• 제목/요약/키워드: 레이저어블레이션

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레이저 어블레이션 시뮬레이션 - 1 차원 비대칭 용량결합형 모델 - (The Simulation of Pulsed Laser Ablation - One-dimensional CCP Model -)

  • 소순열;정해덕;박계춘
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2008년도 춘계학술대회 논문집 센서 박막재료연구회 및 광주 전남지부
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    • pp.22-26
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    • 2008
  • In this paper, we developed a hybrid simulation model of carbon laser ablation under the Ar plasmas consisted of fluid and particle methods. Three kinds of carbon particles, which are carbon atom, ion and electron emitted by laser ablation, are considered in the computation. In the present simulation, we adopt capacitively coupled plasma with asymmetrical electrodes. As a result, in Ar plasmas, carbon ion motions were suppressed by a strong electric field and were captured in Ar plasmas. Therefore, a low number density of carbon ions were deposited upon substrate. In addition, the plume motions in Ar gas atmosphere was also discussed.

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레이저 어블레이션에 의해 증착된 비정질 다이아몬드 박막의 결합및 물리적 특성 (Bonding and Physical Characteristics of Diamond-like Carbon Films Prepared by Laser Ablation)

  • 박환태;홍영규;김재기;김진승;박찬
    • 한국진공학회지
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    • 제5권1호
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    • pp.1-5
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    • 1996
  • Noncrystalline films of diamond-like carbon (DLC) have been prepared by laser ablation technique at room temperature. A Q-switched Nd-YAG laser beam with wavelength of 1064 nm and pulse duration of 10 ns was focused onto a graphite target with power densities of about $10^9 W/\textrm{cm}^2$. The physical properties of the resulting films were analyzed with density, hardness, and resistivity measurements. The surface and bonding structure were investigated by atomic force microscopy (AFM), Raman spectroscopy, electron energy loss spectroscopy (EELS).

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레이저 어블레이션법으로 제작된 PLZT 박막의 전기적특성 (Electrical Properties of PLZT Thin Films Prepared By Pulsed Laser Ablation)

  • 이도형;장낙원;마석범;최형욱;박창엽
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1998년도 춘계학술대회 논문집
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    • pp.139-142
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    • 1998
  • PLZT thin films were fabricated with different Zr/Ti ratios by pulsed laser deposition. PLZT films deposited on Pt/Ti/SiO$_2$/Si substrate. This PLZT thin films of 5000${\AA}$. thickness were crystallized at 600$^{\circ}C$, 200 mTorr O$_2$ press. 2/55/45 PLZT thin film showed a maximum dielectric constant value of $\varepsilon$$\_$r/=1500, and dielectric loss was 0.O$_3$. At 2/70/30 PLZT thin film, Coercive field and remnant polarization was respectively 19[kV/cm], 8[${\mu}$C/$\textrm{cm}^2$].

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레이저 어블레이션법으로 제작될 (Ba, Sr)TiO$_3$ 박막의 구조 및 유전특성에 관한 연구 (A Study on Structural and Dielectric Properties of the (Ba,Sr)TiO$_3$ Thin Films Prepared by Laser Ablation)

  • 주학림;김성구;장낙원;마석범;백동수
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1999년도 춘계학술대회 논문집
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    • pp.122-125
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    • 1999
  • (Ba$_{0.6}$Sr$_{0.4}$)TiO$_3$(BST) thin films were fabricated with different deposition temperature and oxygen pressure by Pulsed Laser Deposition(PLD). Energy Dispersive Spectroscopy(EDS) proved that BST thin films prepared by PLD have almost the same stoichiometric composition as the BST target materials. This BST thin films were fully crystallized at $650^{\circ}C$, 300mTorr oxygen pressure and showed a maximum dielectric constant value of $\varepsilon$$_{t}$=684 and dielectric loss was 0.01 at 75$0^{\circ}C$, 300mTorr oxygen pressure.ssure.

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KrF 엑시머 레이저에 의한 ITO 박막의 어블레이션과 표면특성관찰 (The ablation of ITO thin films by KrF Eximer laser and its characteristics)

  • Lee, Kyoung-Cheol;Lee, Cheon
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2000년도 추계학술대회 논문집
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    • pp.511-514
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    • 2000
  • This work aimed to develop ITO (Indium Tin Oxide) thin films ablation with a KrF Eximer laser required for the application in flat panel display, especially patterning into small geometry on a large substrate area. The threshold fluence for ablating ITO on glass substrate is about 0.1 J/cm$^2$. And its value is much smaller than using third harmonic Nd:YAG laser. Through the optical microscope measurement the surface color of the damaged ITO is changed into dark brown and irradiated spot is completely isolated form the undamaged surroundings by laser light. The XPS analysis showed that the relative surface concentration of Sn and In were essentially unchanged (In :Sn=5:1) after irradiating Eximer laser. Using aluminium mask made by second harmonic Nd:YAG laser the ITO patterning is carried out.

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나노초 레이저를 이용한 PMMA의 습식 및 건식어블레이션 비교 연구 (Comparison study of nanosecond laser induced wet and dry ablation of PMMA)

  • 이호
    • 한국산업융합학회 논문집
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    • 제22권3호
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    • pp.243-250
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    • 2019
  • The nanosecond laser assisted ablation have been investigated. The biocompatable polymer PMMA was employed as the target material and the two distinctive surface conditions were test. The first surface condition is a dry surface for which the target surface is exposed to air and the second surface condition is the wet surface for which the target surface is covered with dehydrated water. The ablation volume, the laser induced acoustic wave, the laser induced plasma were investigated for both wet and dry condition. The nanosecond laser pulse ablatied more on the wet surface compared to the dry surface. The enhanced ablation of wet surface is attributed to the confined acoustic wave and the laser-induced plasma in the liquid layer.

펨토초 레이저와 나노초 레이저를 이용한 ITO Glass의 어블레이션 비교 연구 (A Comparative Study of ITO Glass Ablation Using Femtosecond and Nanosecond Lasers)

  • 전진우;신영관;김훈영;최원석;지석영;강희신;안상훈;장원석;조성학
    • 한국광학회지
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    • 제28권6호
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    • pp.356-360
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    • 2017
  • ITO는 높은 전기 전도도와 가시광선, 근적외선 영역에서 투명성을 가진다. LCD, OLED 등을 포함한 광학에 적용되는 부품들의 제조에 투명전극으로 ITO가 사용되고 있다. 가시광선 영역에서의 투명성과 높은 전도도 때문에 다양한 전기, 디스플레이 센서의 전극으로 이용되었다. 한 가지 사안은 기판의 특성에 충격없이 ITO, 금속 필름같은 특정한 영역의 층을 제거하는 부분이다. 레이저를 사용한 유리 위의 ITO 제거는 기존 방법에 비해 친환경적이다. 본 연구는 펨토초 레이저와 나노초 레이저를 사용하여 ITO를 제거하는 비교분석이다.

수용액에 분산된 ZnO 분말의 laser ablation에 의한 ZnO 나노입자의 생성 (Preparation of ZnO Nanoparticles by Laser Ablation of Dispersed ZnO Powder in Solution)

  • 강위경;정영근
    • 대한화학회지
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    • 제50권6호
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    • pp.440-446
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    • 2006
  • 액체상태에 분산된 ZnO 분말을 레이저 ablation 시켜 ZnO 나노입자를 생성하였고, 계면활성제에 따른 생성된 나노입자의 특성을 비교하였다. 생성된 나노 입자는 UV-VIS 흡광 스펙트럼과 X-ray 회절 스펙트럼으로 순수한 ZnO 결정 상태를 나타냄을 확인하였으며, 전자투과 현미경 사진으로 나노입자의 크기, 크기 분포 및 모양을 관찰하였다. 순수한 물에서 얻어진 ZnO 나노입자의 밴드 갭 에너지는 3.35 eV로 bulk ZnO와 비슷한 값을 나타내었으며, 평균 크기는 27 nm로 막대모양의 입자들이 주로 생성되었다. SDS 용액에서 얻어진 ZnO 나노입자는 입자 크기가 평균 28 nm인 주로 구형에 가까운 형태를 가졌으며 CTAB 용액에서 나노입자는 막대 모양의 형태가 많으며 평균 크기가 40 nm 이었다. CTAB 용액에서 만들어진 ZnO 나노입자는 SDS 용액에서 만들어진 ZnO 나노입자 보다 더 안정하였다. 이러한 계면활성제에 따른 ZnO 나노입자의 크기 및 모양, 그리고 안정성의 차이는 ZnO와 계면활성제 사이의 전하 극성 차이로 인한 정정기적 인력과 용매화 차이로 설명할 수 있었다.

레이저 어블레이션에 의한 $(Pb,La)TiO_3$ 박막의 제작 (Fabrication of $(Pb,La)TiO_3$ Thin Films by Pulsed Laser Ablation)

  • 박정흠;김준한;이상렬;박종우;박창엽
    • 한국전기전자재료학회논문지
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    • 제11권2호
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    • pp.133-137
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    • 1998
  • $(Pb_{0.72}La_{0.28})Ti_{0.93}O_3(PLT(28))$ thin films were fabricated by pulsed laser deposition. PLT films deposited on $Pt/Ti/SiO_2/Si$ at $600^{\circ}C$ had a preferred orientation in (111) plane and at $550^{\circ}C$ had a (100) preferred orientation. We found that (111) preferred oriented films had well grown normal to substrate surface. This PLT(28) thin films of $1{\mu}m$ thickness had dielectric properties of ${\varepsilon}_r$=1300, dielectric $loss{\fallingdotseq}0.03 $. and had charge storage density of 10 [${\mu}C/cm^2$] and leakage current density of less than $10^{-6}[A/cm^2]$ at 100[kV/cm]. These results indicated that the PLT(28) thin films fabricated by pulsed laser deposition are suitable for DRAM capacitor application.

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RF Ar 플라즈마에서의 레이저 어블레이션 모델링 (Modeling of the Laser Ablation under the RF Ar Plasmas)

  • 소순열;임장섭;이진;정해덕;박계춘;문채주
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 제38회 하계학술대회
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    • pp.1408-1409
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    • 2007
  • In this paper, we developed a hybrid simulation model of carbon laser ablation under the Ar plasmas consisted of fluid and particle methods. Three kinds of carbon particles, which are carbon atom, ion and electron emitted by laser ablation, are considered in the computation. In the present modeling, we adopt capacitively coupled plasma with ring electrode inserted in the space between the substrate and the target, graphite. This system may take an advantage of ${\mu}m$-sized droplets from the sheath electric field near the substrate. As a result, in Ar plasmas, carbon ion motions were suppressed by a strong electric field and were captured in Ar plasmas. Therefore, a low number density of carbon ions were deposited upon substrate. In addition, the plume motions in Ar gas atmosphere was also discussed.

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