• Title/Summary/Keyword: 5G Device

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THE INFLUENCE OF THE DIE HARDENER ON GYPSUM DIE (석고 다이에 대한 다이 강화제의 영향)

  • Kim, Young-Rim;Park, Ju-Mi;Song, Kwang-Yeob
    • The Journal of Korean Academy of Prosthodontics
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    • v.45 no.4
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    • pp.546-554
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    • 2007
  • Statement of problem: Die materials require abrasion resistance, dimensional stability with time, and high surface wettability for adequate material properties. Wear of gypsum materials is a significant problem in the fabrication of accurately fitting cast prosthetic devices. So It has been recommended that the use of die hardener before carving or burnishing of the wax pattern. Purpose: The purpose of this study was to compare the abrasion resistance and surface microhardness(Knoop) with 3 commonly used gypsum die materials(MG Crystal Rock, Super plumstone, GC $FUJIROCK^{(R)}$ EP) with and without the application of 2 die hardeners. Material and methods: Three die materials were evaluated for abrasion resistance and surface microhardness after application of 2 die hardeners(Die hardener and Stone die & plaster hardener). Thirty specimens of each gypsum material were fabricated using an impression of resin die(Pattern resin; GC Corporation, Japan) with 1-mm high ridges, sloped 90 degrees. Gypsum materials were mixed according to manufacturer's recommendations and allowed to set 24 hours before coating. Specimens were arbitrary assigned to 1 of 3 treatment subgroups (n=10/subgroup): no treatment(control), coated with Die hardener, and coated with Stone die & plaster hardener. Abrasion resistance(measured by weight loss) was evaluated using device in 50g mass perpendicular to the ridges. Knoop hardness was determined by loading each specimen face 5 times for 15 seconds with a force of 50g. A scanning electron microscope was used to evaluate the surface of specimens in each treatment subgroup. Conclusions: The obtained results were as follows: 1. 3 types of die stone evaluated in this study did not show significant differences in surface hardness and abrasive resistance(P<.05). 2. In the abrasive resistance test, there were no significant differences between GC $FUJIROCK^{(R)}$ EP and MG Crystal Rock with or without 2 die hardener(P<.05). 3. Super plumstone treated with Stone die & plaster hardener showed increased wear loss(P<.05) 4. Die hardener coatings used in this study decreased the surface hardness of the gypsum material(P<.05).

Vibration Characteristics of the Oriental Melon by Vibration Test (진동시험에 의한 참외의 진동특성)

  • Kim, Man-Soo;Jung, Hyun-Mo;Kim, Ghi-Seok;Park, Chung-Gil
    • Korean Journal of Agricultural Science
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    • v.32 no.1
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    • pp.29-42
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    • 2005
  • During a long journey of agricultural products from the production area to markets, the quality of agricultural products was always affected by some degree of vibration. The vibration input during the transportation may cause serious agricultural product injury, and this damage is particularly severe whenever the vegetable inside package is free to bounce, and is vibrated at its resonant frequency. The objectives of this study were to determine the resonant frequency of the oriental melon and to investigate the relationships between resonant frequency and physical properties of the oriental melon such as mass, volume and major and minor axes. In this study vibration testing device was constructed to determine the vibration response of the oriental melon in frequency ranges of 5 to 150 Hz. The computer program for controlling the vibration shaker and the function generator and measuring the vibration characteristics of the oriental melon was developed. The ranges of resonant frequency and peak acceleration at resonance of the oriental melon were 51 to 73 Hz and 1.24 to 1.92 G-rms, respectively. The resonant frequency and the peak acceleration decreased with the increase of the sample mass, volume, major and minor axes of the oriental melon. Multiple regression models for resonant frequency and peak acceleration of the oriental melon as a function of mass, major axis and minor axis of the sample were developed and analyzed.

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Direct Growth of CNT on Cu Foils for Conductivity Enhancement and Their Field Emission Property Characterization (전도성 향상을 위한 구리호일 위 CNT의 직접성장 및 전계방출 특성 평가)

  • Kim, J.J.;Lim, S.T.;Kim, G.H.;Jeong, G.H.
    • Journal of the Korean Vacuum Society
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    • v.20 no.2
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    • pp.155-163
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    • 2011
  • Carbon nanotubes (CNT) have been attracted much attention since they have been expected to be used in various areas by virtue of their outstanding physical, electrical, and chemical properties. In order to make full use of their prominent electric conductivity in some areas such as electron emission sources, device interconnects, and electrodes in energy storage devices, direct growth of CNT with vertical alignment is definitely beneficial issue because they can maintain mechanical stability and high conductivity at the interface between substrates. Here, we report direct growth of vertically aligned CNT (VCNT) on Cu foils using thermal chemical vapor deposition and characterize the field emission property of the VCNT. The VCNT's height was controlled by changing the growth temperature, growth time, and catalytic layer thickness. Optimum growth condition was found to be $800^{\circ}C$ for 20 min with acetylene and hydrogen mixtures on Fe catalytic layer of 1 nm thick. The diameter of VCNT grown was smaller than that of usual multi walled CNT. Based on the result of field emission characterization, we concluded that the VCNT on Cu foils can be useful in various potential applications where high conductivity through the interface between CNT and substrate is required.

Design and Fabrication of the 0.1${\mu}{\textrm}{m}$ Г-Shaped Gate PHEMT`s for Millimeter-Waves

  • Lee, Seong-Dae;Kim, Sung-Chan;Lee, Bok-Hyoung;Sul, Woo-Suk;Lim, Byeong-Ok;Dan-An;Yoon, yong-soon;kim, Sam-Dong;Shin, Dong-Hoon;Rhee, Jin-koo
    • Journal of electromagnetic engineering and science
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    • v.1 no.1
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    • pp.73-77
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    • 2001
  • We studied the fabrication of GaAs-based pseudomorphic high electron mobility transistors(PHEMT`s) for the purpose of millimeter- wave applications. To fabricate the high performance GaAs-based PHEMT`s, we performed the simulation to analyze the designed epitaxial-structures. Each unit processes, such as 0.1 m$\mu$$\Gamma$-gate lithography, silicon nitride passivation and air-bridge process were developed to achieve high performance device characteristics. The DC characteristics of the PHEMT`s were measured at a 70 $\mu$m unit gate width of 2 gate fingers, and showed a good pinch-off property ($V_p$= -1.75 V) and a drain-source saturation current density ($I_{dss}$) of 450 mA/mm. Maximum extrinsic transconductance $(g_m)$ was 363.6 mS/mm at $V_{gs}$ = -0.7 V, $V_{ds}$ = 1.5 V, and $I_{ds}$ =0.5 $I_{dss}$. The RF measurements were performed in the frequency range of 1.0~50 GHz. For this measurement, the drain and gate voltage were 1.5 V and -0.7 V, respectively. At 50 GHz, 9.2 dB of maximum stable gain (MSG) and 3.2 dB of $S_{21}$ gain were obtained, respectively. A current gain cut-off frequency $(f_T)$ of 106 GHz and a maximum frequency of oscillation $(f_{max})$ of 160 GHz were achieved from the fabricated PHEMT\\`s of 0.1 m$\mu$ gate length.h.

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Magnetic & Crystallographic Properties of Patterned Media Fabricated by Nanoimprint Lithography and Co-Pt Electroplating (나노임프린트 패터닝과 자성박막도금을 이용하여 제작한 패턴드미디어용 자기패턴의 자기적 및 결정구조특성에 관한 연구)

  • Lee, B.K.;Lee, D.H.;Lee, M.B.;Kim, H.S.;Cho, E.H.;Sohn, J.S.;Lee, C.H.;Jeong, G.H.;Suh, S.J.
    • Journal of the Korean Magnetics Society
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    • v.18 no.2
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    • pp.49-53
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    • 2008
  • Magnetic and crystallographic properties of patterned media fabricated by nanoimprint lithography and Co-Pt electroplating were studied. Thin films of Ru(20 nm)/Ta(5 nm)/$SiO_2$(100 nm) were deposited on Si(100) wafer and then 25 nm hole pattern was fabricated by nanoimprint lithography on substrate. The electroplated Co-Pt nano-dots have the diameter of 35 nm and the height of 27 nm. Magnetic dot patterns of Co-Pt alloy were created using electroplated Co-Pt alloy and then their properties were measured by MFM, SQUID, SEM, TEM and AFM. We observed single domain with perendicular anisotropy for each dot and achieved optimum coercivity of 2900 Oe. These results mean that patterned media fabricated by nanoimprint lithography and electroplating have good properties in view of extending superparamagnetic limit while satisfying the writability requirements with the present write heads.

Imaging Performance Analysis of an EO/IR Dual Band Airborne Camera

  • Lee, Jun-Ho;Jung, Yong-Suk;Ryoo, Seung-Yeol;Kim, Young-Ju;Park, Byong-Ug;Kim, Hyun-Jung;Youn, Sung-Kie;Park, Kwang-Woo;Lee, Haeng-Bok
    • Journal of the Optical Society of Korea
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    • v.15 no.2
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    • pp.174-181
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    • 2011
  • An airborne sensor is developed for remote sensing on an aerial vehicle (UV). The sensor is an optical payload for an eletro-optical/infrared (EO/IR) dual band camera that combines visible and IR imaging capabilities in a compact and lightweight package. It adopts a Ritchey-Chr$\'{e}$tien telescope for the common front end optics with several relay optics that divide and deliver EO and IR bands to a charge-coupled-device (CCD) and an IR detector, respectively. The EO/IR camera for dual bands is mounted on a two-axis gimbal that provides stabilized imaging and precision pointing in both the along and cross-track directions. We first investigate the mechanical deformations, displacements and stress of the EO/IR camera through finite element analysis (FEA) for five cases: three gravitational effects and two thermal conditions. For investigating gravitational effects, one gravitational acceleration (1 g) is given along each of the +x, +y and +z directions. The two thermal conditions are the overall temperature change to $30^{\circ}C$ from $20^{\circ}C$ and the temperature gradient across the primary mirror pupil from $-5^{\circ}C$ to $+5^{\circ}C$. Optical performance, represented by the modulation transfer function (MTF), is then predicted by integrating the FEA results into optics design/analysis software. This analysis shows the IR channel can sustain imaging performance as good as designed, i.e., MTF 38% at 13 line-pairs-per-mm (lpm), with refocus capability. Similarly, the EO channel can keep the designed performance (MTF 73% at 27.3 lpm) except in the case of the overall temperature change, in which the EO channel experiences slight performance degradation (MTF 16% drop) for $20^{\circ}C$ overall temperate change.

Bottom electrode optimization for the applications of ferroelectric memory device (강유전체 기억소자 응용을 위한 하부전극 최적화 연구)

  • Jung, S.M.;Choi, Y.S.;Lim, D.G.;Park, Y.;Song, J.T.;Yi, J.
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.8 no.4
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    • pp.599-604
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    • 1998
  • We have investigated Pt and $RuO_2$ as a bottom electrode for ferroelectric capacitor applications. The bottom electrodes were prepared by using an RF magnetron sputtering method. Some of the investigated parameters were a substrate temperature, gas flow rate, RF power for the film growth, and post annealing effect. The substrate temperature strongly influenced the surface morphology and resistivity of the bottom electrodes as well as the film crystallographic structure. XRD results on Pt films showed a mixed phase of (111) and (200) peak for the substrate temperature ranged from RT to $200^{\circ}C$, and a preferred (111) orientation for $300^{\circ}C$. From the XRD and AFM results, we recommend the substrate temperature of $300^{\circ}C$ and RF power 80W for the Pt bottom electrode growth. With the variation of an oxygen partial pressure from 0 to 50%, we learned that only Ru metal was grown with 0~5% of $O_2$ gas, mixed phase of Ru and $RuO_2$ for $O_ 2$ partial pressure between 10~40%, and a pure $RuO_2$ phase with $O_2$ partial pressure of 50%. This result indicates that a double layer of $RuO_2/Ru$ can be grown in a process with the modulation of gas flow rate. Double layer structure is expected to reduce the fatigue problem while keeping a low electrical resistivity. As post anneal temperature was increased from RT to $700^{\circ}C$, the resistivity of Pt and $RuO_2$ was decreased linearly. This paper presents the optimized process conditions of the bottom electrodes for memory device applications.

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Enhanced Device Performance of IZO-based oxide-TFTs with Co-sputtered $HfO_2-Al_2O_3$ Gate Dielectrics (Co-sputtered $HfO_2-Al_2O_3$을 게이트 절연막으로 적용한 IZO 기반 Oxide-TFT 소자의 성능 향상)

  • Son, Hee-Geon;Yang, Jung-Il;Cho, Dong-Kyu;Woo, Sang-Hyun;Lee, Dong-Hee;Yi, Moon-Suk
    • Journal of the Institute of Electronics Engineers of Korea SD
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    • v.48 no.6
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    • pp.1-6
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    • 2011
  • A transparent oxide thin film transistors (Transparent Oxide-TFT) have been fabricated by RF magnetron sputtering at room temperature using amorphous indium zinc oxide (a-IZO) as both of active channel and source/drain, gate electrodes and co-sputtered $HfO_2-Al_2O_3$ (HfAIO) as gate dielectric. In spite of its high dielectric constant > 20), $HfO_2$ has some drawbacks including high leakage current and rough surface morphologies originated from small energy band gap (5.31eV) and microcrystalline structure. In this work, the incorporation of $Al_2O_3$ into $HfO_2$ was obtained by co-sputtering of $HfO_2$ and $Al_2O_3$ without any intentional substrate heating and its structural and electrical properties were investigated by x-ray diffraction (XRD), atomic force microscopy (AFM) and spectroscopic ellipsometer (SE) analyses. The XRD studies confirmed that the microcrystalline structures of $HfO_2$ were transformed to amorphous structures of HfAIO. By AFM analysis, HfAIO films (0.490nm) were considerably smoother than $HfO_2$ films (2.979nm) due to their amorphous structure. The energy band gap ($E_g$) deduced by spectroscopic ellipsometer was increased from 5.17eV ($HfO_2$) to 5.42eV (HfAIO). The electrical performances of TFTs which are made of well-controlled active/electrode IZO materials and co-sputtered HfAIO dielectric material, exhibited a field effect mobility of more than $10cm^2/V{\cdot}s$, a threshold voltage of ~2 V, an $I_{on/off}$ ratio of > $10^5$, and a max on-current of > 2 mA.

A Study on the Difference of Scattered Rays with or Without Gonadal Shielding During Chest Computed Tomography (흉부 전산화 단층 촬영 검사 시 발생하는 생식선 차폐 유무에 따른 산란 선량 차이에 관한 연구)

  • Kwak, Jong Hyeok;Kim, Gyeong Rip;Sung, Hyun Chul;Kim, Seung Won;Song, Geun Sung;Choi, Min Gyeong;Lee, Sang Weon
    • Journal of the Korean Society of Radiology
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    • v.15 no.2
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    • pp.109-115
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    • 2021
  • This study is a study on the difference in dose according to the presence or absence of gonadal shielding of scattered rays generated during chest computed tomography examination, and the scattered dose of the examination site was measured by placing the RadEye G-10 device in the center of the phantom. When the gonads are not shielded, the scattering lines of the whole, both sides, posterior and gonads are measured and Xenolite nolead Apron (0.35 mm PB), Xenolite nolead Apron (front 0.35 mm PB Mix back 0.25 mm PB, Skirt overlap), Half Apron After shielding with (0.5 mm PB), each scattered dose was measured. During chest computed tomography, the scattered dose of the test site was measured at 272 μSv, and when not shielded with Apron, the average total was 43 μSv, left 81 μSv, right part 82 μSv, posterior part 38.8 μSv, and Gonad part 16 μSv. Became. Xenolite nolead Apron shielded only the upper part and measured all 11.2 μSv, left part 43.1 μSv, right part 45.3 μSv, posterior part 12 μSv and Gonad part 5.2 μSv. Xenolite nolead Apron (Skirt overlap) covered the Pelvis area 360° and the dose was measured to be 5.6 μSv in the whole, 22.4 μSv in the left, 15.7 μSv in the right side, 6 μSv in the posterior part, and 3.2 μSv in the Gonad part. Xenolite nolead Apron (Skirt overlap) covered the Pelvis area 360° and the dose was measured to be 5.6 μSv in the whole, 22.4 μSv in the left, 15.7 μSv in the right side, 6 μSv in the posterior part, and 3.2 μSv in the Gonad part. When measuring only the upper part with Half Apron, the total measurement was 10.7 μSv, the left part 42.6 μSv, the right part 40.6 μSv, the posterior part 11.3 μSv, and the Gonad part 4.7 μSv. The method of 360° shielding of the pelvic area showed a dose reduction of more than 80%, and a dose reduction effect of more than 70% was shown when all shielding was performed. In all computerized tomography examinations, research to reduce the exposure dose and various shielding devices were used. It is believed that continuous research on the technique is needed.

Observation of Response to PPD Skin Test and Local Side Reactions at Multiple Inoculation Sites after Percutanous Inoculation with BCG Tokyo 172 Strain (경피용 건조 B.C.G. 백신(Tokyo 172주) 접종 후 국소 반응과 투베르쿨린 양전율에 관한 연구)

  • Lee, Jin Soo;Sohn, Young Mo
    • Pediatric Infection and Vaccine
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    • v.7 no.2
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    • pp.201-210
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    • 2000
  • Purpose : We observed response to PPD skin test and local side reactions among subjects who received inoculation with Tokyo 172 BCG strain by percutaneous method using multiple puncture device. Methods : 138 infants and young children were enrolled at Yongdong Severance Hospital and 7 private clinics. 5TU PPD skin test were performed at 4 months after inoculation. The local reactions at multiple puncture site were observed in 3 days, 4~6 weeks, 36 weeks, and 48 weeks after inoculations and physical check up was done for evaluation of lymphadenopathy. Results : During 48 weeks of observation period, 96 subjects among 138 who were enrolled were followed up completely with records of PPD skin test and observation of local side reactions, presenting with the photos. The size of the induration after 48 hours of PPD skin test, was less than 5mm in six subjects(6.3%), greater than 10mm in sixty seven subjects(70.0%) and greater than 12mm in forty six subjects(47.9%). All subjects showed inflammatory reaction and pustules at multiple puncture sites and only just small papules, ulcer and pustules remained 4-6 weeks later. Eight to twelve weeks later, all local inflammatory skin reactions disappeared with remaining crust. After 48 weeks, 4(4.2%) subjects showed no scar with only faint stain on the puncture site. More than 70% of subjects showed more than 10 faint pin-point scars on the sites. However, the size of scar was clearly smaller compared to that of intradermal inoculation. There were no cases of lymphadenopathy. Conclusion : We observed good immune response to 5TU PPD skin test among the infant and young children who were immunized with percutanous inoculation of Tokyo 172 BCG strain. We could not find any severe local scar at inoculation sites. A degree of satisfaction of the parents whose children received the percutaneous injection was very high.

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