• Journal of the Korean Society for Precision Engineering
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• v.27 no.8
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• pp.84-90
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• 2010

In focused ion beam (FIB) fabrication processes the ion beam intensity with Gaussian profile has a drawback for high resolution machining. In this paper, the fabrication method to modify the beam profile at substrate using silt mask is proposed to increase the machining resolution at high current. Slit mask is utilized to block the part of beam and transmit only high intensity portion. A nano manipulator is utilized to handle the silt mask. Geometrical analysis on fabricated profile through silt mask was conducted. By utilizing proposed method, improvement of machining resolution was achieved.

• Journal of the Korean Society for Nondestructive Testing
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• v.19 no.3
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• pp.207-216
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• 1999

A phased array is a multi-element piezoelectric device whose elements are individually excited by electric pulses at programmed delay time. One of the advantages of using phased array in nondestructive evaluation (NDE) application over conventional ultrasonic transducers is their great maneuverability of ultrasonic beam. There are some parameters such as the number and the size of the piezoelectric elements and the inter-element spacing of the elements to design phased array transducer. In this study, the characteristic of ultrasonic beam for phased array transducer due to the variation of the number of elements has been simulated for ultrasonic SH-wave on the basis of Huygen's principle. Ultrasonic beam directivity and focusing due to the change of time delay of each element were discussed due to the change of the number of piezoelectric elements. It was found that ultrasonic beam was much more spreaded and hence its sound pressure was decreased as steering angle of ultrasonic beam was increased. In addition, the ability of ultrasonic bean focusing decreased gradually with the increase of focal length at the same piezoelectric elements. However, the ability of beam focusing was improved as the number of consisting elements was increased.

• The Journal of the Acoustical Society of Korea
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• v.36 no.1
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• pp.23-29
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• 2017

A concept of a VSA (Virtual Source Array) is the method for an acoustic spatio-temporal focus at a selected location in the outbound direction with respect to the VSA without the need of a probe source as combines a TRP (Time-Reversal Processing) and time-delay and beam-steering. However, in TRP using the VSA concept, it is limited to the critical angle and the short distances relevant to the VSA. In this paper, the waveguide invariant theory is applied to the VSA concept to refocus the received field at ranges greater other than the critical angle and the short ranges by shifting the focused field. The suggested method is verified via numerical simulation, and the results show that the robust acoustic focusing is achieved on the selected location regardless of the limitation on the conventional VSA concept.

• Proceedings of the Korean Vacuum Society Conference
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• 1994.02a
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• pp.124-125
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• 1994

• Proceedings of the Korean Vacuum Society Conference
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• 1993.02a
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• pp.14-15
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• 1993

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2008.11a
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• pp.305-306
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2013.05a
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• pp.595-596
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• 2013

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.193-194
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• 2011

• Proceedings of the Korean Vacuum Society Conference
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• 2013.02a
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• pp.180-180
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• 2013

반도체, 디스플레이와 같이 저압, 극청정 조건에서 진행되는 공정에서 발생한 오염입자는 수 율에 큰 영향을 미친다. 따라서 공정 중에 발생한 오염입자를 실시간으로 모니터링할 수 있는 장비에 대한 연구가 활발히 진행되고 있다. Particle Beam Mass Spectrometer (PBMS)는 저압에서 실시간으로 나노 입자의 크기를 측정할 수 있는 대표적인 장비 중 하나이다. 입자를 포함한 가스 유동이 PBMS로 유입되면, 우선 입자를 입자빔의 형태로 집속하는 공기역학렌즈를 통과하게 된다. 집속된 입자는 노즐에 의해서 가속되며, 이로 인해 충분한 관성을 가지게 된 입자는 양극과 음극, 필라멘트로 구성된 electron gun에서 전자충돌에 의해 포화상태로 하전된다. 하전한 입자는 electrostatic deflector에서 크기에 따라 분류되어 Faraday detector와 electrometer에 의해 측정된다. 그러나 공기역학렌즈는 입자의 크기가 작아질수록 집속 효율이 급격히 낮아진다는 문제점을 지니고 있다. 이는 입자가 작아질수록 점성에 의한 영향이 관성에 의한 영향보다 커짐으로써 나타나는 현상이다. 최근 이러한 문제점을 해결하기 위해 사중극자를 사용하여 입자를 집속시키는 방법이 대안으로 제시되었다. 사중극자는 서로 마주보는 쌍곡선 형태의 전극구조에 AC 전기장을 인가하는 방식을 사용한다. 사중극자의 중심은 정확히 평형점을 가지게 되며 입자는 사중극자 내에서 진동을 반복하며 평형점을 향해 모이게 된다. 입자의 크기가 작을수록 전기력에 의한 영향을 크게 받으므로 사중극자를 이용한 입자집속 방법은 나노입자의 집속에 있어 공기역학렌즈를 이용한 집속에 비해 이점을 지닌다. 또한 집속 하고자 하는 입자 대상이 바뀔 경우 구조를 바꿔야 하는 공기역학렌즈와 달리 사중극자를 이용한 방법은 AC 전기장을 조절하는 것 만으로 제어가 가능하다. 본 연구에서는 저압 조건에서 나노입자를 집속하기 위한 사중극자의 전극 구조를 이론적인 계산을 통하여 구하였다. 그 결과 0.1 torr의 압력 조건하에서 5~100 nm 범위의 기본 입자를 AC 전압과 진동수를 조절하여 집속할 수 있는 사중극자 형태를 설계하였다.

• Journal of the Institute of Electronics Engineers of Korea SD
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• v.37 no.9
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• pp.31-37
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• 2000

An angular selectivity through the focused readout beam is geometrically analyzed and experimental results are presented. Based on the analysis of geometrical results, we derive a new relation that the angular selectivity depends on incident conditions of the readout beam and independent on the writing conditions. In order to demonstrate our theory, we investigate angular selectivity as functions of following factors: writing beam incident angle, readout beam width and lens focal length. From the experimental results, it is shown that the angular selectivities are 2.632$^{\circ}$, 2.618$^{\circ}$, 2.604$^{\circ}$ when the external half-crossing angles of writing beam are 8$^{\circ}$, 10$^{\circ}$, 14$^{\circ}$, respectively. Applying the same incident angle of the recording beam, angular selectivity is changed by the control of readout beam width and then their properties are 2.632$^{\circ}$, 0.588$^{\circ}$. From these results, we have known that the angular selectivity is very critical to incident conditions of readout beam.