• Title/Summary/Keyword: 라만 스펙트럼

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The Photovoltaic Effect of Iodine-Doped Metal Free Phthalocyanine/ZnO System (Ⅱ). The Photovoltaic Effect of $ZnO/H_2Pc(I)_x$ Dispersed in Poly(9-vinylcarbazole) (요오드가 도핑된 무금속 프탈로시아닌/산화아연계의 광기전력 효과 (Ⅱ). Poly(9-vinylcarbazole)에 분산된 $ZnO/H_2Pc(I)_x$계의 광기전력 효과)

  • Heur, Soun-Ok;Kim, Young-Soon
    • Journal of the Korean Chemical Society
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    • v.39 no.3
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    • pp.176-185
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    • 1995
  • To improve photosensisitizing efficiency of ZnO/$H_2Pc(I)_x$ system, ZnO/$H_2Pc(I)_x$ system was dispersed in a typical photoconductive polymer of poly(9-vinylcarbazole)(PVCZ). The iodine dopant level(x) of ZnO/${\chi}-H_2Pc(I)_x$ is proportional to concentration of iodine, whereas x of ZnO/${\beta}-H_2Pc(I)_x$ decreased from the highest x=0.97 at more than $6.3{\times}10^{-3}$ M iodine solution. The Raman spectra of ZnO/${\chi}-H_2Pc(I)_x$ at 514 nm exhibited characteristic $I_3^-$ patterns in the range of 50∼550 $cm^{-1}$ at $x{\geq}0.57.$ The surface photovoltage of ZnO/${\chi}-H_2Pc(I)_{0.48}$/PVCZ was approximately 1.6 times greater than ZnO/${\chi}-H_2 Pc(I)_{0.48}$ and was 1.8 times of ZnO/${\chi}-H_2Pc(I)_{0.57}$/PVCZ at 670 nm. With ZnO/$H_2Pc(I)_x$/PVCZ, the highest iodine dopant levels showed a higher photovoltage. Therefore the injection of holes from H2Pc into PVCZ resulted in that photosensisitizing effect of ZnO/$H_2Pc(I)_x$/PVCZ system was improved compared to ZnO/$H_2Pc(I)_x$ case.

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Electrochemical properties of heat-treated multi-walled carbon nanotubes (열처리된 탄소나노튜브 상대전극의 전기화학적 특성 연구)

  • Lee, S.K.;Moon, J.H.;Hwang, S.H.;Kim, G.C.;Lee, D.Y.;Kim, D.H.;Jeon, M.H.
    • Journal of the Korean Vacuum Society
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    • v.17 no.1
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    • pp.67-72
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    • 2008
  • We have studied the effect of heat treatment of multi-walled carbon nanotubes (MWNTs) as a counter electrode on the electro-chemical properties of dye-snsitized solar cells. MWNTs on the p-type Si substrate were synthesized by thermal chemical vapor deposition (CVD) using Fe catalysts. We prepared the two types of MWNTs samples with the different diameters. The rapid thermal annealing (RTA) treatment for the MWNTs was carried out at the growth temperature ($900^{\circ}C$) for 1 minute with $N_2$ gas atmosphere. The structural, electrical and electrochemical properties of MWNTs were investigated by field-emission scanning electron microscopy (FE-SEM), Raman spectroscopy, 2-point probe station and electrochemical impedance spectroscopy (EIS). The I(D)/I(G) ratio of heat-treated MWNTs in Raman spectra was considerably decreased. It was also found that the heat-treated MWNTs showed better redox reaction of iodide at the interface between MWNTs surface and electrolyte than that of as-grown MWNTs. The redox resistance value of heat-treated electrodes was measured to be much lower than that of as-grown electrode at the interface. As a result, the counter electrode using the heat-treated MWNTs showed better electrochemical properties.

Preparation and Characterization of Conducting Polymer Nanocomposites Including Graphene Oxide via In-situ Chemical Polymerization (제자리 화학중합을 통한 그래핀 옥사이드를 포함하는 전도성 고분자 나노복합체의 제조와 특성 분석)

  • Jeong, Yeonjun;Moon, Byung-Chul;Jang, Min-Chae;Kim, Yangsoo
    • Polymer(Korea)
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    • v.38 no.2
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    • pp.180-187
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    • 2014
  • Nanocomposites including graphene oxide (GO) and conducting polymers (PPy, PANI and PEDOT) were prepared via an in-situ chemical polymerization process, and their characteristic properties depending upon the change of conducting polymer (CP) content were analyzed. A confirmation was made on not only the functional groups formed in GO but also the presence of CP existent in the nanocomposites. The molecular interaction between GO and poly(4-styrene sulfonic acid) (PSSA) or CP in the nanocomposites was proposed. With the increase of PEDOT content in the GOPSS/PEDOT nanocomposite, the estimated value of $I_D/I_G$ regarding the Raman analysis of them was decreased and a major change of their Raman spectra characteristic peaks was observed. In the GO-PSS/PEDOT nanocomposite, PEDOT molecules made an exfoliation of GO-PSSA layers and thus they were intercalated among layers. Such a unique molecular morphology induced the highest electrical conductivity for the GO-PSS/PEDOT nanocomposite among three kinds of nanocomposites prepared in this study. It is also noted that the uniform morphology confirmed in this study helped a thermal stability improvement in the nanocomposite due to the presence of GO or GO-PSSA acting as a thermal barrier.

Hexagonal shape Si crystal grown by mixed-source HVPE method (혼합소스 HVPE 방법에 의해 성장된 육각형 Si 결정)

  • Lee, Gang Seok;Kim, Kyoung Hwa;Park, Jung Hyun;Kim, So Yoon;Lee, Ha Young;Ahn, Hyung Soo;Lee, Jae Hak;Chun, Young Tea;Yang, Min;Yi, Sam Nyung;Jeon, Injun;Cho, Chae Ryong;Kim, Suck-Whan
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.31 no.3
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    • pp.103-111
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    • 2021
  • Hexagonal shape Si crystals were grown by the mixed-source hydride vapor phase epitaxy (HVPE) method of mixing solid materials such as Si, Al and Ga. In the newly designed atmospheric pressure mixed-source HVPE method, nuclei are formed by the interaction between GaCln, AlCln and SiCln gases at a high temperature of 1200℃. In addition, it is designed to generate a precursor gas with a high partial pressure due to the rapid reaction of Si and HCl gas. The properties of hexagonal Si crystals were investigated through scanning electron microscopy (FE-SEM), energy dispersive X-ray spectroscopy (EDS), high-resolution X-ray diffraction (HR-XRD), and Raman spectrum. From these results, it is expected to be applied as a new material in the Si industry.

Growth of hexagonal Si epilayer on 4H-SiC substrate by mixed-source HVPE method (혼합 소스 HVPE 방법에 의한 4H-SiC 기판 위의 육각형 Si 에피층 성장)

  • Kyoung Hwa Kim;Seonwoo Park;Suhyun Mun;Hyung Soo Ahn;Jae Hak Lee;Min Yang;Young Tea Chun;Sam Nyung Yi;Won Jae Lee;Sang-Mo Koo;Suck-Whan Kim
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.33 no.2
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    • pp.45-53
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    • 2023
  • The growth of Si on 4H-SiC substrate has a wide range of applications as a very useful material in power semiconductors, bipolar junction transistors and optoelectronics. However, it is considerably difficult to grow very fine crystalline Si on 4H-SiC owing to the lattice mismatch of approximately 20 % between Si and 4H-SiC. In this paper, we report the growth of a Si epilayer by an Al-related nanostructure cluster grown on a 4H-SiC substrate using a mixed-source hydride vapor phase epitaxy (HVPE) method. In order to grow hexagonal Si on the 4H-SIC substrate, we observed the process in which an Al-related nanostructure cluster was first formed and an epitaxial layer was formed by absorbing Si atoms. From the FE-SEM and Raman spectrum results of the Al-related nanostructure cluster and the hexagonal Si epitaxial layer, it was considered that the hexagonal Si epitaxial layer had different characteristics from the general cubic Si structure.