• Title/Summary/Keyword: 단결정

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Growth and effect of thermal annealing for $AgGaSe_2$ single crystal thin film by hot wall epitaxy (Hot wall epitaxy(HWE)법에 의한 $AgGaSe_2$ 단결정 박막 성장과 열처리 효과)

  • Baek, Seung-Nam;Hong, Kwang-Joon;Kim, Jang-Bok
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.16 no.5
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    • pp.189-197
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    • 2006
  • A stoichiometric mixture of evaporating materials for $AgGaSe_2$ single crystal thin films was prepared from horizontal electric furnace. To obtain the single crystal thin films, $AgGaSe_2$ mixed crystal was deposited on thoroughly etched semi-insulating GaAs(100) substrate by the hot wall epitaxy(HWE) system. The source and substrate temperatures were $630^{\circ}C\;and\;420^{\circ}C$, respectively. The temperature dependence of the energy band gap of the $AgGaSe_2$ obtained from the absorption spectra was well described by the Varshni's relation, $E_g(T)=1.9501eV-(8.79x10^{-4}eV/K)T^2(T+250K)$. After the as-grown $AgGaSe_2$ single crystal thin films was annealed in Ag-, Se-, and Ga-atmospheres, the origin of point defects of $AgGaSe_2$ single crystal thin films has been investigated by the photoluminescence (PL) at 10K. The native defects of $V_{Ag},\;V_{Se},\;Ag_{int},\;and\;Se_{int}$ obtained by PL measurements were classified as a donors or accepters type. And we concluded that the heat-treatment in the Ag-atmosphere converted $AgGaSe_2$ single crystal thin films to an optical p-type. Also, we confirmed that Ga in $AgGaSe_2$/GaAs did not form the native defects because Ga in $AgGaSe_2$ single crystal thin films existed in the form of stable bonds.

Single crystal growth of potassium lithium niobate for nonlinear optics (비선형광학재료 Potassium lithium niobate 단결정 육성)

  • 강길영;윤종규
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.7 no.3
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    • pp.384-392
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    • 1997
  • Potassium lithium niobate(KLN) single crystal for a nonlinear-optic material, which changes the wavelength of lasers, has a ferroelectric tetragonal tungsten bronze structure at room temperature. It has been very hard to get single crystals of good quality due to the cracks during cooling process. In order to investigate the composition change due to the evaporation of solution during the growth, the thermogravimetric analysis was carried out. In atmospheric condition at $1000^{\circ}C$ which is about $10^{\circ}C$ higher than the crystal growing temperature, the weight change was negligible amount of $1.46{\times}10^{-5}$g/($\textrm{cm}^2$hr). By using both the Pt plate as the nucleation site and the slow cooling method with temperature fluctuation, KLN single crystal of good quality of size 1 cm could be obtained. The phase transition temperature was $490^{\circ}C$, which was higher than that reported by other researchers of the other composition. The optical anisotropy due to the absorption of OH-band exists in the range of IR.

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Statistical approach to obtain the process optimization of texturing for mono crystalline silicon solar cell: using robust design (단결정 실리콘 태양전지의 통계적 접근 방법을 이용한 texturing 공정 최적화)

  • Kim, Bumho;Kim, Hoechang;Nam, Donghun;Cho, Younghyun
    • 한국신재생에너지학회:학술대회논문집
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    • 2010.11a
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    • pp.47.2-47.2
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    • 2010
  • For reducing outer reflection in mono-crystalline silicon solar cell, wet texturing process has been adapted for long period of time. Nowadays mixed solution with potassium hydroxide and isopropyl alcohol is used in silicon surface texturing by most manufacturers. In the process of silicon texturing, etch rate is very critical for effective texturing. Several parameters influence the result of texturing. Most of all, temperature, process time and concentration of potassium hydroxide can be classified as important factors. In this paper, temperature, process time and concentration of potassium hydroxide were set as major parameters and 3-level test matrix was created by using robust design for the optimized condition. The process optimization in terms of lowest reflection and stable etch rate can be traced by using robust design method.

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Growth of 6H-SiC Single Crystals by Sublimation Method (승화법에 의한 6H-SiC 단결정 성장)

  • 신동욱;김형준
    • Korean Journal of Crystallography
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    • v.1 no.1
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    • pp.19-28
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    • 1990
  • 6H-SiC is a promising material (Eg=3.0eV) for blue light-emitting doide and high-temperature semiconducting device. In the experiment, single crystals of a-SiC have been grown by the sublimation method to fabricate blue light~emitting diode. During the growth of a-SiC single crystals, a temperature Vadient, yonh temperature and pressure ranges were kept 44℃/cm , 1800-1990℃ and 50-1000 mTorr, respectively. Single crystals obtained in Acheson furnace were used as seed crystals. Polarizing microscopy and back-reflection X-ray Laue diffraction showed that the a-SiC crystal was epitaxially and on the seed crytal. It was found by XRD analysis that when other growth conditions were the same, a-SiC was grown at the temperature above 1840℃ and 3C-SiC was gown at lower temperature or under low supersaturation of vapor. The carrier type. concentration and mobility were measured be hole(p-type), 7.6x1014cm-3 and 19cm2V-1sec-1, respectively, by van der Pauw method.

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The single crystal growth of various colored cubic zirconia for jewelry (다양한 색의 보석용 큐빅 지르코니아 단결정 성장)

  • Nam, Kyung-Ju
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.17 no.6
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    • pp.272-276
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    • 2007
  • The various colored cubic zirconia single crystals for jewelry were grown by skull melting method of excellent productivity. The cubic zirconia is similar to the character of diamond, which has high refractive index, large dispersion and high hardness. It is possible that the development of new colored cubic zirconia by doping 3d-transition elements or 4f-rare earth elements. The colored cubic zirconia is representative of synthetic gemstone which was grown up by mixing one or over two materials among $Pr_6O_{11},\;TiO_2,\;MnO_2\;and\;Er_2O_3$ as coloring agent. Subsequent heat treatment improves the quality of color and uniformity. This study is aimed the color reappearance of cubic zirconia such as natural peridot, smoky-quartz and red-tourmaline.

A Systematic Approach for Selective Epitaxial Growth of Silicon using Transport Phenomena, Thermodynamics, and Microscopic Simulation (이동현상, 열역학, 미시적 이론 연구릉 통한 선택적 단결정 실리콘 성장공정의 전산모사)

  • 윤종호;박상규
    • Journal of the Korean Vacuum Society
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    • v.3 no.4
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    • pp.466-481
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    • 1994
  • 차세대 집적회로 제조공정에 있어 핵심기술인 선택적 단결정 실리콘 성장공정에 대한 이동현상, 열역학, 미시적 전산모사를 수행하여 다각적인 분석과 이해를 시도하였다. 첫째, 실리콘 단결정 성장 공 정에 가장 많이 사용되는 배럴 반응기를 대상으로 유한 요소법을 이용하여 이동현상적 이론연구를 수행 하였다. 반응기내의 기체속도 분포, SiH2Cl2 농도분포를 각각 구하였으며 압력, 기판온도, 총유량 HCl 유 량변화 등의주요공정변수가 증착율과 균일도 지수에 미치는 영햐을 고찰하였다. 이러한 연구를 통하여 저온, 저압, 총유량이 많고 첨가되는 HCl 유량이 작은 경우가 균일도 확보를 위하여 적합한 조업조건임 을 알수 있었다. 둘째 Si-H-Cl 계에 대한 열역학적 기체의 Cl/H비가 낮은 경우가 선택적 실리콘 증착 에 적합함을 알수 있었다. 셋째, Monte Carlo법을 이용한 선택적 실리콘 미세박막 성장패턴에 관한 이 론 연구를 수행하여 종횡비, 재방출, 표면확산에 따른 박막증착 패턴의 변화를 고찰하였으며 표면확산이 선택도 상실 현상의 중요한 원인이 될 수 있음을 발견하였다. 또한 최상의 선택도 확보를위해서는 낮은 부착계수와 낮은 표면확산계수를 유지해야 됨을 알수 있었다.

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The Embodiment of GAS Pressure Controller for Temperature Control of Sing Crystal $(Al_2O_3)$ Growing Furnace (단결정$(Al_2O_3)$ 성장 노(爐)의 온도 조절용 GAS압력 제어기의 구현)

  • Cho, Hyun-Seob
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.8 no.2
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    • pp.207-211
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    • 2007
  • It is a quite quality concerning to control the temperature of single crystalline growth as it does when we get most of heat treating products. It is also important factor to control the temperature when we make the $Al_2O_3$(single crystalline) used to artificial jewels, glass of watches, and heat resistant transparent glasses. Thus, it is a major interest to get the proper temperature in accordance with the time process while we are making mixture of oxygen and hydrogen to have the right temperature. In this paper, we will study of electrical valve positioning system with DC-Motor for the gas mixture to improve the quality of products.

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Analysis of melt flows and remelting phenomena through numerical simulations during the kyropoulos sapphire single crystal growth (전산해석을 통한 키로플러스 사파이어 단결정 성장공정의 유동 및 remelting 현상 분석)

  • Kim, Jin Hyung;Park, Yong Ho;Lee, Young Cheol
    • Journal of the Korean Crystal Growth and Crystal Technology
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    • v.23 no.3
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    • pp.129-134
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    • 2013
  • Sapphire wafers are used as an important substrate for the production of blue LED (light emitting diode) and the LED's performance largely depends on the quality of the sapphire single crystals. There are several crystal growth methods for sapphire crystals and Kyropoulos method is an efficient way to grow large diameter and high-quality sapphire single crystals with low dislocation density. During Kyropoulos growth, the convection of molten melt is largely influenced by the hot zone geometry such as crucible shape, heater and refractory arrangements. In this study, CFD (computational fluid dynamics) simulations were performed according to the bottom/side ratios (per unit of the crucible surface area) of heaters. And, based on the results of analysis, the molten alumina flows and remelting phenomena were analyzed.