• Title/Summary/Keyword: 빔 집속

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Methodologic Aspect of LINAC-based Stereotactic Radiosurgery (선형가속기 기반 뇌정위 방사선 수술기법)

  • Choi, Tae Jin
    • Progress in Medical Physics
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    • v.23 no.3
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    • pp.127-137
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    • 2012
  • A conversing beam is firstly designed for radiosurgery by a neurosugern Lars Leksell in 1949 with orthogonal x-rays tube moving through horizontal moving arc to focusing the beam at target center. After 2 decades he composits 201 source of the Co-60 for gamma knife which beams focused at locus. Sveral linac-based stereotactic radiosurgery using the circular collimated beam which size range for 0.4~4.0 cm in a diameter by non-coplanar multiarc have been developed over the decades. The irregular lesions can be treated by superimposing with several spherical shots of radiation over the tumour volume. Linac based techniques include the use of between 4 and 11 non-co-planar arcs and a dynamic rotation technique and use photon beam energies in the range of 6~10 MV. Reviews of the characteristics of several treatment techniques can be found in the literature (Podgorsak 1989, Schell 1991). More in recent, static conformal beams defined by custom shaped collimators or a mini- or micro-multileaf collimator (mMLC) have been used in SRS. Finally, in the last few years, intensity-modulated mMLC SRS has also been introduced. Today, many commercial and in-house SRS programs have also introduced non-invasive immobilization systems include the cyberknife and tomotherapy and proton beam. This document will be compared the characteristics of dose distribution of radiosurgery as introduced gamma knife, BrainLab include photon knife in-house SRS program and cyberknife in currently wide used for a cranial SRS.

Study on Frictional Characteristics of Sub-micro Structured Silicon Surfaces (서브 마이크로 구조를 가진 실리콘 표면의 마찰 특성 연구)

  • Han, Ji-Hee;Han, Gue-Bum;Jang, Dong-Yong;Ahn, Hyo-Sok
    • Tribology and Lubricants
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    • v.33 no.3
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    • pp.92-97
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    • 2017
  • The understanding of the friction characteristics of micro-textured surface is of great importance to enhance the tribological properties of nano- and micro-devices. We fabricate rectangular patterns with submicron-scale structures on a Si wafer surface with various pitches and heights by using a focused ion beam (FIB). In addition, we fabricate tilted rectangular patterns to identify the influence of the tilt angle ($45^{\circ}$ and $135^{\circ}$) on friction behaviour. We perform the friction test using lateral force microscopy (LFM) employing a colloidal probe. We fabricate the colloidal probe by attaching a $10{\pm}1-{\mu}m$-diameter borosilicate glass sphere to a tipless silicon cantilever by using a ultraviolet cure adhesive. The applied normal loads range between 200 nN and 1100 nN and the sliding speed was set to $12{\mu}m/s$. The test results show that the friction behavior varied depending on the pitch, height, and tilt angle of the microstructure. The friction forces were relatively lower for narrower and deeper pitches. The comparison of friction force between the sub-micro-structured surfaces and the original Si surface indicate an improvement of the friction property at a low load range. The current study provides a better understanding of the influence of pitch, height, and tilt angle of the microstructure on their tribological properties, enabling the design of sub-micro- and micro-structured Si surfaces to improve their mechanical durability.

-The Optical- and Ion-Induced Characteristics of a-$Se_{75}Ge_{25}$ Thin Film for Focused Ion Beam (FIB)- (집속이온빔 (FIB) 레지스트를 위한 비정질 $Se_{75}Ge_{25}$ 박막의 이온 및 광유기특성)

  • Lee, Hyun-Yong;Park, Tae-Sung;Kim, Jong-Bin;Lee, Young-Jong;Chung, Hong-Bay;Cho, Guang-Sup;Kang, Seung-Oun;Hwang, Ho-Jung;Park, Sun-Woo
    • Proceedings of the KIEE Conference
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    • 1992.07b
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    • pp.843-846
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    • 1992
  • This thesis was investigated on optical-and ion-induced characteristics in positive(a-$Se_{75}Ge_{25}$) and negative (Ag/a-$Se_{75}Ge_{25}$) resists for focused-ion-beam microlithogaphy. The a-$Se_{75}Ge_{25}$ inorganic thin film shows an increase in optical absorption after exposure to$\sim$$10^{16}$ dose(ions/$cm^{2}$) of Ga ions. The observed shift in the absorption edge toward longer wavelengths is consistent with that in films exposed to band-gap photons ($\sim$$10^{20}$ photons/$cm^{2}$). But, ion induced shift is twice as much as that in film exposed to optical radiation. This result may be related with microstructural rearrangements with in the short range of SeGe network. Due to changes in the short range order, the chemical bonding may be affected, which results in increased chemical dissolution in ion-induced film. Also, this resist exhibits good thermal stability because of its high Tg(~220$^{\circ}C$). The composition of deposited film measured by AES is consistent with that of bulk.

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Micropatterning by Low-Energy Focused ton Beam Lithography(FIBL) (저에너지 집속이온빔리소그라피(FIBL)에 의한 미세패턴 형성)

  • 이현용;김민수;정홍배
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 1995.11a
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    • pp.224-227
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    • 1995
  • The micro-patterning by a Bow energy FIB whish has been conventionally utilized far mask-repairing was investigated. Amorphous Se$\_$75/Gee$\_$25/ resist irradiated by 9[keV]-defocused Ga$\^$+/ ion beam(∼10$\^$15/[ions/$\textrm{cm}^2$]) resulted in increasing the optical absorption, which was also observed also in the film exposed by an optical dose of 4.5${\times}$10$\^$20/[photons/$\textrm{cm}^2$]. The ∼0.3[eV] edge shift for ion-irradiated film was about twice to that obtained for photo-exposed. These large shift could be estimated as due to an increase in disorder from the decrease in the sloop of the Urbach tail. For Ga$\^$+/ FIB irradiation with a relatively low energy, 30[keV] and above the amount of dose of 1.4${\times}$10$\^$16/[ions/$\textrm{cm}^2$], the irradiated region in a-Se$\_$75/Ge$\_$25/ resist was perfectly etched in acid solution for 10[sec], which is relatively a short development time. A contrast was about 2.5. In spite of the relatively low incident energy,∼0.225[$\mu\textrm{m}$] pattern was clearly obtained by the irradiation of a dose 6.5${\times}$10$\^$16/[ions/$\textrm{cm}^2$] and a scan diameter 0.2[$\mu\textrm{m}$], from which excellent results were expected fur incident energies above 50[keV] which was conventionally used in FIBL.

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Ion Migration Failure Mechanism for Organic PCB under Biased HAST (고온고습 전압인가(Biased HAST) 시험에서 인쇄회로기판의 이온 마이그레이션 불량 메커니즘)

  • Huh, Seok-Hwan;Shin, An-Seob;Ham, Suk-Jin
    • Journal of the Microelectronics and Packaging Society
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    • v.22 no.1
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    • pp.43-49
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    • 2015
  • By the trends of electronic package to be smaller, thinner and more integrative, organic printed circuit board is required to be finer Cu trace pitch. This paper reports on a study of failure mechanism for PCB with fine Cu trace pitch using biased HAST. In weibull analysis of the biased HAST lifetime, it is found that the acceleration factor (AF) of between $135^{\circ}C/90%RH/3.3V$ and $130^{\circ}C/85%RH/3.3V$ is 2.079. A focused ion beam (FIB) was used to polish the cross sections to reveal details of the microstructure of the failure mode. It is found that $Cu_xO/Cu(OH)_2$ colloids and Cu dendrites were formed at anode (+) and at cathode (-), respectively. Thus, this gives the evidence that Cu dendrites formed at cathode by $Cu^{2+}$ ion migration lead to a short failure between a pair of Cu nets.

The study of optimal reduced-graphene oxide line patterning by using femtosecond laser pulse (펨토초 레이저 펄스를 이용한 환원된 그래핀의 최소 선폭 패턴 구현에 관한 연구)

  • Jeong, Tae-In;Kim, Seung-Chul
    • Journal of the Korea Convergence Society
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    • v.11 no.7
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    • pp.157-162
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    • 2020
  • In recent years, laser induced graphene process have been intensively studied for eco-friendly electronic device such as flexible electronics or thin film based energy storage devices because of its simple and effective process. In order to increase the performance and efficiency of an electronic device using such a graphene patterned structure, it is essential to study an optimized laser patterning condition as small as possible linewidth while maintaining the graphene-specific 2-dimensional characteristics. In this study, we analyzed to find the optimal line pattern by using a Ti:sapphire femtosecond laser based photo-thermal reduction process. we tuned intensity and scanning speed of laser spot for generating effective graphene characteristic and minimum thermal effect. As a result, we demonstrated the reduced graphene pattern of 30㎛ in linewidth by using a focused laser beam of 18㎛ in diameter.

A Small Crack Length Evaluation Technique by Electronic Scanning (전자적 스캔에 의한 미소결함길이 평가기법)

  • Cho, Yong-Sang;Kim, Jae-Hoon
    • Journal of the Korean Society for Nondestructive Testing
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    • v.29 no.1
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    • pp.15-20
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    • 2009
  • The results of crack evaluation by conventional UT(Ultrasonic Test)is highly depend on the inspector's experience or knowledge of ultrasound. Phased array UT system and its application methods for small crack length evaluation will be a good alternative method which overcome present UT weakness. This study was aimed at checking the accuracy of crack length evaluation method by electronic scanning and discuss about characteristics of electronic scanning for crack length evaluation. Especially ultrasonic phased array with electronic scan technique was used in carrying out both sizing and detect ability of crack as its length changes. The response of ultrasonic phased array was analyzed to obtain the special method of determining crack length without moving the transducer and detect-ability of crack minimal length and depth from the material. A method of crack length determining by electronic scanning for the small crack is very real method which has it's accuracy and verify the effectiveness of method compared to a conventional crack length determination.

Study on Enhancements to Ultrasonic Data Imaging Using Full Matrix Capture Technique (Full Matrix Capture 기법을 통한 초음파신호 영상화 향상 연구)

  • Lee, Tae-Hun;Yoon, Byung-Sik;Lee, Jeong-Seok
    • Journal of the Korean Society for Nondestructive Testing
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    • v.35 no.5
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    • pp.299-306
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    • 2015
  • A conventional phased array system can control an ultrasonic beam electronically by adjusting the excitation time delay of individual elements in a multi-element probe and produce an ultrasonic image. In Contrast, full matrix capture (FMC) is a data acquisition process that allows receiving ultrasonic signals from one single shot of the phased array transducer element through all the other elements and captures the complete dataset from every possible transmit-receive combination. This FMC data can be used to create the ultrasonic image in post processing. It is possible to produce not only images equivalent to conventional phased array image but also total focusing method (TFM) images with improved resolution and sharpness, which is virtually focused at any point in a region of interest. In this paper, the system that can perform FMC by using a conventional phased array instrument is developed, and a study was conducted on the imaging algorithms to reconstruct sector B-scan and TFM images from FMC dataset.

Effects of storing defocused Fourier plane holograms in three-dimensional holographic disk memories (디스크형 3차원 홀로그래피 메모리에서 비초점 Fourier 면 홀로그램의 저장 효과)

  • 장주석;신동학
    • Korean Journal of Optics and Photonics
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    • v.12 no.1
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    • pp.61-66
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    • 2001
  • Defocused Fourier plane holograms are stored in disk-type holographic memories where thin recording media are used, the areal storage density per hologram and the intensity uniformity of the signal beam at the recording plane are studied. As the pixel pitch of the spatial light modulator that represents binary data increases, the storage density per hologram increases if exact Fourier holograms are stored. When defocused Fourier plane holograms are stored, however, we show that there exists an optimal pixel pitch that maximizes the area storage density per hologram in general, to increase the areal storage density per hologram, f/# of the Fourier transform lens that focuses the data image should be as small as possible. In this case, not only the intensity distribution at the recording plane but also the recording area becomes very sensitive to the degree of defocusing. Therefore, even if the exact Fourier plane holograms are stored, the defocusing effect owing to the medium thickness should be taken into account to achieve the maximal areal storage density per hologram.logram.

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Alignment Algorithm for Nano-scale Three-dimensional Printing System (나노스케일 3 차원 프린팅 시스템을 위한 정렬 알고리즘)

  • Jang, Ki-Hwan;Lee, Hyun-Taek;Kim, Chung-Soo;Chu, Won-Shik;Ahn, Sung-Hoon
    • Journal of the Korean Society for Precision Engineering
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    • v.31 no.12
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    • pp.1101-1106
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    • 2014
  • Hybrid manufacturing technology has been advanced to overcome limitations due to traditional fabrication methods. To fabricate a micro/nano-scale structure, various manufacturing technologies such as lithography and etching were attempted. Since these manufacturing processes are limited by their materials, temperature and features, it is necessary to develop a new three-dimensional (3D) printing method. A novel nano-scale 3D printing system was developed consisting of the Nano-Particle Deposition System (NPDS) and the Focused Ion Beam (FIB) to overcome these limitations. By repeating deposition and machining processes, it was possible to fabricate micro/nano-scale 3D structures with various metals and ceramics. Since each process works in different chambers, a transfer process is required. In this research, nanoscale 3D printing system was briefly explained and an alignment algorithm for nano-scale 3D printing system was developed. Implementing the algorithm leads to an accepted error margin of 0.5% by compensating error in rotational, horizontal, and vertical axes.