• Title/Summary/Keyword: 유도결합 플라즈마

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Euclidean Weight Distance as a Performance Measure for Backpropagation Neural Network Process Model (역전파 신경망 공정 모델의 평가지표로서의 유클리디언 웨이트 거리)

  • Kim, Byung-Whan
    • Proceedings of the KIEE Conference
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    • 2001.07d
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    • pp.2663-2665
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    • 2001
  • 역전파 신경망은 반도체 공정 모델링에 효과적으로 응용이 되고 있으며, 최근 선형뉴런을 비선형 함수 대신 출력층에 이용하여 모델의 예측정확도를 향상 시킨 바 있다. 본 연구에서는 그 원인을 규명하기 위한 모델의 평가지표로서의 유클리디언 웨이트 거리(Euclidean Weight Distance)를 제안한다. 이 지표를 이용하여 신경망의 입력층과 은닉층, 그리고 은닉층과 출력층의 웨이트를 감시하였으며, 그 결과 예측정확도의 향상이 이 지표의 감소에 기인하고 있음을 알았다. 모델링에 이용한 실험데이터는 다중 유도결합형 플라즈마 장비로부터 Langmuir Probe 진단 시스템을 이용하여 수집하였다.

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Properties of Electron Temperature and Electron Density in Inductively Coupled Xenon Plasma (유도결합형 제논 플라즈마의 전자온도, 전자밀도 특성)

  • Her, In-Sung;Choi, Gi-Seung;Lee, Jong-Chan;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2005.07c
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    • pp.2418-2420
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    • 2005
  • In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma(ICP). In results at several dependences of $20{\sim}100mTorr$ Xenon pressure, $50{\sim}200W$ RF power and horizontal distribution were especially mentioned. When Xe pressure was 20mTorr and RF power was 200W, the electron temperature and density were respectively 3.58eV and $3.56{\times}10^{12}cm^{-3}$. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

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Electrical Properties of Plasma According to Gas Pressure and RF Power of Xe-Inductively Coupled Plasma (유도결합형 제논의 가스압력 및 RF전력에 따른 플라즈마의 전기적 특성)

  • Choi, Yong-Sung;Lee, Kyung-Sup
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2006.12a
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    • pp.43-47
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    • 2006
  • In this paper, parameters of electron temperature and density for the mercury-free lighting-source were measured to diagnosis and analyze in Xe based inductively coupled plasma (ICP). As results at several dependences of 20~100mTorr Xenon pressure, the brightness of discharge tube was higher (4,900 $cd/m^2$) than other conditions when Xe pressure was 20mTorr and RF power was 200W. In that case, the electron temperature and density were 3.58eV and $3.56{\times}10^{12}cm^2$, respectively. The key parameters of Xe based ICP depended on Xe pressure more than RF power that could be verified. A high electron temperature and low electron density with a suitable Xe pressure are indispensible parameters for Xe based ICP lighting-source.

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Spectrum Properties of Inductively Coupled Argon Plasma (유도결합형 플라즈마에서의 아르곤 가스의 스펙트럼 특성)

  • Lee, Young-Hwan;Pack, Kwang-Hyeon;Choi, Yong-Sung;park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.147-149
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    • 2004
  • Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of spectrum as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10 [mTorr] to 100 [mTorr] and the RF power was varied from 10 [W] to 120 [W]. It was found that the intensity of wavelength tends to be decreased when argon pressure is increased, and the intensity of wavelength is increased as RF power is increased.

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E-H mode transition of Inductively Coupled Plasma with Ar Gas Pressure and RF Power (13.56MHz) (Ar 가스압력과 RF 전력변화 (13.56MHz)에 따른 유도결합형 플라즈마의 광학적 E-H모드변환 특성)

  • Her, In-Sung;Lee, Young-Hwan;Choi, Young-Sung;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1695-1697
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    • 2003
  • In this paper the emission properties of electrodeless fluorescent lamp were discussed using the inductively coupled plasma. To transmit the electromagnetic energy into the chamber a RF power of 13.56MHz was appied to the antenna and considering the Ar gas pressure and the RF electric power change, the emission spectrum, Ar-I line, luminance were investigated. At this time the input parameter for ICP RF plasma, Ar gas pressure and RF power were applied in the range of 10${\sim}$60m Torr, 10${\sim}$300W respectively.

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Ar Gas properties of Inductively Coupled Plasma for Input Power (유도결합형 플라즈마에서 압력에 따른 Ar Gas의 특성분석)

  • Jo, Ju-Ung;Lee, Y.H.;Her, In-Sung;Kim, Kwang-Soo;Choi, Yong-Sung;Lee, Jong-Chan;Park, Dea-Hee
    • Proceedings of the KIEE Conference
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    • 2003.07c
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    • pp.1704-1706
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    • 2003
  • Low-Pressure inductively coupled RF discharge sources have important industrial applications mainly because they can provide a high-density electrodeless plasma source with low ion energy and low power loss. In an inductive discharge, the RF power is coupled to the plasma by an electromagnetic interaction with the current flowing in a coil. In this paper, the experiments have been focussed on the electric characteristic and carried out using a single Langmuir probe. The internal electric characteristics of inductively coupled Ar RF discharge at 13.56 [MHz] have been measured over a wide range of power at gas pressure ranging from $1{\sim}70$ [mTorr].

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Luminance Efficacy of Inductively Coupled Argon Plasma (유도결합형 플라즈마에서의 아르곤 가스의 광 효율)

  • Lee, Young-Hwan;Pack, Kwang-Hyeon;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.299-301
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    • 2004
  • Inductively coupled plasma is commonly used for electrodeless lamp due to its ease of plasma generation. Optical characteristics significantly depend on the RF power and gas pressure of the plasma. This paper describes the measurement of luminous efficacy as a function of RF power and gas pressure with a goal of finding optimal operating conditions of the electrodeless lamp. The gas pressure was varied from 10 [mTorr] to 100 [mTorr] and the RF power was varied from 10 [W] to 120 [W]. It was found that the luminous flux tends to be decreased when argon pressure is increased, and the luminous flux is increased as RF fewer is increased. It was also found that the luminance efficacy is high when the argon pressure is low and when the RF power is low.

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Inductively Coupled Plasma discharge characteristic of Ne, Ar, Kr mixed gas (유도결합형 플라즈마에서의 Ne, Ar, Kr 혼합가스 방전특성)

  • Her, In-Sung;Choi, Yong-Sung;Lee, Chong-Chan;Park, Dae-Hee
    • Proceedings of the KIEE Conference
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    • 2004.11a
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    • pp.306-309
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    • 2004
  • Recently, the environmental problem has received considerable attention. so, many lamps have been developing for environmental requirement and energy efficiency. also, at glow discharge lamp researchers try to reduce energy spending that is power saving lamp. this kind requirement agree with strong points of electrodeless fluorescent lamp has received to now lighting sauce. At low pressure as mTorr I.C.P make high density plasma easily, is good to maintain discharge, has high ionization and does not have failing lighting and losing ability of electron radiation by oxidation and volatilization of electrodes, because this tape does not have electrodes. This point of I.C.P can use at electrodeless fluorescent lamp in this study ICP display elements and Ar, Ne, Kr are researched for optical characteristic. each gas is looked into optical characteristic, also mixed gases is experiment for optical characteristic.

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Electric Characteristics of Ring-shaped Electrodeless Flurescent Lamps by Coil Turns (환형무전극 램프의 코일 권선수 변화에 따른 전기적 특성)

  • Lee, Young-Hwan;Kim, Kwang-Soo;Jo, Ju-Ung;Choi, Yong-Sung;Park, Dae-Hee
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2003.11a
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    • pp.543-545
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    • 2003
  • 무전극 램프에서 유도 결합형 플라즈마가 많이 사용되는데 코일의 권선수나 주파수에 의해 전기적 특성의 변화가 크다. 따라서, 기존의 환형 무전극 형광 램프에 사용되는 ferrite core나 coil을 새롭게 적용하기 위하여 투자율이 2000인 Mn-Zn ferrite를 사용하여 주파수별로 coil의 권선수를 변화시키며 전기적 특성을 측정하여 기존의 환형 무전극 형광램프와 비교하였다.

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Numerical Modeling of a Rectangular Type Inductively Coupled Plasma System (사각형 유도 결합 플라즈마 시스템의 수치 모델링)

  • Joo, Jung-Hoon
    • Journal of the Korean institute of surface engineering
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    • v.45 no.4
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    • pp.174-180
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    • 2012
  • Low pressure inductively coupled plasma characteristics of argon and oxygen are numerically simulated for a 400 mm rectangular type system with a plasma fluid model. The results showed lower power absorption profile at the corner than a circular one in a 13.56 MHz driven 1.5 turn antenna system with a drift-diffusion and quasi-neutrality assumption. Ions controlled by electric field are more non-uniform than metastables and the power absorption profile of oxygen plasma is affected by horizontal gas flow pattern to show 25% lower power absorption at the pumping flange side. Oxygen negative ions which are generated in electron collisional dissociation of oxygen molecules was calculated as 0.1% of oxygen atoms with similar spatial profile.