• Title/Summary/Keyword: 355nm

Search Result 190, Processing Time 0.034 seconds

Retrieval of Vertical Single-scattering albedo of Asian dust using Multi-wavelength Raman Lidar System (다파장 라만 라이다 시스템을 이용한 고도별 황사의 단산란 알베도 산출)

  • Noh, Youngmin;Lee, Chulkyu;Kim, Kwanchul;Shin, Sungkyun;Shin, Dongho;Choi, Sungchul
    • Korean Journal of Remote Sensing
    • /
    • v.29 no.4
    • /
    • pp.415-421
    • /
    • 2013
  • A new approach to retrieve the single-scattering albedo (SSA) of Asian dust plume, mixed with pollution particles, using multi-wavelength Raman lidar system was suggested in this study. Asian dust plume was separated as dust and non-dust particle (i.e. spherical particle) by the particle depolarization ratio at 532 nm. The vertical profiles of optical properties (the particle extinction coefficient at 355 and 532 nm and backscatter coefficient at 355, 532 and 1064 nm) for non-dust particle were used as input parameter for the inversion algorithm. The inversion algorithm provides the vertical distribution of microphysical properties of non-dust particle only so that the estimation of the SSA for the Asian dust in mixing state was suggested in this study. In order to estimate the SSA for the mixed Asian dust, we combined the SSA of non-dust particles retrieved by the inversion algorithms with assumed the SSA of 0.96 at 532 nm for dust. The retrieved SSA of Asian dust plume by lidar data was compared with the Aerosol Robotics Network (AERONET) retrieved values and showed good agreement.

Optical Design of an Integrated Two-Channel Optical Transmitter for an HDMI interface (광 HDMI 인터페이스용 2채널 광송신기 광학 설계)

  • Yoon, Hyun-Jae;Kang, Hyun-Seo
    • Korean Journal of Optics and Photonics
    • /
    • v.26 no.5
    • /
    • pp.269-274
    • /
    • 2015
  • In this paper we design the optical system for an integrated two-channel TO-type optical transmitter to apply the HDMI interface using the code V simulator. The proposed integrated two-channel optical transmitter has two VCSELs attached in parallel on an 8-pin TO-CAN package, on top of which is a lens filter block ($1mm{\times}2mm{\times}4mm$) composed of hemispherical lenses and WDM filters. Considering two-channel transmitters manufactured with wavelength combinations of 1060nm/1270nm and 1330nm/1550nm, we obtain the optimum value of the diameter of the hemispherical lens as 0.6 mm for both combinations, and the distances L between the lens filter block and ball lens as 1.7 mm and 2.0 mm for the 1060nm/1270nm and 1330nm/1550nm wavelength combinations, respectively. At this time, the focal length f0 of the lens filter blocks for wavelengths of 1060, 1270, 1330, and 1550 nm are 0.351, 0.354, 0.355, and 0.359 mm, respectively, and the focal lengths F of light passing through the lens filter block and ball lens are 0.62 mm for 1060nm/1270nm and 0.60-0.66 mm for 1330nm/1550nm wavelength combinations.

Near-Infrared and Blue Emissions of LuNbO4:Yb3+, Tm3+ Phosphors (LuNbO4:Yb3+, Tm3+ 형광체의 근적외선 및 청색 발광 특성)

  • Im, Min Hyuk;Kim, Young Jin
    • Korean Journal of Materials Research
    • /
    • v.28 no.6
    • /
    • pp.355-360
    • /
    • 2018
  • $LuNbO_4:0.2Yb^{3+},xTm^{3+}$ powders were prepared using a solid-state reaction process. The effects of the amount of Tm on up-conversion(UC) and down-conversion(DC) luminescence properties are investigated. X-ray diffraction patterns confirm that $Yb^{3+}$ and $Tm^{3+}$ ions are successfully incorporated into Lu sites. Under 980 nm excitation, the UC spectra of the powders predominantly exhibit strong near-infrared emission bands that peak at 805 nm, whereas weak 480 nm emission bands are observed as well. The emission bands are assigned to the $^1G_4{\rightarrow}^3H_6$ (480 nm) and 3 $^3H_4{\rightarrow}^3H_6$ (805 nm) transitions of the $Tm^{3+}$ ions via an energy transfer from $Yb^{3+}$ to $Tm^{3+}$; two- and three-photon UC processes are responsible for the 805 and 480 nm emissions, respectively. The DC emission spectra exhibit blue emission ($^1D_2{\rightarrow}^3F_4$) of $Tm^{3+}$ at 458 nm. The amount of Tm affects the emission intensity with the strongest emissions at x = 0.007 and 0.02 for the UC and DC luminescence, respectively. The results demonstrate that $LuNbO_4:Yb^{3+},Tm^{3+}$ phosphors are suitable for bio-applications.

Study on the Luminescence of Si Nanocrystallites on Si Substrate fabricated by Changing the Wavelength of Pulsed Laser Deposition (펄스레이저 증착법의 레이저 파장변환에 의한 실리콘 나노결정의 발광 특성 연구)

  • 김종훈;전경아;최진백;이상렬
    • The Transactions of the Korean Institute of Electrical Engineers C
    • /
    • v.52 no.4
    • /
    • pp.169-172
    • /
    • 2003
  • Silicon nanocrystalline thin films on p-type (100) silicon substrate have been fabricated by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355, 532, and 1064 nm. The base vacuum in the chamber was down to $10^-6$ Torr and the laser energy densities were 1.0~3.0 J/$\textrm{cm}^2$ After deposition, silicon nanocrystalline thin films have been annealed at nitrogen gas. Strong Blue and green luminescence from silicon nanocrystalline thin films have been observed at room temperature by photoluminescence and its peak energies shift to green when the wavelength is increased from 355 to 1064 nm.

Blind Via Hole Drilling Using DPSS UV laser (DPSS UV 레이저를 이용한 블라인드 비아 홀 가공)

  • 김재구;장원석;신보성;장정원;황경현
    • Laser Solutions
    • /
    • v.6 no.1
    • /
    • pp.9-16
    • /
    • 2003
  • Micromachining using the DPSS 3rd Harmonic Laser (355nm) has outstanding advantages as a UV source in comparison with Excimer lasers in various aspects such as maintenance cost, maskless machining, high repetition rate and so on. It also has the greater absorptivity of many materials in contrast to other IR sources. In this paper, the process for micro-drilling of blind hole in Cu/PI/Cu substrate with the DPSS UV laser and the scanning device is investigated by the experimental methods. It is known that there is a large gap between the ablation threshold of copper and that of PI. We use the Archimedes spiral path for the blind hole with different energy densities to ablate the different material. Finally, the blind via hole of diameter 100$\mu\textrm{m}$ and 50$\mu\textrm{m}$ was drilled.

  • PDF

Metal work function dependent photoresponse of schottky barrier metal-oxide-field effect transistors(SB MOSFETs) (금속(Al, Cr, Ni)의 일함수를 고려한 쇼트키 장벽 트랜지스터의 전기-광학적 특성)

  • Jung, Ji-Chul;Koo, Sang-Mo
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
    • /
    • 2010.06a
    • /
    • pp.355-355
    • /
    • 2010
  • We studied the dependence of the performance of schottky barrier metal-oxide-field effect transistors(SB MOSFETs) on the work function of source/drain metals. A strong impact of the various work functions and the light wavelengths on the transistor characteristics is found and explained using experimental data. We used an insulator of a high thickness (100nm) and back gate issues in SOI substrate, subthreshold swing was measured to 300~400[mV/dec] comparing with a ideal subthreshold swing of 60[mV/dec]. Excellent characteristics of Al/Si was demonstrated higher on/off current ratios of ${\sim}10^7$ than others. In addition, extensive photoresponse analysis has been performed using halogen and deuterium light sources(200<$\lambda$<2000nm).

  • PDF

Micro machining of Polymers Using Photothermal Process (광열반응을 이용한 폴리머의 미세가공기술)

  • 장원석;신보성;김재구;황경현
    • Proceedings of the Korean Society of Precision Engineering Conference
    • /
    • 2003.06a
    • /
    • pp.616-619
    • /
    • 2003
  • Photochemical and photothermal effects have correlation with each other and depend on laser wavelength. Multi-scanning laser ablation process of polymer with DPSS(Diode Pumped Solid State) 3rd harmonic Nd:YVO$_4$ laser with wavelength of 355nm is applied to fabricate three-dimensional micro shape. The DPSSL photomachining system can rapidly and cheaply fabricate 2D pattern or 3D shape with high efficiency because we only use CAD/CAM software and precision stages instead of complex projection mask. Photomachinability of polymer is highly influenced by laser wavelength and its own chemical structure. So the optical characteristics of polymers for 355nm laser source is investigated by experimentally and theoretically.

  • PDF

Rapid Manufacturing of Laser Micro-Patterning Using Fixed Masks (고정 마스크에 의한 레이저 미세패터닝 쾌속 제작)

  • Shin, B.S.;Oh, J.Y.
    • Laser Solutions
    • /
    • v.9 no.1
    • /
    • pp.17-23
    • /
    • 2006
  • The technologies of laser micromachining are changed toward more complex-micropatterning, from the micro circle-shaped hole drilling to the micro arbitrary-shaped hole drilling. In this paper, the fundamental experiments by using DPSS 3rd harmonic $Nd:YVO_4\;laser({\lambda}=355nm)$ were carried out in order to obtain the feasibility of flexible micropatterning by various fixed masks. Fixed masks and Galvano scanners were investigatde to make micro patterns. from these experimental results, micropatterns on PEN film were rapidly manufactured in large area.

  • PDF

Study on the Luminescence of Si Nanocrystallites on Si Substrate Fabricated by Changing the Wavelength of Pulsed laser deposition (펄스레이저 증착법의 레이저 파장변환에 의한 실리콘 나노결정의 발광특성 연구)

  • Kim, Jong-Hoon;Bae, Sang-Hyuck;Lee, Sang-Yeol
    • Proceedings of the KIEE Conference
    • /
    • 2000.11c
    • /
    • pp.411-412
    • /
    • 2000
  • Si nanocrstallites on p-tyre (100) Si substrate have been fabricated by pulsed laser deposition technique using a Nd:YAG laser with the wavelength of 355, 532 and 1064 nm. The base vacuum in the chamber was down to $10^{-5}$ Torr and the pressure of the gas during deposition was varied from 1 to 3 Torr. After deposition, Si nanocrystallites have been annealed at $N_2$ gas. Nitrogen have been used as ambient gases. Strong blue and green luminescence from Si nanocrystallites has been observed in room temperature by photoluminescence and its peak energies shift to green when the wavelength is increased from 355-1064 nm

  • PDF

A Study on the Ablation of AZ5214 and SU-8 Photoresist Processed by 355nm UV Laser (355nm UV 레이저를 이용한 AZ5214와 SU-8 포토레지스트 어블레이션에 관한 연구)

  • Oh, J.Y.;Shin, B.S.;Kim, H.S.
    • Laser Solutions
    • /
    • v.10 no.2
    • /
    • pp.17-24
    • /
    • 2007
  • We have studied a laser direct writing lithography(LDWL). This is more important to apply to micro patterning using UV laser. We demonstrate the possibility of LDWL and construct the fabrication system. We use Galvano scanner to process quickly micro patterns from computer data. And laser beam is focused with $F-{\theta}$ lens. AZ5214 and SU-8 photoresist are chosen as experimental materials and a kind of well-known positive and negative photoresist respectively. Laser ablation mechanism depends on the optical properties of polymer. In this paper, therefore we investigate the phenomenon of laser ablation according to the laser fluence variation and measure the shape profile of micro patterned holes. From these experimental results, we show that LDWL is very useful to process various micro patterns directly.

  • PDF