• Journal of the Institute of Electronics Engineers of Korea SD
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• v.48 no.3
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• pp.18-24
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• 2011

This paper presents that the yield strength of the pressure sensor with a double boss diaphragm structure can be improved as the grooves are formed at the corner of the diaphragm bridge. Generally the boss structure is widely used for the low-pressure sensor, of which the sensitivity is not enough in case of the small diaphragm size limited by a chip size constraint. The double boss structure pressure sensor exhibits a great sensitivity, but suffers from the low yield strength problem due to the high stress occurred at the corner of the diaphragm bridge to be limited in the operating range. ANSYS simulation is performed by changing the length of the groove from 0.5${\mu}m$ to 10${\mu}m$ at the corner of the diaphragm bridge of the double boss structure pressure sensor. The maximum stress is analyzed at the corner of the diaphragm bridge, the edge of the diaphragm bridge, and the position of the piezoresistive sensor. Consequently, in case the length of the groove from the edge of the diaphragm is 6${\mu}m$ or greater, the stress occurred in the corner of the bridge is less than the stress acting on a piezoresistive element.

• Journal of Sensor Science and Technology
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• v.4 no.1
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• pp.29-34
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• 1995

The absolute silicon pressure sensors are fabricated using SDB(silicon direct bonded) wafer. The fabricated pressure sensors consist of four bridge type piezoresistances and a diaphragm which plays a role of mechanic amplifier to supplying pressure. In order to make the diaphragm cavity in low vaccum condition, we anodically bonded Si diaphragm with pyrex 7740 glass in 0.02mmHg, at $400^{\circ}C$. The sensitivity and offset voltage of the fabricated sensors were $30.4{\mu}V/VmmHg$ and 30.6mV, respectively.

• Journal of Sensor Science and Technology
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• v.3 no.3
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• pp.45-53
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• 1994

A new type of Si diaphragm was fabricated using Si-wafer direct bonding and two-step electrochemical etch-stopping methods. Using the new diaphragm structure in mechanical sensors, more precise control of cavity depth and diaphragm thickness was achievable. Also, the propagation of the stress, which was generated near the bonding interface, to the surface can be avoided. Finally, a piezoresistive-type Si pressure sensor was fabricated utilizing the diaphragm and a digital pressure gauge, which can display units of pressure, was realized.

• Journal of Sensor Science and Technology
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• v.7 no.3
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• pp.147-153
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• 1998

The strain characteristics of a fiber optic Fabry-Perot pressure sensor with high sensitivity using a $Si_{3}N_{4}/SiO_{2}/Si_{3}N_{4}$ (N/O/N) diaphragm is experimentally investigated. A 600 nm thick N/O/N diaphragm was fabricated by silicon anisotropic etching technology in 44 wt% KOH solution. An interferometric fiber optic pressure sensor has been manufactured by using a fiber optic Fabry-Perot intereferometer and a N/O/N diaphragm. The 2 cm length fiber optic Fabry-Perot interferometers in the continuous length of single mode fiber were produced with two pieces of single mode fiber coated with $TiO_{2}$ dielectric film utilizing the fusion splicing technique. The one end of the fiber optic Fabry-Perot interferometer was bonded to a N/O/N diaphragm. and the other end was connected to an optical setup through a 3 dB coupler. For the N/O/N diaphragm sized $2{\times}2\;mm^{2}$ and $8{\times}8\;mm^{2}$, the pressure sensitivity was measured 0.11 rad/kPa and 1.57 rad/kPa, respectively, and both of the nonlinearities were less than 0.2% FS.

• Journal of the Korean Institute of Telematics and Electronics T
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• v.35T no.1
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• pp.75-81
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• 1998

This paper is to optimize single-element piezoresistor shear stress strain gauge related to aspect ratio of rectangular diaphragm. The shear stress distribution on diaphragm has been simulated by finite-element method(FEM). As simulation results, the maximum sensitivity for strain gauge was appeared at the center of diaphragm with aspect ratio 3, and in along to long edge with the ratio 2. The diaphragm with ratio 2 is not acceptable due to the yield of mask alignment in IC process technology. The optimum condition of diaphragm with respect to good sensitivity was realized in the case of ratio 3. In this case, the area by gauge was 8% of overall size of rectangular diaphragm.

• Journal of the Korean Vacuum Society
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• v.6 no.3
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• pp.220-226
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• 1997

An optical intensity-type pressure sensor has been fabricated by coupling multimode optical fiber with 100 nm-Au/30 nm-NiCr/150 nm-$Si_3N_4/300 nm-SiO_2/150 nm-Si_3N_4$ optical reflection layer supported by micromachined frame-shape silicon substrate, and its characteristics was investigated. For the application of $Si_3N_4/SiO_2/Si_3N_4$ diaphragm to the optical reflection layer of the sensor, NiCr and Au films were deposited on the backside of the diaphragm by thermal evaporation , respectively, and thus optical low caused by transmission in the reflection layer could be decreased to a few percents. Dielectric diaphragms with uniform thickness were able to be also reproduced because top- and bottom-$Si_3N_4$ layer of the diaphragm could automatically stop silicon anisotropic etching. The respective pressure ranges in which the sensor showed linear optical output power-pressure characteristics were 0~126.64 kPa, 0~79. 98 kPa, and 0~46.66 kPa, and the respective pressure sensitivities of the sensor were about 20.69 nW/kPa, 26.70 nW/kPa, and 39.33 nW/kPa, for the diaphragm sizes of 3$\times$3 $\textrm{mm}^2$, 4$\times$4 $\textrm{mm}^2$, and 5$\times$5 $\textrm{mm}^2$, indicating that the sensitivity increases as diaphragm size increases.

• Proceedings of the Korean Society Of Semiconductor Equipment Technology
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• 2003.05a
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• pp.23-28
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• 2003

본 논문에서는 MEMS 공정기술을 이용하는 압저항(piezoresistive) 압력센서용 다이아프램의 최적구조 제작을 위한 TMAH(Tetramethyl Ammonium Hydroxide)의 식각특성을 연구하였다. KOH, EDP 등 기존의 공정 수행에 있어서 부딪치게 되는 환경적 요인을 개선하고, 생산성 향상을 위해 독성이 없고 CMOS 집적회로 공정과 호환성이 높은 TMAH를 사용하여, 식각온도와 TMAH 농도 및 식각시간에 따른 에칭률 변화를 측정하였다. 식각온도가 증가 함에 따라, 그리고 TMAH 농도가 감소함에 따라, Si 에칭률은 증가하였으나 hillock 발생률이 증가하여 식각표면의 평탄화 정도가 나빠졌다. 이러한 단점을 AP(Ammonium Persulfate) 첨가제를 이용하여 해결하였다. l5wt% 농도의 TMAH 800ml 용액을 가지고 매 10분당 같은 양의 AP를 1시간당 5g이 되도록 첨가하여, 한변의 길이가 100~400 $\mu\textrm{m}$인 정사각형 모양을 가진 우수한 이방성 다이아프램을 성공적으로 제작하였다.

• Korean Journal of Optics and Photonics
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• v.12 no.6
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• pp.463-467
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• 2001

In this study, we developed a FFPI (fiber optic Fabry-Perot interferometer) pressure sensor using the Si diaphragm which measures pressure in vivo. The diaphragm and its supporting structure were etched in KOH solution and were fabricated with micromachining technology. For the configuration of the sensor, the length of the cavity of the Fabry-Perot etalon is 15 mm and one end of the etalon was bonded to a Si diaphragm with 507m thickness. When the area of the Si diaphragm was 2$\times$2 mm2 (cavity length 15 mm), it turns out that the pressure sensitivity was about 1.5 degree/kPa. The pressure sensor developed in this study showed that the phase change was linearly proportional to the increasing pressure in the range of 80 kPa.

• Journal of the Microelectronics and Packaging Society
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• v.24 no.1
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• pp.51-56
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• 2017

In this paper, we have developed a differential pressure flow sensor designed as a single capacitive type. And the sensor was fabricated using a MEMS process. Differential pressure flow sensors are the most commonly used sensors for industrial applications. The sensing diaphragm and bonding joint of the MEMS pressure sensor are easily broken at high pressure. In this paper, we proposed a structure in which the diaphragm of the sensor was not broken at a pressure exceeding the proof pressure, and the differential pressure sensor was designed and manufactured accordingly. The operating characteristics of the sensor were evaluated at a pressure three times higher than the sensor operating pressure (0-3 bar). The developed sensor was $3.0{\times}3.0mm$ and measured with a LCR meter (HP 4284a) at a pressure between 0 and 3 bar. It showed 3.67 pF at 0 bar and 5.13 pF at 3 bar. The sensor operating pressure (0-3 bar) developed a pressure sensor with hysteresis of 0.37%.

• Journal of the Microelectronics and Packaging Society
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• v.25 no.3
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• pp.55-59
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• 2018

In this paper, we investigated the characteristics of shear stress type piezoresistor on a diaphragm structure formed by MEMS (Microelectromechanical System) technology of silicon-direct-bonding (SDB) wafers with Si/$SiO_2$/Si-sub. The diaphragm structure formed by etching the backside of the wafer using a TMAH aqueous solution can be used for manufacturing various sensors. In this study, the optimum shape condition of the shear stress type piezoresistor formed on the diaphragm is found through ANSYS simulation, and the diaphragm structure is formed by using the semiconductor microfabrication technique and the shear stress formed by boron implantation. The characteristics of the piezoelectric resistance are compared with the simulation results. The sensing diaphragm was made in the shape of an exact square. It has been experimentally found that the maximum shear stress for the same pressure at the center of the edge of the diaphragm is generated when the structure is in the exact square shape. Thus, the sensing part of the sensor has been designed to be placed at the center of the edge of the diaphragm. The prepared shear stress type piezoresistor was in good agreement with the simulation results, and the sensitivity of the piezoresistor formed on the $2200{\mu}m{\times}2200{\mu}m$ diaphragm was $183.7{\mu}V/kPa$ and the linearity of 1.3 %FS at the pressure range of 0~100 kPa and the symmetry of sensitivity was also excellent.