• Title/Summary/Keyword: (Ba, Sr)$TiO_3$

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Spectrochemical Determination of Impurities in Barium Titanate and Strontium Titanate Single Crystals (Barium Titanate 및 Strontium Titanate 單結晶中의 不純物의 分光化學分析)

  • Jae-young Hwang
    • Journal of the Korean Chemical Society
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    • v.7 no.4
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    • pp.254-256
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    • 1963
  • A spectrochemical analysis was made to compare the major impurities in $BaTiO_3$ single crystals grown from $KF-BaTiO_3$ system and $TiO_2-BaTiO_3$ system respectively. The present technique was also extended, without any modifications, to the analysis of $SrTiO_3$ crystal.

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Preparation and Characteristics of $(Ba_{1-x}Sr_x)TiO_3$ Thin Films by the Sol-gel Process (졸-겔법을 이용한 $(Ba_{1-x}Sr_x)TiO_3$ 박막의 제조 및 특성)

  • 황규석;김병훈
    • Journal of the Korean Ceramic Society
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    • v.32 no.4
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    • pp.516-524
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    • 1995
  • In this study, to prepare the dielectric (Ba, Sr)TiO3 thin films by the sol-gel process, Titaminum (IV) sio-propoxide (Ti[OCH(CH3)2]4), Ba and Sr acetate were used for sol and thin films were prepared by dip-coating process. Stability of sol decreased with the increase of Sr, and thickness of thin films were obtained 0.13~0.17${\mu}{\textrm}{m}$ by 1 coating cycle. Transmittance of amorphous thin films heated at 500 and 55$0^{\circ}C$ was very good, and crystallization tendency of thin films according to heat-treatment temperature and crystallization characteristics of thin films heated at 11$0^{\circ}C$ for 3 hrs were analysed. As a result, good perovskite structure was obtained higher than 100$0^{\circ}C$, and tetragonality of thin film was decreased but pyrochlore was formed with increasing Sr. In case of addition to substitute 0.4mol% Sr for Ba, dielectric constant was 288 and loss factor (tan $\delta$) was 0.04.

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Properties of Li doped BST-MgO thick film Interdigital Capacitor (Li이 첨가된 BST-MgO Interdigital 커패시터의 특성연구)

  • Kim, Se-Ho;Han, Yong-Su;Koh, Jung-Hyuk
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2007.11a
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    • pp.286-286
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    • 2007
  • Li이 첨가된 0.7(Ba,Sr)$TiO_3$-0.3MgO 후막 interdigital 커패시터를 연구하였다. Li이 첨가된 0.7(Ba,Sr)$TiO_3$-0.3MgO의 후막을 $Al_2O_3$ 기판 위에 형성하기 위하여 스크린 프린팅 방법을 이용하였다. $BaSrTiO_3$의 세라믹 물질은 높은 유전율(1MHz에서 500이상)과 낮은 유전 손실(1MHz에서 0.01)값을 가지고 있는 반면, $1350^{\circ}C$의 높은 온도에서 소결되는 단점이 있다. 따라서 본 연구에서는 $BaSrTiO_3$ 세라믹 물질의 유전특성을 향상시키고 $1350^{\circ}C$의 높은 소결온도를 낮추기 위해서, MgO(30wt%)와 Li(3wt%)을 $BaSrTiO_3$에 첨가하였다. 그리고 10um의 후막을 $Al_2O_3$ 기판 위에 스크린 프린팅 방법을 통해 형성한 후, 50um finger gap의 interdigital 커패시터를 Ag 전극을 이용하여 제작하였다. 샘플을 제작하기 전에, Frequency와 유전율의 상관관계를 알아보기 위해 3D simulator를 통해 시뮬레이션 하였고, 주파수와 온도별 유전 특성, 구조와 전암-전류에 대한 특성을 본 연구의 결과를 통해 토의 할 것이다.

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Solid State Reactions and Dielectric Properties of $BaTiO_3-SrTiO_2$ System ($BaTiO_3-SrTiO_2$ 계의 고상반응과 유전성)

  • 윤기현;조경화;이남양
    • Journal of the Korean Ceramic Society
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    • v.22 no.2
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    • pp.63-67
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    • 1985
  • $BaTiO_3$ and $SrTiO_2$ were mixed with the mole ratio of 36:65:50, 50: 50 and 65:35 and then heated at 110$0^{\circ}C$~130$0^{\circ}C$ for 1~64 hrs. The solid state reactions and dielectric properties were investigated as a function of amount of solid solution. Activation energy of solid solution decreased with increasing amount of $BaTiO_3$ due to fast diffusion of $Ba^{2+}$ ions. Dielectric constants increased with increasing the soaking time at 125$0^{\circ}C$and 130$0^{\circ}C$ and Curie Temperature shifted to higher temperature with increasing the soaking time at 125$0^{\circ}C$ and 130$0^{\circ}C$. It attributes to the am-ount of solid solution and grain growth, Dielectric constants decreased and Curie Temperature shifted to lower temperature due to decreasing polari-zability.

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Defect Chemistry in Simple ATi$O_3$Perovskite Ceramics (ATi$O_3$단순 페롭스카이트의 결함구조)

  • Han, Yeong-Ho
    • Korean Journal of Materials Research
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    • v.2 no.4
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    • pp.248-256
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    • 1992
  • This paper has reviewed some of the basic principles that underlie the field of defect chemistry in simple ATi$O_3$(A=Ca, Sr, Ba) perovskites. Frenkel defects in perovskite structure is very much unlikely, and Schottky defects and intrinsic electronic defects in undoped materials are negligibly small compared with background acceptor impurities. The electrical properties of perovskite ceramics are dependent on the aliovalent impurities. Since perovskite structure is a ternary system, the stoiohiometry between cations as well as cation-anion ratio will affect defect structure and electrical properties. BaTi$O_3$and SrTi$O_3$show a limited deviation from the cation stoichiometry while CaTi$O_3$has significant excess CaO and Ti$O_2$solubility.

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Structure and electrical properties of $BaTiO_3$ System Array Thick Films for Infrared Detector Device (적외선 감지 소자를 위한 $BaTiO_3$계 어레이 후막의 구조 및 전기적 특성)

  • Noh, Hyun-Ji;Nam, Sung-Pill;Lee, Sung-Gap;Kim, Dae-Yeong;Bae, Seon-Gi;Lee, Young-Hie
    • Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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    • 2009.06a
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    • pp.180-181
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    • 2009
  • $(Ba_{0.6},Sr_{0.3}Ca_{0.1})TiO_3$ powders, which were prepared by sol-gel method using a solution of Ba-acetate, Sr-acetate and Ca-acetate and Ti iso-propoxide, $(Ba_{0.6},Sr_{0.3}Ca_{0.1})TiO_3$ array thick films doped with 0.1 mol% $MnCO_3$ and $Yb_2O_3$ (0.1~0.7 mol%) were fabricated by the screen printing method on the alumina substrate. And the structural and electrical properties as a function of $Yb_2O_3$ amount were investigated. The thickness of all (Ba,Sr,Ca)$TiO_3$ thick films was approximately 60mm. The Curie temperature of doped with 0.1 mol% $Yb_2O_3$ specimen was $45^{\circ}C$, and the dielectric constant and at this temperature was 1062.

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High Temperature Grain Growth Behavior of Aerosol Deposited BaTiO3 Film on (100), (110) Oriented SrTiO3 Single Crystal (상온분사분말공정에 의해 SrTiO3 (100), (110) Seed에 코팅된 BaTiO3의 고온 성장 거동 분석)

  • Lim, Ji-Ho;Lee, Seung Hee;Kim, Ki Hyun;Ji, Sung-Yub;Jung, Suengwoon;Park, Chun-kil;Jung, Han-Bo;Jeong, Dae-Yong
    • Korean Journal of Materials Research
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    • v.29 no.11
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    • pp.684-689
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    • 2019
  • Single crystals, which have complexed composition, are fabricated by solid state grain growth. However, it is hard to achieve stable properties in a single crystal due to trapped pores. Aerosol deposition (AD) is suitable for fabrication of single crystals with stable properties because this process can make a high density coating layer. Because of their unique features (nano sized grains, stress inner site), it is hard to fabricate single crystals, and so studies of grain growth behavior of AD film are essential. In this study, a $BaTiO_3$ coating layer with ${\sim}9{\mu}m$ thickness is fabricated using an aerosol deposition method on (100) and (110) cut $SrTiO_3$ single crystal substrates, which are adopted as seeds for grain growth. Each specimen is heat-treated at various conditions (900, 1,100, and $1,300^{\circ}C$ for 5 h). $BaTiO_3$ layer shows different growth behavior and X-ray diffraction depending on cutting direction of $SrTiO_3$ seed. Rectangular pillars at $SrTiO_3$ (100) and laminating thin plates at $SrTiO_3$ (110), respectively, are observed.

The Etching Characteristics of (Ba0.6Sr0.4)TiO3 films Using Ar/CF4 Inductively Coupled Plasma (Ar/CF4 유도결합 플라즈마를 이용한 (Ba0.6Sr0.4)TiO3 박막의 식각 특성)

  • 강필승;김경태;김동표;김창일;이수재
    • Journal of the Korean Institute of Electrical and Electronic Material Engineers
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    • v.15 no.11
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    • pp.933-938
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    • 2002
  • (Ba,Sr)TiO$_{4}$ (BST) thin films on Pt/Ti/SiO$_{2}$/Si substrates were deposited by a sol-gel method and the etch characteristics of BST thin films have been investigated as a function of gas mixing ratio. The maximum etch rate of the BST films was 440 $AA$/min under such conditions as: CF$_{4}$(CF$_{4}$+Ar) of 0.2, RF-power of 700 W, DC-bias voltage of -200 V, pressure of 15 mTorr and substrate temperature of 30 $^{circ}C$. The selectivities of BST to Pt, SiO$_{2}$ and PR were 0.38, 0.25 and 0.09, respectively. In the XPS (X-ray photoelectron spectroscopy) analysis, Barium (Ba) and Strontium (Sr) component in BST thin films formed low volatile compounds such as BaFx, SrFx, which are forms by the chemical reaction with F atoms and is removed by Ar ion bombardment. Titanium (Ti) is removed by chemical reaction such as TiF with ease. The result of secondary ion mass spectrometry (SIMS) analysis confirmed the existence of the BaFx, SrFK, TiFx.