• Proceedings of the Optical Society of Korea Conference
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• 2006.02a
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• pp.123-124
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• 2006

• Proceedings of the Optical Society of Korea Conference
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• 2008.02a
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• pp.343-344
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• 2008

• Proceedings of the Korean Society of Precision Engineering Conference
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• 2011.06a
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• pp.595-596
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• 2011

• 정보저장시스템학회:학술대회논문집
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• 2005.10a
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• pp.81-82
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• 2005

새로운 고 용량 광 저장 시스템 개발을 위하여 초 미세 개구를 가지는 마이크로 프로브 어레이시스템 완성을 목표로 연구를 진행하였다. 효율적인 초 미세 개구 생성을 위해 기존의 제작된 마이크로 프로브 위에 FIB 공정을 이용하여 40nm 크기를 가지는 어퍼쳐를 만들었다. 나노 어퍼쳐를 가지는 마이크로 프로브 어레이는 곧 마이크로 렌즈와 VCSEL 과 일체화된 광 기록 헤드시스템으로 준비될 예정이다. 멤스 공정을 이용한 이 시스템은 향후 높은 저장 용량과 빠른 전송속도를 달성할 수 있는 차세대 광정보저장기기에 적용 가능한 새로운 광 픽업 시스템을 발전시킬 수 있을 것으로 생각된다.

• 정보저장시스템학회:학술대회논문집
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• 2005.10a
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• pp.38-39
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• 2005

A new C-aperture is needed in the Ag film because general metal films don't alternate with the PEC film. In this paper, using FDTD method and the Drude-Lorentz metal model, a new C-aperture is designed in the Ag film and the 40nm-beam size and the $7\%$ near-field transmission efficiency are obtained at 28nm distance from the aperture. Its near-field transmission is about 1000 times larger than that of a 54 nm${\times}$54 nm square aperture.

• Proceedings of the Korean Society for Technology of Plasticity Conference
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• 2005.09a
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• pp.29-34
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• 2005

A optical head unit for nano optical probe away was developed. The optical probe array is generated by Talbot effect. The shape and thickness of microlens array(MLA) were designed to minimize the spot size at the foci of MLA. To increase the optical efficiency of the system and obtain the large tolerance for fabrication, aperture size was theoretically optimized. Then microlens illuminated aperture array(MLIAA) as an optical head unit was fabricated using a ultra violet(UV) molding process on aluminum aperture array. In this process, Al aperture array was fabricated separately using the photolithography and reactive ion etching(RIE) process. Optical properties of the generated optical probes were measured and compared at Talbot distance from the aperture array having a diameter of $1{\mu}m$ and MLIAA.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2002.11a
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• pp.538-541
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• 2002

탄소나노튜브 (CNT)가 도포된 평면형 에미터와 원형 개구의 게이트 전극을 가지는 삼전극 전계방출 소자의 전계방출 특성을 시뮬레이션하였다. 체계적인 시뮬레이션을 위해 소자 내 전위의 공간적 분포 특정을 결정하는 전계형상인자 $\gamma$를 정의하고 이 값에 따른 전위분포의 특성과 방출 전자의 궤적을 계산하였다. 계산 결과$\gamma$ > 1 인 전압조건에서는 에미터의 가운데를 중심으로 강한 전자방출이 발생하고 전자빔이 구조의 축 방향으로 자체 집속됨을 알 수 있었다. 이렇게 되면 에미터와 게이트의 정렬이 전혀 필요하지 않게 되며 또한 별도의 전자집속회로 없이도 에미터와 양극에 있는 형광체가 1:1 로 대응하는 획기적인 디스플레이 구조를 가능하게 해 준다 적정 전압조건에서 CNT의 전계강화인자 $\beta$의 변화에 따른 총 전류를 계산한 결과，$\beta$ >3000인 CNT를 사용할 경우 실제 소자로서 구현이 가능함을 확인하였다.

• Journal of the Korea Institute of Information and Communication Engineering
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• v.19 no.5
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• pp.1040-1046
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• 2015

With the rapid progress of electronics and radio communication technology, human enjoys greater freedom in information communication. However, EMW (Electro-Magnetic Wave) environments have become more complicate and difficult to control. Thus, international organizations, such as the American National Standard Institution (ANSI), Federal Communications Commission (FCC), the Comite Internationale Special des Perturbations Radio Electrique (CISPR), etc, have provided standard for controlling the EM wave environments and for the countermeasure of the electromagnetic compatibility (EMC). In this paper, the status of EMW absorbers and the goal of smart EMW absorber in the future were described. Furthermore, design method of the smart EM wave absorber with heat radiating function was suggested. The designed smart EM wave absorber has the absorption ability of more than 20 dB from 2 GHz to 2.45 GHz band, the optimum aperture (hole) size, the adjacent hole space, and the thickness of which were 6 mm, 9 mm, and 6.5 mm, respectively. Thus, it is respected that these results can be applied as various EMC devices in electronic, communication, and controlling systems.

• Transactions of the Korean Society of Mechanical Engineers A
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• v.24 no.4 s.175
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• pp.955-962
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• 2000

Scanning Probe Microscope (SPM) such as Scanning Tunneling Microscope (STM) and Atomic Force Microscope (AFM) was shown to be the powerful tool for nano-scale characterization of a fracture surface . AFM was used to study cross sectional profiles and dimensions of fatigue striations in 2017-T351 aluminum alloy. Their widths (SW) and heights (SH) were measured from the cross sectional profiles of three-dimension AFM images. The following results that will be helpful to understand the fatigue crack growth mechanism were obtained. (1) Coincidence of the crack growth rate with the striation width was found down to the growth rate of 10-5 mm/cycle. (2) The relation of SH=0.085(SW)1.2 was obtained. (3) The ratio of the striation height to its width SH/SW did not depend on the stress intensity factor range K and the stress ratio R. (4) Not only the SW but also the SH changed linearly with the crack tip opening displacement (CTOD) when plotted in log-log scale. From these results, the applicability of the AFM to nano-fractography is discussed.

• Journal of the Korean Society for Precision Engineering
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• v.28 no.3
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• pp.383-388
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• 2011

The cold hollow cathode gas ion source is under development for multi aperture focused ion beam (FIB) system. In this paper, we describe the cold hollow cathode ion source design and the general ion source performance using Ar gas. The glow discharge characteristics and the ion beam current density at various operation conditions are investigated. This ion source can generate maximum ion beam current density of approximately 120 mA/$cm^2$ at ion beam potential of 10 kV. In order to effectively transport the energetic ions generated from the ion source to the multi-aperture focused ion beam(FIB) system, the einzel lens system for ion beam focusing is designed and evaluated. The ions ejected from the ion source can be forced to move near parallel to the beam axis by adjusting the potentials of the einzel lenses.