Effects of substrate bias and pulse frequency on the crystalline and microstructure of TiN films deposited by pulsed DC reactive magnetron sputtering (바이어스 전압과 Duty 변화에 따른 펄스 DC 마그네트론 TiN막의 결정배향성 및 미세구조 연구)
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- Proceedings of the Korean Institute of Surface Engineering Conference
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- 2009.05a
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- pp.158-158
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- 2009