• 제목/요약/키워드: 팬필터유닛

검색결과 5건 처리시간 0.017초

청정공간에서 제품과 팬필터유닛의 위치에 따른 오염물질의 전파 특성 (Characteristics of Contaminant Transfer in a Clean Space for the Location of Product and Fan Filter Unit)

  • 김혁순;노광철;이영구;오명도
    • 대한설비공학회:학술대회논문집
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    • 대한설비공학회 2008년도 동계학술발표대회 논문집
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    • pp.452-457
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    • 2008
  • We performed a study on the contaminant transfer in a clean space for the location of product and fan filter unit using computational fluid dynamics analysis. To simplify the real product moving process, three different non-moving cases regrading the locations of product were selected: no product, at the lower side, and at the upper and lower sides. And to investigate the characteristics of the contaminant transfer, the arrangement of fan filter units was varied. Local mean air-age and contaminant distribution were used as evaluation indices. From the results, the contaminant transfer to the product was the most when the products were simultaneously located at the upper and lower sides. And the contaminant was easily exhausted regardless of the location of product when the fan filter units were properly arranged at the top side of the clean space.

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광식각공정이 있는 클린룸에서의 3차원 기류 및 동적교차오염에 관한 연구 (A Study on the 3-D Airflow and Dynamic Cross Contamination in the Photolithography Process Cleanroom)

  • 노광철;오명도;이승철
    • 대한기계학회논문집B
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    • 제28권5호
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    • pp.560-568
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    • 2004
  • We performed the numerical study on the characteristics of the 3-D airflow and dynamic cross contamination in the photolithography process cleanroom. The nonunifurmity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. From the numerical results, we knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers and the global cross contamination varies with the location of source and the passage of time through the concentration ratio.

광식각공정 클린룸에서의 기류 및 교차오염에 대한 수치적 연구 (A Numerical Study on the Characteristics of Airflow and Cross Contamination in the Photolithography Process Cleanroom)

  • 노광철;이승철;오명도
    • 대한기계학회:학술대회논문집
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    • 대한기계학회 2003년도 추계학술대회
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    • pp.151-156
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    • 2003
  • We performed the numerical study on the characteristics of the airflow and cross contamination in the photolithography process cleanroom. The nonuniformity, the deflection angle and the global cross contamination were used for analyzing the characteristics and performances of cleanroom. We knew that the airflow characteristics of the cleanrooms are largely affected by the porosity of panel and the adjustment of dampers. And the numerical result showed that the global cross contamination varies with the location of source and the passage of time.

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초청정 클린룸 공조방식에 따른 기류특성에 관한 수치해석 (A Numerical Analysis on the Airflow Characteristics in Super Cleanrooms with Different Design Types)

  • 노광철;이승철;오명도
    • 설비공학논문집
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    • 제15권9호
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    • pp.751-761
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    • 2003
  • We performed the numerical analysis on the airflow characteristics in the two type of cleanroom systems, which are the axial fan type (AFT) and the fan filter unit (FFU). A computational fluid dynamic model was applied to investigate and compare the nonuniformity, the deflection angle and the air ventilation effectiveness of the two designs of cleanrooms when dampers are adjusted and not adjusted. And the flow-resistance models of the various components were used in this simulation. We know that the airflow characteristics of the cleanrooms are largely affected by damper adjusting And we also find out that the FFU system is superior to the AFT system through the comparison of the cleanroom performance indices.