• Proceedings of the Membrane Society of Korea Conference
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• 1997.04b
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• pp.50-51
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• 1997

가압경수로형(PWR) 원자력발전소에스는 원자로 출력조절을 위한 중성자 흡수체로 붕산(Boric Acid)을 사용하며, 불순물이 농축되는 것을 방지하기 위하여 이온교환수지로 수질 정화를 하고 있다. 그러나, 붕산으로 포화운전되는 이온교환수지에서 붕산보다 이온선택도가 낮은 실리카는 제거되지 않으므로, 원자력발전소의 운전년수 경과에 따라 1차계통수(원자로냉각재)의 붕산수중에 실리카 농도가 증가하게 된다. 한편, 실리카는 고온, 고압 운전조건에서 양이온불순물과 결합하여 핵연료피복재에 열전달을 방해하는 규석(Zeolite)층을 형성함으로서 국부가열(Hot Spot)에 의한 핵연료 손상을 일으킬 수 있으므로, 효율적인 실리카 제거기술이 요구된다. 따라서, 기존에 원전에서 사용하고 있는 Feed & Bleed에 의한 수질정화 방법은 다량의 폐기물 발생 및 붕산보충이 필요하므로, 역삼투막(RO)을 이용하여 붕소와 실리카의 최적 분리, 회수조건을 연구하고, 붕산저장 용량이 큰 SFP(Spent Fuel Pool)의 수질정화용 이동형 RO장치를 개발하기 위하여 붕산수중의 실리카에 대한 역삼투막의 선택적 제거특성을 검토하였다.

• Electrical & Electronic Materials
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• v.7 no.4
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• pp.294-299
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• 1994

CHF$_{3}$/CH$_{4}$Ar 플라즈마에 의해 형성된 산화막 식각 잔류물의 화학구조와 이 잔류물의 제거를 위한 세정방법을 x-ray photoelectron spectroscopy를 이용하여 조사하였다. 잔류무르이 구조는 CF$_{x}$-polymer와 Si-C, Si-O 결합으로 이루어진 SiO$_{y}$ C$_{z}$ 이었다. CF$_{4}$O$_{2}$ 플라즈마에 의한 silicon light etch는 산화막 식각 잔류물인 SiO$_{y}$ C$_{z}$ 층과 손상된 실리콘 표면을 제거하엿으며 NH$_{4}$OH-H$_{2}$O$_{2}$과 HF용액으로 완전히 제거되는 CF$_{x}$-polymer/SiO$_{x}$층을 남겼다. 100.angs.정도의 silicon light etch는 minority carrier life time과 thermal wave signal값을 초기 웨이퍼 수준까지 회복시켰으며 접합누설 전류도 거의 습식 식각 공정수준까지 감소시켰다.

• Proceedings of the Korean Vacuum Society Conference
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• 1998.02a
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• pp.179-179
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• 1998

실리콘 집적회로 제조시 sub-micron 의 contact 형성 공정은 질연막 형성 후 이의 식각 및 세정, c contact 실리사이드, 획산방지막, 배선 금속층의 형성 과정올 거치게 된다. 본 연구팀에서는 C.F야f2 헬리 콘 플라즈마훌 이용한 고선택비 contact 산화막 식각공정시 형성된 잔류막충과 오염 손상올 관찰하고 산소 플라즈마 처리와 후속 열처리에 따른 이들의 제거 정도를 관찰하여 이에 대한 결과를 발표하였다. 본 연구메서는 식각 및 후처리에 따라 잔류하는 잔류막과 손상층이 후속 공정인 contact 실리사이드 형 섬에 미치는 영향올 관찰하였다. C C.F바f2 웰리콘 풀라즈마률 이용한 식각시 공정 변수로는 수소가스 첨가, bias voltage 와 과식각 시간 의 효과를 관찰하였으며 다른 조건은 일정하게 하였다 .. Contact 실리사이드로는 Ti, Co-싫리사이드를 선 택하였으며 Piranha cleaning, 산소 플라즈마 처리, 산소 풀라즈마+600 'C annealing으로 각각 후처리된 시 편을 후처리하지 않은 시펀돌과 함께 실리사이드 형성용‘시펀으로 이용하였다 각각 일정 조건에서 동 일 두께의 실리사이드훌 형성시킨 후 4-point probe룰 이용하여 면저황올 측정하였다 후처리하지 않은 시편의 경무 실리사이드 형성은 아주 시펀의 일부분에서만 형성되었으며 후속 세정 및 얼처리훌 황에 따라 실리사이드의 면저항은 감소하여 식각 과정을 거치지 않은 깨끗한 실리콘 웨이퍼위에 실리사이드 를 형성시킨 값(control 값)에 접근하였다. 실리사이드의 면저항값은 식각시 노훌된 실리콘 표면 위에 형 성된 손상충보다는 잔류막에 큰 영향을 받았으며 수소 가스가 첨가된 식각 가스로 식각한 시편으로 형 성한 실리사이드의 면저항값이 손상이 상대적으로 적은 것으로 관찰된 수소훌 첨가하지 않은 식각 가 스로 식각한 시펀 위에 형성된 실리사이드의 면저황에 비해 낮은 값을 나타내었다. 실리사이드의 전기적 륙성에 미치는 손상층의 영향올 좀더 면밀히 관찰하고자 bare 실리콘 wafer 에 잔류막이 거의 없이 손상층을 유발시키는 식각 조건들 (100% HBr, 100%H2, 100%Ar, Cl싸fz)에 대하여 실 리콘 식각을 수행한 후 Co-실리사이드률 형성하여 이의 면저황을 측정한 걸과 100% Ar 가스로 식각된 시편을 이용하여 형성한 실리사이드의 면저항은 control 에 기까운 면저항값올 지니고 따라서 손상층이 실리사이드 형섬메 미치는 영향은 크지 않음을 알 수 있었다. 이상의 연구 결과훌 통해 손상층이 실리사이드의 형성이나 전기적 톡섬에 미치는 영황은 잔류막층 에 의한 영향보다 적다는 것을 알 수 았으며 잔류막층의 두께보다는 성분이나 걸합상태, 특히 식각 및 후처리 후 잔류하는 탄소 싱분과 C-Si 결함에 큰 영향올 받는 것올 알 수 있었다.

• Membrane Journal
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• v.27 no.3
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• pp.248-254
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• 2017

In order to secure the reliability of pathogenic microorganisms such as Cryptosporidium and Giaridia, which are chlorophilic protozoans, membrane filtration systems have been widely used in water purification process. hese integrity tests are classified into direct and indirect methods. Based on the bubble point theory, the pressure-based test in the direct method is presented in the USEPA Guidance Manual with sensitivity to detect a minimum size of pathogenic microorganisms of $3{\mu}m$ or more. Indirect methods are widely used in that they are capable of continuous operation in on-line state, but there is a very low sensitivity of damage detection compared to the direct method, and there is a limit that can not specify the damage area, so it is necessary to improve this sensitivity. In this study, we compared the LRVDIT and UCL values according to the type of membrane defect, number of fiber breaks, and initial set pressure value through the Integrity Test by Pressure Decay Test (PDT).

• Journal of Korean Ophthalmic Optics Society
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• v.15 no.1
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• pp.55-60
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• 2010

Purpose: We investigated the changes of plastic lens after etching of coating films by comparing uncoated lens. Methods: CR-39, middle index and high index lenses of 0 (zero) diopter were etched at $80^{\circ}C$ and room temperature using a coating remover, and then changes of refractive power, transmittance and surface morphology were investigated. Results: There were no differences in refractive power and transmittance between uncoated and etched lenses. The etching rate was similar in both CR-39 and middle index lens, but in the case of high index lens, it was slower and less steady than the others. From the SEM observation of lens surface, etching damage was found out on the surface of etched lens. It was shown the least damage in middle index lens but the most damage in high index lens. Conclusions: If the etching of coating films is demanded on condition that the surface of ophthalmic lenses are not damaged, a using of most adequate coating remover based on lens material should be considered, and a caution for proper etching conditions is required.

• Proceedings of the Korean Radioactive Waste Society Conference
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• 2005.06a
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• pp.137-144
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• 2005

Silica in primary system combines with an alkali grammatical particle metal and forms the zeolite layer which is hindering the heat transfer on the surface of the cladding. Zeolite layer becomes the cause of the damage in this way. The problems of the NPP's primary system have been issued steadily by EPRI. Through a series of experiments of the laboratory scale, we confirmed the applicability of NF membrane for silica removal, as silica rejection rate of NF membrane is about $60\;{\sim}\;70\%$ and boron rejection rate is about $10\;{\sim}\;20\%$. We accomplished a site experiment about four NF membranes manufactured by FilmTec and Osmonics Inc. In experiment using 400L of SFP water, when operation pressure is $10kg_{f}/cm^2$, we confirmed that the silica rejection rate of NF90-2540 manufactured by FilmTec Inc. is about $98\%$, boron rejection rate is about $43\%$. The silica rejection rate of NF270-2540 is about $38\%$, boron rejection rate is about $3.5\%$. Afterward, through additional experiments, such as long term characteristic experiments, we are going to design a optimum NF membrane system for silica removal.

• Korean Journal of Microbiology
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• v.55 no.2
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• pp.87-102
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• 2019

Most chronic wounds persist in the inflammatory phase during wound healing due to the biofilm. Biofilms are resistant to antibiotics, weakening penetration, resistance to biocides and weakening local immune responses. The biofilm is firmly attached to the surrounding tissues and is very difficult to remove. Therefore, strategies to remove hard biofilms without damaging surrounding tissue are very important. One of possible strategies is dispersal. So many studies have been done to develop new strategies using dispersal mechanisms. In this review paper, especially chemotaxis, phage therapy, polysaccharides, various enzymes (glycosidases, proteases, and deoxyribonucleases), surfactants, dispersion signals, autoinducers, inhibitors were introduced. Combination therapies with other therapies such as antibiotic therapy were also introduced. It is expected that the possibility of treatment of chronic wound infection using the knowledge of the biofilm dispersal mechanisms presented in this paper will be higher.

• Membrane Journal
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• v.27 no.4
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• pp.367-373
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• 2017

Pressurized membrane module systems, including hollow fiber type of Microfiltration (MF) and Ultrafiltration (UF) membranes are being increasingly used in drinking water treatment due to their high removal efficiency of pathogen. However, when fibers are damaged in pressurized membrane system, the pathogen will be able to penetrate the membrane. Therefore, it is essential to guarantee the regulatory requirements for water quality by an effective on-line or off-line condition integrity monitoring methods. Recently, pressure decay test (PDT) which is one of membrane integrity tests has been reflected to drinking water treatment plants using pressurized membrane module. In this paper, three different method were used to perform PDT and three different sensitivity values were analyzed through experiments. Three types of direct integrity test methods were applied to pressure feed side, filtrate side and bidirectional pressure decay test. The results of these experiments show that the sensitivity was increasing when the volume of pressurized gas was decreasing. The sensitivity is inversely proportional to the gas volume. Furthermore, it is desirable to increase pressure difference between feed side and permeate side in order to achieve higher sensitivity in the PDT by membrane damage.

• Membrane Journal
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• v.2 no.1
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• pp.67-73
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• 1992

The effects of after-treatment condition on the permeability of polysulfone hollow fiber membranes were investigated. It was well known that the permeability of and the rejection of hollow fiber membranes prepared by dry-wet spinning technique was highly affected by spinning conditions such as composition of spinning solution, inner and outer coagulant and spinning height. But these are also governed by after-treatment condition such as drying, hot water treatment and glycerine treatment. Since it was difficult to remove DMAc and NMP in membranes by washing with in cold water and even traces of such solvent affected the reproducibility of the membrane characteristics, the hot water-treatment should be required.

• Journal of Korean Ophthalmic Optics Society
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• v.17 no.2
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• pp.119-126
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• 2012

Purpose: To study changes in coating and lens materials after chemically etched different polymer based glass lenses in short-term and ambient condition using hydrofluoric acid. Methods: Vinyl ester polymer (Lens A) and thiourethane polymer (Lens B), both dyed in gray 70%, were etched in hydrofluoric acid solution for 5, 10, or 15 min. The mechanical properties, degrees of damages in hard coating, anti-reflection coating, and other coatings, rates of refractive index and light transmission of both polymer types were evaluated. Results: Rates of refractive index of both lens types were not changed significantly after chemical etching. However, anti-reflection coatings and hard coatings were removed and lens surfaces were damaged. As a results, UV light transmission of lenses increased and mechanical properties decreased. Chemical etching notably changed various properties of thiourethane polymer materials. Conclusions: Depending on types of polymer materials, chemical reactions by hydrofluoric acid were dissimilar. Thus, various properties of les materials were altered differently.