agent is added to reduce energy consumption via slag foaming and to induce the deoxidation effect. Herein, a waste MgO-C based refractory material was used to achieve the aforementioned effects economically. The waste MgO-C refractory materials contain a significant amount of MgO and graphite components; however, most of these materials are currently discarded instead of being recycled. The mass recycling of waste MgO-C refractory materials would be achievable if their applicability as a flux for steelmaking is proven. Therefore, experiments were performed using a target composition range similar to the commercial EAF slag composition. A pre-melted base slag was prepared by mixing SiO2, Al2O3, and FeO in an alumina crucible and heating at 1450℃ for 1 h or more. Subsequently, a mixed flux #2 (a mixture of light-burnt dolomite, waste MgO-C based refractory material, and limestone) was added to the prepared pre-melted base slag and a melting reaction test was performed. Injecting the pre-melted base slag with the flux facilitates the formation of the target EAF slag. These results were compared with that of mixed flux #1 (a mixture of light-burnt dolomite and limestone), which is a conventional steelmaking flux, and the possibility of replacement was evaluated. To obtain a reliable evaluation, characterization techniques like X-ray diffraction (XRD) analysis and X-ray fluorescence (XRF) spectrometry were used, and slag foam height, slag basicity, and Fe recovery were calculated.

Elemental alteration of the surface of dental casting alloys induced by electro discharge machining (치과용 주조 합금의 방전가공에 따른 표면 성분 변화)

  • Jang, Yong-Chul;Lee, Myung-Kon
    • Journal of Technologic Dentistry
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    • v.31 no.1
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    • pp.55-61
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    • 2009
  • Passive fitting of meso-structure and super-structures is a predominant requirement for the longevity and clinical success of osseointegrated dental implants. However, precision and passive fitting has been unpredictable with conventional methods of casting as well as for corrective techniques. Alternative to conventional techniques, electro discharge machining(EDM) is an advanced method introduced to dental technology to improve the passive fitting of implant prosthesis. In this technique material is removed by melting and vaporization in electric sparks. Regarding the efficacy of EDM, the application of this technique induces severe surface morphological and elemental alterations due to the high temperatures developed during machining, which vary between $10,000{\sim}20,000^{\circ}C$. The aim of this study was to investigate the morphological and elemental alterations induced by EDM process of casting dental gold alloy and non-precious alloy used for the production of implant-supported prosthesis. A conventional clinical dental casting alloys were used for experimental specimens patterns, which were divided in three groups, high fineness gold alloy(Au 75%, HG group), low fineness gold alloy(Au 55%, LG group) and nonprecious metal alloy(Ni-Cr, NP group). The UCLA type plastic abutment patterns were invested with conventional investment material and were cast in a centrifugal casting machine. Castings were sandblasted with $50{\mu}m\;Al_2O_3$. One casting specimen of each group was polished by conventional finishing(HGCON, LGCON, NPCON) and one specimen of each group was subjected to EDM in a system using Cu electrodes, kerosene as dielectric fluid in 10 min for gold alloy and 20 min for Ni-Cr alloy(HGEDM. LGEDM, NOEDM). The surface morphology of all specimens was studied under an energy dispersive X-ray spectrometer (EDS). The quantitative results from EDS analysis are presented on the HGEDM and LGEDM specimens a significant increase in C and Cu concentrations was found after EDM finishing. The different result was documented for C on the NPEDM with a significant uptake of O after EDM finishing, whereas Al, Si showed a significant decrease in their concentrations. EDS analysis showed a serious uptake of C and Cu after the EDM procedure in the alloys studied. The C uptake after the EDM process is a common finding and it is attributed to the decomposition of the dielectric fluid in the plasma column, probably due to the development of extremely high temperatures. The Cu uptake is readily explained from the decomposition of Cu electrodes, something which is also a common finding after the EDM procedure. However, all the aforementioned mechanisms require further research. The clinical implication of these findings is related with the biological and corrosion resistance of surfaces prepared by the EDM process.

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Detoxification of PCBs Containing Transformer Oil by Catalytic Hydrodechlorination in Supercritical Fluids (초임계유체 내 수첨탈염소반응에 의한 PCBs가 함유된 절연유의 무해화 연구)

  • Choi, Hye-Min;Kim, Jae-Hoon;Kim, Jae-Duck;Kang, Jeong-Won
    • Clean Technology
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    • v.15 no.1
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    • pp.9-15
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    • 2009
  • Catalytic hydrodechlorination of PCBs (polychlorinated biphenyls) included in the transformer oil was carried out to detoxify PCBs and to recycle the treated oil. Catalysts such as 0.98 wt% Pt and 0.79 wt% Pd on ${\gamma}$-alumina (${\gamma}-Al_2O_3$) support, 12.8 wt% Ni on ${\gamma}-Al_2O_3$, and 57.6 wt% Ni on silica-alumina ($SiO_2-Al_2O_3$) support were used for the catalytic hydrodechlorination. Various supercritical fluids such as carbon dioxide, propane and isobutane were used as reaction media. The effects of reaction temperature, reaction time, catalysts, and supercritical fluids on the catalytic hydrodechlorination were examined in detail. The detoxification degree increased in the order of Ni > Pd > Pt. This is possibly due to higher metal loading and larger metal size of the Ni catalyst. Below $175^{\circ}C,\;scCO_2$ was found as the most effective reaction media for the catalytic hydrodechlorination of PCBs included in the transformer oil.

Sandstone Diagenesis of the Lower Permian Jangseong Formation, Jangseong Area, Samcheog Coalfield (삼척탄전 장성일대에 분포하는 하부페름기 장성층 사암의 속성작용)

  • 박현미;유인창;김형식
    • The Journal of the Petrological Society of Korea
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    • v.7 no.2
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    • pp.132-145
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    • 1998
  • The coal-bearing siliciclastic rocks of the Lower Permian Jangseong Formation, Samcheog coalfield, represent a megacyclothem which shows cyclic repetitions of sandstone, shale, coaly shale, and coals. Petrographic, geochemical, and SEM studies for sandstone samples, and XRD analysis for clay minerals were carried out to understand diagenesis in the sandstones of the Jangseong Formation. The Jangseong sandstones are composed of 60% quartz (mainly monocrystalline quartz) and 36% clay matrix and cement with minor amounts of feldspar, lithic fragments and accessory minerals (less than 4%). Jangseong sandstones are classified mostly as quartzwackes and partly as lithic graywackes according to the scheme of Dott(1964). The textural relationships between authigenic minerals and cements in thin sections and SEM photomicrographs suggest the paragenetic sequence as follows; (1) mechanical compaction, (2) cementation by quartz overgrowth, (3) formation of authigenic clay minerals (illite, kaolinite), (4) dissolution of framework grains and development of secondary porosity, and (5) later-stage pore-filling by pyrophyllite. We propose that these diagenetic processes might be due to organic-inorganic interaction between the dominant framework grains and the formation water. The Al, Si ions and organic acid, derived from dewatering of interbedded organic-rich shale and coals, were transported into the Jangseong sandstones. This caused changes in the chemistry of the formation water of the sandstones, and resulted in overgrowth of quartz and precipitation of authigenic clay minerals of kaolinite and illite. The secondary pores, produced during dissolution of clay and framework grains by organic acid and $CO_2$ gas, were conduit for silica-rich solution into the Jangseong sandstones and the influx of silica-rich solution produced the late-stage pyrophyllite after the expanse of kaolinite. The origin of the solution that formed pyrophyllite is not likely to be the organic-rich formation water based on the observation of fracture-filling pyrophyllite in the Jangseong sandstones, but the process of pyrophyllite pore-filling was indirectly related to organic-inorganic interaction.

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Analysis for Buffer Leakage Current of High-Voltage GaN Schottky Barrier Diode (고전압 GaN 쇼트키 장벽 다이오드의 완충층 누설전류 분석)

  • Hwang, Dae-Won;Ha, Min-Woo;Roh, Cheong-Hyun;Park, Jung-Ho;Hahn, Cheol-Koo
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.48 no.2
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    • pp.14-19
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    • 2011
  • We have fabricated GaN Schottky barrier diode (SBD) for high-voltage applications on Si substrate. The leakage current and the electrical characteristics of GaN SBD are investigated by annealing metal-semiconductor junctions. Ohmic junctions of Ti/Al/Mo/Au and Schottky junctions of Ni/Au are used in the fabrication. A test structure is proposed to measured buffer leakage current through a mesa structure. When annealing temperature is increased from $700^{\circ}C$ to $800^{\circ}C$, measured buffer leakage current is also increased from 87 nA to 780 nA at the width of 100 ${\mu}m$. The diffusion of Au, Ti, Mo, O into GaN buffer layer increases the leakage current and that is verified by Auger electron spectroscopy. Experimental results show that the low leakage current and the high breakdown voltage of GaN SBD are achieved by annealing metal-semiconductor junctions.