• Journal of the Institute of Electronics Engineers of Korea SD
• /
• v.37 no.11
• /
• pp.18-24
• /
• 2000

(Ba,Sr)$TiO_3$ thin films have attracted great interest as new dielectric materials of capacitors for ultra-large-scale integrated dynamic random access memories (ULSI-DRAMs) such as 1 Gbit or 4 Gbit. In this study, inductively coupled $BCl_3/Cl_2/Ar$ plasmas was used to etch (Ba,Sr)$TiO_3$ thin films. RF power/dc bias voltage=600 W/-250 V and chamber pressure was 10 mTorr. The $Cl_2/(Cl_2+Ar)$ was fixed at 0.2 the (Ba,Sr)$TiO_3$ thin films were etched adding $BCl_3$. The highest (Ba,Sr)$TiO_3$ etch rate is $480{\AA}/min$ at 10 % $BCl_3$ to $Cl_2/Ar$. The change of Cl, B radical density measured by optical emission spectroscopy(OES) as a function of $BCl_3$ percentage in $Cl_2/Ar$. The highest Cl radical density was shown at the addition of 10% $BCl_3$ to $Cl_2/Ar$. To study on the surface reaction of (Ba, Sr)$TiO_3$ thin films was investigated by XPS analysis. Ion bombardment etching is necessary to break Ba-O bond and to remove $BaCl_2$. There is a little chemical reaction between Sr and Cl, but Sr is removed by physical sputtering. There is a chemical reaction between Ti and Cl, and $TiCl_4$ is removed with ease. The cross-sectional of (Ba,Sr)$TiO_3$ thin film was investigated by scanning electron microscopy (SEM), the etch slope is about 65~70$^{\circ}$.

• Analytical Science and Technology
• /
• v.6 no.2
• /
• pp.239-246
• /
• 1993

The structure of $(BaSr)TiO_3$ thin film deposited on ITO coated glass, bare glass and (100) Si substrates was not changed, but the crystallinity was improved by the polycrystalline ITO layer and (100) Si substrate. The composition of $(BaSr)TiO_3$ thin film deposited on ITO coated glass was nearly stoichiometric ((Ba+Sr)/Ti=1.08~1.09) and very uniform through all deposition process. But as the deposition temperature increases, the interdiffusion between grown thin film and ITO layer and between ITO layer and base glass is severer. $(BaSr)TiO_3$ thin film deposited on ITO coated glass substrate was highly transparent. The refractive index($n_f$) of $(BaSr)TiO_3$ thin film deposited on ITO coated glass was 2.138~2.286 as a function of substrate temperature.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2003.11a
• /
• pp.55-55
• /
• 2003

Ferroelectric 물질은 고유전성, 자발분극과 전기장에 따른 유전상수의 변화 등의 특성을 가지고 있으므로 많은 연구가 진행중이다. 이러한 ferroelectric 물질의 유전 특성에 미치는 요소로는 물질의 조성비, 박막의 스트레스, 결정성 등이 있다. 특히 스트레스에 대한 연구가 활발히 진행중이다. 본 연구에서 산화물 인공격자를 이용하여 단일박막에서 얻을 수 없는 격자변형도를 얻어 격자 변형이 박막의 유전특성에 미치는 영향을 연구하였다. BaTiO$_3$ (BTO)/SrTiO$_3$ (STO) 산화물 인공격자를 Pulsed laser deposition (PLD)법으로 (La,Sr)CoO$_3$ 전극이 코팅된 MGO (100) 단결정 기판위에 증착시켰다. 적층 주기에 변화를 주어 BTO와 STO 각각 1.01~1.095와 0.925 ~ 1.003의 단일 막에서는 얻을 수 없는 격자 변형도를 얻었다. 이 실험적 데이터를 기초로 하여 density functional theory (DFT)라고 불리는 범함수밀도론를 기초한 제일원리적 계산 방법을 통하여 격자 변형된 SrTiO$_3$의 구조적, 전기적 특성을 계산하였다. SrTiO$_3$와 BaTiO$_3$ 격자의 안정성을 분석하기 위하여 Vienna Ab-intio Simulation Package (VASP) code가 사용되었다. SrTiO$_3$와 BaTiO$_3$ 산화물 격자의 안정성 분석 후, frozen-phonon 계산 방법을 사용하여 zone-centered optical phonon mode가 계산되었으며, mode effective charge는 Berry-phase polarization 으로부터 얻어졌다. SrTiO$_3$ 격자가 격자변형이 일어나지 않은 상태로부터 c/a= 0.985로 격자 변형 이 일어남에 따라 optical phonon mode는 점차 hardening되었다. BaTiO$_3$ 격자의 경우 SrTiO$_3$ 격자와는 달리 격자 변형이 1.01~1.023으로 진행됨에 따라 optical phonon mode의 증가를 가져왔으나 Born effective charge의 증가하였으며, 더 이상 격자 변형이 진행됨에 따라 optical phonon mode의 감소를 가져왔으나 Born effective charge의 증가 유전상수는 증가했다. 격자 변형이 SrTiO$_3$ 와 BaTiO$_3$ 산화물 격자의 optical phonon mode와 Born effective charge에 크게 영향을 미쳤다.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 1996.11a
• /
• pp.50-50
• /
• 1996

• Journal of the Korean Institute of Telematics and Electronics D
• /
• v.36D no.4
• /
• pp.56-62
• /
• 1999

In this study, (Ba, Sr)$TiO_3$ thin films were etched with $Cl_2$/Ar gas mixing ratio in an inductively coupled plasma (ICP) by varying the etching parameter such as rf power, dc bias voltage, and chamber pressure. The etch rate was 56 nm/min under $Cl_2$/($Cl_2$+Ar) gas mixing ratio of 0.2, rf power of 600 W, dc bias voltage of 250 V, and chamber pressure of 5 mTorr. At this time, the selectivity of BST to Pt, $SiO_2$ was respectively 0.52, 0.43. The surface reaction of the etched (Ba, Sr)$TiO_3$ thin films was investigated with X-ray photoelectron spectroscopy (XPS). Ba is removed by chemical reaction between Sr and Cl to remove Sr. Ti is removed by chemical reaction such as $TiCl_4$ with ease. The results of secondary ion mass spectrometer (SIMS) analysis compared with the results of XPS analysis and the results were the same.

• Journal of the Korean Crystal Growth and Crystal Technology
• /
• v.10 no.2
• /
• pp.111-115
• /
• 2000

$BaTIO_3$ thin films were prepared on (100) $BaTIO_3$ substrates by coating- pyrolysis process using metal-organic compounds of Ba and Ti. The amorphous films prefired at $450^{\circ}C$were crystallized above $700^{\circ}C$ under oxygen partial pressure of $2\times 10^{-4}$. The lattice parameters of the perpendicular axis for the $BaTIO_3$ thin films heat-treated below $800^{\circ}C$ were closer to a value of cubic $BaTIO_3$, whereas those above $800^{\circ}C$ were closer to a value of tetragonal BaTiG. The results of XRD P scan and pole-figure analyses indicated that BaTiO, thin films have an epitaxial relationship with the $SrTiO_3$ substrates. The $BaTIO_3$thin films annealed at$800^{\circ}C$ showed the surface with island-like grains about 0.4$mu \textrm{m}$ and the cross section of 0.8 $mu \textrm{m}$ thickness with granular grains.

• Proceedings of the Materials Research Society of Korea Conference
• /
• 2000.11a
• /
• pp.47-47
• /
• 2000

• Korean Journal of Materials Research
• /
• v.10 no.9
• /
• pp.607-611
• /
• 2000

Zr modified $(Ba_{1-x},Sr_x)TiO_3$ thin films as capacitor for high density DRAM were deposited by r.f. magnetron sputtering. The films deposited at various chamber pressure exhibited a polycrystalline structure. The Zr/Ti ratio of the films increased significantly with decreasing the chamber pressure and this variation affected the microstructure and surface roughness of films When chamber pressure increased dielectric constant of the films effected due to decrease of Zr. The thin films prepared in this study show dielectric constant of 380 to 525 at 100KHz. The variation of capacitance and polarization measured as a function of bias voltage suggested that all films were paraelectric phases. Leakage current exhibited smaller value as chamber pressure decrease and the leakage current density of the films deposited above 10mTorr was $10^{-7}~10^{-8}A/cm^2$ order at 200kV/cm. $(Ba_{1-x},Sr_x)(Ti_{1-y},Zr_y)O_3$ thin films in this study appeared to be potential thin film capacitor for high density DRAM.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1999.11a
• /
• pp.121-124
• /
• 1999

The (Ba,Sr)TiO$_3$[BST] thin film were fabricated on the Pt/Ti/SiO$_2$/Si substrate by RF sputtering technique. The structural properties of the BST thin films were investigated with deposition time and substrate temperature by XRD. In the case of the BST thin films which has the deposition thin of 20 min, second phases and BST (111) peaks were increased with increasing the temperature of substrate. The capacitance of the BST thin film (deposition time of 20 min.) was decreased with the substrate temperature and was 1500pF with applied voltage of 1V.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
• /
• 1999.05a
• /
• pp.649-652
• /
• 1999

The (Ba, Sr)TiO$_3$(BST) thin films were fabricated on Pt/Ti/SiO$_2$/Si substrate by RF sputtering technique. The structural properties of the BST thin films were investigated with substrate temperature by XRD, SEM, EDS and AES depth profils. Increasing the substrate temperature, barium multi titanate phases were decreased. The BST thin film had a structure of perovskite type, and had peaks of (100), (200) at the substrate temperature of 50$0^{\circ}C$. When the BST thin films were deposited at the substrate temperature of 50$0^{\circ}C$, the composition ratio of Ba/sr was 52/48.