• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.890-893
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• 2004

The ultra precision machining in industrial field are increased day by day. The diamond turning has been used generally, but now is faced with limitation of use, because of higher requirement of production field. The electron beam lithography is alternative in machining area as semiconductor production. For EB lithography, 5 axis vacuum stage is required to duplicate small and large patterns on wafer. The stage is composed of 2 rotational axis and 3 translational axis with 5 DC servo motors. The positioning repeatability and resolution of Z axis feed unit are 3.21$\mu$m and 0.5 $\mu$m/step enough to apply to lithography.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.659-660
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.435-436
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• 2011

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2011.06a
• /
• pp.575-576
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• 2011

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.775-776
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• 2013

• Proceedings of the Korean Society of Precision Engineering Conference
• /
• 2012.10a
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• pp.303-304
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• 2012

• Journal of the Korean Vacuum Society
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• v.7 no.4
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• pp.355-360
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• 1998

Epitaxial $Ba_{0.5}Sr_{0.5}TiO_3$thin films of two different thickness (~250 $\AA$ and ~1340 $\AA$) on MgO(001) prepared by a pulsed laser deposition method were studied by synchroton x-ray scattering measurements. The film initially grew on MgO(001) with a cube-on-cube relationship, maintaining it during further growth. As the film grew, the surface of the film became rough significantly, but the interface between the film and the substrate seemed to have changed little. In the early stage, the film was highly strained in a tetragonal structure with the longer axis parallel to the surface normal direction. As the growth proceeded further, it was mostly relaxed to a cubic structure with the lattice parameter of the bulk value and the mosaic distribution improved significantly in both in-plane and out-of-plane directions.

• Journal of the Korean Vacuum Society
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• v.14 no.3
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• pp.119-125
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• 2005

The horizontal reflectometer, which uses a neutron beam in the reactor, provides scientists a set of unique tools offering destruction-free investigation of biological membranes in the native-like environments in nano-meter scale. As an intial stage for the development of the first Korean neutron reflectometer with a horizontal sample geometry, we performed the instrumental simulation using MCSTAS, Monte Carlo Simulations of Triple Axis Spectrometers for neutron ray-tracing simulation. The results indicated that modeling of the overall instrument geometry based on the thermal neutron source with a wavelength of 2.55 $2.5{\AA}$ at HANARO was successfully performed, and further the optimization of the individual components of the instrument, including the collimator, monochromators, filter and supermirror has been made.