• Title/Summary/Keyword: 공기-브러쉬 세척

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Verifying Rehabilitation and Evaluation of Bedrock Wells using Air-brush Surging and Explosive Methods (공기-브러쉬와 폭약 세척 방법에 의한 암반관정의 세척 효과 검증)

  • Lee, Jeong-Hwan;Hamm, Se-Yeong;Han, Suk-Jong;Ok, Soon-Il;Cha, Eun-Jee;Cho, Heuy-Nam;Choo, Chang-Oh;Kim, Moo-Jin
    • The Journal of Engineering Geology
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    • v.21 no.4
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    • pp.369-379
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    • 2011
  • The application of appropriate rehabilitation works can improve productivity and water quality of clogged wells, with extending the operation of the wells for a certain period. This study verified rehabilitation effect of the clogged wells by means of explosive method and air brush surging and by using hydraulic tests, water quality, and geophysical logs (optical and acoustic televiewer logs) before and after the cleaning works on the two wells drilled in bedrock in Mt. Geumjeong, Busan City. Air-brush surging method resulted in maximum 273% increase of the productivity with the concentration of $F^-$, $SiO_2$, and a decrease of turbidity and the concentration of $Cl^-$, $NO_3^-$. The explosive method resulted in maximum 156% increase of the productivity with an increase of the concentration of $F^-$, $SiO_2$ and a decrease of turbidity, $Cl^-$, $NO_3^-$.

Solar Module Cleaning System in Desert (사막용 태양광 모듈 크리닝 시스템)

  • Ko, Hyun-Jin;Gu, Yun-Seo
    • Proceedings of the KIEE Conference
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    • 2015.07a
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    • pp.1090-1091
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    • 2015
  • 사막은 일조량이 많고, 세계적으로 넓은 규모를 가지고 있어 대규모 태양광 발전소 건설에 주목받고 있지만, 태양광 모듈 표면에 쌓이는 모래먼지로 인하여 발전효율 저하가 발생되고 있는 실정이다. 이에 태양광 모듈 표면의 모래먼지를 제거할 수 있는 태양광 모듈 크리닝 시스템을 개발 하였다. 본 논문에서는 사막 환경을 고려하여 물을 필요로 하지 않는 압축공기 및 회전하는 브러쉬로 모듈 표면을 세척하는 Solar Module Cleaning System을 제안한다.

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Development of microarrayer for manufacturing DNA chip used in genome project (유전자 검색을 위한 DNA 칩 제작용 microarrayer의 개발)

  • Lee, Hyun-Dong;Kim, Ki-Dae;Kim, Chan-Soo;Lim, Yong-Pyo;Park, Jung-Kyu
    • Korean Journal of Agricultural Science
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    • v.30 no.1
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    • pp.76-88
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    • 2003
  • This study exploits the robot system which is necessary in gene study, bio-technology industry. As well, it can achieve the job of DNA chip manufacturing whose use rate has been increased recently. The robot consists of DNA spotting device for spotting DNA on the silylated slide and well plate, bed for fixing well-plate, washing & drying device of washing and drying the pin part of DNA spotting device, distillation-water vessel, and discharge vessel of wash water. We made the term of sticking DNA to the pin on well plate to be 15 seconds. The spot size of DNA was set to be 0.28 mm on the average by bringing the slide into contact with pin for 1 second. At this rate, if DNA is spotted in the minimum space possible of about 0.32mm, it can stick about 8,100 DNA spots on the well plate. Analyzing the procedure: Movement starts. Pin washes, dries, and smears DNA on the well plate. Spots DNA onto 12 chips takes 2 minutes and 50 seconds.

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The development of the Ionizer using clean room (청정환경용 정전기 제거장치 개발)

  • Jeong, Jong-Hyeog;Woo, Dong Sik
    • Journal of the Korea Academia-Industrial cooperation Society
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    • v.19 no.1
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    • pp.603-608
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    • 2018
  • Although the voltage-applied discharge method is most widely used in the semiconductor and display industries, periodic management costs are incurred because the method causes defects due to the absorption of ambient fine dust and causes emitter tip contamination due to the discharge. The emitter tip contamination problem is caused by the accumulation of fine particles in ambient air due to the corona discharge of the ionizer. Fuzzy ball generation accelerates the wear of the emitter tip and deteriorates the performance of the ionizer. Although a mechanical cleaning method using a manual brush or an automatic brush is effective for contaminant removal, it requires management of additional mechanical parts by the user. In some cases, contaminants accumulated in the emitter may be transferred to the wafer or product. In order to solve this problem, we developed an ionizer for a clean environment that can remove the pencil-type emitter tip and directly ionize the surrounding gas molecules using the tungsten wire located inside the ion tank. As a result of testing and certification by the Korea Institute of Machinery and Materials, the average concentration was $0.7572particles/ft^3$, the decay time was less than two seconds, and the ion valance was 7.6 V, which is satisfactory.