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The Effects of Electrode Distance on the Formation of $(ZnS)_{1-x}(SiO_2)_x$ Protective Films in Phase Change Optical Disk by R.F. Sputtering Method (R.F. Sputtering 방법에 의한 상변화형 광디스크의 $(ZnS)_{1-x}(SiO_2)_x$ 보호막 형성에 미치는 전극거리의 영향)

  • Lee, Jun-Ho;Kim, Do-Hun
    • Korean Journal of Materials Research
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    • v.9 no.12
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    • pp.1245-1251
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    • 1999
  • Phase-change optical disk very rapid recording, high densification of data, resulting in high feedback rate and good C/N(carrier to noise) ratio of a feedback signal. However, repetitive thermal energy may cause the deformation of a disk or the lowering of an eliminability and a cyclability of the recording. The lowering of the cyclability can be reduced by insertion of thin layer of ZnS-$SiO_2$ dielectric thin film in appropriate disk structure between the upper and lower part of the recording film. Using the Taguchi method, optimum conditions satisfying both the optimized quality characteristic values and the scattering values for film formation were found to be the target R.F. power of 200W, the substrate R.F. power of 20W, the Ar pressure of 6mTorr, and the electrode distance of 6cm. From the refractive index data, the existence of the strong interaction between the electrode distance and Ar pressure was confirmed, and so was the large effect of the electrode distance on transmittance. According to the analysis of TEM and XRD, the closer the electrode distance was, the finer was the grain size due to the high deposition rate. However, the closer electrode distance brought the negative effect on the morphology of the film and caused the reduction of transmittance. AFM and SEM analyses showed that the closer the electrode distance was, the worse was the morphology due to the high rate of the deposition. Under optimum condition, the deposited thin film showed a good morphology and dense microstructure with less defects.

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진공 측정 기술 개발 동향

  • Sin, Yong-Hyeon
    • Proceedings of the Korean Vacuum Society Conference
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    • 2010.08a
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    • pp.3-3
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    • 2010
  • 이번 성원에드워드 학술상 수상자 선정은, 진공기술의 중요성에 공감하고 진공기술 발전을 위한 노력을 독려하자는 진공학회 회원들의 의견을 모아주신 결과로 생각한다. 본 발표에서는 그동안 한국표준과학연구원에서 수행해 온 진공 기술 연구 및 산학연 협력 네트워크 활동을 소개하고자 한다. 진공기술은 진공 환경을 발생시키고 측정 제어하며, 만들어진 진공 환경 안에서 원하는 작업을 할 수 있도록 하는 기술을 말한다. 우리나라의 주력산업인 반도체 및 디스플레이의 경우 그 생산 설비의 1/3이상이 진공 장비이며 진공 공정을 통해 만들어진다. 때문에 우리나라에서는 주력 산업분야나 그 전후방 산업의 경쟁력 강화 측면에서 진공기술 개발 중요성이 아주 크다. 한국표준과학연구원은 국가 대표 측정 기관으로 국가 측정 표준을 확립하고 측정관련 과학기술을 연구개발하며 그 성과를 보급하여 경제발전과 과학기술발전, 그리고 삶의 질 향상에 기여하는 것을 임무로 하고 있다. 우리나라에서 진공 측정 표준에 대한 연구가 본격적으로 시작된 것은 1984년으로 불용 장비로 불하받은 펌프와 챔버, 그리고 차관으로 도입된 Capacitance Diaphragm Gauge 몇 개만으로 시작되었다. 지금은 발전을 거듭하여 초음파 간섭 수은주 압력계를 비롯하여 정적 팽창시스템, 동적 팽창 시스템 등 진공도 범위별 국가 표준기와 리크 표준기를 자체 개발 하여 국가 측정 표준을 확립하고 있다. 우리나라의 진공 표준 및 측정 능력은 국제기구인BIPM에서 실시하는 국가 측정능력 비교시험을 통해 세계 최고 수준으로 인정 받은 바 있으며 교정검사 등을 통해 산학연에 보급되고 있다. 진공 측정 및 표준기술을 토대로, 1999년부터 과학기술부와 산업자원부의 지원을 받아 산학연이 필요로 하는 펌프 계측기 부품 소재 및 공정 특성을 평가하기 위한 장치와 절차를 개발하였다. 이를 이용해 보급되는 기술 data는 진공부품 및 장비 국산화, 국산제품 신뢰성 제고, 검증부품 사용을 통한 장비 품질 향상, 독자적 장비 기술 확보, 생산품 품질관리 등에 쓰이고 있다. 한국 표준연구원 진공센터의 교정 및 시험 능력은 ISO 9001 인증 획득과 국제 전문가의 review를 거쳐, 국제기구 측정능력표에 등재되어 있어 국제적 신뢰도도 확보하고 있다. 정기적인 진공기술 교류회를 개최하고 진공기술 홈페이지를 운영 하는 등 산학연 정보 교류 및 협력 네트워킹 활성화를 위해 노력한 바 있으며 이 분야의 연구 성과는 '국가 우수 연구성과 100선'에 선정된 바 있고, 산업자원부 지정 '산학연 연계 우수사례' 첫 번째로 선정되기도 하였다. 2008년부터는 진공기술 교류회 등을 통한 네트워킹 활동으로 도출된 기술 수요에 따라 대기업과 중소기업 학교 연구소들과 함께 진공공정 실시간 측정 진단 기술과 센서 개발 연구, 그리고 이들 개발품의 신뢰성 검증 및 평가 기술 개발을 위해 노력하고 있다.

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Effect of shelf-life extension of birch sap using high pressure processing (초고압 기술이 자작나무 수액의 저장성 향상에 미치는 영향)

  • Choi, Kyung Hwa;Kim, Sun Im;lee, Dong Uk;Jeon, Jung Tae
    • Food Science and Preservation
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    • v.24 no.3
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    • pp.343-350
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    • 2017
  • Effects of high pressure processing on physicochemical and microorganisms properties in birch sap were investigated using variable high pressure processing conditions. The viable cell counts of untreated birch sap was 4.0 log CFU, whereas high pressure processed sap were not detected. In birch sap was treated with 450 to 550 MPa, microorganisms were not detected during storage period, and physicochemical properties as well as color were slightly changed. The more processing time and pressure, its quality variations were more stable and then its optimum processing condition was determined with 120 sec at 550 MPa. The microorganisms and physicochemical properties of treated birch sap were investigated during storage at $5^{\circ}C$ and $10^{\circ}C$ for 45 and 28 days. Changes of physicochemical properties of treated birch sap were smaller than those of the untreated, but viable cell count were not detected during storage period. As for pH, $^{\circ}Brix$, and turbidity result of birch sap, quality shelf life of control and treatment were 4 and 24 days, respectively. Especially, ${\Delta}E$ value of instrumental color was untreated birch sap 4 days similar with the high pressure processed it for 28 days. These results indicated that the high pressure processing can be used as an effective method to improve the shelf life of birch sap.

Design of I-123 Nuclide production system (I-123 핵종생산장치 시스템 설계)

  • Jung, Hyun-Woo;You, Jae-Jun;Kim, Byung Il;Chun, KwonSoo;Lee, Ji-Seub;Park, Hyun;Choi, JunYong;Oh, Se-Young;Bang, Sang-Kwon;Lee, Dong Hoon
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2014.05a
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    • pp.496-499
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    • 2014
  • Xe Gas is moved to Target from GPM. It is Used to feasible nuclear reaction from proton of 30MeV Cyclotron being investigated by the Xe-124 Gas target System. This system is divided into four parts. Hardware was constructed by solidworks and Helium Supply is to cool the Havor Foil. Water has the job of cooling down the temperature when Xe Gas is being investigated in the target. Temperature and pressure gauges are attached to be checked easily. GPM(Gas Process Manifold) has the part that prepares to transport Xe Gas. There are Storage Vessel that stores Xe Gas, the cold trap that filters humidity and impurity and lastly storage vessel that temporarily stores Xe Gas. HCS(Helium Circulation System) using the Helium to cleaning and cooling. these parts are used to SIEMENS PLC and Pcvue Program. Because It is more comfortable and easy maintenance.

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A Study on the Release Characteristics During Wafer-Level Lens Molding Using Thermosetting Materials (열경화성 소재를 사용한 웨이퍼 레벨 렌즈 성형 중 이형 특성에 관한 연구)

  • Park, Si-Hwan;Hwang, Yeon;Kim, Dai-Geun
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.22 no.1
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    • pp.461-467
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    • 2021
  • Among the defect factors that can occur when a wafer-level lens is molded using a thermosetting material, the mold sticking problem of a molded lens during the release process can damage the molded substrate and deform the substrate at the wafer level. An experiment was conducted to examine the factors affecting the demolding force in the lens forming process. The demolding force was examined according to the coating material of the molds. The mold was surface-treated with ITO and Ti, followed by plasma treatment in an O2 atmosphere. A DLC coating was then performed, and the curing and releasability were examined. A coating method for the pull-off experiment was selected based on the results. To measure the demolding force according to the curing process conditions, a method of curing at a constant pressure and a method of curing at a constant position were applied. As a result, the TiO2 surface treatment reduced the release force. When cured by controlling the location, curing shrinkage can reduce the adhesion energy of the interface during curing, resulting in better demolding.

A Study on SUS MASK Etching Using Additives (첨가제를 이용한 SUS MASK 에칭에 관한 연구)

  • Lee, Woo-Sik
    • The Journal of Korea Institute of Information, Electronics, and Communication Technology
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    • v.15 no.4
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    • pp.243-248
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    • 2022
  • The purpose of this paper is to etching SUS MASK by adding an additive (F300) to FeCl3. The equipment used in the experiment is a self-made automatic liquid management system. The automatic liquid management system is a device capable of controlling the Oxidation Reduction Potential (ORP) and specific gravity in real time and supplying FeCl3 and additives in a quantitative manner. SUS MASK was etched in units from 10 sheets up to 200 sheets for 1 minute. It was confirmed that when the initial SUS MASK was 10 sheets, the ORP value started with 628 mV and measured at 611 mV from the time of 40 sheets being injected, and maintained close to 610 mV up to 200 sheets. The specific gravity was maintained near 1.640. And the SUS MASK was measured close to 0.4 mm from 50 sheets to 200 sheets. The experimental conditions of ORP had a specific gravity of 610 mV, 1.463, an etching pressure of 3.0 kg/cm2, an additive (F300) ratio of 1.2%, and the hole size was measured by up to 200 sheets of 10 sheets at once etching. As a result, the diameter approached 0.4 mm from 20 sheets. Even if the number of SUS MASK was increased, the ORP and specific gravity were well controlled, and it was confirmed that the experimental target value was close to 0.4 mm.

Efficient Multicasting Mechanism for Mobile Computing Environment Machine learning Model to estimate Nitrogen Ion State using Traingng Data from Plasma Sheath Monitoring Sensor (Plasma Sheath Monitoring Sensor 데이터를 활용한 질소이온 상태예측 모형의 기계학습)

  • Jung, Hee-jin;Ryu, Jinseung;Jeong, Minjoong
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2022.05a
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    • pp.27-30
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    • 2022
  • The plasma process, which has many advantages in terms of efficiency and environment compared to conventional process methods, is widely used in semiconductor manufacturing. Plasma Sheath is a dark region observed between the plasma bulk and the chamber wall surrounding it or the electrode. The Plasma Sheath Monitoring Sensor (PSMS) measures the difference in voltage between the plasma and the electrode and the RF power applied to the electrode in real time. The PSMS data, therefore, are expected to have a high correlation with the state of plasma in the plasma chamber. In this study, a model for predicting the state of nitrogen ions in the plasma chamber is training by a deep learning machine learning techniques using PSMS data. For the data used in the study, PSMS data measured in an experiment with different power and pressure settings were used as training data, and the ratio, flux, and density of nitrogen ions measured in plasma bulk and Si substrate were used as labels. The results of this study are expected to be the basis of artificial intelligence technology for the optimization of plasma processes and real-time precise control in the future.

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Room Temperature Imprint Lithography for Surface Patterning of Al Foils and Plates (알루미늄 박 및 플레이트 표면 미세 패터닝을 위한 상온 임프린팅 기술)

  • Tae Wan Park;Seungmin Kim;Eun Bin Kang;Woon Ik Park
    • Journal of the Microelectronics and Packaging Society
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    • v.30 no.2
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    • pp.65-70
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    • 2023
  • Nanoimprint lithography (NIL) has attracted much attention due to its process simplicity, excellent patternability, process scalability, high productivity, and low processing cost for pattern formation. However, the pattern size that can be implemented on metal materials through conventional NIL technologies is generally limited to the micro level. Here, we introduce a novel hard imprint lithography method, extreme-pressure imprint lithography (EPIL), for the direct nano-to-microscale pattern formation on the surfaces of metal substrates with various thicknesses. The EPIL process allows reliable nanoscopic patterning on diverse surfaces, such as polymers, metals, and ceramics, without the use of ultraviolet (UV) light, laser, imprint resist, or electrical pulse. Micro/nano molds fabricated by laser micromachining and conventional photolithography are utilized for the nanopatterning of Al substrates through precise plastic deformation by applying high load or pressure at room temperature. We demonstrate micro/nanoscale pattern formation on the Al substrates with various thicknesses from 20 ㎛ to 100 mm. Moreover, we also show how to obtain controllable pattern structures on the surface of metallic materials via the versatile EPIL technique. We expect that this imprint lithography-based new approach will be applied to other emerging nanofabrication methods for various device applications with complex geometries on the surface of metallic materials.

Remediation of Sediments using Micro-bubble (미세기포를 이용한 퇴적물 정화)

  • Kang, Sang Yul;Kim, Hyoung Jun;Kim, Tschung Il;Park, Hyun Ju;Na, Choon Ki;Han, Moo Young
    • Journal of Korean Society of Environmental Engineers
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    • v.38 no.8
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    • pp.420-427
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    • 2016
  • This study was conducted on the sediment remediation using micro-bubble to remove fine particles. For this study, characteristics of contamination and release in sediment were analyzed. And then, the characteristics of bubbles on removal efficiency was investigated at various operation conditions. In particle size distribution of the sediment used for the study, the proportion of clay and silt (<0.075 mm) was about 7.7%, sand (0.075~4.75 mm) was about 67.8%, and gravel (${\geq}4.75$) was 24.5%. Total nitrogen (TN) and total phosphorus (TP) of the sediment were 2,790~3,260, 261~311 mg/kg respectively. Ignition loss and water content were 4.1~9.6, 32.9~53.2% respectively. In analysis of removal efficiency according to operation conditions of micro-bubble, it was the highest when operation condition is pressure 6 atm, pressurized water ratio 30%, and coagulant dosage 15 ppm. At the time, the sediment's removal efficiency was 19.9%. Accordingly removal efficiency of TN and TP were 21.4, 22.6% respectively. Finally a research was found that fine particles in sediment were almost removed by micro-bubble, which led to decrease nutrients' release at about 20.1~64.3% in comparison to sediment including lots of fine particles.

Operating Characteristics of 1 $Nm^3/h$ Scale Synthetic Natural Gas(SNG) Synthetic Systems (1 $Nm^3/h$ 규모 합성천연가스(SNG) 합성 시스템의 운전 특성)

  • Kim, Jin-Ho;Kang, Suk-Hwan;Ryu, Jae-Hong;Lee, Sun-Ki;Kim, Su-Hyun;Kim, Mun-Hyun;Lee, Do-Yeon;Yoo, Yong-Don;Byun, Chang-Dae;Lim, Hyo-Jun
    • Korean Chemical Engineering Research
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    • v.49 no.4
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    • pp.491-497
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    • 2011
  • In this work, we proposed the three different reactor systems for evaluating of synthetic natural gas(SNG) processes using the synthesis gas consisting of CO and $H_2$ and reactor systems to be considered are series adiabatic reaction system, series adiabatic reaction system with the recirculation and cooling wall type reaction system. The maximum temperature of the first adiabatic reactor in series adiabatic reaction system raised to 800. From the these results, carbon dioxide in product gas as compared to other systems was increased more than that expected due to water gas shift reaction(WGSR) and the maximum $CH_4$ concentration in SNG was 90.1%. In series adiabatic reaction system with the recirculation as a way to decrease the temperature in catalyst bed, the maximum $CH_4$ concentration in SNG was 96.3%. In cooling wall type reaction system, the reaction heat is absorbed by boiling water in the shell and the reaction temperature is controlled by controlling the amount of flow rate and pressure of feed water. The maximum $CH_4$ concentration in SNG for cooling wall type reaction system was 97.9%. The main advantage of the cooling wall type reaction system over adiabatic systems is that potentially it can be achieve almost complete methanation in one reactor.