• The Journal of The Korea Institute of Intelligent Transport Systems
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• v.13 no.2
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• pp.50-56
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• 2014

This paper describes the design, fabrication, and measurement of a 4-port femtocell MIMO antenna for LTE 700MHz(Band12, 13, 14, 17, 28, 44) applications. Based on microstrip patch antenna, an impedance matching is achieved by short pin. In order to obtain sufficient bandwidth and isolation between antenna elements in a limited dimension, a cross decoupler is used. With a Voltage Standing Wave Ratio (VSWR)${\leq}2$, the measured result of the fabricated antenna provides 105MHz(0.698~0.803MHZ) bandwidth and shows the gain with 1.97dBi and isolation above 13dB. As one of the key parameters for MIMO performance evaluation, correlation coefficient of MIMO is achieved within 0.2.

• Journal of the Korean Society for information Management
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• v.26 no.3
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• pp.335-353
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• 2009

Since libraries first used RFID systems in the late 1990's, there is growing debate about the advantages and disadvantages of HF and UHF RFID systems. This study tries to explore practical issues in HF and UHF RFID systems especially in the areas of system characteristics and advantages and disadvantages affecting technology implementation to libraries. This study investigates the current status of RFID systems in Korean libraries, and analyzes the best practices of four libraries(two libraries in HF and two libraries in UHF respectively). Also, this study describes functional characteristics of HF and UHF RFID systems, debates on frequencies in ISO/DIS 28560, and the opinions of both manufacturers which provide RFID systems to libraries and librarians who use HF and UHF RFID systems in their libraries.

• Journal of the Korea Academia-Industrial cooperation Society
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• v.9 no.2
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• pp.333-338
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• 2008

In this paper, a new NMOS current-mirror type bridge rectifier for driving RFID chips, whose minimum input voltage required to obtain the effective DC output voltage is low enough and whose power dissipation can be reduced than that of conventional one, is proposed. The designed rectifier is able to supply high enough and well-rectified DC voltages to drive RFID transponder chips for the frequency range of 13.56 MHz HF(for ISO 18000-3), 915 MHz UHF(fur ISO 18000-6), and 2.45 GHz microwave(for ISO 18000-4). Output characteristics of the proposed rectifier are analyzed with the high frequency equivalent circuit. And the circuitry method for effective reducing of the gate leakage current due to the increasing of operating frequency is also proposed theoretically. Using this method, the power consumption of $100\;{\mu}W$ and the DC output voltage of 2.13V for 3V peak-to-peak input voltage and $45\;K{\Omega}$ load resistance are obtained. Compared to conventional one, the proposed rectifier operates in more stable and shows superior characteristics in UHF and microwave frequencies.

• Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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• 2018.05a
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• pp.232-234
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• 2018

In this study, We developed the non-contact RFID smart tag system. which are consists of passive RFID Tag and Reader. The system was designed for the low frequency of 13.56Mhz-band. The developed RFID smart tag board was developed to improve response time through simulation experiments were conducted. We introduced in the body of an RFID tag technology, circuit design and simulation and experimental results are described.

• Journal of the Korean Vacuum Society
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• v.4 no.2
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• pp.210-216
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• 1995

최근에 연구되고 있는 저온, 저압 플라즈마를 이용한 식각기술 중 차세대 반도체 metallization 공정에 응용될 수 있는 가장 적합한 기술이라 사료되는 유도 결합형 플라즈마(Inductively Coupled Plasma : ICP)를 이용한 RF 스퍼터 식각 반응로를 제작하고 이에 대한 특성을 조사하였다. 유도용 주파수로서 13.56 MHz를 사용하였으며 유도결합을 일으키기 위해 3.5회의 나선형 평판형 코일을 사용함으로써 비교적 대면적에 균일한 고밀도 플라즈마를 얻을 수 있었다. 또한 기판에 독립적인 13.56MHz RF power를 가해 DC 바이어스를 인가함으로써 기판으로 입사하는 하전입자들의 에너지를 조절하여 기판에의 손상을 최소화하며 SiO2의 스퍼터 식각 속도를 극대화할 수 있었다. 따라서 이러한 특성을 갖는 유도 결합형 플라즈마 식각장치를 차세대 반도체의 RF스퍼터 식각 공정에 응용할 수 있으리라 사료된다.

• Proceedings of the Korean Vacuum Society Conference
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• 2014.02a
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• pp.489.1-489.1
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• 2014

Plasma Enhanced Chemical Vapor Deposition (PECVD) 장치를 통하여 증착된 수소화된 질화막(SiNx:H)은 결정질 태양전지의 반사방지막과 패시베이션 층으로 널리 사용되고 있다. 본 연구에서는 PECVD 장치내에 플라즈마를 형성하는 무선주파수(Radio Frequency)를 다양하게 변화시켜 수소화된 실리콘 질화막의 경향성을 알아보고 각 무선주파수에서 최적화된 패시베이션층을 태양전지에 적용하여 그 특성들을 분석하였다. 다양한 무선주파수 범위는 고주파(High Frequency: 13.56 MHz), 저주파 (Low Frequency: 440 kHZ) 그리고 혼합주파(Dual Frequency: 13.56 MHz + 440 kHz)를 각각 이용하여 수소화된 질화막을 증착 하였으며 $156{\times}156mm$ 대면적 결정질 실리콘 태양전지를 제작하여 비교하였다.

• Journal of the Korean institute of surface engineering
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• v.29 no.6
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• pp.760-765
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• 1996

Silicon oxide thin films are prepared by plasma-enhanced CVD (PECVD) using 100kHz and 13.56MHz generators. Source gases are two sorts of mixture, tetramethoxysilane (TMOS) and oxygen, and tetramethylsilane (TMS) and oxygen. We investigate the effect of frequency on film properties of deposited films including mechanical properties. 100kHz PECVD process can deposit silicon oxide films at $23^{\circ}C$ at the power of 20W. X-ray photoelectron spectroscopy (XPS), infrared spectroscopy (IR) and ellipsometric measurements reveal that the structural quality of the films prepared both by 100kHz process and by 13.56MHz process are very like silicon dioxide. The 100kHz process is adequate for low temperature deposition of SiOx films.

• Journal of the Semiconductor & Display Technology
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• v.4 no.3 s.12
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• pp.35-38
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• 2005

Due to high permeability of the ferrite cores, the characteristics of the inductively coupled plasma(ICP) are expected to be greatly improved. We investigated the effect of the ferrite cores on conventional inductively coupled plasma. It was observed that the current and voltage in the ICP antenna are slightly decreased and the power transfer efficiency is increased. However, due to eddy current and hysteresis loss, plasma density in the ICP with the ferrite cores is not increased. It seems that the ICP with the ferrite cores at low frequency ($\∼$100 kHz) will be greatly improved since the losses at the low frequency can be negligible.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1994.05a
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• pp.17-20
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• 1994

PTCRl(positive temperature coefficient of resistivity) thermistors in the thin file BaTiO$_3$ system were deposited by radio frequency (13.56 MHz) and dc radio frequency (13.56MHz) and dc magnerton sputter equipment. R-T(resistivity -temperature) properties was investigated as a function of substrate and the temperature variation. The specimens make a comperison between the thin films and the bulk in the resistivity variation. Substrate temperature. deposition time. and forward power are deposited at the 400$^{\circ}C$, 10 hours, and 210 watt. respectively. The aim of this work is to obtain lower than bulk specimen resistivity in thin films BaTiO$_3$ system thermistor by RF/DC magnetron sputter equipment.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2005.09a
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• pp.197-202
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• 2005

Due to high permeability of the ferrite core, the characteristics of the ICP are expected to be greatly improved. We investigated the effect of the ferrite cores on conventional inductively coupled plasma. It was observed that the current and voltage in ike ICP antenna are slightly decreased and the power transfer efficiency is increased. However, due to eddy current and hysterisis loss, plasma density in the ICP with the ferrite cores is not increased. It seems that the ICP with the ferrite cores at low frequency (${\~}$100kHz) will be greatly improved since the losses at the low frequency can be negligible.