• Proceedings of the Korean Vacuum Society Conference
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• 2011.02a
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• pp.100-100
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• 2011

2004년 일본의 Hosono 그룹에 의해 처음 발표된 이래로, amorphous gallium-indium-zinc oxide (a-GIZO) thin film transistors (TFTs)는 높은 이동도와 뛰어난 전기적, 광학적 특성에 의해 큰 주목을 받고 있다. 또한 넓은 밴드갭을 가지므로 가시광 영역에서 투명한 특성을 보이고, 플라스틱 기판 위에서 구부러지는 성질에 의해 플랫 패널 디스플레이나 능동 유기 발광 소자(AM-OLED), 투명 디스플레이에 응용될 뿐만 아니라, 일반적인 Poly-Si TFT에 비해 백플레인의 대면적화에 유리하다는 장점이 있다. 최근에는 Y2O3나 ZrO2 등의 high-k 물질을 gate insulator로 이용하여 높은 캐패시턴스를 유지함과 동시에 낮은 구동 전압과 빠른 스위칭 특성을 가지는 a-GIZO TFT의 연구 결과가 보고되었다. 하지만 투명 디스플레이 소자 제작을 위해 플라스틱이나 유리 기판을 사용할 경우, 기판 특성상 공정 온도에 제약이 따르고(약 $300^{\circ}C$ 이하), 이를 극복하기 위한 부가적인 기술이 필수적이다. 본 연구에서는 p-type Si을 back gate로 하는 Inverted-staggered 구조의 a-GIZO TFT소자를 제작 하였다. p-type Si (100) 기판위에 RF magnetron sputtering을 이용하여 Gate insulator를 증착하고, 같은 방법으로 채널층인 a-GIZO를 70 nm 증착하였다. a-GIZO를 증착하기 위한 sputtering 조건으로는 100W의 RF power와 6 mTorr의 working pressure, 30 sccm Ar 분위기에서 증착하였다. 소스/드레인 전극은 e-beam evaporation을 이용하여 Al을 150 nm 증착하였다. 채널 폭은 80 um 이고, 채널 길이는 각각 20 um, 10 um, 5 um, 2 um이다. 마지막으로 Furnace를 이용하여 N2 분위기에서 $500^{\circ}C$로 30분간 후속 열처리를 실시한 후에, 전기적 특성을 분석하였다.

• Journal of the Korean Society for Nondestructive Testing
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• v.26 no.2
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• pp.69-76
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• 2006

TRISO(tri-isotropic)-coated fuel particle technology is utilized owing to its higher stability at a high temperature and Its efficient retention capability for fission products In the HTGR(high temperature gas-reeled reactor). The typical spherical TRISO fuel panicle with a diameter of about 1mm is composed of a nuclear fuel kernel and outer coating layers. The outer coating layers consist of a buffer PyC(pyrolytic carbon) layer, Inner PyC(1-PyC) layer, SiC layer, and outer PyC(O-PyC) layer Most of the Inspection Items for the TRTSO-coated fuel particle depend on destructive methods. The coating thickness of the TRISO fuel particle can be nondestructively measured by the X-ray radiography without generating radioactive wastel. In this study, the coaling thickness for the simulated TRISO-coated fuel particle with $ZrO_2$ kernel Instead of $%UO_2$ kernel was measured by using micro-focus X-ray radiography with micro-focus X-ray generator and flat panel detector The radiographic image was also enhanced by image processing technique to acquire clear boundary lines between coating layers. The coaling thickness wat effectively measured by applying the micro-focus X-ray radiography The inspection process for the TRISO-coated fuel particles will be improved by the developed micro-focus X-ray radiography and digital image processing technology.

• Proceedings of the KIEE Conference
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• 2005.07c
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• pp.1881-1883
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• 2005

In this study, PZT thin films were fabricated using sol-gel Processing onto $Si/SiO_2/Ti/Pt$ substrates. PZT sol with different Zr/Ti ratio(20/80, 30/70, 40/60, 52/48) were prepared, respectively. The films were fabricated by using the spin-coating method on substrates. The films were heat treated at $450^{\circ}C$, $650^{\circ}C$ by rapid thermal annealing(RTA). The preferred orientation of the PZT thin films were observed by X-ray diffraction(XRD), and Scanning electron microscopy(SEM). All of the resulting PZT thin films were crystallized with perovskite phase. The fine crystallinity of the films were fabricated. Also, we found that the ferroelectric properties from the dielectric constant of the PZT thin films were over 600 degrees, P-E hysteresis constant. And the leakage current densities of films were lower than $10^{-8}\;A/cm^2$. It is concluded that the PZT thin films by sol-gel process to be convinced of application for ferroelectric memory device.

• Transactions on Electrical and Electronic Materials
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• v.12 no.5
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• pp.193-196
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• 2011

Lead zirconate titanate (PZT)/ bismuth ferrite (BFO) multilayer thin films have been fabricated by the spin-coating method on Pt(200 nm)/Ti(10 nm)/$SiO_2$(100 nm)/p-Si(100) substrates using $BiFeO_3$ and $Pb(Zr_{0.52}Ti_{0.48})O_3$ metal alkoxide solutions. The PZT/BFO multilayer thin films show a uniform and void-free grain structure, and the grain size is smaller than that of PZT single films. The reason for this is assumed to be that the lower BFO layers play an important role as a nucleation site or seed layer for the formation of homogeneous and uniform upper PZT layers. The dielectric constant and dielectric losses decreased with increasing number of coatings, and the six-layer PZT/BFO thin film has good properties of 162 (dielectric constant) and 0.017 (dielectric losses) at 1 kHz. The remnant polarization and coercive field of three-layer PZT/BFO thin films were 13.86 ${\mu}C/cm^2$ and 37 kV/cm respectively.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 1999.11a
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• pp.311-314
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• 1999

Ferroelectric PZT heterolayered thin films were fabricated by spin coating method on the Pt/Ti/SiO$_2$/Si substrate using PZT(10/90) and PZT(90/10) metal alkoxide solutions. All PZT heterolayered films showed a homogeneous grain structure without presence of the rosette structure. It can be assumed that the lower PZT layers a role of nucleation site or seeding layer for the formation of the upper PZT layer. Zr and Ti diffusion into the Pt electrode were mainly distributed at the surface of Pt electrode beneath the PZT/Pt interface. The PZT/Pt interfacial layer showed a microstructure characterized by a grain phase surrounded by a Pb-deficient pyrochlore matrix phase. The relative dielectric constant and the dielectric loss of the PZT-6 film were 567 and 3.6, respectively.

• The Journal of the Petrological Society of Korea
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• v.4 no.1
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• pp.31-48
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• 1995

The Jurassic Kwanaksan stock, so far known to be composed of biotite granite only, has the mineral assemblage of quartz+K-feldspar+plagioclase+biotite${\pm}$gernet. The lithology of the stock is classified as alkali feldspar granite by their mode and plagioclase compositions (An<5). Subsolvus feldspars, rather early crystallization of biotite, and shallow emplacement depth estimated from Q-Ab-Or diagram suggest hydrous nature of the magma, which contrasts with anhydrous A-type like geochemistry described below. Major and trace element compositions of the Kwanaksan stock are distinct from those of the adjacent Seoul batholith, suggesting a genetic difference between the two, The Kwanaksan stock shows geochemical characteristics similar to A-type granite in contrast to most other Mesozoic granites in Korea, in that it has high $SiO_2$(73~78wt%), $Na_2O+K_2O$, Ga(27~47 ppm). Nb(22~40 ppm), Y(48~95 ppm), Fe/Mg and Ga/Al, and low CaO(<0.51 wt%). Ba (8~75 ppm) and Sr(2~23 ppm). However, it has lower Zr and LREE and higher Rb(384~796 ppm) than typical A-type granite. LREE-depleted rare earth element pattern with strong negative Eu anomaly of previous studies is reinterpreted as representing source magma characteristics. The residual material during partial melting is not compatible with pyroxenes, amphibole or garnet, while significant amount of plagioclase is required. Similarity of geochemistry of the Kwanaksan stock to A-type granite suggests the origin of the stock has a chose relationship with that of A-type granite. These observations lead us to propose that the Kwanaksan stock was formed by partial melting of felsic source rock.

• Korean Journal of Materials Research
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• v.17 no.1
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• pp.18-24
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• 2007

Mullite-PSZ composite was prepared by sol-gel method using $Al(sec-OC_4H_9)_3,\;Si(OC_2H_5)_4,\;ZrOCl_2\;8H_2O\;and\;Y_2O_3$. The sinterability ana mechanical properties of powder compacts sintered at $1,650^{\circ}C$ for 4 hrs were investigated for various PSZ contents. In result Al-Si spinel formed at $980^{\circ}C$ from amorphous dried gel, and zirconia as well as mullite crystal formed above $1,200^{\circ}C$. The sintered body was densified to $97{\sim}98%$ except the specimen containing 25vol% PSZ which showed the relative density of about 95% obtained by sintering at $1,650^{\circ}C$ for 4 h. The flexural strength of the sintered body was a maximum value of 290 MPa in 20 vol% PSZ, which was also considerably larger than the value of 200 MPa without PSZ. The value of the fracture toughness increased linearly with increase of PSZ content and showed a maximum value of $4.3MPam^{1/2}$ in 25 vol% PSZ, Namely this value was remarkably larger than the $value(2.6MPam^{1/2})$ of pure mullite without PSZ.

• Journal of the Mineralogical Society of Korea
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• v.18 no.4 s.46
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• pp.277-288
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• 2005

Perlite, a hydrated volcanic glass, occurs mainly as a bed-like body, and is distributed intermittently along the unconformity surface between the Beomgockri Group and its lower formations, viz. Janggi Group. The perlite is intimately associated with surrounding pumiceous welded tuff and rhyodacites in space and time. Compared to the typical perlite, the perlite is rather silica-poor and impure, and thus, includes lots of phenocrysts and rock fragments. Nearly the perlite is compositionally rather close to a pitchstone than a perlite in water contents. Petrographic comparison between perlite and associated volcanic to volcaniclastic rocks indicates that pumiceous welded tuff and rhyodacite seem to be Protolith of the Perlite. A Zr/$TiO_{2}$-Nb/Y diagram and field occurrence of perlite and their protolithic rocks also conforms the above interpretation. Kn addition, remnant vesicles in perlite strongly reflect that the precursor of perlitic glass appeared to be pumice fragment as well as volcanic glass. The perlite was diagenetically formed by way of a pervasive water-rock interaction at the deposition of the Manghaesan Formation in lacustrine environment. During perlitization, $SiO_{2}$ and alkali tend to be consistently depleted. Preexisting system of the Beomgockri Group based on the perlite formation should be corrected, because the perlite was formed diagenetically without lateral persistence in its occurrence.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2001.07a
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• pp.709-712
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• 2001

The effects of post annealing temperature by the Rapid Thermal Annealing(RTA) on the electrical properties of Pb(Zr,Ti)O$_3$(PZT) thin film were investigated. Analyses by the RTA treatments reveled that the leakage current of PZT thin films strongly depend on heating temperature and time. It was found that leakage current properties of PZT capacitor were changed by heating temperature during the RTA annealing. On Pt/Ti/Si substrates, PZT films are deposited at 350 $^{\circ}C$ by rf magnetron sputtering. The X-ray diffusion (XRD) was confirmed the formation of PZT thin film. Leakage current characteristics were improved with decreasing the post annealing temperature of PZT thin film. RTA annealed film on the 700$^{\circ}C$ shows ferroelectric and electrical properties with a remanent polarization of 12.4${\mu}$C/$\textrm{cm}^2$ coercive field of 117kV/cm, leakage current J= 6.2${\times}$10$\^$-6/ A/$\textrm{cm}^2$

• Laser Solutions
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• v.17 no.3
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• pp.19-23
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• 2014

To directly engrave circuit-line patterns as wide as $6{\mu}m$ in a buildup film to be used as an IC substrate, we applied a projection ablation technique in which an 8 inch dielectric ($ZrO_2/SiO_2$) mask, a DPSS 355nm laser instead of an excimer laser, a ${\pi}$-shaper and a galvo scanner are used. With the ${\pi}$-shaper and a square aperture, the Gaussian beam from the laser is shaped into a square flap-top beam. The galvo scanner before the $f-{\theta}$ lens moves the flat-top beam ($115{\mu}m{\times}105{\mu}m$) across the 8 inch dielectric mask whose patterned area is $120mm{\times}120mm$. Based on the results of the previous research by the authors, the projection ratio was set at 3:1. Experiments showed that the average width and depth of the engraved patterns are $5.41{\mu}m$ and $7.30{\mu}m$, respectively.