Browse > Article
http://dx.doi.org/10.5762/KAIS.2018.19.1.603

The development of the Ionizer using clean room  

Jeong, Jong-Hyeog (Department of Aviation Information and Communications Engineering, Kyungwoon University)
Woo, Dong Sik (Department of Aviation Information and Communications Engineering, Kyungwoon University)
Publication Information
Journal of the Korea Academia-Industrial cooperation Society / v.19, no.1, 2018 , pp. 603-608 More about this Journal
Abstract
Although the voltage-applied discharge method is most widely used in the semiconductor and display industries, periodic management costs are incurred because the method causes defects due to the absorption of ambient fine dust and causes emitter tip contamination due to the discharge. The emitter tip contamination problem is caused by the accumulation of fine particles in ambient air due to the corona discharge of the ionizer. Fuzzy ball generation accelerates the wear of the emitter tip and deteriorates the performance of the ionizer. Although a mechanical cleaning method using a manual brush or an automatic brush is effective for contaminant removal, it requires management of additional mechanical parts by the user. In some cases, contaminants accumulated in the emitter may be transferred to the wafer or product. In order to solve this problem, we developed an ionizer for a clean environment that can remove the pencil-type emitter tip and directly ionize the surrounding gas molecules using the tungsten wire located inside the ion tank. As a result of testing and certification by the Korea Institute of Machinery and Materials, the average concentration was $0.7572particles/ft^3$, the decay time was less than two seconds, and the ion valance was 7.6 V, which is satisfactory.
Keywords
Clean room; Emitter; Fuzz ball; Ionizer; Tensuten wire;
Citations & Related Records
연도 인용수 순위
  • Reference
1 Adachi T, Kawasaki M, Nakabayashi H: The Behavior of Dust Particle in Electrostatic Precipitation, 1979.
2 M. Goldman, A. Goldman and R. S. Sigmond, "The corona discharge, its properties and specific uses", Pure & Appi. Chem., vol. 57, no. 9, pp. 1353-1362, 1985. DOI: https://doi.org/10.1351/pac198557091353   DOI
3 Arnold Steinman, "The Physics of Charge Neutralization by Air Ions", Compliance Engineering 23, no. 1, 2006.
4 Ohmi T, Inaba H and Takenami T : Research on adhesion of particles to charged wafers critical in contamination control, 1989.
5 Inaba H, Ohmi T, Takenami T, et al., "Evaluation of Wind Velocity, Airstream Distribution, and Dust Scattering," in Proceedings of 8th Symposium on ULSI Ultra Clean Technology: Submicron ULSI Process Technology II, Tokyo, pp. 245-290, 1989.
6 Ohmi T, "Ultraclean Technology: ULSI Proceeding's Crucial Factor," Microcontamination, pp. 49-58, 1988.
7 Nojima H, Nishikawa K: Air Purification Technology Using Ions Generated by Discharge Plasma at Atmospheric Pressure, 2002.
8 Larry Levit and Douglas Beyer, "Generating Air Ionization With No Contaminating Particles", www.electrostatics.org/images/2011_A3.pdf
9 Simco Ion Application Note, Principles of Sheath Technology and Low Maintenance Ionizer, http://www.novxcorp.com/documents/technical/TS-005nozzles.pdf
10 Okano Kazuo, Posadas Arnel, "Particle Generation of Ceramic Emitters for Cleanroom Air Ionizers", EOS/ESD Symposium, pp. 287-291, 1997.
11 Sakata S, Okada T : Contamination-Free Ionizer for Super Clean Rooms, 1991.
12 Noll Charles G., Lawless Philip A., "Comparison of Germanium and Silicon Needles as Emitter Electrodes for Air Ionizers", EOS/ESD Symposium, pp. 195-204, 1997.