• Journal of Korean Society of Environmental Engineers
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• v.32 no.11
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• pp.1011-1016
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• 2010

The $H_2S$ adsorption characteristics and property analyses of granular activated carbon adsorbent impregnated with basic solution such as NaOH, KOH, and $(CH_2CH_2OH)_2NH$ were investigated. The concentrations of NaOH and KOH reagent ranged over 1 to 5 M, The concentration of $(CH_2CH_2OH)_2NH$ was in the range of 0.1 to 1 M. Adsorption temperature($25{\sim}45^{\circ}C$) and adsorbate ($H_2S$) concentration (18.23 mg/L) were applied. The experimental results showed that the BET surface area of activated carbon impregnated with KOH decreases from $1,050\;m^2/g$ to $750\;m^2/g$, and the acidity of activated carbon impregnated with NaOH decreases from 0.541 meq/g-AC to 0 meq/g-AC, as the concentration of basic solution increases, while the pH of impregnated activated carbon increased from 9.54 to 10.94 for three basic solutions. It was also found that the $H_2S$ adsorption equilibrium capacity of activated carbon impregnated with NaOH, KOH, $(CH_2CH_2OH)_2NH$ increased with increasing temperature and $H_2S$ adsorption equilibrium capacity of the activated carbon impregnated with diethanolamine was much higher than other cases. At adsorption temperature of $45^{\circ}C$, the $H_2S$ adsorption equilibrium capacity of impregnated activated carbon was 2.0~3.3 times lager than that of pure activated carbon.

• Journal of the Korean Vacuum Society
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• v.11 no.3
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• pp.183-188
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• 2002

In the present study AI$(CH_3)_3)$films were deposited by the ALD technique using trimethylaluminum(TMA) and ozone to improve the quality of the AI$(CH_3)_3)$ films, since the $OH^-$ radicals existing in the AI$(CH_3)_3)$ films deposited using TMA and $H_2O$ degrade the physical and the dielectric properties of the AI$(CH_3)_3)$ film. The XPS analysis results indicate that the $OH^-$ radical concentration in the AI$(CH_3)_3)$film deposited using $O_3$is lower than that using $H_2O$. The etch rate of the AI$(CH_3)_3)$film deposited using $O_3$is also lower than that using $H_2O$, suggesting that the chemical inertness of the former is better than the latter. The MIS capacitor fabricated with the TiN conductor and the $Al_2$O$_3$dielectrics formed using $O_3$offers lower leakage current, better insulating property and smaller flat band voltage shift $({\Delta}V_{FB})$.

• Journal of the Korean Vacuum Society
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• v.6 no.3
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• pp.282-286
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• 1997

Reactive ion etching (RIE) characteristics of InP in the $Cl_2$/ CH_4/H_2$ discharges was investigated, as a function of the rf power, substrate temperature and gas composition. It was observed that the etch rate increased as the rf power, sample temperature and/or $Cl_2$ gas concentration increased. Etch rate of about 0.9$\mu\textrm{m}$/min was obtained at the optimum condition of 150W rf power, $180^{\circ}C$ substrate temperature and $10Cl_2$ /$5CH_4/85H_2$ gas ratio. Polymer formation was completely suppressed by adding $Cl_2$ to the $CH_4$ /$H_2$ discharges.

• Bulletin of the Korean Chemical Society
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• v.16 no.6
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• pp.524-528
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• 1995

The reaction of [IrCl(cod)]2 with ppol ligand, Ph2PCH2CH2CH2P(Ph)CH2CH2CH=CH2, in ethanol gives an iridium complex, whose structure is converted from an ionic form, [Ir(cod)(ppol)]Cl·2C2H5OH (1),in polar solvents (ethanol, methanol and acetonitrile), to a molecular form, [IrCl(cod)(ppol)], in non-polar solvents (benzene and toluene). The cationic complexes, [Ir(cod)(ppol)]AsF6·1/2C2H5OH and [Ir(cod)(ppol)]PF6·1/2CH3CN, were prepared to compare with the ionic form by 31P NMR spectroscopy. When carbon monoxide is introduced to 1, cod is replaced by CO to give the 5-coordinated complex, [IrCl(CO)(ppol)]. Hydrogenation of 1-octene was not successful in the presence of 1. In order to verify the reason for 1 not behaving as a good catalyst for hydrogenation, electrophilic reactions with HCl, I2 and HBF4·etherate were performed, which yielded the oxidative addition product, [IrHCl2(ppol)], the substitution product, [IrI(cod)(ppol)], and another cationic product, [Ir(cod)(ppol)]BF4, respectively. Thus, the iridium complex is not sufficiently basic to activate hydrogen atoms or the olefin of the ppol ligand.

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.648-653
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• 1996

Hydrogenated amorphous carbon(a-C:H) films are prepared by rf plasma CVD in a $CH_4$ source gas system diluted with Ar of $H_2$. The spectra of emissive and reactive species in the plasma are detected using in stiu optical emission spectroscopy. Inaddition, the relationship between the film properties which can be varied by the deposition parameters and the Raman spectra is studied. In the $CH_4/H_2$ gas system, the emission intensities of CH and $H \tau$ decrease and those of $H \alpha$, $H \beta$, $C_2$ and Ar increase with increasing $H_2$ concentration, The formation of $C_2$ and CH in the $CH_4/Ar/H_2$ gas system is greatly suppressed by hydrogen addition and the excess of hydrogen addition is found to form graphite structure. The $C_2$ formation in the gas phase enhances a-C:H film formation.

• Proceedings of the Korea Society for Energy Engineering kosee Conference
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• 2004.11a
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• pp.195-200
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• 2004

Carbon dioxide ($CO_2$) and methane (CH$_4$) are two major greenhouse Bases. $CO_2$is a stack gas of many industrial processes and the main product of the hydrocarbon combustion. There is recent research interest on the synthesis gas (syngas) formation from $CO_2$ and CH$_4$, via the following reaction: CH$_4$+$CO_2$longrightarrow 2H$_2$+$CO_2$, in order to reduce the greenhouse effects and to synthesize various chemicals, Preliminary experiments were conducted on the conversion of $CO_2$ and CH$_4$ to syngas by making use of a microwave plasma torch at atmospheric pressure. Conversion rates of $CO_2$and CH$_4$ to hydrogen (H$_2$), carbon monoxide (CO) and higher hydrocarbons were investigated using Gas Chromatography (GC) and Fourier Transform Infrared (FTIR). The experimental data indicate that the main products were H$_2$, CO and small amount of higher hydrocarbons, such as ethylene (C$_2$H$_4$).

• Korean Journal of Soil Science and Fertilizer
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• v.45 no.5
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• pp.853-860
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• 2012

To estimate potential use of fly ash in reducing $CH_4$ and $CO_2$ emission from soil, $CH_4$ and $CO_2$ fluxes from a paddy soil mixed with fly ash at different rate (w/w; 0, 5, and 10%) in the presence and absence of fertilizer N ($(NH_4)_2SO_4$) addition were investigated in a laboratory incubation for 60 days under changing water regime from wetting to drying via transition. The mean $CH_4$ flux during the entire incubation period ranged from 0.59 to $1.68mg\;CH_4\;m^{-2}day^{-1}$ with a lower rate in the soil treated with N fertilizer due to suppression of $CH_4$ production by $SO_4^{2-}$ that acts as an electron acceptor, leading to decreases in electron availability for methanogen. Fly ash application reduced $CH_4$ flux by 37.5 and 33.0% in soils without and with N addition, respectively, probably due to retardation of $CH_4$ diffusion through soil pores by addition of fine-textured fly ash. In addition, as fly ash has a potential for $CO_2$ removal via carbonation (formation of carbonate precipitates) that decreases $CO_2$ availability that is a substrate for $CO_2$ reduction reaction (one of $CH_4$ generation pathways) is likely to be another mechanisms of $CH_4$ flux reduction by fly ash. Meanwhile, the mean $CO_2$ flux during the entire incubation period was between 0.64 and $0.90g\;CO_2\;m^{-2}day^{-1}$, and that of N treated soil was lower than that without N addition. Because N addition is likely to increase soil respiration, it is not straightforward to explain the results. However, it may be possible that our experiment did not account for the substantial amount of $CO_2$ produced by heterotrophs that were activated by N addition in earlier period than the measurement was initiated. Fly ash application also lowered $CO_2$ flux by up to 20% in the soil mixed with fly ash at 10% through $CO_2$ removal by the carbonation. At the whole picture, fly ash application at 10% decreased global warming potential of emitted $CH_4$ and $CO_2$ by about 20%. Therefore, our results suggest that fly ash application can be a soil management practice to reduce green house gas emission from paddy soils. Further studies under field conditions with rice cultivation are necessary to verify our findings.

• Bulletin of the Korean Chemical Society
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• v.30 no.8
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• pp.1899-1902
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• 2009

• Journal of fish pathology
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• v.6 no.2
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• pp.103-110
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• 1993

Total genomic DNA library of Serratia marcescens was prepared by inserting Sau3AI partial digesting fragments(above 5 kb) into the dephosphorylated BamHl site of pUC19. In primary screening, two colonies were selected by observing the halo around E. coli transformants grown on the swollen colloidal chitin media. Secondary screening was performed by soaking two colonies with a few drops of 4-methylumbelleliferryl N-acetyl-$\beta$-D-glucocosaminide(4-MuNGlcNAc). As 4-MuNGlcNAc is a specific, fluorogenic substrate for chitinase, the positive clones produce light fluorescence by the exposure under the long wave U.V. light(360 nm). From genomic DNA library derived from pUC19, we have isolated two different chitinase clones, pCH1(11.0Kb) and pCH2(7.5Kb), which show completely different restriction map to each other. The cross-hybridization of pCH1EA and pCH2 have not revealed any hybridization signals to each other.

• Korean Journal of Materials Research
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• v.21 no.9
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• pp.486-490
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• 2011

Nano-indium-coated ZnO:In thick films were prepared by a hydrothermal method. ZnO:In gas sensors were fabricated by a screen printing method on alumina substrates. The gas sensing properties of the gas sensors were investigated for hydrocarbon gas. The effects of the indium concentration of the ZnO:In gas sensors on the structural and morphological properties were investigated by X-ray diffraction and scanning electron microscopy. XRD patterns revealed that the ZnO:In with wurtzite structure was grown with (1 0 0), (0 0 2), and (1 0 1) peaks. The quantity of In coating on the ZnO surface increased with increasing In concentration. The sensitivity of the ZnO:In sensors was measured for 5 ppm $CH_4$ gas and $CH_3CH_2CH_3$ gas at room temperature by comparing the resistance in air with that in target gases. The highest sensitivity to $CH_4$ gas and $CH_3CH_2CH_3$ gas of the ZnO:In sensors was observed at the In 6 wt%. The response and recovery times of the 6 wt% indiumcoated ZnO:In gas sensors were 19 s and 12 s, respectively.