• Journal of the Korea Institute of Information and Communication Engineering
• /
• v.6 no.8
• /
• pp.1292-1296
• /
• 2002

In this paper, a 3-coupled microstrip line tunable bandpass filter has been designed on the basis of a tonductoriFerroelectricfDielectric (CFD) structure. This tunable filter basically exploits the fact that the increase in the bias voltage leads to the reduction of the effective dielectric constant (eon). This reduced $\varepsilon$eff shifts the center frequency (fc) to the higher value. The characteristics of designed filter are as follows; Return loss (RL) is larger than 10 dB; Insertion loss (IL) is les.i than 3.5 dB: 3-dB bandwidth (BW) is less than 1.18 GHz fc can be tuned from 25.4 GHz to 28.8 GHz over the variation of $\varepsilon$eff, from 10 to 13. Therefore, the tunability comes up to 3.4 GHz. The dimension of the filter designed is 7.0 mm ${\times}$ 5.0 nm ${\times}$ 0.5 mm.

• Journal of the Institute of Electronics Engineers of Korea TE
• /
• v.39 no.4
• /
• pp.409-412
• /
• 2002

The LNA(Low Noise Amplifier) is designed for use in low cost commercial application covered fully IMT-2000 band(1920~2170MHz, BW=250MHz). It is optimized source inductance for source lead and designed to equivalent etched line. The LNA uses a high pass impedance matching network for noise match and simple structure. The bias circuit designs have been made self-biased with a negative voltage applied to gate. The power supply voltage is 8V, total current is 180mA. The LNA is biased at a Vgs of -0.4, Vds of 4V for first stage and Vds of 5V for second stage. The LNA is designed competitively for commercial product specification. The measured gain and noise figure of the completed amplifier was 20dB and 1dB, respectively. Also, input VSWR, P1dB and gain flatness was measured of 1.14 ~ l.3dB, 22.4dBm and $\pm$0.45dB, respectively. The designed LNA can be used for commercial product.

• 전자공학회논문지 IE
• /
• v.43 no.2
• /
• pp.63-69
• /
• 2006

Islanding phenomenon of utility-connected PV power conditioning systems(PV PCS) can cause a variety of problems and must be prevented. If the real and reactive powers supplied by PV PCS are closely matched to those of load, islanding detection by passive methods becomes difficult. The active frequency drift(AFD) method, called the frequency bias method, enables islanding detection by forcing the frequency of the voltage in the islanding to drift up or down. In this paper, non-detection zone(NDZ) of AFD is analyzed for the islanding detection method of utility-connected PV PCS by simulation tool PSIM.

• Journal of the Korean Institute of Telematics and Electronics D
• /
• v.36D no.5
• /
• pp.29-35
• /
• 1999

Inductively coupled plsama etching of platinum thin film was studied using $O_2$ addition to $Cl_2$/Ar gas plasma. In this study, Pt etching mechanism was investigated with Ar/$Cl_2$ /$O_2$ gas plasma by using XPS and QMS. Ion current density was measured with Ar/$Cl_2$ /$O_2$ gas plasma by using single Langmuir probe. It was confirmed by using QMS and single Langmuir probe that Cl and Ar species rapidly decreased and ion current density was also decreased with increasing $O_2$ gas ratios. These results implied that the decrease of Pt etch rate is due to the decrease of reactive species ans ion current density with increasing $O_2$ gas mixing ratios. A maximum etch rate of 150nm/min and the oxide selectivity of 2.5 were obtained at Ar/$Cl_2$ /$O_2$ flow rate of 50 seem, RF power of 600 W, dc bias voltage of 125 V, and the total pressure of 10 mTorr.

• Journal of the Korean Vacuum Society
• /
• v.6 no.3
• /
• pp.267-274
• /
• 1997

Silicon shallow trenches applied to the STI (Shallow Trench Isolation) of integrated circuits were etched using inductively coupled $Cl_2$ and HBr/$Cl_2$ plasmas and the effects of process parameters on the etch profiles of silicon trenches and the physical damages on the trench sidewall and bottom were investigated. The increase of inductive power and bias voltage in $Cl_2$ and HBr/$Cl_2$ plasmas increased polysilicon etch rates in general, but reduced the etch selectivities over nitride. In case of $Cl_2$ plasma, low inductive power and high bias voltage showed an anisotropic trench etch profile, and also the addition of oxygen or nitrogen to chlorine increased the etch anisotropy. The use of pure HBr showed a positively angled etch profile and the addition of $Cl_2$ to HBr improved the etch profile more anisotropically. HRTEM study showed physical defects formed on the silicon trench surfaces etched in $Cl_2/N_2$ or HBr/ $Cl_2$ plasmas.

• The Journal of Korean Institute of Electromagnetic Engineering and Science
• /
• v.11 no.3
• /
• pp.445-453
• /
• 2000

In this paper, the method of designing an active inductor for MMIC is proposed. The proposed tunable active inductor is composed of a cascade FET with feedback capacitors and resistors. Because of a very low series resistance in the proposed inductor, a very high Q factor can be obtained. Also it has an excellent characteristics suitable for high frequency band. The inductance value can be changed by controlling feedback capacitors, resistors and a bias voltage respectively. When the feedback resistor and parallel resistor within circuits are varied, the inductance value is changed from 0.2 nH to 1.7 nH in the range 1 to 15 GHz. Also we designed bandpass filter using the proposed active inductor and it shows the insertion loss of 0.4 dB and return loss, 20 dB.

• Proceedings of the KIEE Conference
• /
• 2008.07a
• /
• pp.1260-1261
• /
• 2008

Aluminium doped zinc oxide (ZnO:Al) thin film has emerged as one of the most promising transparent conducting electrode in flat panel displays(FPD) and in photovoltaic devices since it is inexpensive, mechanically stable, and highly resistant to deoxidation. In this paper ZnO:Al thin film was deposited on the polyethylene terephthalate(PET) substrate by the capacitively coupled r.f. magnetron sputtering method. Wide ranges of bias voltage, -30V${\sim}$45V, was applied to the growing films as an additional energy instead of substrate heating, and the effect of positive and negative bias on the film structure and electrical properties of ZnO:Al films was studied and discussed. The results showed that a bias applied to the substrate during sputtering contributed to the improvement of electrical properties of the film by attracting ions and electrons in the plasma to bombard the growing films. These bombardments provided additional energy to the growing ZnO film on the substrate, resulting in significant variations in film structure and electrical properties. The film deposited on the PET substrate at r. f. discharge power of 200 W showed the minimum resistivity of about $2.4{\times}10^{-3}{\Omega}-cm$ and a transmittance of about 87%.

• Proceedings of the Korean Vacuum Society Conference
• /
• 2010.08a
• /
• pp.177-177
• /
• 2010

티타늄 화합물은 뛰어난 물리적 특성과 인체 무해성을 가지고 있어 생체, 내식 및 내마모 재료 등에 널리 응용되고 있으며, 다양한 색상 구현을 통한 미려한 외관 등 기능성을 위한 표면처리 분야에도 많은 관심을 받고 있다. 이중 질화 티타늄은 금색을 대체할 수 있는 물질로 코팅방법과 기판온도, 바이어스, 질소유량 등과 같은 공정변수 제어를 통해 그 물성을 변화시킬 수 있어 기능적 측면과 함께 미려한 외관처리에 응용이 가능하다. 본 연구에서는 아크(cathodic arc) 코팅 시스템을 이용하여 다양한 조건에서 TiN 박막을 제조하고 그 특성을 평가하였다. 아크 장비는 화합물 박막을 코팅할 수 있는 아크 소스와 시편 홀더, 가스 주입구, 시편 가열장치 그리고 배기 장치로 구성되어 있고, 아크 소스에 장착된 타겟은 99.5%의 Ti 타겟을 사용하였다. 시편과 타겟 간의 거리는 약 31cm이며, 시편은 알코올과 아세톤으로 초음파 세척 된 강판(냉연 강판), 실리콘 웨이퍼를 사용하였다. 시편을 진공용기에 장착하고 ${\sim}10^{-6}$ Torr까지 진공배기를 실시하고, Ar 가스를 진공용기 내로 공급하여 ${\sim}10^{-4}$ Torr에서 시편에 bias (Pulse : 400V)를 인가한 후 아크를 발생시켜 약 5분간 청정을 실시하였다. 플라즈마 청정이 끝나면 시편에 인가된 bias를 차단하고, 질소 유량, 온도, bias, 시간 등의 공정변수에 따라 코팅을 실시하였다. 질소의 유량이 80sccm 일 때, Ti 금속 결정구조가 나타났는데, 이는 질소와 충분하게 반응하지 못한 Ti이 기판에 코팅되어 나타나는 현상으로 판단된다. 색상변화에서는 질소 유량이 증가함에 따라 노란색이 짙어지며, TiN은 시편에 인가되는 bias 전압이 높아질수록 붉은색이 증가하고, 온도에 따른 큰 변화는 관찰되지 않았다. 공정변수에 따른 반사율 변화는 TiN의 경우 질소 가스 유량이 200sccm, bias 150V, 공정 온도 200도에서 반사율이 가장 높았으며, 코팅 시간이 짧을수록 반사율이 높아지는 경향을 나타냈다. 따라서 본 연구에서 얻어진 결과를 외관 코팅 분야에 응용한다면 장식성과 외관의 경도, 내마모성, 내식성의 향상 등 많은 장점을 가질 것으로 예상된다.

• The Journal of Korean Institute of Communications and Information Sciences
• /
• v.37 no.8A
• /
• pp.712-719
• /
• 2012

This paper presents Single-bit Third order Delta-Sigma Modulator, which can be applied to the Low speed High resolution ADC in Audio signal Process System. Whereas the Operational Amplifier in modulator consumed static power dissipation in operating, this modulator used Switching on/off techniques, which makes the Power dissipation of the modulator reduced. Also proposed modulator minimizes frequency characteristic variation by optimizing switch position. And this modulator chooses Single-bit type to guarantee stability. The designed ADC went through 0.35um CMOS n-well 1-poly 4-metal process to be a final product, and the final product has shown 17.1mW of power dissipation with 3.3V of Supply Voltage, 6.4MHz of conversion rate. And 84.3dB SNDR and 13.5bit ENOB with 20KHz of input frequency.

• Journal of the Korean Vacuum Society
• /
• v.13 no.4
• /
• pp.157-163
• /
• 2004

Dependence of residual compressive stress of diamond-like carbon (DLC) films on relative humidity was investigated. Polymeric, graphitic and diamond-like carbon films were prepared by r.f.-PACVD using methane or benzene with the negative self bias voltage of the substrate ranging from -100 to -800 V. In-situ measurements of the residual stress were carried out in an environment chamber where the relative humidity was varied from 10％ to 90％. In dense DLC film of high residual compressive stress and hardness, we could not observe any change in the residual compressive stress with relative humidity. However, in the cases of graphitic and polymeric DLC films, abrupt change in the residual stress occurred by changing the relative humidity. The quantity of the stress change was inversely proportional to the film thickness, which means that the stress change with humidity is not due to the penetration of the water molecule into the film structure, but due to surface interaction between water molecules and film surface.