• Title/Summary/Keyword: 광조형 공정

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A Benchmark Study on the Stereo-lithography-type Rapid Prototyping Apparatus using Transparent Materials (투명 재료를 사용하는 광조형 방식 쾌속조형 장비의 성능 비교 시험)

  • Kim, Gi-Dae;Sung, Joo-Hyung
    • Journal of the Korean Society for Precision Engineering
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    • v.24 no.6
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    • pp.138-145
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    • 2007
  • Among various rapid prototyping processes, stereo-lithography process which can manufacture transparent prototype is known to be the greatest in the form & dimensional accuracy and surface roughness. In this paper, bench mark tests of 4 stereo-lithography-type rapid prototyping apparatus were carried out using transparent materials. The test includes measurement of mechanical properties, form accuracy, building speed and manufacturing cost. It was observed that ViperPRO of 3D systems is advantageous in the mechanical properties and building speed, RM600011 of CMET in sub-milli scale form accuracy and manufacturing cost, and relatively economical Eden500V of Objet is great in tensile strength at room temperature.

A Study on the Polymer Lithography using Stereolithography (광조형법을 이용한 고분자 리소그래피에 관한 연구)

  • Jung Young Dae;Lee Hyun Seop;Son Jae Hyuk;Cho In Ho;Jeong Hae Do
    • Journal of the Korean Society for Precision Engineering
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    • v.22 no.1
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    • pp.199-206
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    • 2005
  • Mask manufacturing is a high COC and COO process in developing of semiconductor devices because of mask production tool with high resolution. Direct writing has been thought to be the one of the patterning method to cope with development or small-lot production of the device. This study consists two categories. One is the additional process of the direct and maskless patterning generation using SLA for easy and convenient application and the other is a removal process using wet-etching process. In this study, cured status of epoxy pattern is most important parameter because of the beer-lambert law according to the diffusion of UV light. In order to improve the contact force between patterns and substrate, prime process was performed and to remove the semi-cured resin which makes a bad effects to the pattern, spin cleaning process using TPM was also performed. At a removal process, contact force between photo-curable resin as an etching mask and Si wafer is important parameter.

Development of Large-area Two-photon Stereolithography Process for the Fabrication of Large Three-dimensional Microstructures (대면적 3 차원 마이크로 형상제작을 위한 스테이지 스캐닝 시스템을 이용한 이광자 흡수 광조형 공정 개발)

  • Lim, Tae-Woo;Son, Yong;Yi, Shin-Wook;Kong, Hong-Jin;Park, Sang-Hu;Yang, Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.25 no.1
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    • pp.122-129
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    • 2008
  • Two-photon stereolithography is recognized as a promising process for the fabrication of three-dimensional (3D) microstructures with 100 nm resolution. Generally, beam-scanning system has been used in the conventional process of two-photon stereolithography, which is limited to the fabrication of micro-prototypes in small area of several tens micrometers. For the applications to 3D high-functional micro-devices, the fabrication area of the process is required to be enlarged. In this paper, large-area two-photon stereolithography (L-TPS) employing stage scanning system has been developed. Continuous scanning method is suggested to improve the fabrication speed and parameter study is conducted. An objective lens of high numerical aperture (N.A.) and high strength material were employed in this system. Through this work, 3D microstructures of $600*600*100\;{\mu}m$ were fabricated.

A Study on Fabrication of Internally Colored Shape in Stereolithography Parts using Molten Ink Deposition Process (용융잉크 적층공정을 이용한 내부채색형상을 포함한 광조형물 제작에 관한 연구)

  • Park, Jong-Cheol;Park, Suk-Hee;Kang, Sang-Il;Yang, Dong-Yol
    • Journal of the Korean Society for Precision Engineering
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    • v.27 no.6
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    • pp.98-104
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    • 2010
  • Rapid Prototypes with internally colored objects are convenient by visualizing. A rapid prototyping method has been developed to fabricate mono-colored or multi-colored objects. In this work, a new process was proposed that can fabricate internally visible colored 3D objects in stereolithography parts. The process consists of projection stereolithography process using transparent photocurable resin for outer shapes and molten ink deposition process using molten solid ink for internal shapes. In molten ink deposition process, molten solid ink could be deposited uniformly in a designed pattern. To make molten solid ink uniform over a designed region, parametric study through a patterning solid ink was performed. By laminating resin and solid ink in sequence, the process can make colored 3D objects in StereoLithography(SL) parts. The practicality and effectiveness of the proposed process were verified through fabrication of colored basic 3D objects in SL parts.

Fundamental Process Development of a Ultramicro-Stereolithography using a Femto-second Laser for Manufacturing Nano-scaled Features (펨토초 레이저를 이용한 극미세 광조형 기반공정 개발)

  • 박상후;임태우;정창균;이신욱;이성구;공홍진;양동열
    • Journal of the Korean Society for Precision Engineering
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    • v.21 no.3
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    • pp.180-187
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    • 2004
  • The miniaturization technologies are perceived as potential key technologies of the future. They will bring about completely different ways in which people and machines interact with the physical world. However, at the present time, the primary technologies used fur miniaturization are dependent on the microelectronic fabrication techniques. The principal shortcomings associated with such techniques are related to the inability of to produce arbitrary three-dimensional features not only in electronics but also in a wide range of metallic materials. In this paper, a ultramicro-stereolithography system assisted with a femto-second laser was developed to fabricate the arbitrary three-dimensional nano/micro-scaled features. In the developed process, a femto-second laser is projected according to CAD data on a photosensitive monomer resin, it induces polymerization of the liquid resin. After the polymerization, a droplet of ethanol is dropped to remove the liquid resin and then the polymerized nano-scaled features only remain. By a newly developed process, miniature devices for an extremely wide range of applications would become a technologically feasible reality. Some of nano/micro-scaled features as examples were fabricated to prove the usefulness of this study at the fundamental stage.

다구찌 방법을 이용한 공정변수의 최적화

  • 이수호;박원식;조형석
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 1995.10a
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    • pp.907-910
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    • 1995
  • Though SLA(Stereolithography Apparatus) is being recognized as an innovative technology, it still can not be used to fully practical applications since it lacks of dimensional accuracy compared to conventional processes. In SLA, the accuracy of cured part depends upon the set of process parmeters. In order to improve the accuracy of SLA, this paper quantitatively evaluates how largely each process parameter of SLA contributes to the part accuracy and estimates the optimal set of process parameter which minimizes the dimensional errors of the test part, "letter-H" part. For this purpose, we use ANOVA(analysis of variance) and S/N(signal-to-noise)ratio of Taguchi method.hi method.

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Development of Post-process for Improving the Surface Roughness of Stereolithography parts - Using Wax Coating and Grinding Post-process - (RP part 표면정도 향상을 위한 후처리 공정 개발 -왁스 코팅과 연삭 후처리 공정 이용-)

  • 안대건;김호찬;최홍태;이석희
    • Proceedings of the Korean Society of Precision Engineering Conference
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    • 2002.10a
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    • pp.659-662
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    • 2002
  • SL(Stereolithography) part is made by piling up thin layers which causes the stair stepping effect at the surface of SL parts. This effect brings about excessive surface roughness and requires additional post-process finishing such as abrasive techniques that are detrimental to part geometry and time consuming. Hence a wax coating and grinding post-process is proposed to improve the surface quality of SL part. The wax that has suitable properties for the proposed post-process is coated all over the part surface. By grinding the thin layer of coated on the SL part only, the surface roughness can be improved without any damage on the part. From the experimental results, This approach is considered to be very practical fur die casting with RT(Rapid Tooling) techniques.

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Application of Reverse Engineering System for Improvement of Curl Distortion in Stereolithography Process (광조형 공정시 휨에 의한 변형을 개선하기 위한 역설계 시스템의 적용)

  • Che, Woo-Seong
    • Journal of the Semiconductor & Display Technology
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    • v.8 no.4
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    • pp.7-13
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    • 2009
  • The slender device(long length and thin width) manufactured by stereolithography process suffers from large curl distortion. This paper adapts two control parameters such as a critical exposure and a penetration depth. The measurement of the test parts dimension are carried out by reverse engineering method with the optical 3-dimensional measurement equipment. We investigate how each parameter contributes to the part accuracy and estimates the optimal set of parameters which minimizes the dimensional error of the test parts. Finally, As being an the RAM slot as being an example of the slender device, the RAM slot is made with the optimal values of control parameter and the results are investigated

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