• Title/Summary/Keyword: 켈빈 격자

Search Result 2, Processing Time 0.015 seconds

Isogeometric Optimal Design of Kelvin Lattice Structures for Extremal Band Gaps (극대화된 밴드갭을 갖는 켈빈 격자 구조의 아이소-지오메트릭 최적 설계)

  • Choi, Myung-Jin;Oh, Myung-Hoon;Cho, Seonho;Koo, Bonyong
    • Journal of the Computational Structural Engineering Institute of Korea
    • /
    • v.32 no.4
    • /
    • pp.241-247
    • /
    • 2019
  • A band gap refers to a certain frequency range where the propagation of mechanical waves is prohibited. This work focuses on engineering three-dimensional Kelvin lattices having external band gaps at low audible frequency ranges using a gradient-based design optimization method. Elastic wave propagation in an infinite periodic lattice is investigated by employing the Bloch theorem. We model the ligaments using a shear-deformable beam model obtained by consistent linearization in a geometrically exact beam theory. For a given lattice topology, we enlarge band gap sizes by controlling the configuration of the beam neutral axis and cross-section thickness that are smoothly parameterized by B-spline basis functions within the isogeometric analysis framework.

Formation of Al0.3Ga0.7As/GaAs Multiple Quantum Wells on Silicon Substrate with AlAsxSb1-x Step-graded Buffer (AlAsxSb1-x 단계 성분 변화 완충층을 이용한 Si (100) 기판 상 Al0.3Ga0.7As/GaAs 다중 양자 우물 형성)

  • Lee, Eun Hye;Song, Jin Dong;Yoen, Kyu Hyoek;Bae, Min Hwan;Oh, Hyun Ji;Han, Il Ki;Choi, Won Jun;Chang, Soo Kyung
    • Journal of the Korean Vacuum Society
    • /
    • v.22 no.6
    • /
    • pp.313-320
    • /
    • 2013
  • The $AlAs_xSb_{1-x}$ step-graded buffer (SGB) layer was grown on the Silicon (Si) substrate to overcome lattice mismatch between Si substrate and $Al_{0.3}Ga_{0.7}As$/GaAs multiple quantum wells (MQWs). The value of root-mean-square (RMS) surface roughness for 5 nm-thick GaAs grown on $AlAs_xSb_{1-x}$ step-graded buffer layer was ~1.7 nm. $Al_{0.3}Ga_{0.7}As$/GaAs MQWs with AlAs/GaAs short period superlattice (SPS) were formed on the $AlAs_xSb_{1-x}$/Si substrate. Photoluminescence (PL) peak at 10 K for the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure showed relatively low intensity at ~813 nm. The RMS surface roughness of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure was ~42.9 nm. The crystal defects were observed on the cross-sectional transmission electron microscope (TEM) images of the $Al_{0.3}Ga_{0.7}As$/GaAs MQW structure. The decrease of PL intensity and increase of RMS surface roughness would be due to the formation of the crystal defects.