• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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• pp.118-121
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• 2003

The electrochemical behaviors of UBM nickel were investigated. Electrode potential has been changed with the surface composition. Zinc is dissolved into the solution immediately after immersion. Electrode potential has three distinct regions: Zinc dissolution region, transient region and nickel plating region. The effects additives on electrode potential and polarization curves were also investigated. The addition of suppressor lowered the current density which is related with deposition rate.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2003년도 기술심포지움 논문집
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• pp.122-127
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• 2003

본 논문에서는 새로운 솔더 범프 형성 방법 중의 하나인 Solder droplet jetting에 의한 솔더 범프 형성 공정에 대해 연구하였으며, 이를 위해 솔더 제팅 직후의 안정한 솔더 액적(solder droplets)의 형성을 위한 공정 변수들의 영향에 대해 먼저 알아보았다 이를 위해 제팅 노즐에 가해지는 파형과 용융 솔더의 온도, 질소 가스의 압력 등에 의한 영향을 주로 살펴보았다. 다음으로 리플로를 거쳐 솔더 범프를 형성하였으며, 다양한 크기의 솔더 범프를 간단한 방법으로 형성하였다. 또한 무전해 니켈/솔더 계면 반응과 Bump shear test를 통한 기계적 성질을 고찰하는 한편, 계면 반응 결과는 스크린 프린팅에 의해 형성된 솔더 범프의 결과와 비교함으로써, 저가의 공정으로 미세 피치를 갖는 솔더 범프를 형성할 수 있는 Solder droplet jetting 방법이 기존의 방법에 의해 형성된 솔더 범프의 특성과 유사함을 고찰하였다. 마지막으로 실제 칩에 적용 되는 솔더 범프를 형성하여 플립칩 어셈블리 및 전기적 테스트를 수행하여, Solder droplet jetting이 실제 차세대 플립칩용 솔더 범프 형성 방법으로서 적용될 수 있음을 고찰하였다.

• 한국표면공학회지
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• 제24권4호
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• pp.206-214
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• 1991

In the basic study of selective electroless Ni plating of Si wafers, plating rate and physical properties are investigated to obtain optimum conditions of contact hole filling. Si wafers are excellently activated in the concentration of 0.5M IF, 1mM PdCl2, 2mM EDTA at $70^{\circ}C$, 90sec. The optimum condition of Ni-B deposition on p-type Si wafers is 0.1M NiSO4, 0.11M Citrate, $70^{\circ}C$, pH6.8, 8mM DMAB. The main factor in the sheet resistences variation of films is amorphous and on heat treating matrix was transformed into a stable phase (Ni+Ni3B) at $300-400^{\circ}C$. But pH or DMAB concentration in the plating solution doesn't play role of heat-affected phase change.

• 대한전기학회:학술대회논문집
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• 대한전기학회 2000년도 하계학술대회 논문집 C
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• pp.2224-2226
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• 2000

In this paper, we tried to figure out the residual stress of Electroless Nickel (EN) films as a function of process conditions: bath temperatures, pH values, and hypophosphorous acid concentrations. The residual stresses of EN films were in the range of - 4 MPa to 250 MPa depending on process conditions and they were very sensitive to phosphorous concentration in EN film and also hypophosphorous acid concentrations in EN bath.

• 한국마이크로전자및패키징학회:학술대회논문집
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• 한국마이크로전자및패키징학회 2002년도 춘계 기술심포지움 논문집
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• pp.109-114
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• 2002

The adhesion of electroless plated Ni layer on Al/Si substrates has been investigated. The zincating treatment was conducted with a conventional method and a modified method. In a modified method, ultrasonic agitation was applied during zincating. Adhesion strength was evaluated by a pull-off test. The ultrasonic agitation during zincating increased the nucleation density of Zn particles and refined Zn particle size. the adhesion strength of electroless Ni layer deposited on the modified zincated surface was higher than that on the conventionally zincated surface. the improvement of adhesion was attributed to the fine and dense Zn particles.

• 한국수소및신에너지학회논문집
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• 제21권5호
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• pp.383-389
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• 2010

Co-B, Co-P-B, Co-Ni-B and Co-Ni-P-B catalysts supported on Ni foam were prepared using electroless plating in the present study. The surface morphology of the catalysts/Ni foam was observed using SEM and EDS analysis. The Co-Ni-P-B/Ni foam catalyst showed the superior performance on hydrogen generation due to the uniform formation of catalyst particles on the Ni foam surface. The characteristics of hydrogen generation with Co-Ni-P-B/Ni foam catalyst was investigated at the variety of $NaBH_4$ and NaOH concentrations. Durability test was performed, resulting in the stable hydrogen generation for 6 hours.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 1999년도 추계학술대회 논문집
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• pp.625-628
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• 1999

Recently. high-density printed circuit boards(PCB) become indispensable with the minaturization of components. Nickel is deposited on the copper patterns and followed by the gold deposition for improving connection reliability between the printed circuit boards and electronic components. Conventionally electrodeposition has been applied to metalization of copper patterns. However metalization by this method is not applicable for the isolated fine and concentrated patterns. Therefore, metalization technology of the fine patterns by electroless plating is required in place of electrodeposition. The application of electroless nickel plating for interconnection with solder strongly relies on the solderability and the interactions between nickel and solder. Factors such as phosphorus content of the deposit additive and bath temperature may influence solderability of the electroless nickel deposit. So solderability of electroless nickel/ gold deposits was investigated with substrates plated changing the condition of nickel solution.

• 한국표면공학회지
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• 제31권4호
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• pp.209-216
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• 1998

It is well knownthat electroledd plating is the desirable surface treatment method which is being widely used to all kinds of material such as requiring corrosing resistance, wear resistance and conductivity, especially nonconductivity materials' surface plating. However, it is suggested that there are some problems that must be solved, for exaple, rate of plating, corrosion resistance, thickness of plating film etc. Therefore in this paper, when electroless nickel plating was performed on the PZT(Pb(Zr,Ti))with varying of solution composition such as NaOH, and $H_2NCH_2COOH$, the effect of the rate of plating and corrosion resistance were investigated.

• 한국표면공학회지
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• 제23권4호
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• pp.208-217
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• 1990

Electroless Ni-Cu-P plating was performed was performed to investigate for plating and changes in microhardness and corrosion rate of of electroless deposits depending on heat treatment. The activation energy for $75~85^{\circ}C$ were calculated to be 66.7KJ/mole. Plating rate increased to 34% with addition of 200ppm of NaF and 0.8ppm of thiourea to the bath. The highest hardness value was obtained by heat treatment deposits layer at$ 400^{\circ}C$, 1 hour. The increase in hardness of deposits by heating was confirmed to be associated with crystallization of the amorphous deposits. Corrosion resistance of deposir layer, which had been heated up to $300^{\circ}C$, was found to be exellent when immersed in 1N-H2SO4 solution, Change of the corrosion resistance seems to have some important bearing on content of amorpous, Ni3P and Cu3P.

• 한국표면공학회지
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• 제37권6호
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• pp.326-334
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• 2004

Deposit charateristics of Electroless nickel(EN) were investigated with various complexing agents. As expected, the deposition rate of nickel is increased with pH and that of Phosphorous is decreased with pH. The result of SEM investigation shows that the rough surface crystallization is appeared with pH. It is show that the surface resistance of EN deposit is decreased with pH at 85$^{\circ}C$.