• Journal of the Korean Institute of Telematics and Electronics T
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• v.36T no.1
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• pp.8-12
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• 1999

$\textrm{WO}_3$ semiconductive film, which is known to have a sensitivity on $\textrm{NO}_X$ gas was prepared on 8YSZ (8% Yttria stabilized $\textrm{ZrO}_2$) ionic conductor substrate that has oxygen ion pumping effect. Microstructure and electrical properity, especially $\textrm{NO}_X$ sensitivity as a function of DC voltage applied to 8YSZ substrate was examined. When the $\textrm{WO}_3$ film was annealed, it showed amorphous structure, while crystallization was occurred at $600^{\circ}$C revealing orthorhombic phase of $\textrm{WO}_3$. As the annealing temperature increases, (111) and (001) peaks of $\textrm{WO}_3$ film was enhanced. At $400^{\circ}C$ when DC voltage was applied, comparing with no DC bias, more stable and large response characteristics was showed, and the best sensitivity was observed at 2V. Recovery characteristics of NO gas was much better that that of $\textrm{NO}_2$ gas.

• Proceedings of the Korean Institute of Electrical and Electronic Material Engineers Conference
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• 2000.07a
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• pp.471-474
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• 2000

A flat type microgas sensor was fabricated on the p-type silicon wafer with low stress S $i_3$ $N_4$, whose thickness is 2${\mu}{\textrm}{m}$ using MEMS technology and its characteristics were investigated. W $O_3$thin film as a sensing material for detection of N $O_2$gas was deposited using a tungsten target by sputtering method, followed by thermal oxidation at several temperatures (40$0^{\circ}C$~$600^{\circ}C$) for one hour. N $O_2$gas sensitivities were investigated for the W $O_3$thin films with different annealing temperatures. The highest sensitivity when operating at 20$0^{\circ}C$ was obtained for the samples annealed at $600^{\circ}C$. As the results of XRD analysis, the annealed samples had polycrystalline phase mixed with triclinic and orthorhombic structures. The sample exhibit higher sensitivity when the system has less triclinic structure. The sensitivities, $R_{gas}$ $R_{air}$ operating at 20$0^{\circ}C$ to 5 ppm N $O_2$of the sample annealed at $600^{\circ}C$ were approximately 90. 90.

• Journal of the Korean Institute of Electrical and Electronic Material Engineers
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• v.18 no.1
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• pp.12-16
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• 2005

Chemical mechanical polishing (CMP) process is one of the most useful methods for improving the surface roughness of films. The effects of CMP on the surface morphology of WO$_3$ films prepared by RF sputtering system were investigated in this paper. A removal rate of films increased, and the uniformity performance of surface decreased with the addition of an oxidizer to the tungsten slurry. Non-uniformity performance of surface was superior as its value was below 5 % when oxidizers of 5.0 vol% and 2.5 vol%, respectively, were added to the tungsten slurry. The optimized oxidizer concentration, reflected both the improved roughness values and hillock-free surface with the good uniformity performance, was 5.0 vol% as an atomic force microscopy(AFM) analysis of thin film topographies. Our CMP results will be a useful reference for advanced technology of thin films for gas sensor applications in the near future.

• Korean Journal of Materials Research
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• v.3 no.6
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• pp.632-637
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• 1993

The optical properties and electrochromism of amorphous $WO_3$ thin films were studied. $WO_3$ thin films with thickness of 3000$\AA$~6000$\AA$ were deposited by vacuum evaporat.ion. All these films were transparent and found to be amorphous in structure by X-ray diffraction analysis and the visible wave length refractive indices were found to be between 1.9 and 2.1 and the optical energey gap to be 3.25 eV. Electrochromic devices were made consisting of IT0 transparent electrode, $WO_3$ thin films, $LiCIO_4$- propylene carbonate and Pt counter electrode. In terms of their operation, the amorphous $WO_3$ films were colored blue by a double injection of electrons from the transparent electrode and lithium ions from the $LiCIO_4$-propylene carbonate organic electrolyte and made colorless by electrochemical oxidation reaction. The electrochromic properties of $WO_3$ thin films including coloration and bleaching, optical density and response time were all found to be strongly dependent on the film deposition condition, electrolyte concentration, sheet resistance of the transparent electrode and applied voltage.

• Korean Journal of Materials Research
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• v.29 no.8
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• pp.491-496
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• 2019

In this study, we prepare pure $WO_3$ inverse opal(IO) film with a thickness of approximately $3{\mu}m$ by electrodeposition, and an ultra-thin $TiO_2$ layer having a thickness of 2 nm is deposited on $WO_3$ IO film by atomic layer deposition. Both sets of photoelectrochemical properties are evaluated after developing dye-sensitized solar cells(DSSCs). In addition, morphological, crystalline and optical properties of the developed films are evaluated through field-emission scanning electron microscopy(FE-SEM), High-resolution transmission electron microscopy(HR-TEM), X-ray diffraction(XRD) and UV/visible/infrared spectrophotometry. In particular, pure $WO_3$ IO based DSSCs show low $V_{OC}$, $J_{SC}$ and fill factor of 0.25 V, $0.89mA/cm^2$ and 18.9 %, achieving an efficiency of 0.04 %, whereas the $TiO_2/WO_3$ IO based DSSCs exhibit $V_{OC}$, $J_{SC}$ and fill factor of 0.57 V, $1.18mA/cm^2$ and 50.1 %, revealing an overall conversion efficiency of 0.34 %, probably attributable to the high dye adsorption and suppressed charge recombination reaction.

• Journal of the Semiconductor & Display Technology
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• v.4 no.1 s.10
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• pp.29-34
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• 2005

Tungsten oxide($WO_{3}$) is suitable to materials for photochromic window in the visible region. The resistivities of CdS, $WO_{3}$, and $WO_{3}$/CdS films prepared by thermal evaporation method were $4.61\times 10\^{3}$, $7.59\times10^{3}$, and $6.29\times10^{3}$ $\omega$ cm. And x-ray diffraction patterns of CdS, $WO_{3}$/CdS films showed a preferred orientation of hexagonal(002), and the monoclinic(020) structure, respectively. The optical transmission were measured that the cut-on wavelength were 510nm, 380nm for CdS and $WO_{3}$ films respectively, and the transmission spectrum of $WO_{3}$/CdS was shifted into the visible region. Photoluminescence(PL) spectra showed the two peaks at 2.8 eV and 3.2 eV for the as-grown sample($WO_{3}$/CdS ($500{\AA}$), but the other sample($WO_{3}$/CdS ($1000{\AA}$)) had a peak energy value of 2.8 eV. The photochromism of $WO_{3}$/CdS films showed that the excitation of electron-hole pairs and subsequent coloration is shifted into visible-light range. And the spectral behavior of coloration turned out to be proportional to the excited electron-hole pairs creation rate of CdS film. This result is interpreted in terms of charge carrier injection from the CdS-layer into the $WO_{3}$ films. We found a value of about 2.8 eV of $WO_{3}$/CdS film which is somewhat higher than peak energy of 2.54 eV using CBD prepared by Bechinger et. al.

• Proceedings of the Materials Research Society of Korea Conference
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• 2003.03a
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• pp.189-189
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• 2003

WO$_3$ 박막은 H$^{+}$이온이나 Li$^{+}$ 이온과 반응하여 H$_2$WO$_4$나 Li$_{x}$WO$_{3+x}$의 화합물을 이루고 파란색을 나타내는 효과를 보인다. 이러한 효과를 전기변색 (electrochromic) 효과라 한다. 이러한 전기변색효과를 이용하여 건축물의 창문을 통하여 들어오는 태양에너지와 빛의 양을 조절하는 윈도우를 제작하려는 국가적인 프로젝트가 미국, EU, 일본 등의 선진국에서 활발하게 진행되고 있다. WO$_3$ 박막을 제조하는 방법으로는 sputtering, CVD, 그리고 sol-gel coating 법 등이 있다. sputtering이나 CVD의 경우는 매우 균일하고 전기변색 특성이 좋은 박막을 제조할 수 있는 이점이 있지만 장치의 제조비가 비싸고 대형 패널을 제작하는 데에는 어려움이 있다. 솔-젤 코팅의 경우는 WO$_3$의 전구체인 솔을 합성하고 bath에 솔을 넣은 후 코팅하고자 하는 글라스 기판을 담갔다가 꺼내어 건조하고 열처리하는 간단한 방법으로 제조할 수 있는 장점이 있다. 솔-젤 코팅의 경우 제조비가 값싸고 대면적 코팅이 용이하다는 점이 다른 코팅 방법에 비하여 장점이라고 한 수 있다.다.다.

• Korean Journal of Materials Research
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• v.15 no.7
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• pp.486-490
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• 2005

Thin films of tungsten oxide and nickel oxide were deposited on $Al_2O_3/Si-substrate$ by high vacuum thermal evaporation. The properties of microstructure and crystallinity were analyzed by SEM and XRD respectively. $WO_3$ films without addition of NiO showed polycrystalline structure after annealing at $500^{\circ}C$ for SO min. There were the cracks between the polycrystalline grains and the crack width was increased with the thickness of $WO_3$ films. The cracks in the $WO_3$ films could be controlled by an optimum deposition of NiO on $WO_3$ films and either less or more than the optimum addition fails to suppress the cracks. A process mechanism to suppress the crack has been discussed.

• Korean Journal of Materials Research
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• v.26 no.10
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• pp.577-582
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• 2016

$Dy^{3+}$ and $Eu^{3+}$-codoped $SrWO_4$ phosphor thin films were deposited on sapphire substrates by radio frequency magnetron sputtering by changing the growth and thermal annealing temperatures. The results show that the structural and optical properties of the phosphor thin films depended on the growth and thermal annealing temperatures. All the phosphor thin films, irrespective of the growth or the thermal annealing temperatures, exhibited tetragonal structures with a dominant (112) diffraction peak. The thin films deposited at a growth temperature of $100^{\circ}C$ and a thermal annealing temperature of $650^{\circ}C$ showed average transmittances of 87.5% and 88.4% in the wavelength range of 500-1100 nm and band gap energy values of 4.00 and 4.20 eV, respectively. The excitation spectra of the phosphor thin films showed a broad charge transfer band that peaked at 234 nm, which is in the range of 200-270 nm. The emission spectra under ultraviolet excitation at 234 nm showed an intense emission peak at 572 nm and several weaker bands at 479, 612, 660, and 758 nm. These results suggest that the $SrWO_4$: $Dy^{3+}$, $Eu^{3+}$ thin films can be used as white light emitting materials suitable for applications in display and solid-state lighting.

• Journal of the Korean Vacuum Society
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• v.10 no.1
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• pp.61-66
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• 2001

$WO_3$ films were multicoated on the microscope slide glass and ITO-coated glass using a tungsten alkoxide type solution by the sol-gel deposition process. The effect of dipping and processing parameters on the structure, optical and electrochemical properties of the film were also investigated. Coating using alkoxide solution was very uniformed for low dipping speed of 0.005 m/s, but thickness variations across the sample became apparent for dipping speeds greater than 0.007 m/s. Electrochemical coloration experiments showed that films fired at lower temperatures color more easily than film fired to > $200^{\circ}C$. Rutherford backscattering spectroscopy studies revealed that $K^+$ ions were uniformly distributed throughout the $WO_3$layer in the colored sample.