• Title/Summary/Keyword: 1-V characteristics

Search Result 4,917, Processing Time 0.036 seconds

Analysis of The Electrical Characteristics of Power IGBT According to Design and Process Parameter (설계 및 공정 변수에 따른 600 V급 IGBT의 전기적 특성 분석)

  • Kang, Ey Goo
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.29 no.5
    • /
    • pp.263-267
    • /
    • 2016
  • In this paper, we analyzed the electrical characteristics of NPT planar and trench gate IGBT after designing these devices according to design and process parameter. To begin with, we have designed NPT planar gate IGBT and carried out simulation with T-CAD. Therefore, we extracted design and process parameter and obtained optimal electrical characteristics. The breakdown voltage was 724 V and The on state voltage drop was 1.746 V. The next was carried out optimal design of trench gate power IGBT. We did this research by same drift thickness and resistivity of planar gate power IGBT. As a result of experiment, we obtain 720 V breakdown voltage, 1.32 V on state voltage drop and 4.077 V threshold voltage. These results were improved performance and fabrication of trench gate power IGBT and planar gate Power IGBT.

A Study on the Ontology Modeling by Analyzing RiC-CM v0.2 (RiC-CM v0.2 분석을 통한 온톨로지 모델링에 관한 연구)

  • Jeon, Ye Ji;Lee, Hyewon
    • Journal of Korean Society of Archives and Records Management
    • /
    • v.20 no.1
    • /
    • pp.139-158
    • /
    • 2020
  • This study is the first paper to introduce in the country the preview of RiC-CM v0.2, the standard for the description of records based on archival principles by the ICA in December 2019, and an early stage of research that considers how to apply it at archive management. This study was conducted as follows. First, this study compared and analyzed entities, attributes, and relations of RiC-CM v0.1 and v0.2, and extracted the characteristics of version 0.2. Second, this study tried to confirm the semantic structure of the archives by constructing the ontology modeling in consideration of the basic principle and the extracted characteristics of version 0.2, and built ontology modeling using Protégé. Finally, this study figured out the differences from version 0.1 through entering individuals into Protégé and examined how the characteristics of version 0.2 was represented by ontology.

Quality Characteristics of Salt-Fermented Anchovy Sauce and Sandlance Sauce (멸치액젓 및 까나리액젓의 품질 특성)

  • OH Kwang-Soo
    • Korean Journal of Fisheries and Aquatic Sciences
    • /
    • v.32 no.3
    • /
    • pp.252-255
    • /
    • 1999
  • The quality characteristics of the Korean traditional salt-fermented fish sauces, the traditional anchovy sauce (TAS) and the sandlance sauce(TKS) were evaluated comparing to the commercial anchovy sauce (CAS) and sandlance sauce (CKS). The acidity was higher in TKS than in TAS, whereas the contents of VBN, total-N and amino-N were higher levels in TAS. In color values, L and b values in TAS were generally higher than those in TKS, whereas a and ${\Delta}E$ values were higher in TKS. The contents of total free amino acids in TAS and TKS were $12.40\;g\%$ (w/v) and $9.549 g\%$ (w/v), respectively. The contents or six amino acids, alanine, glutamic acid, leucine, isoleucine, valine and Iysine were higher in TAS, whereas the contents of arginine, glutamic acid, leucine, alanine and valine were higher in TKS. Nucleotides such as IMP and hypoxanthine were principal components in both TAS and TKS. The nitrogen related compounds, TMAO, TMA and total creatinine were determined to be $108.8\;mg\%$ (w/v), $60.5\;mg\%$ (w/v), $62.4\;mg\%$ (w/v) in TAS, and those in TKS were $60.1\;mg\%$ (w/v), $24.1\;mg\%$ (w/v), $67.6\;mg\%$ (w/v), respectively.

  • PDF

Characterization of Current Drivability and Reliability of 0.3 um Inverse T-Gate MOS Compared with Those of Conventional LDD MOS (0.3 um급 Inverse-T Gate 모스와 LDD 모스의 전류구동력 및 신뢰성 특성비교)

  • 윤창주;김천수;이진호;김대용;이진효
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.30A no.8
    • /
    • pp.72-80
    • /
    • 1993
  • We fabricated 0.3um gate length inverse-T gate MOS(ITMOS) and conventional lightly doped drain oxide spacer MOS(LDDMOS), and studied electrical characteristics for comparison. Threshold voltage of 0.3um gate length device was 0.58 V for ITMOS and 0.6V for LDDMOS. Measured subthreshold characteristics showed a slope of 85mV/decades for both ITLDD and LDDMOS. Maximum transconductance at V S1ds T=V S1gs T=3.3V was 180mS/mm for ITMOS and 163mS/mm for LDDMOS respectively. GIDL current was observed to be 0.1pA/um for ITOMS and 0.8pA/um for LDDMOS. Substrate current of ITMOS as a function of drain current was found to be reduced by a foactor of 2.5 compared with that of LDDMOS.

  • PDF

A Characteristics of Horizontal Swing Angle of Suspension Clamp in V type Suspension String Sets (V련 현수애자장치의 클램프 횡진 특성)

  • Sohn Hong-Kwan;Lee Hyung-Kwon;Min Byeong-Wook
    • The Transactions of the Korean Institute of Electrical Engineers A
    • /
    • v.54 no.3
    • /
    • pp.133-138
    • /
    • 2005
  • This paper presents a characteristics of horizontal swing angle in V type suspension string sets for 765kV T/L. The design of V type suspension string set does not differ from that of general string set for general towers, but it prevents instabilities from swing motion by the horizontal angle and by the wind pressure. We were designed specially 6 conductor yoke, arcing horn and earth horn. And we were decided to 550mm for a distance of strings. We were carried out characteristics of horizontal swing test and movement of mass center test for V-string sets of 400kN single, 300kN double and 400kN double. This products will be used for 765kV T/L of 1 circuit in suspension towers.

Sintering Effect on Clamping Characteristics and Pulse Aging Behavior of ESD-Sensitive V2O5/Mn3O4/Nb2O5 Codoped Zinc Oxide Varistors

  • Nahm, Choon-Woo
    • Transactions on Electrical and Electronic Materials
    • /
    • v.16 no.6
    • /
    • pp.308-311
    • /
    • 2015
  • V2O5/Mn3O4/Nb2O5 codoped zinc oxide varistor ceramics were sintered at a temperature range as low as 875~950℃. The voltage clamping characteristics of V2O5/Mn3O4/Nb2O5 codoped zinc oxide varistor ceramics were investigated at a pulse current range of 1~50 A. The sintering temperature had a significant effect on clamp voltage ratio, which exhibits surge protection capabilities. The varistor ceramics sintered at 875℃ exhibited the best clamping characteristics, in which the clamp voltage ratio was 2.69 at a pulse current of 50 A. The varistor ceramics sintered at 900℃ exhibited the highest electrical stability, where = 3,824 V/cm (initial 3,909 V/cm), and E1 mA/cm2 = 27 (initial 39) after application of a pulse current of 100 A.

Effect of Cooling Rate on DC Accelerated Aging Characteristics of ZPCCY-Based Varistor Ceramics (ZPCCY계 바리스터 세라믹스의 DC 가속열화 특성에 미치는 냉각속도의 영향)

  • 남춘우;김향숙
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
    • /
    • v.15 no.9
    • /
    • pp.776-782
    • /
    • 2002
  • The microstructure, V-Ι characteristics, and stability of ZnO-P $r_{6}$ $O_{11}$ CoO-C $r_2$ $O_3$- $Y_2$ $O_3$-based varistor ceramics were investigated with cooling rate in the range of 2~8$^{\circ}C$/min. The cooling rate relatively weakly affected the microstructure, the varistor voltage, and the leakage current in the V-Ι characteristics. But the nonlinear exponent relatively strongly affected by cooling rate. The cooling rate also greatly affected the stability of V-Ιand dielectric characteristics for DC accelerated aging stress. On the whole, the varistors cooled with 4$^{\circ}C$/fin exhibited the highest performance in the densification, nonlinearity, and stability. Especially, they exhibited a high stability, in which the variation rate of the varistor voltage( $V_{1㎃}$), the nonlinear exponent($\alpha$), and the dissipation factor(tan $\delta$) is -1.4%, -4.9%, and +60.0%, respectively, under DC accelerated aging stress such as 0.95 $V_{1㎃}$15$0^{\circ}C$/12 h)

A Nano-structure Memory with SOI Edge Channel and A Nano Dot (SOI edge channel과 나노 점을 갖는 나노 구조의 기억소자)

  • 박근숙;한상연;신형철
    • Journal of the Korean Institute of Telematics and Electronics D
    • /
    • v.35D no.12
    • /
    • pp.48-52
    • /
    • 1998
  • We fabricated the newly proposed nano structure memory with SOI edge channel and a nano dot. The width of the edge channel of this device, which uses the side wall as a channel and has a nano dot on this channel region, was determined by the thickness of the recessed top-silicon layer of SOI wafer. The size of side-wall nano dot was determined by the RIE etch and E-Beam lithography. The I$_{d}$-V$_{d}$, I$_{d}$-V$_{g}$ characteristics of the devices without nano dots and memory characteristics of the devices with nano dots were obtained, where the voltage scan was done between -20 V and 14 V and the threshold voltage shift was about 1 V.t 1 V.

  • PDF

Effects of Vth adjustment ion implantation on Switching Characteristics of MCT(MOS Controlled Thyristor) (문턱전압 조절 이온주입에 따른 MCT (MOS Controlled Thyristor)의 스위칭 특성 연구)

  • Park, Kun-Sik;Cho, Doohyung;Won, Jong-Il;Kwak, Changsub
    • Journal of the Institute of Electronics and Information Engineers
    • /
    • v.53 no.5
    • /
    • pp.69-76
    • /
    • 2016
  • Current driving capability of MCT (MOS Controlled Thyristor) is determined by turn-off capability of conducting current, that is off-FET performance of MCT. On the other hand, having a good turn-on characteristics, including high peak anode current ($I_{peak}$) and rate of change of current (di/dt), is essential for pulsed power system which is one of major application field of MCTs. To satisfy above two requirements, careful control of on/off-FET performance is required. However, triple diffusion and several oxidation processes change surface doping profile and make it hard to control threshold voltage ($V_{th}$) of on/off-FET. In this paper, we have demonstrated the effect of $V_{th}$ adjustment ion implantation on the performance of MCT. The fabricated MCTs (active area = $0.465mm^2$) show forward voltage drop ($V_F$) of 1.25 V at $100A/cm^2$ and Ipeak of 290 A and di/dt of $5.8kA/{\mu}s$ at $V_A=800V$. While these characteristics are unaltered by $V_{th}$ adjustment ion implantation, the turn-off gate voltage is reduced from -3.5 V to -1.6 V for conducting current of $100A/cm^2$ when the $V_{th}$ adjustment ion implantation is carried out. This demonstrates that the current driving capability is enhanced without degradation of forward conduction and turn-on switching characteristics.

Rabrication of 4.7 V Operation GaAs power MESFETs and its characteristics at 900 MHz (900MHz 대역 4.7 V 동작 전력소자 제작 및 특성)

  • 이종람;김해천;문재경;권오승;이해권;황인덕;박형무
    • Journal of the Korean Institute of Telematics and Electronics A
    • /
    • v.31A no.10
    • /
    • pp.71-78
    • /
    • 1994
  • We have developed GaAs power metal semiconductor field effect transistors (MESFETs) for 4.7V operation under 900 MHz using a low-high deped structures grown by molecular beam epitaxy (MBE). The fabricted MESFETs with a gate widty of 7.5 mm and a gate length of 1.0.mu.m show a saturated drain current (Idss) of 1.7A and an uniform transconductance (Gm) of around 600mS, for gate bias ranged from -2.4 V to 0.5 V. The gate-drain breakdown voltage is measured to be higher than 25 V. The measured rf characteristics of the MESFETs at a frequency of 900 MHz are the output power of 31.4 dBm and the power added efficiency of 63% at a drain bias of 4.7 V.

  • PDF