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http://dx.doi.org/10.5695/JKISE.2021.54.6.302

The Effect of electron beam surface irradiation on the properties of SnO2/Ag/SnO2 thin films  

Jang, Jin-Kyu (School of Materials Science and Engineering, University of Ulsan)
Kim, Hyun-Jin (School of Materials Science and Engineering, University of Ulsan)
Choi, Jae-Wook (School of Materials Science and Engineering, University of Ulsan)
Lee, Yeon-Hak (School of Materials Science and Engineering, University of Ulsan)
Kong, Young-Min (School of Materials Science and Engineering, University of Ulsan)
Heo, Sung-Bo (Korea Institute of Industrial Technology)
Kim, Yu-Sung (Korea Institute of Industrial Technology)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean institute of surface engineering / v.54, no.6, 2021 , pp. 302-306 More about this Journal
Abstract
SnO2 30/Ag 15/SnO2 30 nm(SAS) tri-layer films were deposited on the glass substrates with RF and DC magnetron sputtering and then electron beam is irradiated on the surface to investigate the effect of electron bombardment on the opto-electrical performance of the films. electron beam irradiated tri-layer films at 1000 eV show a higher figure of merit of 2.72×10-3 Ω-1 than the as deposited films due to a high visible light transmittance of 72.1% and a low sheet resistance of 14.0 Ω/☐, respectively. From the observed results, it is concluded that the post-deposition electron irradiated SnO2 30/Ag 15/SnO2 30 nm tri-layer films can be used as a substitute for conventional transparent conducting oxide films in various opto-electrical applications.
Keywords
SnO2; Ag; Electron irradiation; X-ray diffraction; Figure of merit;
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