DRY ETCHING CHARACTERISTICS OF INGAN USING INDUCTIVELY COUPLED $Cl_2/CHF_3,{\;}Cl_2/CH_4$ AND Cl_2/Ar PLASMAS.
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 한국표면공학회 1999년도 추계학술발표회 초록집
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- pp.59-59
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- 1999