Plasma etching of $SiO_2$ using dielectric barrier discharge in atmospheric pressure
(Dielectric Barlier Discharge type 대기압 플라즈마 발생장치를 이용한 $SiO_2$ 식각에 관한 연구)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2009.05a
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- pp.95-95
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- 2009