• Laser Solutions
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• v.13 no.2
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• pp.6-9
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• 2010

In printed electronics, printing rolls are used to transfer electronic ink onto a flexible substrate. Generally printing rolls are being made by the indirect laser method which is based on the etch process, thus not environment-friendly and not suitable for making a large printing roll. For the pursuit of making a large printing roll for mass printing of electronic devices, we have directly engraved micro-patterns into a Zn plated printing roll using a 30W pulse-modulated fiber laser. We have successfully engraved line patterns ranging from about 15-30${\mu}m$ in width.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.36 no.2
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• pp.173-178
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• 2012

Currently, active research is being performed on printing of electronic devices such as RFID devices, flexible displays, solar cells, and e-paper. This technique has several advantages over existing technologies such as lithography and etching. In particular, RFID devices, flexible displays, solar cells, and e-paper require flexibility and a mass production system. Thus, attention is being focused on the roll-to-roll process. High quality should be guaranteed in the roll-to-roll printed electronics systems, and good thickness and roughness qualities must be ensured. Experimental design was applied to this problem to analyze the main effects and interaction effects of various factors. Matching technology between the nip roll characteristics and the quality of the print pattern in roll-to-roll printed electronics systems was proposed to improve the printing quality.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.10
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• pp.1146-1152
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• 2011

Ink transfer process is very important to determine quality of printed pattern, therefore its mechanism should be understood to control printing quality. Although there have been many attempts to understand ink transfer mechanism by numerical simulation and experimental studies, their model was too much simple to model realistic printing process and our understanding is not enough yet. In this paper we designed ink transfer visualization system to present flow visualization of ink transfer process for gravure offset printing. We considered rotational effect of blanket roll which is related with printing speed and used non-Newtonian fluid as working fluid such as Ag paste. For printing unit, cantilever-type blanket roll is used for convenient visualization of ink transfer. Serial images were captured continuously by using high-speed CMOS camera and long range microscope. We investigated the effects of various design parameters such as printing speed and pattern angle on the ink transfer process. We found more stretched ink filament for non-Newtonian fluid than Newtonian fluid. As increasing printing speed, length of stretched ink filament and height of break-up point are also increased. We also compared ink transfer process between CD and MD pattern and its relationship with ink transfer mechanism.

• 한국신재생에너지학회:학술대회논문집
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• 2009.06a
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• pp.57-60
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• 2009

The conductive coating method was used for a various industrial fields. For example, Sputtering process is using to a coat of ITO layer in LCD or OLED panel manufacture process and fabricate a base layer of substrate of an electric printing device. However, conventional coating process (beam sputtering, spin coating etc.) has a problems in the industrial manufacturing process. These processes have a very high cost and critical manufacturing environment as a vacuum process. Recently, many researchers were proposed a various printing process instead of conventional coating process. In this paper, we propose an ESD printing process in ITO coating layer and apply to fabricate a conductive coating film. Ours transparent electrode had a surface resistance of about $66{\Omega}/{\square}$ and transparent of 74% in the wavelength of 500nm. This transparent electrode manufacturing process will be applied to Roll-to-Roll process. In addition, we developed roll printing process system for the next generation flexible solar cell.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2006.05a
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• pp.105-108
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• 2006

It has been issued to fabricate nano-scale patterns with large-scale in the field of digital display. Also, large-scale fabrication technology of nano pattern is very important not only for the field of digital display but also for the most of applications of the nano-scale patterns in the view of the productivity. Among the fabrication technologies, UV nano imprinting process is suitable for replicating polymeric nano-scale patterns. However, in case of conventional UV nano imprinting process using flat mold, it is not easy to replicate large areal nano patterns. Because there are several problems such as releasing, uniformity of the replica, mold fabrication and so on. In this study, to overcome the limitation of the conventional UV nano imprinting process, we proposed a continuous UV nano imprinting process using a pattern roll stamper. A pattern roll stamper that has nano-scale patterns was fabricated by attaching thin metal stamper to a roll base. A continuous UV nano imprinting system was designed and constructed. As practical examples of the process, various nano patterns with pattern size of 500, 150 and 50nm were fabricated. Finally, geometrical properties of imprinted nano patterns were measured and analyzed.

• 한국신재생에너지학회:학술대회논문집
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• 2011.05a
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• pp.116.1-116.1
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• 2011

Materials with a combination of high electrical conductivity and optical transparency are important components of many electronic and optoelectronic devices such as liquid crystal displays, solar cells, and light emitting diodes. In this study, to fabricate a low-resistance and high optical transparent electrode film for organic photovoltaic, the following steps were performed: the design and manufacture of an electroforming stamp mold, the fabrication of thermal roll imprinted (TRI) poly-carbonate (PC) patterned films, the manufacture of high-conductivity and low-resistance Ag paste which was filled into patterned PC film using a doctor blade process and then coated with a thin film layer of conductive polymer by a spin coating process. As a result of these imprinting processes the PC films obtained a line width of $10{\pm}0.5{\mu}m$, a channel length of $500{\pm}2{\mu}m$, and a pattern depth of $7.34{\pm}0.5{\mu}m$. After the Ag paste was used to fill part of the patterned film with conductive polymer coating, the following parameters were obtained: a sheet resistance of $9.65{\Omega}$/sq, optical transparency values were 83.69 % at a wavelength of 550 nm.