• 제목/요약/키워드: (111) orientation

검색결과 353건 처리시간 0.025초

구리 전착층에 미치는 콜로이달실리카 및 음극 Pre-Coating의 영향 (Effect of Colloidal Silica and Pre-Coating of Cathode on Copper Electrodeposited Film)

  • 이상백;윤정모;박형호;배인성;김병일
    • 한국재료학회지
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    • 제11권7호
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    • pp.569-574
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    • 2001
  • 황산구리 전해욕에 분산제인 콜로이달 실리카($SiO_2$현탁액)를 첨가시키는 분산도금의 방법과 Au pre-coating을 이용하여 음극에 석출하는 전해 석출물의 결정구조, 표면형상, 결정방향 등의 변화를 검토하였다. 실리카 분산 및 Au pre-coating에 의하여 전해 석출피막의 결정입자가 미세화 되고, 균일하게 성장됨은 물론, 결정 수가 증가하였다. 콜로이달 실리카의 분산 효과에 의해서 전해 석출피막의 경도가 대략 15%까지 상승하였다. 또한 콜로이달 실리카를 분산시킨 구리 전착층의 X-선 회절패턴이 (111)면, (200)면과 (311)면이 거의 소멸되어 우선 방위가 (111)에서 (110)면으로 변화되었다.

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열처리에 따른 Cu 전해도금막의 미세구조 및 물리적성질 변화 (The Microstructure and physical properties of electroplated Cu films)

  • 권덕렬;박현아;김충모;이종무
    • 한국진공학회지
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    • 제13권2호
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    • pp.72-78
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    • 2004
  • TaN막 위에 magnetron sputtering으로 증착 시킨 Cu seed 막을 Cu 전해도금을 하기에 앞서 ECR plasma 장치로 전처리 세정하였다. 이때 Cu 막을 200∼$500^{\circ}C$로 변화시키면서 알곤 또는 질소 분위기에서 RTA(rapid themal annealing) 방법으로 열처리하였다. Cu seed 막 위에 전해도금법으로 형성한 Cu 막을 열처리했을 때 미세구조와 물리적 특성변화를 XRD(x-ray diffraction), EBSD(electron back-scattered diffraction), AFM(atomic force microscopy) 분석을 이용하여 조사하였다. $400^{\circ}C$보다 높은 온도에서 재결정이 일어났으며, 열처리 온도를 증가함에 따라 Cu막의 비저항이 감소하고 (111) 우선배향성이 증가하는 경향을 나타냈다. 최소의 비저항과 부드러운 표면 및 (111) 배향성이 뛰어난 Cu막을 얻기 위한 최적의 열처리 조건은 $400^{\circ}C$의 질소분위기에서 120초간 RTA처리를 하는 것으로 판단된다. 이 조건하에서 전해도금된 Cu막의 비저항(resistivity)과 표면 거칠기(surface roughness)는 각각 1.98$\mu$O-cm 및 17.77nm였다.

황산구리 전해욕의 전착피막에 미치는 콜로이달실리카의 영향 (Effect of Colloidal Silica on Electredeposited Film from Copper sulfate Bath)

  • 이상백;김병일;윤정모;박정현
    • 한국재료학회지
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    • 제11권5호
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    • pp.413-418
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    • 2001
  • 황산구리 전해욕에 분산제인 콜리이달 실리카($SiO_2$현탁액)를 첨가시키는 분산도금의 방법을 이용하여 음극에 석출하는 전해 석출물의 결정구조, 표면형상, 결정방향 등의 변화를 검토하였고 내식성, 물리적 특성 또한 조사하였다. 콜로이달 실리카를 분산시킨 구리 전해욕의 석출피막의 특성에 대해서 조사한 결과, 다음과 같은 결론을 얻었다. 전해 석출피막의 결정입자가 미세화 되고, 균일하게 성장됨은 물론, 결정 수가 증가하였으며, 콜로이달 실리카의 분산 효과에 의해서 전해 석출피막의 경도가 대략 16%까지 상승하였다. 또한 콜로이달 실리카를 분산시킨 극리 전착층의 X-선 회절패턴이 (111)면, (200)면과 (311)면이 거의 소멸되어 우선 방위가 (111)에서 (110)면으로 변화되었다. 부식전위의 측면에서도 콜로이달 실리카의 흡착 효과에 의해서 구리 전착층의 전위가 귀하게 이동하는 효과를 얻을 수 있었다.

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Sol의 물리화학적 변수들이 $Pb(Mg, Zn)_{1/3}Nb_{2/3}O_3$ 박막의 우선 배향성에 미치는 효과 (Effects of Physico-chemical Factors of Sol on the Degree of Preferred Orientation in $Pb(Mg, Zn)_{1/3}Nb_{2/3}O_3$ Thin Films)

  • 조문규;장현명;김광수
    • 한국세라믹학회지
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    • 제32권3호
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    • pp.305-312
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    • 1995
  • Thin films of Pb(Mg, Zn)1/3Nb2/3O3 were fabricated by spin coating the Pb-Mg-Zn-Nb-O complex alkoxide sols on(111) Pt-coated MgO (100) planes. It was observed that the content of H2O and the rheological characteristics of sol greatly influenced the orientation of perovskite grains after thin-film formation. A strong preferential orientation of (100)-type planes of the perovskite grains was obtained for the sol aged for 15 days with the molar ratio of H2O to total metal alkoxides=2. As small angle X-ray scattering experiment in the Porod region was performed to correlate the observed preferential orientation with the network structure of precursors at various stage of aging. It was shown that the degree of branching of the Pb-Mg-Zn-Nb-O precursor chain had a direct effect on the preferred oreintation, and weakly branched precursor systems led to highly oriented grains after thin-film formation.

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Co-Fe-Cr 합금도금층의 조성 및 우선방위에 미치는 전해조건의 영향 (The effect electrolysis conditiong on the composition and the preferred orientation of Co-Fe-Cr alloy electrodeposits)

  • 예길촌;문근호
    • 한국표면공학회지
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    • 제31권6호
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    • pp.393-399
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    • 1998
  • The composition and the properred orientation of Co-Fe-Cr alloy electrodeposits were invesigated according to the electrolysis conditions using sulface bath. The current efficiency and the cathode overpotential decrased noticeably with the increase of Cr content in the bath. As the D.C. current density increased increased, the Cr content in the alloy increasd, while Co content decreased and Fe content remained constant, In the pulse current electrolysis, the Cr content of the alloy increased with the mean current density and off-time and then its content increased mord more noticeably with the peak current density than that of D.C. electrolysis. The preferred orientation of the alloy changed from (220)+(111) to (220) with decreasing cathode overpotential.

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저압 MOCVD로 CBr4 가스를 사용하여 탄소 도핑된 GaAs 에피층의 결정학적 방향에 따른 전기적 성질의 의존성 (Crystallographic Orientation Dependence Of Electrical Properties of Carbon-doped GaAs Grown by Low Pressure Metalorganic Chemical Vapor Deposition Using CBr4)

  • 손창식
    • 한국전기전자재료학회논문지
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    • 제15권3호
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    • pp.214-219
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    • 2002
  • In order to elucidate the crystallographic orientation dependence of electrical properties of carbon (C)-doped GaAs epilayers, C incorporation into GaAs epilayers on high-index GaAs substrates with various crystallographic orientations from (100) to (111)A has been performed by a low pressure metalorganic chemical vapor deposition using C tetrabromide ($CBt_4$) as a C source. The hole concentration of C-doped GaAs epilayers rapidly decreases with a hump at (311)A with increasing the offset angle. Although the growth temperature and the V/III ratio are varied, the crystallographic orientation dependence of hole concentration show a same trend. The above behaviors indicate that the bonding strength of As sites on a glowing surface plays an important role in the C incorporation into the high-index GaAs substrates.

Pt 코팅된 Si 기판에 제조한 KLN 박막의 구조적 특성 (Structural Properties of KLN Thin Film Deposited on Pt Coated Si Substrate)

  • 박성근;이기직;백민수;전병억;김진수;남기홍
    • 한국전기전자재료학회논문지
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    • 제14권5호
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    • pp.410-416
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    • 2001
  • KLN thin films were fabricated on Pt coated Si(100) wafer using an rf-magnetron sputtering method. The grown KLN thin film consists of 4-fold grains. In this experiment, the structure of 4-fold grained thin film was investigated using XRD and SEM measurements. Pt layer was also deposited using the rf-magnetron sputtering method,. XRD measurement showed that he Pt thin film has Gaussian distribution form with strong (111) direction orientation. The KLN thin film has preferred-orientation of (001) direction, and the peak consists of 2 separate peaks; one with broad FWHM and the other with narrow FWHM. The sharp peak is due to single crystal, and combining with Em results, the 4-fold grain consists of singel crystals with c-axis normal to substrate.

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Ni-Fe합금도금층의 조선 및 우선배향에 미치는 전해조건의 영향 (The effect of electrolysis conditions on the composition and preferred orientation of Ni-Fe alloy electrodeposits)

  • 예길촌;김용웅;김용희;김용주
    • 한국표면공학회지
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    • 제27권6호
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    • pp.319-326
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    • 1994
  • The effects of electrolysis conditions on the composition and preferred orientation of Ni-Fe alloy were studied using the sulfate-chloride baths paddle agitated. Cathode current efficiency is higher in the deposits from bath 2 than that of deposits from bath 1. The Fe content of alloy deposits from bath 2 is nearly constant(19∼21wt.%) in the wide range of current density, while it decreases noticeably with current density in the deposits from bath 1. The variation of Fe content at the edge of specimen is lower in deposits from bath 2 than those from bath 1. The alloy deposits show (111) & (200) preferred orientation for the deposits from bath 1 and bath 2 respectively.

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The Level of Self-Directedness : A Parameter for the Success of Cyber Education

  • Yum, Ji-Hwan
    • Journal of Information Technology Applications and Management
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    • 제16권3호
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    • pp.101-111
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    • 2009
  • The study reveals the relationships between the level of self-directedness and educational performance of students in the cyber education environment. Where the motivations for participating cyber education may vary, the final destination of education may be the same-improving the level of self achievement by study. As the researchers believe that the paramount success factor of cyber education would be self-directedness, we probed the factors to build UP self-directedness. Researchers developed the level of self-directedness as object-orientation, action-orientation, and learning orientation. Those composite orientations were compared with learning achievement. The study showed the significant relationship between some factors of self-directedness and educational performance.

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스퍼터링 및 후 열처리 조건변화에 따른 SBN 강유전체 박막의 배향성에 관한 연구 (Effect of Sputtering and Post-Annealing Condition on The Orientation of SBN Thin Films)

  • 이채종;이희영
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 2006년도 영호남 합동 학술대회 및 춘계학술대회 논문집 센서 박막 기술교육
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    • pp.133-135
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    • 2006
  • SBN60 and SBN60/30 thin films were deposited by ion beam sputtering technique. Using the ceramic target of the same composition and Pt(100)/$TiO_2$/$SiO_2$/Si or Pt(111)/Ti/$SiO_2$/Si substrate, crystallization and orientation behavior as well as electric properties of the films were examined, Thickness was controlled to $3000{\AA}$ and the films were heat-treated at $650^{\circ}C{\sim}800^{\circ}C$. The orientation and crystallization behavior were observed which showed the dependence on processing condition($O_2$/Ar ratio, substrate temp, annealing temp...).

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