• 한국항해항만학회:학술대회논문집
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• 한국항해항만학회 2009년도 공동학술대회
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• pp.467-470
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• 2009

외부적으로 직렬 및 병렬로 접속된 50개의 DSSC로써 새로운 8 V DC 전원을 만들었다. 한 개의 DSSC는 $5.2{\times}2.6$ cm(유효면적 8 $cm^2$) 약 4.2%의 효율을 보이며, 전기화학적 임피던스 분석법 및 I-V 곡선으로 특성이 분석되었다. 또한 펄스형 Nd:YAG 레이저 빔을 활용하여 투명 도전층을 식각함으로써, 최종효율 약 45%를 달성하였다.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.398-398
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• 2007

The Liquid Crystal (LC) alignment uniformity is very important in LC devices. The alignment mechanism of LC molecules on a rubbed polyimide (PI) surface is very important for both LC fundamental research and application. So, Generally a rubbing method to align LC has been widely used to mass-produce LCD panels. But because rubbing method is contact method between rubbing fabric and indium-tin-oxide glass or flexible substrate, rubbing method has some defects, such as the electrode charges and the creation of contaminating particles. Thus we strongly recommend a non-contact alignment technique for getting rid of some defects of rubbing method. Most recently, the LC aligning capabilities achieved by ion-beam exposure on the organic and nonorganic thin film surface have been reported successfully. In this research, we studied the tilt angle generation and electro-optical performances for a NLC on homeotropic polyimide surfaces with ion-beam exposure. The LC aligning capabilities of a nematic liquid crystal (NLC) on a homeotropic PI surface using a new ion-beam method were studied. On the homeotropic PI surface, the tilt angle of the NLC by exposure ion-beam had a tendency to decrease as increased ion-beam energy density. And, on the homeotropic PI surface, the alignment character of the NLC with respect to ion-beam energy was good. And we achieved satisfactory result for EO character.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2005년도 하계학술대회 논문집 Vol.6
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• pp.379-380
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• 2005

Single phase $CuInS_2$ thin film with a highest diffraction peak (112) at a diffraction angle ($2\Theta$) of $27.7^{\circ}$ was well made by SEL method at annealing temperature of $250^{\circ}C$ and annealing hour of 60 min in vacuum of $10^{-3}$ Torr or in S ambience for an hour. And the peak of diffraction intensity at miller index (112) of $CuInS_2$ thin film annealed in S ambience was shown a little higher about 11 % than in only vacuum. Single phase $CuInS_2$ thin films were appeared from 0.85 to 1.26 of Cu/In composition ratio and sulfur composition ratios of $CuInS_2$ thin films fabricated in S ambience were all over 50 atom%. Also when $CuInS_2$ composition ratio was 1.03, $CuInS_2$ thin film with chalcopyrite structure had the highest XRD peak (112). The largest lattice constant of a and grain size of $CuInS_2$ thin film in S ambience was 5.63 ${\AA}$ and 1.2 ${\mu}m$ respectively. And the films in S ambience were all p-conduction type with resistivities of around $10^{-1}{\Omega}cm$.

• 한국재료학회지
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• 제27권6호
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• pp.345-349
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• 2017

The effects of electron beam(EB) irradiation on the electrical and optical properties of InGaZnO(IGZO) thin films fabricated using a sol-gel process were investigated. As the EB dose increased, the electrical characteristic of the IGZO TFTs changed from semiconductor to conductor, and the threshold voltage values shifted to the negative direction. X-ray photoelectron spectroscopy analysis of the O 1s core level showed that the relative area of oxygen vacancies increased from 14.68 to 19.08 % as the EB dose increased from 0 to $1.5{\times}10^{16}electrons/cm^2$. In addition, spectroscopic ellipsometer analysis showed that the optical band gap varied from 3.39 to 3.46 eV with increasing EB dose. From the result of band alignment, it was confirmed that the Fermi level($E_F$) of the sample irradiated with $1.5{\times}10^{16}electrons/cm^2$ was located at the closest position to the conduction band minimum(CBM) due to the increase of electron carrier concentration.

• 펄프종이기술
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• 제44권4호
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• pp.51-61
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• 2012

The new alkali pulping process combined with electron beam treatment was applied to utilize hemp bast tissues as a new valuable fibrous resource. Hemp bast tissues have some chemical properties with high lignin contents and holocellulose not to be defiberized by alkali pulping only, compared with the bast tissue of paper mulberry. To make up for the weakness of traditional alkali pulping process, electron beams were directly irradiated into the swelled bast tissue of hemp in NaOH solution and distilled water, and then facilitated the defiberization of hemp bast tissues. The papermaking from hemp bast fibers manufactured by the combination pulping process showed good apparent density, formation structure and air permeability, and had some mechanical properties with lower tensile, tear, burst strength and folding endurance. It is finally concluded that the combination pulping process with electron beam treatment could be suggested a new alternative for non-woody fibers.

• Journal of Welding and Joining
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• 제31권6호
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• pp.50-57
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• 2013

Characterization of microstructures and cryogenic mechanical properties of electro beam (EB) welds between cast and forged Inconel 718 superalloys has been investigated. Optimal EBW condition was found in the beam current range of 36~39 mA with the constant travel speed of 12 mm/s and arc voltage of 120 kV for 10 mm-thick specimens. Electron beam current lower than 25 mA caused to occur the liquation microfissuring in cast-side heat affected zone (HAZ) of EB welds. The HAZ liquation microfissure was found on the liquated grain boundaries with resolidified ${\gamma}/Laves$ and ${\gamma}/NbC$ eutectic constituents. EBW produced welds showing a fine dendritic structure with relatively discrete Laves phase due to fast cooling rate. After post weld aging treatment, blocky Laves phase and formation of ${\gamma}^{\prime}+{\gamma}^{{\prime}{\prime}}$ strengtheners were observed. Presence of primary strengthener and coarse Laves particles in PWHT weld may cause to reduce micro-plastic zone ahead of a crack, leading to a significant decrease in Charpy impact toughness at $-196^{\circ}C$. Fracture initiation and propagation induced by Charpy impact testing were discussed in terms of the dislocation structures ahead of crack arisen from the fractured Laves phase.

• 폴리머
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• 제36권1호
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• pp.93-97
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• 2012

본 연구에서는 리튬 이차전지용 분리막을 80, 100, $120^{\circ}C$의 온도에서 각각 1시간 동안 열처리하여 형상 및 물성의 변화에 미치는 영향을 평가하였다. 열처리는 전자빔처리에 의한 사슬절단 산화반응과 달리 화학적 반응을 수반하지 않았으며, 흥미롭게도 인장강도 및 탄성계수가 향상되는 효과를 보여주었다. 하지만 $100^{\circ}C$ 및 $120^{\circ}C$에서 처리된 분리막의 경우 PE 섬유사에 상당량의 주름이 형성되었으며 각각 7.5 및 15%의 면적수축이 관찰되었다. 결과적으로 $80^{\circ}C$, 1시간의 처리 조건을 통하여 5%의 면적 수축이 발생되었지만 일반 분리막대비 향상된 전지특성을 유지하면서 최대 1.3배의 인장강도 및 2.3배의 탄성계수를 확보할 수 있었다.

• 한국정보통신학회논문지
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• 제11권6호
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• pp.1115-1121
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• 2007

이온 빔 스퍼터법을 이용하여 저속성장으로 동시 증착에 의해 $Bi_2Sr_2Ca{_{n-1}}Cu_nO_x$(n=0,1,2) 박막을 제작하였다. Bi 2212 상은 기판온도 $750{\sim}795^{\circ}C$의 범위에서 나타났으며, $750^{\circ}C$보다 저온 측에서는 Bi 2201의 단일상이 존재하였다. 그러나, 조성과 관계되는 $PO_3$은 압력 변화에 대해서는 관찰되지 않았다. 그리고 $45{\sim}90K$의 임계온도(Tc)를 갖는 c축 배향한 고품질의 Bi 2212 박막을 얻었다. 소수의 박막에서는 소량의 CuO가 불순물로 관찰되었으며, 얻어진 모든 박막에서 $CaCuO_2$ 의 불순물 상은 관찰되지 않았다.

• 방사선산업학회지
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• 제3권1호
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• pp.7-11
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• 2009

Hard magnet was usually used by coating $SiO_2$ ceramic thick films followed by the thermal annealing process. In this work, the alternative annealing process for NdFeB magnets using e-beam sources (1~2 MeV, 50~400 kGy) was investigated. NdFeB magnets was coated with ceramic thick films using the spray method. The optimal annealing parameter for e-beam source reveals to be 1 MeV and 300 kGy. The sample prepared at 1 MeV and 300 kGy was characterized by the analysis of the surface morphology, film hardness, adhesion and chemical stability. The mechanical property of thick film, especially film hardness, is better than that of thermal annealed samples at $180^{\circ}C$. As a result, e-beam annealing process will be one of candidate and attractive heat treatment process. In future, manufacturing process will be carried out in cooperation with the magnet company.

• 한국표면공학회지
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• 제54권6호
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• pp.302-306
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• 2021

SnO₂ 30/Ag 15/SnO₂ 30 nm(SAS) tri-layer films were deposited on the glass substrates with RF and DC magnetron sputtering and then electron beam is irradiated on the surface to investigate the effect of electron bombardment on the opto-electrical performance of the films. electron beam irradiated tri-layer films at 1000 eV show a higher figure of merit of 2.72×10^-3 Ω^-1 than the as deposited films due to a high visible light transmittance of 72.1% and a low sheet resistance of 14.0 Ω/☐, respectively. From the observed results, it is concluded that the post-deposition electron irradiated SnO₂ 30/Ag 15/SnO₂ 30 nm tri-layer films can be used as a substitute for conventional transparent conducting oxide films in various opto-electrical applications.