• Korean Journal of Crystallography
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• v.3 no.2
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• pp.85-97
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• 1992

EBFZM( Electron Beam Floating Zone Melting) 법을 이용하여 몰리브덴에서의 금속계 불순물과 침입형 불순물의 정련기구 및 단결정 성장기구를 연구하 였다. Fe, Cr, Co등의 금속계 불순물은 몰리브덴과의 평형증기압의 차이에 따른 불순물의 선택적 증발에 의하여 우수한 정련효과를 나타내며, 몰리브덴보다 응점이 높은 Ta, W는 잘 제거되지 않았다. 한편 대역 정제에 의한 정련효과는 미약함을 확인하였다. EBF ZM은 C,0,N등의 침입형 불순물의 정련에도 효과적 이었다. 본 연구의 모든 조건에서 몰리브덴은 단결정으로 성장하였으며 2차 재결정 epitaxy에 의한 단결 정 성장기구가 제시되었다. 몰리브덴 단결정 내의 전 위밀도는 strain-anneal법에 의한 단결정의 경우보다 높았으며,본 실험의 열처리 조건에서는 변화하지 않았다. The purification and single crystal growth mechanisms of molybdenum were analysed in EBFZM ( electron beam floating zone melting). Metallic impurities of Fe, Cr, Co were purified efficiently but Ta and W were not removed well in this study. It was due to a preferential evaporation of the elements caused by the difference in equillibrium vapor pressure between the elements and molybdenum. The pu- rification effect by zone refining was not significant. The EBFZM also refined the interstitial impurities of C, 0 and N, effectively. The single crystals of molybdenum were grown regardless of the experimental conditions and the secondary recrystallization epitaxy was surge sled as a growth mechanism. The dislocation density in single crystal was higher than that by strain-anneal method, and was not reduced by heat treatments.

• Korean Journal of Materials Research
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• v.7 no.7
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• pp.608-617
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• 1997

전자빔 용해법에 의해 고순도 티타늄잉고트 및 버튼시편을 제조하였다. 이들 중 18개의 금속불순물을 GDMS(Glow Discharge Mass Spectrometry)로 그리고 탄소, 질소, 산소의 함량을 고온연소법으로 측정한 후 이들과 전기비저항, 경도와의 관계를 조사하였다. 99%와 99.6%스폰지를 용해한 경우 대부분의금속불순물들이 대폭 감소하는 큰 휘발 정련효과가 나타났으며 비금속불순물들의 경우는 장비의 진공상태에 따라 큰 영향을 받으며 정련효과를 기대할 수 없었다. 금속 불순물중 철은 가장 제거하기 어려운 원소로 밝혀졌으며 이는 원료 스폰기중에서 철이 주불순물이기 때문이며 추가적인 예비정련이 필요한 것으로 나타났다. 상온 및 액체질소온도에서의 전기비저항은 가스불순물의 량이 증가함에 따라 직선적으로 증가하였으며 이들의 저항비($\rho$$_{RT}$ /$\rho$$_{N2}$)는 가스불순물의 총량이 1,000ppm이하의 경우 불순물량이 감소함에 따라 급격하게 저하하였으며 이 이상인 경우 완만하게 감소하였다. 이들의 경도는 가스불순물의 량이 증가하였으며 산소당량의 평방근에 비례하는 것으로 나타났다.다.

• Proceedings of the Materials Research Society of Korea Conference
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• 2009.11a
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• pp.37.2-37.2
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• 2009

태양전지 산업의 급속한 발전에 따라 고순도 실리콘을 경제적으로 제조하려는 노력이 경주되고 있다. 이중금속 실리콘(MG)의 정제에 의한 태양전지 실리콘(SoG) 제조에관한 연구가 더욱 더 주목받고 있다. 본 연구에서는 고순도 금속 실리콘 정제 연구의 일환으로 금속 실리콘에 대한 플라즈마 용해시 불순물 정제 가능성에 대한 기초연구를 수행하였다. 먼저 4N 급 Ar 금속 실리콘을 출발물질로 하여 반복 용해횟수(용해시간)를 달리하여 200g 급 Si button을 제조하였다. 이후 화학적 분석법으로 B, P 및 미량 금속 불순물 평가를 실시하였으며, 이로부터 Ar 플라즈마의 정제 효과를 분석하고자 하였다.

• Journal of Nuclear Fuel Cycle and Waste Technology(JNFCWT)
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• v.14 no.2
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• pp.91-100
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• 2016

The neutron activation inventories in reactor vessel and its internals, and bio-shield of a PWR nuclear power plant were calculated to evaluate the effect of impurity elements contained in the structural materials on the activation inventory. Carbon steel is, in this work, used as the reactor vessel material, stainless steel as the reactor vessel internals, and ordinary concrete as the bio-shield. For stainless steel and carbon steel, one kind of impurity concentration was employed, and for ordinary concrete five kinds were employed in this study using MCNP5 and FISPACT for the calculation of neutron flux and activation inventory, respectively. As the results, specific activities for the cases with impurity elements were calculated to be more than twice than those for the cases without impurity elements in stainless and carbon steel. Especially, the specific activity for the concrete material with impurity elements was calculated to be 30 times higher than that without impurity. Neutron induced reactions and activation inventories in each material were also investigated, and it is noted that major radioactive nuclide in steel material is Co-60 from cobalt impurity element, and, in concrete material, Co-60 and Eu-152 from cobalt and europium impurity elements, respectively. The results of this study can be used for nuclear decommissioning plan during activation inventory assessment and regulation, and it is expected to be used as a reference in the design phase of nuclear power plant, considering the decommissioning of nuclear power plants or nuclear facilities.

• Clean Technology
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• v.6 no.1
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• pp.79-84
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• 2000

In this study, to reduce the consumption of chemicals in cleaning processes, Si-wafers contaiminated with metallic impurities were cleaned with electrolyzed water(EW), which was generated by the electrolysis of a diluted electrolyte solution or ultra pure water(UPW). Electrolyzed water could be controlled for obtaining wide ranges of pH and ORP(oxidation-reduction potential). The pH and oxidation-reduction potential of anode water and cathode water were measured to be 4.7 and +1000mV, and 6.3 and -550mV, respectively. To analyze the amount of metallic impurities on Si-wafer surfaces, ICP-MS was introduced. Anode water was effective for Cu removal, while cathode water was more effective for Fe removal.

• Korean Journal of Materials Research
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• v.8 no.9
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• pp.837-842
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• 1998

As the size of the integrated circuit is scaled down the importance of Si cleaning has been emphasized. One of the major concerns is abut the removal of metallic impurities such as Cu and Fe on Si surface. In this study, we intentionally contaminated Cu and Fe on the Si wafers and cleaned the wafer by cleaning splits of the chemical mixture of $\textrm{H}_2\textrm{O}_2$ and HF and the combination of HF treatment with UV/$\textrm{O}_3$ treatment. The contamination level was monitored by TXRF. Surface microroughness of the Si wafers was measured by AFM. The Si wafer surface was examined by SEM. AES analysis was carried out to analyze the chemical composition of Cu impurities. The amount of Cu impurities after intentional contamination was abut the level of $\textrm{10}^{14}$ atoms/$\textrm{cm}^2$. The amount of Cu was decreased down to the level of $\textrm{10}^{10}$ atoms/$\textrm{cm}^2$ by cleaning splits. The repeated treatment exhibited better Cu removal efficiency. The surface roughness caused by contamination and removal of Cu was improved by repeated treatment of the cleaning splits. Cu were adsorbed on Si surface not in a thin film type but in a particle type and its diameter was abut 100-400${\AA}$ and its height was 30-100${\AA}$. Cu was contaminated on Si surface by chemical adsorption. In the case of Fe the contamination level was $\textrm{10}^{13}$ atoms/$\textrm{cm}^2$ and showed similar results of above Cu cleaning. Fe was contaminated on Si surface by physical adsorption and as a particle type.

• Applied Chemistry for Engineering
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• v.5 no.6
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• pp.925-934
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• 1994

Nickel recovered from the spent oil-hydrogenation catalysts was used in hydrogenation catalyst preparation. The spent catalyst contains approximately 21.8% Ni, 0.7% Mg, and small quantities of Al, Fe, and Zn. Nickel recovery was obtained by inorganic acid digestion in the order of HCI>$NHO_3$>$H_2SO_4$. For $HNO_3$, 3hour extraction with 3N solution was satisfactory. In the PH range of 6.5~9.0, Ni recovery was higher, but metallic impurities were found to be coprecipitated. The PH in the range of 7.0~9.0 seems to be the optimum condition for separation to obtain acceptable Ni precipitates without the decrease of purity. The catalysts prepared with reclaimed nickel by wet reduction methods showed catalytic activities close to those prepared using reagent nickel in the oil hydrogenation reaction. The surface areas of the support do not seem to affect the catalytic activity.

• Journal of the Korean Crystal Growth and Crystal Technology
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• v.27 no.6
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• pp.303-308
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• 2017

The $FeCl_3$ waste solution used to etch various metals contains valuable metal such as nickel. In this study, we recovered as high purity nickel carbonate crystalline powders from nickel-containing etching waste solution after regeneration of iron chloride. Firstly we eliminated about of the iron impurities under the condition of pH 4 using 5 % NaOH aqueous solution and then removed the remaining impurities such as Ca, Mn and Zn etc. by using solvent extractant D2EHPA (Di-(2-ethylhexyl) phosphoric acid). Thereafter, nickel carbonate powder having a purity of 99.9 % or more was obtained through reaction with sodium carbonate in a nickel chloride solution.

• Journal of the Korean Vacuum Society
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• v.8 no.1
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• pp.13-19
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• 1999

Total reflection X-ray fluorescence spectroscopy using synchrotron radiation source called as TRSFA was explored to achieve high sensitivities to impurity metals on Si wafer surface. It consists of monochromating part to select a specific wavelength, slit part to shield direct beam and to control monochromated beam, and main chamber to dectect fluorescent X-ray counts of impurities on si wafer. Monochromated X-ray of 10.90 KeV was selected and the optimum total reflection condition on silicon wafer was obtained through tuning the dead time and fluorescent X-ray count of Si and Fe. TRSFA system could increase the sensitivity as high as 50 times in comparision with TRXFA using normal X-ray source. But the trend was varied since the surface conditions of Si wafers and, therefore, the reflectivities were different. Furthemore, there seems to be a promising path to reaching a detection limit useful to the next generation metal impurities control, because Fe impurity below to the $5\times10^{9}\textrm{atomas/cm}^2$ can be detectable through the developed TRSFA system.

• Korean Journal of Materials Research
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• v.2 no.2
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• pp.157-160
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• 1992

Unusual surface impurity levels of PREPed Ti-51at%Al powders were analyzed using Auger spectroscopy and they were compared with these obtained from bulk starting electrode. Oxygen and carbon contents were varied very much with particle size. Powder surfaces were believed to be mainly covered by a complex compound containing Ti, Al, O, and C. The decrease in contents of oxygen and carbon of powders were attributed to the certain refining reaction of transfer type DC Ar plasma during the powder production.