• Proceedings of the Korean Society of Precision Engineering Conference
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• 2003.10a
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• pp.38-38
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• 2003

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.10a
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• pp.367-368
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• 2012

• Journal of the Korean Society for Precision Engineering
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• v.14 no.6
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• pp.99-105
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• 1997

Recently, with a great interest in micromachine, it is more and more important to promote the way of manufacturing micromachine. The silicon process or the LIGA process was the main method to manufacture micromachine in the past. But, these manufacturing method was 2.5-dimensinal, there was the limit in manufacturing perfect 3-dimensional structure micromachine. In this study, we developed the rapid prototyping system for micromachining and tested its property. We also realized .mu. m-order manu- facturing and 3-dimensional structure processing. The results showed the possibility of micromachining with the rapid prototyping system.

• Journal of the Korean Society for Precision Engineering
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• v.23 no.7 s.184
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• pp.146-151
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• 2006

In order to increase the productivity of conventional microstereolithography, a new method using a digital micromirror device ($DMD^{TM}$) as the dynamic patter generator is proposed. The deviation from the level of clear optical images to the level of photopolymer surface is a key for the fabrication of an accurate 3D structure, so this deviation is minimized by controlling the viscosity of FA 1260T with organic solvents. After finding the appropriate process variables, the feasibility of microstructure fabrication such as a microgear and a microsphere is demonstrated. Microstereolithography with $DMD^{TM}$ showed the potential to replace the existing focused beam microstereolithography.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2005.10a
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• pp.509-513
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• 2005

In order to increase productivity in conventional stereolithography. Microstereolithography using a digital micramirror device $(DMD^{TM})$ as a dynamic patter generator is proposed The deviation from a level of clear optical images to a level of a photopolymer surface is a key for the fabrication of an accurate 3D structure. so this deviation is minimized by controlling the viscosity of FA1260T with organic solvents. After finding the appropriate process valuables (exposure time of optical images. layer thickness of each layer). the feasibility of microstructures such as a microgear and a microsphere is then demonstrated. Microstereolithography wi th $DMD^{TM}$ might eventually replace conventional laser induced microstereolithography market such as in the manufacturing of jewels and medical parts.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2012.05a
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• pp.525-526
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• 2012

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2009.10a
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• pp.657-658
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• 2009

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2010.05a
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• pp.573-574
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• 2010

• Journal of the Korean Society for Precision Engineering
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• v.24 no.12
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• pp.128-135
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• 2007

Micro-channels for a wave micropump have been fabricated using the Stereolithography and UV Photolithography. The micro-channel with a channel height of $500\;{\mu}m$ was fabricated with stereolithography. UV photolithography was used for producing micro-channels with a channel length less than $100\;{\mu}m$. The fabrication process data including spinning rpm, pre-bake and post-bake time, and develop time for single layer and multiple layer 3D micro-structures using SU-8 photo resist are experimentally found. A film mask printed with a 40,000 dpi laser printer was used for UV lithography and micro-structures in the order of tens of micrometers in dimension were successfully fabricated.

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2004.10a
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• pp.714-719
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• 2004

Controlling the cure depth of the Fa1260T photopolymer enhances the quality of a microstructure and minimizes its size in microstereolithography. In this work, variation of cure depth of the Fa1260T photopolymer is investigated while the concentration of a photopolymerization inhibitor as a radical quencher was varied. The energy source inducing photopolymerization was a He-Cd laser and a motorized stage controled the laser beam path accurately. The effects of process variables such as laser beam power and scan speed on the cure depth were examined. Optimum conditions for the minimum cure depth were determined as laser power of 230 W and scan speed of 40-50 m/s at the concentration of the radical quencher of 5％. The minimum cure depth at the optimal condition was 14 m. The feasibility of the fabrication of microstructures such as a microcup, microfunnel, and microgrid of 100 m size is demonstrated using Super IH process.