• Title/Summary/Keyword: 박막형 필터

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FBAR devices for RF bandpass filter applications (박막형 FBAR 공진기 설계 및 제작)

  • Yoon, Gi-Wan;Park, Sung-Chang
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.5 no.7
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    • pp.1321-1325
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    • 2001
  • In this article, piezoelectric films and their application for film bulk acoustic resonator (FBAR) devices are presented. The FBAR is composed of piezoelectric film sandwiched between top and bottom electrodes and an acoustic reflector of SiO2/W stacked multilayers. Various FBAR devices were fabricated and evaluated through simulation and measurement. The insertion loss, return loss and Q-factor were observed to be reasonably high and good. The FBAR technology seems very promising particularly for RF band filter application.

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Align-free Micro-optic Mach-Zehnder Interferometric Filter (정렬에 무관한 마이크로옵틱 마하젠더 간섭계형 필터)

  • Lee, Jong-Hoon;Kim, Hyun-Deok;Song, Jae-Won
    • Korean Journal of Optics and Photonics
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    • v.17 no.3
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    • pp.285-289
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    • 2006
  • A novel alignment-free micro-optic MZI filter has been demonstrated. The filter is composed of two fiber-pigtailed collimators and a beam-splittingplate with a periodically etched stripe pattern. We fabricated the plate through a standard lithographic formulation process by using a pyrex substrate glass with SU-8 resist coating on its one of the surfaces. The maximum insertion loss of the implemented filter was less than 2 dB over 1000 nm to 1600 nm and the extinction ratio was larger than 33 dB. The measured PDL within the 3-dB pass band of the filter was less than 0.15dB and the maximum extinction ratio variation was less than 2 dB even when the worst alignment error occured.

FBAR Device with Thin AlN Piezoelectric Film for 2 GHz RF Bandpass Filter Applications (2 GHz 대역 RF 대역통과 필터 응용을 위한 AlN 압전 박막을 이용한 FBAR 소자)

  • Giwan Yoon;Munhyuk Yim;Dongkyu Chai;Kim, Sanghee;Kim, Jongheon
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.2
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    • pp.250-254
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    • 2003
  • A film bulk acoustic resonator (FBAR) device for 2 GHz radio frequency (RF) bandpass filter application is presented. This FBAR device consists of an aluminum nitride (AlN) film sandwiched between top(Al) and bottom(Au) electrodes and an acoustic multilayer reflector of a silicon dioxide/tungsten (SiO2/W). The A/N film deposited using a RF sputtering was observed to have small columnar grains with a strongly preferred orientation towards c axis. In addition to a high quality factor (4300), a large return loss of 37.19 dB was obtained.

ZnO Film Deposition on Aluminum Bottom Electrode for FBAR Filter Applications and Effects of Deposition Temperature on ZnO Crystal Growth (FBAR 필터 응용을 위한 Al 하부전극 상에서 ZnO 박막 증착 및 온도가 ZnO 결정의 성장에 미치는 영향)

  • ;;;Mai Linh
    • Journal of the Korea Institute of Information and Communication Engineering
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    • v.7 no.2
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    • pp.255-262
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    • 2003
  • In this paper, an investigation on the ZnO film deposition using radio-frequency magnetic sputtering techniques on aluminum bottom electrode for film bulk acoustic wave resonator (FBAR) filter applications and the temperature effects on the ZnO film growth is presented. The investigation on how much impact the actual process temperature may have on the crystal growth is more meaningful if it is considered that the piezoelectricity property of ZnO films plays a dominant role in determining the resonance characteristics of FBAR devices and the piezoelectricity is determined by the degree of the c-axis preferred orientation of the deposited ZnO films. In this experiment, it was found that the growth of ZnO crystals has a strong dependence on the deposition temperature ranged from room temperature to $350^{\circ}C$ regardless of the RF powers applied and there exist 3 temperature regions divided by 2 critical temperatures according to the degree of the c-axis preferred orientation. Overall, below $200^{\circ}C$, ZnO deposition results in columnar grains with a highly preferred c-axis orientation. With this ZnO film, a multilayered FBAR structure could be realized successfully.

Design and Fabrication of Reflection-type Pump LD Protection Filters for High Power Fiber Lasers by Using Ta2O5/SiO2 Thin Films (Ta2O5/SiO2를 이용한 고출력 광섬유 레이저의 펌프 LD 보호기용 반사형 필터 설계 및 제작)

  • Sung, Hamin;Kim, Jae Hun;Lee, Seok;Jhon, Young Min
    • Korean Journal of Optics and Photonics
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    • v.23 no.3
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    • pp.124-127
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    • 2012
  • We designed and fabricated dichroic filters for high-power fiber lasers to protect the pumping laser diode from counterpropagating laser beams. The transmittance at laser diode wavelengths of 905 nm~925 nm was designed to be less than 0.1% and the transmittance at the fiber laser or Brillouin scattering wavelengths of 1020 nm ~ 1100 nm was designed to be more than 99.9%. Since oxide materials have good adhesion to the $SiO_2$ substrate, $SiO_2/Ta_2O_5$ were used as coating materials. The filter was fabricated according to our optimized design and its characteristics were compared with the theoretical design. As a result, the transmittance at laser diode wavelengths of 905 nm~925 nm was measured to be less than 0.1%, and the transmittance at the fiber laser or Brillouin scattering wavelengths of 1020 nm~1100 nm was measured to be more than 95.5%, which coincided well with the theoretical design considering processing errors. The filter was found to operate well over 1W of input laser power.

FBAR Devices Fabrication and Effects of Deposition Temperature on ZnO Crystal Growth for RF Filter Applications (RF 필터응용을 위한 FBAR 소자제작과 증착온도가 ZnO 박막의 결정성장에 미치는 영향)

  • Munhyuk Yim;Kim, Dong-Hyun;Dongkyu Chai;Mai Linh;Giwan Yoon
    • Proceedings of the Korean Institute of Information and Commucation Sciences Conference
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    • 2003.05a
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    • pp.88-92
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    • 2003
  • In this paper, the characteristics of the ZnO films deposited on AI bottom electrode and the temperature effects on the ZnO film growth are presented along with the fabrication and their evaluation of the film bulk acoustic wave resonator (FBAR) devices. All the films used in this work were deposited using a radio-frequency (RF) magnetron sputtering technique. Growth characteristics of the ZnO films are shown to have a strong dependence on the deposition temperatures ranged from room temperature to 35$0^{\circ}C$ regardless of the RF power applied for sputtering the ZnO target. In addition, according to the growth characteristics of the distinguishably different micro-crystal structures and the degree of the c-axis preferred orientation, the deposition temperatures can be divided into 3 temperature regions and 2 critical temperatures in-between. Overall, the ZnO films deposited at/below 20$0^{\circ}C$ are seen to have columnar grains with a highly preferred c-axis orientation where the full width at half maximum (FWHM) of X-ray diffraction rocking curve is 14$^{\circ}$. Based on the experimental findings, several FBAR devices were fabricated and measured. As a result, the FBAR devices show return loss of ~19.5dB at resonant frequency of ~2.05GHz.

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Design of silicon subwavelength structures with extremely transparent property for mid-infrared applications (고투과특성을 지닌 중적외선용 무반사 실리콘 서브파장구조 설계)

  • Sin, Myeong-Gyu;Lee, Jong-Heon;Song, Yeong-Min
    • Proceedings of the Korean Vacuum Society Conference
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    • 2016.02a
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    • pp.282.2-282.2
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    • 2016
  • 중적외선 물질에는 Ge, ZnS, ZnSe, Si 등이 있으나 고굴절율이므로 반사가 매우 크게 발생을 한다. 이를 줄이기 위해 다층 박막 무반사 코팅을 일반적으로 사용하지만 열에 취약함, 적합한 물질을 찾는 것이 매우 어려움, 다층 박막으로 제작 시 두께가 매우 두꺼워짐의 단점이 있다. 또한 Ge, ZnS, ZnSe 의 소재는 가격이 Silicon에 비해 매우 비싸다. 그러므로 RCWA(Rigorous Coupled Wavelength Analysis) 시뮬레이션을 이용하여 상대적으로 저렴한 소재임에도 고투과성을 지닌 중적외선용 무반사 실리콘 서브파장구조(Subwavelength Structures, SWSs)를 제안한다. 본 연구에서는 원기둥, 원뿔, 파라볼라, 잘린 원뿔(truncated cone) 등의 형태에 따른 투과율 특성을 파악하여 최적구조가 파라볼라 형태임을 증명하였다. 또한 서브파장구조의 주기, 높이의 특성을 조절하여 공정 시의 종횡비(Aspect ratio)를 고려한 최적형태를 제안하였다. 중적외선 영역($3{\mu}m{\sim}5{\mu}m$)에서 일반 Silicon의 적외선 영역에서 평균 55%의 낮은 투과율을 보이나, 양면에 무반사 구조를 설계 하였을 때 평균 94%의 높은 투과율을 확인할 수 있다. 다양한 형태를 가진 무반사 실리콘 서브파장 구조물을 RCWA 방식으로 계산함으로서 특성을 파악하며 최적구조를 설계 할 수 있다. 또한 단면에 비하여 양면으로 SWSs 구조를 제작할 시 매우 두드러지는 투과특성을 확인할 수 있다. 고굴절율이지만 뛰어난 투과특성을 이용하여 초소형 적외선 카메라 렌즈 뿐만 아니라 적외선 광검출기, 광학 필터 등에 이용 가능할 것으로 예상된다.

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Color Filter Based on a Sub-wavelength Patterned Metal Grating (광파장 이하 주기를 갖는 금속 격자형 컬러필터)

  • Lee, Hong-Shik;Yoon, Yeo-Taek;Lee, Sang-Shin;Kim, Sang-Hoon;Lee, Ki-Dong
    • Korean Journal of Optics and Photonics
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    • v.18 no.6
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    • pp.383-388
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    • 2007
  • A color filter was demonstrated incorporating a patterned metal grating in a quartz substrate. The filter is created in a metal layer perforated with a symmetric two-dimensional array of circular holes, with the pitch smaller than the wavelength of the visible light. A finite-difference time-domain simulation was performed to analyze the device by investigating the effect of structural parameters like the grating height, the period, the hole size, and the refractive index of the hole-filling material on its performance. The device performance was especially optimized by controlling the refractive index of the material comprising the holes of the grating. And two different devices were fabricated by means of the e-beam direct writing with the following design parameters: the grating height of 50 nm, the two pitches of 340 nm for the red color and 260 nm for the green color. For the prepared device with the period of 340 nm, the center wavelength was 680 nm and the peak transmission 57%. And for the other device with the pitch of 260 nm, the center wavelength was 550 nm and the peak transmission was 50%. The filling of the hole with a material whose refractive index is matched to that of the substrate has led to an increase of ${\sim}15%$ in the transmission efficiency.

Studies on the Photo-Electrochemical Properties of Ti$O_2$-x Thin Films Prepared by Air Oxidation and Water Vapor Oxidation (공기 산화와 수증기 산화에 의해 제조된 Ti$O_2$-x박막의 광전기화학적 성질에 관한 연구)

  • Choi Yong-Kook;Jo, Gi Hyeong;Choi Q-Won;Oh Jeong-Geun;Seong Jeong-Sub
    • Journal of the Korean Chemical Society
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    • v.37 no.6
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    • pp.549-554
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    • 1993
  • The titanium oxide thin film was prepared by air oxidation and water vapor oxidation. The photo-electrochemical properties of the electrode was studied in 1M NaOH solution. Titanium dioxide electrodes prepared at higher temperatures were found to have slightly more negative flat band potentials and slightly higher donor densities than their low temperature counterparts. The value of flat band potential ($V_{fb}$) was obtained to be -0.95 ∼ -1.1 V by the measurement of photocurrent and Motte-Schottky plots. The photocurrent of visible region was measured in terms of single crystal filter which entirely blocks the UV radiation. The photo-response of electrodes appeared good with the measument by direct current, when the slit of great resolution was used.

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The Study on the Antireflection(AR) Coating Design Scheme According to the Index Profile in the Thin-Film Silicon Solar Cell (굴절률 분포에 따른 박막 실리콘 태양전지 반사방지막 설계기술 연구)

  • Kim, Chang-Bong
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.13 no.9
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    • pp.4139-4145
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    • 2012
  • This paper shows an antireflection coating design skill for utilization the thin-film silicon solar cell in the future. The reflectivity of each index profile previously suggested as linear, cubic and quintic function has been calculated and compared. Each index profile is applied to the antireflection coating consisting of 6 layers with 180nm thickness. Also we suggest the graded index profile and compare it's reflectivity to the linear, cubic and quintic's ones. As a results we find the reflectivity generally decreases as the order goes to higher. However the reflectivity in the graded index profile shows the higher(lower) value than ones in the linear, cubic and quintic especially in the shorter(longer) wavelength range from 500 nm to below 700 nm(above 700 nm to 800 nm). Therefore we find that the graded index profile structure could be applied for the better antireflection coating design scheme especially for optical device and optical filter in the range of from deep red to infrared.