• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1996년도 추계학술대회 논문집
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• pp.152-155
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• 1996

Platinum thin films were deposited on $Al_2$O$_3$substrate by DC magnetron sputtering for RTD(Resistance Thermometer Devices) temperature sensors. We made Pt resistance pattern on $Al_2$O$_3$substrate by lift-off method and fabricated Pt-RTD temperature sensors by using W-wire, silver epoxy and SOG(spin-on-glass). In the temperature range of 25~40$0^{\circ}C$, we investigated TCR(temperature coefficient of resistance) and resistance ratio of Pt-RTD temperature sensors. TCR values were increased with increasing the annealing temperature, time and the thickness of Pt thin films. Resistance values were varied lineally within the range of measurement temperature. At annealing temperature of 100$0^{\circ}C$, annealing time of 240min and thin film thickness of 1${\mu}{\textrm}{m}$, we obtained Pt-RDT TCR value of 3825ppm/$^{\circ}C$ closed to the Pt bulk value.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.354-357
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• 1999

This paper describes on the electrical and physical charateristics thin-film type Pt-RTD\\`s on Si wafers, in which MgO thin-films were used as medium layer in order to improve adhesion of Pt thin-films to SiO$_2$ layer. The MgO medium layer had the properties of improving Pt adhesion to SiO$_2$ and insulation without chemical reaction to Pt thin-films and the resistivity of Pt thin-films was improved. In the analysis of properties of Pt-RTD, TCR value had 3927 ppm/$^{\circ}C$ and liner in the temperature range of room temperature to 40$0^{\circ}C$

• 대한전기학회:학술대회논문집
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• 대한전기학회 1996년도 추계학술대회 논문집 학회본부
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• pp.242-244
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• 1996

Platinum thin films were deposited on Si-wafer by DC magnetron sputtering for RTD (Resistance Thermometer Devices). We investigated the physical and electrical characteristics of these films under various conditions, the input power, working vacuum, temperature of substrate and also after annealing these films. The Resistivity and Sheet Resistivity were decreased with increasing the temperature of substrate and the annealing time at $1000^{\circ}C$. At substrate temperature $300^{\circ}C$, input power 7(w/$cm^2$), working vacuum 5mtorr and annealing conditions $1000^{\circ}C$, 240min we obtained $10.65{\mu}{\Omega}{\cdot}cm$, Resistivity of Pt thin film and $3000{\sim}3900ppm/^{\circ}C$, TCR(temperature coefficient of resistance) closed to the bulk value.

• 대한전기학회:학술대회논문집
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• 대한전기학회 1997년도 하계학술대회 논문집 C
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• pp.1485-1487
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• 1997

Platinum-Cobalt alloy thin films were deposited on $Al_2O_3$ substrates by co sputtering for RTD temperature sensors. We made Pt-Co alloy resistance patterns on $Al_2O_3$ substrate by lift-off method and investigated the physical and electrical characteristics of these films under sputtering conditions (; the input power, working vacuum), annealing conditions (; temperature, time) and also after annealing these films. After the annealing treatment at $800^{\circ}C$ for 60min, the resistivity and sheet resistivity of Pt-Co thin films was $0.0302{\mu}{\Omega}{\cdot}cm$ and $0.1{\Omega}/{\square}$, respectively, and the TCR value of Pt-Co RTD was $3600ppm/^{\circ}C$ in the temperature range of $25{\sim}400^{\circ}C$. These results indicate that Pt-Co thin films have potential for the excellent RTD temperature sensors.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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• pp.431-434
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• 1998

Platinum-Cobalt alloy thin films were deposited on Al$_2$O$_3$ substrate by r.f. cosputtering for RTD temperature sensors. We made Pt-Co alloy resistance patterns on the Al$_2$O$_3$ substrate by lift-off method and investigated the physical and electrical characteristics of these films under various conditions (the input power, working vacuum, annealing temperature, thickness of thin films) and also after annealing these films. At input power of Pt : 4.4 W/$\textrm{cm}^2$, Co : 6.91 W/$\textrm{cm}^2$, working vacuum on and annealing conditions of 1000 $^{\circ}C$ and 60 min, the resistivity and the sheet resistive thin films were 15 ${\mu}$$\Omega$$.$cm and 0.5 $\Omega$/$\square$, respectively. The TCR value of Pt-Co a films was measured with various thickness of thin films and annealing temperature. T TCR value is gained under condition 3000${\AA}$ of thin films thickness and 1000$^{\circ}C$ of temperature. These results indicate that Pt-Co alloy thin films have potentiality for the wide temperature ranges.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1997년도 추계학술대회 논문집
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• pp.335-338
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• 1997

Platinum-Cobalt alloy thin films were deposited on A1$_2$O$_3$substrate by magnetron cosputtering for RTD temperature sensors with wide temperature ranges. We made Pt-Co alloy resistance patterns on the A1$_2$O$_3$substrate by lift-off method and fabricated Pt-Co alley RTD temperature sensors by using Pt-wire, Pt-paste. We investigated the physical and electrical characteristics of theme films under various conditions, input power, working vacuum, annealing temperature and time, and also after annealing these films. The resistivity and sheet resistivity of these films were decreased with increasing the annealing temperature. At input power of Pt : 4.4 W/cm$^2$, Co : 6.91 W/cm$^2$, working vacuum of 10 mTorr and annealing conditions of 800$^{\circ}C$ and 60 min, the resistivity and sheet resistivity of Pt-Co thin films was 15${\mu}$$\Omega$$.$cm and 0.5$\Omega$/ , respectively, and the TCR value of Pt-Co alloy thin films with thickness of 3000${\AA}$ was 3740ppm/$^{\circ}C$ in the temperature range of 25∼600$^{\circ}C$. These results indicate that Pt-Co alloy thin films hove potentiality for the RTD with wide temperature ranges.

• 한국표면공학회지
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• 제32권1호
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• pp.3-9
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• 1999

Pt thin film of about 7000$\AA$ thickness was deposited on the alumina substrate using DC Magnetron Sputter and the characteristics of the film for temperature sensor were investigated. When film of about 7000$\AA$ thickness was deposited at working gas pressure of $2.0{\times}10^{-3}$torr, sputtering power of 50W, substrate temperature of $350^{\circ}C$(Ts), sheet resistance(Rs), resistivity($\rho$) and temperature coefficient of resistivity(TCR) of the film were respectively 0.39$\Omega$/$\square$, 27.60$\mu\Omega$-cm and $3350 ppm/^{\circ}C$. When the film was annealed at $1000^{\circ}C$ for 240min in hydrogen ambient, Rs, $\rho$ and TCR were respectively 0.236$\Omega$/$\square$, 15.18$\mu\Omega$-cm and 3716 ppm/$3716 ppm/^{\circ}C$. When working gas of 15sccm oxygen and 100sccm Argon were used, Rs, $\rho$ and TCR were respectively 0.335$\Omega$/$\square$, 22.45$\mu\Omega$-cm and $3427 ppm/^{\circ}C$. When the film was annealed at $1000^{\circ}C$ for 240min, Rs, $\rho$and TCR were respectively 0.224/$\Omega$$\square$, 14$\mu\Omega$-cm and $3760 ppm/^{\circ}C$ and the characteristics of the film were much improved.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2008년도 추계학술대회 논문집 Vol.21
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• pp.29-29
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• 2008

Platinum Thin films were deposited on $Al_2O_3$ by Rf magnetic Sputtering. The physical and electrical characteristics of these films were analyzed under various deposition conditions(Ar gas pressure, input power, substrate temperature.) and annealing condition. The deposition rate was increased with increasing the input power but not increased linear. In the other factor, The Pt thin films property was associated with resistance. so lower resistance had more and more good Pt thin films condition. For the purpose of this study, we will get the best Pt thin film characteristics.

• 한국가시화정보학회지
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• 제7권2호
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• pp.17-21
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• 2010

This paper presents the fabrication and performance measurement of a temperature sensor array on a flexible substrate attachable to a curved surface using MEMS technology. Specifically, the fabrication uses the well-developed printed circuit board fabrication technology for complex electrode definition. The temperature sensor array are lifted off with a $10{\times}10$ matrix in a $50\;mm{\times}50\;mm$ to visualize temperature distribution. Copper is used as temperature sensing material to measure the change in resistances with temperature increase. In a thermal oven with temperature control, the temperature sensor array is Characterized. The constant slope of resistance change is obtained and temperature distribution is measured from the relationship between resistance and temperature.

• 한국조경학회지
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• 제40권5호
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• pp.100-108
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• 2012

통풍과 차양이 하절기 옥외공간에서 인간이 느끼는 온열쾌적성에 어떤 영향을 미치는지를 객관적으로 검증하기 위하여 통풍과 차양을 달리한 실험구를 조성하고 흑구온도와 기온 및 풍속을 측정하여 평균복사온도를 환산하여 비교 분석하였다. 미기후 측정을 위하여 개방된 잔디밭에 철제 각관을 이용하여 가로${\times}$세로${\times}$높이가 각각 $3m{\times}3m{\times}1.5m$인 프레임을 구성하고, 투명 폴리에틸렌 필름과 농업용 차광막을 이용하여 통풍과 차양의 조건을 달리한 네 가지의 실험구를 조성하였다. 각 실험구 내 중심부 지면으로부터 1.2m 높이에서 베인형 풍속계와 흑구, 측온저항체(PT-100)를 이용하여 2011년 5월 1일부터 동년 9월 30일까지 풍속과 기온, 흑구온도를 매 분 단위로 계측하였다. 기상조건과 계측자료의 유효성 등을 고려하여 총 44일 동안의 13,262건의 자료를 바탕으로 실험구별 일중 시계열적 변화를 분석하였으며, 낮 시간에 해당되는 오전 7시부터 오후 8시까지의 7,172건의 자료를 바탕으로 실험구에 따른 통계적 차이를 해석하였다. 아울러 햇볕이 가장 강렬한 시간대인 오전 11시부터 오후 4시까지의 자료를 바탕으로 평균복사온도와 풍속 및 일사량과의 관계를 분석하였다. 평균복사온도를 기준으로 해석했을 때, 통풍이 차단된 노지에서의 측정기간 중 최고값이 $58.84^{\circ}C$까지 상승한 반면, 차양이 적용되고 통풍이 원할한 실험구의 최고값은 $42.94^{\circ}C$였다. 시험결과를 종합하면, 하절기 옥외공간에서 낮 동안의 평균복사온도에 있어서 차양에 의해서는 최대 $13^{\circ}C$, 평균 $9^{\circ}C$의 냉각효과가 발생한 반면, 방풍에 의해서는 반대로 평균 약 $3^{\circ}C$의 가열효과가 있는 것으로 정리되어, 통풍이 되지 않는 태양직사광 지역은 바람이 원활하게 통하는 그림자 지역 보다 최대 $16^{\circ}C$까지 높은 것으로 나타났다. 결론적으로 본 연구를 통해서 하절기 옥외공간의 열쾌적성을 개선하는데 차양이 가장 중요하며, 그 다음이 통풍이라는 사실을 파악할 수 있었다. 따라서 옥외공간에 더 많은 녹음수와 숲을 조성하여 그림자 지역을 증가시킴으로써 인간의 하절기 옥외활동에 많은 제약을 주고 있는 불필요한 열에너지를 현격하게 저감시켜 쾌적한 미기후를 효과적으로 조성할 수 있으며, 나아가 정교하게 조성된 바람길이나 통풍 시스템을 적용한다면 도시 전체의 열환경도 효과적으로 개선할 수 있을 것이다.