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Identification of Aster Yellows Phytoplasma in Dendranthema grandiflorum

  • Chung, Bong-Nam;Park, Gug-Seoun;Kim, Hyun-Ran;Park, Yong-Mun
    • The Plant Pathology Journal
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    • 제17권1호
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    • pp.57-61
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    • 2001
  • Phytoplasmas were identified from two chrysanthemum (Dendranthema grandiflorum) plants showing different symptoms ; one with stusting, rosette, and excessive branching (Ph-ch1), and the other with stunting and chlorosis (Ph-ch2). Electron microscopy of midrib of the plants with the symptoms revealed that numerous phytoplasmas were localized in the phloem cells. The disease was transmitted from infected plants to healthy ones by grafting. Phytoplasma-specific DNA was detected in polymerase chain reaction (PCR) analysis with template DNA extracted from the leaves of Ph-ch1 and Ph-ch2, both of which yielded a same DNA band corresponding to 1.5 kb. Using a specific primer pair (R16F1/R1) synthesized based on aster yellows (AY) phytoplasma, a DNA fragment of 1.1 kb was amplified by PCR. Endonuclease restriction patterns of the 1.1 kb PCR products from Ph-ch1 and Ph-ch2, which were dgeste with each of the restriction endonucleases Sau3A, Hha, Alu and Rsa, were same as those of AY phytoplasma from periwinkle. This suggests that the chrysanthemum plants (Ph-ch1 and Ph-ch2) be infected with a phytoplasma belonging to AY phytoplasma.

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Role of CH2F2 and N-2 Flow Rates on the Etch Characteristics of Dielectric Hard-mask Layer to Extreme Ultra-violet Resist Pattern in CH2F2/N2/Ar Capacitively Coupled Plasmas

  • Kwon, B.S.;Lee, J.H.;Lee, N.E.
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2011년도 제40회 동계학술대회 초록집
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    • pp.210-210
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    • 2011
  • The effects of CH2F2 and N2 gas flow rates on the etch selectivity of silicon nitride (Si3N4) layers to extreme ultra-violet (EUV) resist and the variation of the line edge roughness (LER) of the EUV resist and Si3N4 pattern were investigated during etching of a Si3N4/EUV resist structure in dual-frequency superimposed CH2F2/N2/Ar capacitive coupled plasmas (DFS-CCP). The flow rates of CH2F2 and N2 gases played a critical role in determining the process window for ultra-high etch selectivity of Si3N4/EUV resist due to disproportionate changes in the degree of polymerization on the Si3N4 and EUV resist surfaces. Increasing the CH2F2 flow rate resulted in a smaller steady state CHxFy thickness on the Si3N4 and, in turn, enhanced the Si3N4 etch rate due to enhanced SiF4 formation, while a CHxFy layer was deposited on the EUV resist surface protecting the resist under certain N2 flow conditions. The LER values of the etched resist tended to increase at higher CH2F2 flow rates compared to the lower CH2F2 flow rates that resulted from the increased degree of polymerization.

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$CH_2F_2-CF_3CH_2F-CF_3CHF_2$계 냉매적용 태양열 열펌프시스템 성능 연구( I ) (A Study on the Performance of Solar Heat, Pump Cycle System for $CH_2F_2$, $CF_3CHF_2$ and $CF_3CH_2F$( I ))

  • 이순복;정현채;배준우;선경호
    • 한국태양에너지학회 논문집
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    • 제23권2호
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    • pp.71-79
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    • 2003
  • The goal of this paper is to measure and compare the performance of solar heat pump for refrigerants. To accomplish the goal, solar heat pump with aluminum roll bond type evaporator and indoor heat exchanged(condenser) was built. The test results showed that the COP and heating capacity of HFC-32/125/134a(23/25/52 wt%, $CH_2F_2/CF_3CHF_2/CF_3CH_2F$) were higher than those of HCFC-22$(CHClF_2)$. A study proved that best conditions to use heating system that is about $40m^2$ and $80m^2$. The COP range of the whole system was from 4 to 6 according to the solar collector's area variation. Hydrochlo-rofluorocarbon HCFC-22$(CHClF_2)$ is included in the compound to be controlled. HFC-32/125/134a(23/25/52 wt%, $CH_2F_2/CF_3CHF_2/CF_3CH_2F$) is the most suitable replacement HCFC-22$(CHClF_2)$ in solar heat pump application. The solar heat pump system was designed to show the best efficiency that the room temperature make $18\sim20^{\circ}C$ and $23\sim25^{\circ}C$ in Seoul during the fall season.

CNG 버스의 CH4 저감용 NGOC의 de-CH4 특성 (The De-CH4 Characteristics of NGOC for CH4 Reduction of a CNG Bus)

  • 서충길;최병철
    • 동력기계공학회지
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    • 제20권4호
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    • pp.69-74
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    • 2016
  • Recently, in order to meet the stricter emission regulations, the proportion of after-treatments for vehicle and vessel is increasing gradually. The purpose of this study is to investigate the de-$CH_4$ characteristics of NGOC in front of proposed combined system according to additive catalyst and support ratio. In the case of Pd addition, the de-$CH_4$ performance of 2Pt-2Pd-3MgO/$Al_2O_3$ NGOC was improved by approximately 10 to 20% for the HC components. The de-$CH_4$ performance of 2Pt-2Pd-3Cr-3MgO/$Al_2O_3$ NGOC was higher compared to five kinds of NGOC catalysts, because Cr particle was smaller and dispersion of Pd was increased. The NGOC(Zeolite:$Al_2O_3$(80%:20%)}catalyst according to support ratio, was improved performance at low temperature region on CO and NO conversion rate.

갯벌의 무척추 동물 서식굴 내 메탄산화 평가 (Assessment of CH4 oxidation in macroinvertebrate burrows of tidal flats)

  • 강정원;권개경;우한준;최재웅
    • 한국습지학회지
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    • 제21권2호
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    • pp.95-101
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    • 2019
  • 식생이 없는 갯벌에서 메탄($CH_4$) 플럭스는 배출과 흡수 양상을 보인다. 특히 메탄영양세균 개체군은 메탄 흡수에 상당한 영향을 준다. 본 예비연구는 거대 무척추 동물의 서식활동(bioturbation) 영향을 이해하기 위해 원형 밀폐 챔버 방법을 사용하여 갯벌에서 메탄 플럭스를 조사하였다. 챔버는 십각목(decapoda)의 mud shrimp(Laomedia astacina)와 crab(Macrophthalmus japonicas) 서식굴에 약 2시간 동안 배치되었고, 메탄과 이산화탄소($CO_2$) 농도는 밀폐된 $CH_4/CO_2$ 확산 플럭스 관측 장비를 사용하여 지속적으로 모니터링 되었다. 서식굴 길이가 긴 Laomedia astacina 위치에서는 깊은 퇴적층의 메탄 방출 때문에 상대적인 높은 수준의 메탄 발생을 일으킨 것으로 나타났다. 또한, 서식굴 퇴적물에서 발견되는 메탄영양세균 개체군은 메탄 산화(oxidation) 잠재력을 나타냈다. 특히 서식굴 내 아질산염 관련 혐기성 산화(anaerobic oxidation of methane, AOM)가 확인되었다. 이러한 메탄 산화 발생은 챔버 실험 동안 이산화탄소의 탄소 안정동위원소비(${\delta}^{13}C$) 감소로 뒷받침되었다. 따라서 갯벌에서 무척추 동물의 서식활동은 대기 중 메탄 농도를 제어할 수 있는 중요한 생태계 환경으로 보인다.

CH3COOH 농도가 수열법으로 제조된 Fe2O3 담지 감마알루미나 촉매의 특성에 미치는 영향 (Effect of CH3COOH Concentration on Characteristics of Fe2O3Supported δ-alumina Catalyst by Hydrothermal Method)

  • 박병기;이정민;서동수
    • 한국세라믹학회지
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    • 제40권8호
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    • pp.758-764
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    • 2003
  • 비정질알루미나와 기공형성제를 물과 혼합하여 원통형으로 성형하고 수화, 건조 및 소성하여 ${\gamma}$-alumina pellets을 제조하였다. 촉매 전구체인 Fe(NO$_3$)$_3$ㆍ9$H_2O$의 농도를 일정하게 하면서 $CH_3$COOH의 농도를 2.5~20% 범위로 변화시킨 혼합용액을 제조하고, 여기에 ${\gamma}$-alumina pellets을 침척하여 $200^{\circ}C$ 온도로 3시간 수열처리 한 다음, 결정의 생성 및 변화, 기공특성, $N_2$ 흡/탈차특성, 산점변화 그리고 기계적 강도 등을 조사하였다. $CH_3$COOH 의 농도에 따라 0.5~2${\mu}m$ 길이의 침상으로 결정이 성장하였고, 결정구조는 의사베마이트 구조를 나타냈다. 10% $CH_3$COOH 용액에서 수열처리 했을 때 100~1000$\AA$사이의 기공부피가 0.86cc/g롤 가장 높았으며, 질소 흡탈착 이력곡선의 폭이 가장 작게 나타났다. $CH_3$COOH 농도가 5~15% 범위일 때 새로운 C-H 관능기가 형성되었고, 촉매의 기계적 강도도는 $CH_3$COOH 농도가 2.5%일 때 1.35MPa로 가장 높았다.

Reactivity of RhCp* Complexes Containing Labile Ligands toward Potential Linking Ligands Containing Terminal Thiophene or Furan Rings:Preparation and Structures of [Cp*Rh(L1)Cl2], [Cp*Rh(η2-NO3)(L1)](OTf),and {[Rh(L2)] · (OTf)}[L1 = 1,2-Bis((thiophen-2-yl)methylene)hydrazine); L2 = 1,2-Bis((furan-2-yl)methylene)hydrazine]

  • Lee, Kyung-Eun;Lee, Soon-W.
    • Bulletin of the Korean Chemical Society
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    • 제31권12호
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    • pp.3600-3604
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    • 2010
  • Rhodium(III)-$Cp^*$ complexes containing labile ligands, $[Cp^*RhCl_2]_2$, [$Cp^*Rh({\eta}^2-NO_3)$(OTf)], and $[Cp^*Rh(OH_2)_3](OTf)_2$, reacted with potential linking ligands [$L^1$ = (2-thiophene)-CH=N-N=CH-(2-thiophene); $L^2$ = (2-furan)-CH=N-N=CH-(2-furan)] to give two molecular compounds, [$Cp^*Rh(L^1)Cl_2$] (1) and [$Cp^*Rh({\eta}^2-NO_3)(L^1)$]$(OTf){\cdot}CH_2Cl_2$ ($2{\cdot}CH_2Cl_2$), and one 1-dimensioanl coordination polymer, $\{[Rh(L^2)]{\cdot}(OTf)}_{\infty}$ (3). Whereas one imine nitrogen atom within the ligand is coordinated to the Rh metal in compounds 1 and 2, both nitrogen atoms are bound to two neighboring Rh metals in compound 3 to lead to a 1-D chain polymer.

중국수의의 문헌적 고찰 (A Study on thed Literature of Chinese Shroud)

  • 유관순
    • 복식
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    • 제25권
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    • pp.117-118
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    • 1995
  • Chinese shroud through literatures are as follows. 1. Taetae, Sime i, P'oo, Hansam, Ko, Mal, Nukpaek, Kwatu, Cu'ungi, Pokk n, Myokmok, Ri, Aksu, Mo and m were used the most in China. 2. The cloths of Chinese shroud were p'o, Paek, Kyon and Kum. The colors of the Chinese shroud were Hyon, Hun and white. 3. The size of the Chinese shroud is as follows. The size of the Ch'ungi was similar to the size of jujube kernel, the length of Myokmok was one Ch' k two Ch'on or one Ch' k five Ch'on, the length of Aksu was one Ch' k two Ch'on and it's width was five Ch'on. The chil of Mo reached the hands and the length of Swae was three Ch' k and the length of m was five Ch'on. 4. In Chinese shroud, cotton was put in P'oo, Aksu was tide by the strings at two corners. Myokmok was tied by the strings of four corners. The tip of the m was divided and Mo wrapped the whole body. 5. The clothes of Soryom was nineteen Ch'ing. The clothes of Taeryom in Kun were one hundred Ch'ing in the Chinese. The impliment of Soryom were Kum, Kyo, Sange i, Sane i, Ch'im, Yok and Kyon in the Chinese shroud. In the case of the implement of Taeryom, the chinese shroud had Kum, Kyo, Sange i, Sane i, Ch'im and Yok.

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Kinetic Investigation of CO2 Reforming of CH4 over Ni Catalyst Deposited on Silicon Wafer Using Photoacoustic Spectroscopy

  • Yang, Jin-Hyuck;Kim, Ji-Woong;Cho, Young-Gil;Ju, Hong-Lyoul;Lee, Sung-Han;Choi, Joong-Gill
    • Bulletin of the Korean Chemical Society
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    • 제31권5호
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    • pp.1295-1300
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    • 2010
  • The $CO_2-CH_4$ reaction catalyzed by Ni/silicon wafers was kinetically studied by using a photoacoustic technique. The catalytic reaction was performed at various partial pressures of $CO_2$ and $CH_4$ (50 Torr total pressure of $CO_2/CH_4/N_2$) in the temperature range of 500 - $650^{\circ}C$ in a static reactor system. The photoacoustic signal that varied with the $CO_2$ concentration during the catalytic reaction was recorded as a function of time. Under the reaction conditions, the $CO_2$ photoacoustic measurements showed the as-prepared Ni thin film sample to be inactive for the reaction, while the $CO_2/CH_4$ reactions carried out in the presence of the sample pre-treated in $H_2$ at $600^{\circ}C$ were associated with significant time-dependent changes in the $CO_2$ photoacoustic signal. The rate of $CO_2$ disappearance was measured from the $CO_2$ photoacoustic signal data in the early reaction period of 50 - 150 sec to obtain precise kinetic data. The apparent activation energy for $CO_2$ consumption was determined to be 6.9 kcal/mol from the $CO_2$ disappearance rates. The partial reaction orders, determined from the $CO_2$ disappearance rates measured at various $PCO{_2}'S$ and $PCH{_4}'S$ at $600^{\circ}C$, were determined to be 0.33 for $CH_4$ and 0.63 for $CO_2$, respectively. Kinetic data obtained in these measurements were compared with previous works and were discussed to construct a catalytic reaction mechanism for the $CO_2-CH_4$ reaction over Ni/silicon wafer at low pressures.