• Title/Summary/Keyword: 잔류막

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Effects of Residual Solvents in the Phase Transition, Transition Enthalpy, and Transition Temperature of Phospholipid Membranes (잔류 유기 용매가 모델 세포 지질막의 상전이, 상전이 엔탈피 및 상전이 온도에 미치는 영향)

  • An, Eun Seol;Choi, Jae Sun;Lee, Dong Kuk
    • Journal of the Society of Cosmetic Scientists of Korea
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    • v.40 no.2
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    • pp.163-170
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    • 2014
  • Lipid membranes composed of phosphatidylcholine (PC) are used in biophysical study to mimic cellular membranes and interactions between the membrane and chemicals, where organics solvents are used in dissolving lipids or chemicals. Later, solvents are removed from the solution under nitrogen gas at room temperature, followed by the further removal of the solvent at vacuum condition for several hours. In this process, some solvents are easily removed under described conditions above and others are required more severe conditions. In this study, $^{31}P$ solid-state nuclear magnetic resonance (SSNMR) techniques and differential scanning calorimetry (DSC) were used to see any changes in the line shapes of $^{31}P$ NMR spectra of multilamellar vesicles (MLVs) samples of POPC and in the phase change temperature of multilamellar vesicles (MLVs) of DPPC in DSC thermogram with or without any residual solvents. The thermodynamic parameters associated with the solvents did exhibit noticeable changes depending on solvent types. Thus, it is concluded that solvents should be carefully chosen and removed completely and experimental results should also be interpreted with caution particularly for the experiments investigating lipid phase changes and related topics.

Magnetic Interaction and Magnetic Properties of Electrodeposited CoPt Magnetic Films with Different Thickness (전기도금법으로 제작한 CoPt 자성막의 자기상호작용과 자기적 성질)

  • Kim, Hyeon-Soo;Lee, Jong-Duck;Jeong, Soon-Young;Lee, Chang-Hyeong;Suh, Su-Jeong
    • Journal of the Korean Magnetics Society
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    • v.21 no.5
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    • pp.151-156
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    • 2011
  • The influence of thickness on magnetic interaction and magnetic properties in electrodeposited CoPt magnetic films was investigated from the analysis of the magnetic remanence curves and the magnetic hysteresis loops. As the thickness of the CoPt film is increased, the perpendicular coercivity and the saturation magnetization are increased but the squareness is considerably decreased. The analysis results of the magnetic remanence curves and the magnetic hysteresis loops exhibited that the dipolar interaction is the main interaction mechanism for all samples, but the strength of the dipolar interaction gradually increased with increasing sample thickness.

Investigation of the residue formed on the silicon exposed to $C_4$F$_8$ helicon wave plasmas (고선택비 산화막 식각공정시 $C_4$F$_8$ 헬리콘 웨이브 플라즈마에 노출된 실리콘 표면의 잔류막 관찰)

  • 김현수;이원정;염근영
    • Journal of the Korean institute of surface engineering
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    • v.32 no.2
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    • pp.93-99
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    • 1999
  • Surface polymer layer formed on the silicon wafer during the oxide overetching using $C_4F_8$/ helicon wave plasmas and their characteristics were investigated using spectroscopic elipsometry, X-ray photoelectron spectroscopy, and secondary ion mass spectrometry. Overetch percentage and dc-self bias voltage were varied to investigate the effects on the characteristics of the polymers remaining on the overetched silicon surface. The increase of bias voltage from -80 volts to -120 volts increased the C/F ratio and carbon bondings such as C-C, $C-CF_x$/, and C-Si in the polymer while reducing the thickness of the polymer layer. However, the increase of the overetch percentage from 50% to 100% did not change the composition of the polymer layer and the carbon bondings in the polymer layer remained same even though it increased the polymer thickness. The polymer layer formed at the higher dc-self bias voltage was more difficult to be removed by the following various post-etch treatments compared to that formed at the longer overetch percentage.

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A study on the formation and removal of residue and damaged layer on the overched silicon surface during the contact oxide etching using $C_4$F$_8$/H$_2$ helicon were plasmas (C$_4$F$_8$/H$_2$ helicon were 플라즈마를 이용한 contact 산화막 식각 공정시 과식화된 실리콘 표면의 잔류막과 손상층 형성 및 이의 제거에 관항 연구)

  • 김현수;이원정;백종태;염근영
    • Journal of the Korean institute of surface engineering
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    • v.31 no.2
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    • pp.117-126
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    • 1998
  • In this study, the residue remaining on the silicon wafer during the oxide overetching using $C_4F_8/H_2$ helicon were plasmas and effects of various cleaning and annealing methods on the removal of the remaining residue were investigated. The addition of 30%$H_2$ to the C4F8 plasma increased the C/F ratio and the thickness of the residue on the etched silicon surface. Most of the residuse on the etched surfaces colud be removed by the oxygen plasmsa cleaning followed by thermal annealing over $450^{\circ}C$. Hydrogen-coataining residue formed on the silicon by 70%$C_4F_8/30%H_2$ helicon plasmas was more easily removed than hydrogen-free residue formed residue formed by $C_4F_8$ helicon wear plasmas. However, damage remaining on the silicon surface overetched using 70%$C_4F_8/30%H_2$ helicon plasmas was intensive and the degree of reocvery duing the post-annealing was lower.

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Changes in the Constituents of Citrus Juice by Ultrafiltration (한외여과에 의한 온주 밀감주스의 성분 변화)

  • 김성미;강영주
    • Food Science and Preservation
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    • v.8 no.4
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    • pp.442-448
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    • 2001
  • The citrus juice obtained from Jeju mandarines, Citru unshiu, was filtered to remove 20% of its original volume through the hollow fiber ultrafiltration systems equipped with various pore sizes of membranes. As the results of ultrafiltration, the contents of total acids, ascorbic acid, ascorbic acid, free sugars and neohesperidin in retentate showed the tendencies of gradual decreases with the increase of membrane pore sizes from 10K to 100K daltons, but tendencies were inverted when the membrane with 500k was used. The changes of color, soluble solids, total nitrogen, amino-nitrogen, naringin and hesperidin were not consistent with the membrane pore size. Considering all the data obtained using various pen sizes of membranes, the filtration system with NMWC 500K daltons was the most effective to produce citrus juices with hither quality.

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Metal-induced Crystallization of Amorphous Ge on Glass Synthesized by Combination of PIII&D and HIPIMS Process

  • Jeon, Jun-Hong;Kim, Eun-Kyeom;Choi, Jin-Young;Park, Won-Woong;Moon, Sun-Woo;Lim, Sang-Ho;Han, Seung-Hee
    • Proceedings of the Korean Vacuum Society Conference
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    • 2012.02a
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    • pp.144-144
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    • 2012
  • 최근 폴리머를 기판으로 하는 고속 Flexible TFT (Thin film transistor)나 고효율의 박막 태양전지(Thin film solar cell)를 실현시키기 위해 낮은 비저항(resistivity)을 가지며, 높은 홀 속도(carrier hall mobility)와 긴 이동거리를 가지는 다결정 반도체 박막(poly-crystalline semiconductor thin film)을 만들고자 하고 있다. 지금까지 다결정 박막 반도체를 만들기 위해서는 비교적 높은 온도에서 장시간의 열처리가 필요했으며, 이는 폴리머 기판의 문제점을 야기시킬 뿐 아니라 공정시간이 길다는 단점이 있었다. 이에 반도체 박막의 재결정화 온도를 낮추어 주는 metal (Al, Ni, Co, Cu, Ag, Pd, etc.)을 이용하여 결정화시키는 방법(MIC)이 많이 연구되어지고 있지만, 이 또한 재결정화가 이루어진 반도체 박막 안에 잔류 금속(residual metal)이 존재하게 되어 비저항을 높이고, 홀 속도와 이동거리를 감소시키는 단점이 있다. 이에 본 실험은, 종래의 MIC 결정화 방법에서 이용되어진 금속 증착막을 이용하는 대신, HIPIMS (High power impulse magnetron sputtering)와 PIII&D (Plasma immersion ion implantation and deposition) 공정을 복합시킨 방법으로 적은 양의 알루미늄을 이온주입함으로써 재결정화 온도를 낮추었을 뿐 아니라, 잔류하는 금속의 양도 매우 적은 다결정 반도체 박막을 만들 수 있었다. 분석 장비로는 박막의 결정화도를 측정하기 위해 GIXRD (Glazing incident x-ray diffraction analysis)와 Raman 분광분석법을 사용하였고, 잔류하는 금속의 양과 화학적 결합 상태를 알아보기 위해 XPS (X-ray photoelectron spectroscopy)를 통한 분석을 하였다. 또한, 표면 상태와 막의 성장 상태를 확인하기 위하여 HRTEM(High resolution transmission electron microscopy)를 통하여 관찰하였다.

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Dielectric Brekdown Chatacteristecs of the Gate Oxide for Ti-Polycide Gate (Ti-Ploycide 게이트에서 게이트산화막의 전연파괴특성)

  • Go, Jong-U;Go, Jong-U;Go, Jong-U;Go, Jong-U;Park, Jin-Seong;Go, Jong-U
    • Korean Journal of Materials Research
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    • v.3 no.6
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    • pp.638-644
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    • 1993
  • The degradation of dielectric breakdown field of 8nm-thick gate oxide ($SiO_2$) for Tipolycide MOS(meta1-oxide-semiconductor) capacitor with different annealing conditions and thickness of the polysilicon film on gate oxide was investigated. The degree of degradation in dielectric breakdown strength of the gate oxide for Ti-polycide gate became more severe with increasing annealing temperature and time, especially, for the case that thickness of the polysilicon film remained on the gate oxide after silicidation was reduced. The gate oxide degradation may be occurred by annealing although there is no direct contact of Ti-silicide with gate oxide. From SIMS analysis, it was confirmed that the degration of gate oxide during annealing was due to the diffusion of titanium atoms into the gate oxide film through polysilicon from the titanium silicide film.

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Development of customized and energy-saving process for wastewater reuse utilizing UF/NF membrane (UF/NF 분리막을 활용한 수요자 맞춤형 / 에너지 절약형 재이용수 공정기술 개발)

  • Hong, Min;Hwang, Hyun-Seob;Park, Ock-Kwon;Kim, Yong-Lim
    • Proceedings of the Korea Water Resources Association Conference
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    • 2012.05a
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    • pp.712-712
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    • 2012
  • 하 폐수 처리방류수를 물리적, 화학적 그리고 생물학적 기술을 이용하여 처리한 후 재활용수로 이용하고자 하는 새로운 노력들이 진행되고 있지만 국내의 경우 방류수 재활용 기술과 처리수의 재이용에 대한 평가기술이 선진국에 비해 초기 단계에 있어 이 분야에 대한 적극적인 기술개발이 요구된다. 막 분리 기술을 이용한 처리 수는 소독 등의 추가적인 처리 없이 살수용수나 수경용수로 이용이 가능하며, 잔류염소를 유지시킬 경우 화장실 세정용수로의 이용도 가능하며, 또한 후처리 기술을 조합하면 고급 공업용수 등으로 사용가능하므로 선진기술로서 수요조건에 맞게 전 후 처리를 조합한 수요자 맞춤형 재이용수 공정기술을 개발할 필요가 있다. 이에 효율적인 하 폐수 재이용을 이용하여 농업용수(축산 음용수, 첨단 수출원예용수, 첨단 농업용수, 농산업 클러스터 복합 곡물 용수), 원예용수(원예단지), 공업용수 등의 다양한 용도에 활용 가능한 수요자 맞춤형 모듈 및 공정 개발을 수행하였다. 개발된 공정은 AOP 및 막 세정 시스템을 이용한 새로운 공정으로, AOP 시스템은 전기 이온 모듈을 통해 OH 라디칼을 생성 및 염분 제거 효율을 극대화 하여 오염 물질을 산화시키는 공정이며, FDA 시스템은 탁도가 높은 원수가 과다 유입 될 경우 후단 여과 막의 부하를 줄이는 역할을 하며, 부유 물질을 여과 시킨다. 막 세정 시스템은 미세 입자를 구성된 기포를 이용하여 눈에 보이지 않는 곳 까지 세척하며, 살균 작용을 하며, 분리 막의 성능을 증대 시킨다. 이어 UF 분리 막 시스템은 원수의 미세불순물, 박테리아, 스케일 물질 등을 제거하며, NF 시스템을 통하여 미립자, 박테리아 유기 화합물 및 2가 염 제거를 하여 재이용수를 생산하는 공정을 개발하였다. 개발된 수요자 맞춤형 공정은 하수 재이용 기술의 이용 목적 및 수요자별로 맞춤형으로 운영이 가능하며, 개발된 세척 기술은 분리 막 세정 유지관리비 및 에너지를 저감 할 수 있으며, 현장 적용의 실증화 과정을 거쳐 공정 기술을 신뢰도를 향상하고, 보유 기술을 수요자 맞춤형으로 업그레이드함으로써 기술의 경쟁력 및 고품질의 하수 재이용 기술의 새로운 방향을 제시 할 수 있을 것으로 판단된다.

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Resistance of Biofilm Bacteria to Chlorination (생물막 세균의 염소소독제에 대한 내성)

  • 조재창;박성주;김상종
    • Korean Journal of Microbiology
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    • v.31 no.3
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    • pp.255-260
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    • 1993
  • The Enterobacter cloacae biofilms developed on slide glasses and galvanized-iron coupons were applied to test the attached bacterial resistance to chlorination. The chlorine resistances of biofilm bacteria grown on the slide glasses and galvanized-iron coupons were 14 and 480 times that of the suspended bacteria, respectively. The chlorine resistance of particleattached bacterial populations was 48 times that of suspended bacterial populations. The biofilm bacterial densities developed on the slide glasses and galvanized-iron coupons which were immersed in the flowing tap water for 75 days were $4.75 {\times} 10^{4}$ and $1.12 {\times} 10^5 cfu/cm^{2}$ It is concluded that main mechanisms of enteric or HPC bacterial resistance to chlorination in tap waters are bacterial attachment or . adsorption to particles or bacterial aggregations and formation of biofilms on the inner wall of distribution systems by escaped bacteria from chlorination in water treatment processes, which results in bacterial regrowth in water distribution systems.

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