• 한국세라믹학회지
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• 제32권7호
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• pp.761-768
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• 1995

Double layered BaTiO3 thin films with high dielectric constant as well as good insulating property were prepared for the application to low voltage driving thin film electroluminescent (TFEL) device. BaTiO3 thin films were formed by rf-magnetron sputtering technique. Amorphous and polycrystalline BaTiO3 thin films were deposited at the substrate temperatures of room temperature and 55$0^{\circ}C$, respectively. Two kinds of films prepared under these conditions showed high resistivity and high dielectric constant. The figure of merit (=$\varepsilon$r$\times$Eb.d) of polycrystalline BaTiO3 thin film was very high (8.43$\mu$C/$\textrm{cm}^2$). The polycrystalline BaTiO3 showed a substantial amount of leakage current (I), under the high electric field above 0.5 MV/cm. The double layered BaTiO3 thin film, i.e., amorphous BaTiO3 layer coated polycrystalline BaTiO3 thin film, was prepared by the new stacking method and showed very good dielectric and insulating properties. It showed a high dielectric constant fo 95 and leakage current density of 25 nA/$\textrm{cm}^2$ (0.3MV/cm) with the figure of merit of 20$\mu$C/$\textrm{cm}^2$. The leakage current density in the double layered BaTiO3 was much smaller than that in polycrystalline BaTiO3 under the high electric field. The saturated brightness of the devices using double layered BaTiO3 was about 220cd/$m^2$. Threshold voltage of TFEL devices fabricated on double layered BaTiO3 decreased by 50V compared to the EL devices fabricated on amorphous BaTiO3.

• 열처리공학회지
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• 제14권3호
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• pp.151-154
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• 2001

$TiO_2$ thin film has wide application because of its high capacitanca, reflection, and good transmissivity in visible range. $TiO_2$ thin film can be made by thermal deposition method, reactive evaporation method, activated reactive evaporation(ARE) method. In the case of thermal deposition, the oxygen deficiency can occur because the melting point of Ti is very high. While in the case of reactive evaporation, high density $TiO_2$ can not be made, because reactive gas($O_2$) and evaporated material(Ti) are not fully combined, activated reactive evaporation, $TiO_2$ is easily deposited at lower gas pressure compared with reactive evaporation because the ionized reactive gas is made by plasma. Therefore, activated reactive evaporation is very useful to deposit the material having the high melting point. In this work, we formed $TiO_2$ thin film by activated reactive evaporation method. The surface of $TiO_2$ thin film was analyzed by X-ray photoelectron spectroscopy. The surface morphology which was analyzed by atomic force microscopy(AFM) shows that feature of the film surface is uniform. The dielectric capacitance, withstanding voltage were $600{\mu}F/cm^2$, 0.4V respectively. In further work, we can increase the withstanding voltage by improving the deposition parameter of substrates.

• 한국표면공학회:학술대회논문집
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• 한국표면공학회 2007년도 춘계학술발표회 초록집
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• pp.147-148
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• 2007

In this study, the technology to grow oriented nanotube thin film from dip-coated $TiO_2$ using hydrothermal method has been successfully developed. The effects of preparation parameters, such as reaction temperature, duration and post treatment conditions on the film morphologies and the adherence to the substrate, have been examined. A general formation mechanism of oriented titanate nanotube thin film is proposed in terms of the detailed observation of the products via two dimensional surface FESEM studies and HRTEM images. The overall formation of $TiO_2-based$ nanotube thin film can be summarized with three successive steps: (1) $TiO_2$ dissolving and amorphous $Na_2TiO_3$ deposition process; (2) layered $Na_2Ti_3O_7$ formation via spontaneous crystallization and rapid growth process; (3) formation of nanotube thin film via $Na_2Ti_3O_7$ splitting and multilayer scrolling process of (100) planes around the c axis of $Na_2Ti_3O_7$.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2007년도 추계학술대회 논문집
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• pp.138-139
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• 2007

In this paper, we have studied the optical properties of $TiO_2$ thin film by adding the additives of PEG, PEO and both of them. As a variable amount of additives was added into $TiO_2$, the transmittance of $TiO_2$ thin film was decreased. When the 20 wt% of additives mixed with PEG and PEO was added into $TiO_2$, the transmittance of $TiO_2$ thin film showed higher than that of 10 wt% of additives mixed with PEG and PEO. As a results, we could conclude that the additives makes pore in $TiO_2$ thin film and it improves the transmittance of $TiO_2$ thin film.

• 한국전기전자재료학회:학술대회논문집
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• 한국전기전자재료학회 2006년도 추계학술대회 논문집 Vol.19
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• pp.280-281
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• 2006

We studied the nematic liquid crystal (NLC) aligning capabilities using the new alignment material of a Titanium dioxide ($TiO_2$) thin film by rf magnetron sputtering system for 15min under various rf power. A very low pretilt angle by ion beam exposure on the $TiO_2$ thin film was measured. A good LC alignment by the ion beam alignment method on the $TiO_2$ thin film surface was observed at annealing temperature of $200^{\circ}C$, and the alignment defect of the NLC was observed above annealing temperature of $250^{\circ}C$. Consequently, the low NLC pretilt angle and the good thermal stability of LC alignment by the ion beam alignment method on the $TiO_2$ thin film by sputter method as various rf power condition can be achieved.

• 한국재료학회지
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• 제11권7호
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• pp.537-544
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• 2001

$TiO_2$광촉매릉 반응성 스퍼터링법을 이웅하여 박막으로 제조하고 유기물 및 살균실험을 통하여 미세조직이 광촉매 효율에 미치는 영향을 조사하고자 하였다. 광촉매 효율측정을 위하여 페놀분해실험 및 E.coli 078을 이용한 살균실험을 행하였다. $TiO_2$박막에 의한 페놀분해실험 시, 전자수용체인 산소의 공급에 의하여 분해효율이 2배까지 증가하였다. E.coli 078분해실험의 경우, 광촉매 $TiO_2$박막을 사웅하여 살균하였을때 UV만 조사하여 살균하였을 경우 보다 분해효율이 최고 70% 이상 증가하였다. 페놀분해실험과 E.coli 078 살균실험 결과 저결정성 박막의 경우 분해능이 매우 미약하였으며, 표면조도가 높고 결정성이 우수한 박막의 경우에 높은 광촉매 효율을 나타내어$TiO_2$박막의 광촉매 효과는 표면형상과 결정성이 매우 중요한 인자로 작용하였다.

• 한국지반환경공학회 논문집
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• 제11권1호
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• pp.5-11
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• 2010

본 연구에서는 에어로졸 증착법을 사용하여 광촉매 $TiO_2$ 박막을 제조하기 위하여 원심분리기의 회전속도, vibration milling 시간에 의한 입경 변화 등과 같은 운전인자의 영향을 검토하였고, 제조된 고정화 $TiO_2$ 광촉매 박막의 경우와 $TiO_2$ 광촉매 분말을 부유 상태로 존재시킨 경우와의 막투과 특성의 변화를 실험적으로 비교검토 하였다. 원심분리기의 회전속도 1000-3000rpm 에서 얻어진 $TiO_2$ 분말은 저온 분사 성형법(aerosol deposition, AD)으로 $TiO_2$ 박막을 제조하는데 있어서 nozzle powder 막힘 현상과 같은 문제점을 나타내었다. 한편, vibrating milling에 의해 제어된 $TiO_2$ 분말의 평균입경 크기는 vibrating milling 2시간 후 약 420nm로 AD법을 이용한 입자의 증착에 효과적인 것으로 나타났다. XRD 분석 결과, 광촉매에 효과적인 아나타제 상을 잘 유지하고 있는 것으로 나타났으며, 이러한 결과로부터 vibrating milling은 $TiO_2$ 분말을 제어하는데 있어 적절한 전처리 공정임을 확인할 수 있었다. 제조된 $TiO_2$ 박막의 여과 특성으로 $TiO_2$ 분말을 분리막의 표면에 고정화 한 경우가 부유 상태일 경우보다 더 높은 막투과 유속을 나타내었다.

• 한국세라믹학회지
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• 제42권7호
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• pp.461-468
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• 2005

Transparent TiO$_{2}$ sols were prepared by hydrothermal synthesis to heat Ti precursor solutions, from Ti hydroxides obtained with neutralizing aqueous TiOCl$_{2}$ solutions having various concentrations of NaCI by aqueous NaOH solution, in the autoclave at 120$^{\circ}C$ The photocatalytic abilities of glass beads coated with the sol for gaseous benzene were evaluated. As a result, it was found that due to the increase of brookite phase in TiO$_{2}$ by controlling the concentration of Na ion the optical absorption of TiO$_{2}$ increases toward long wavelength but that in the area of short wavelength becomes relatively low and consequently the photocatalytic performance of TiO$_{2}$ thin film for benzene gas rather decreases, compared to that of composite film of anatase and brookite phases. These results suggest that in order for coated TiO$_{2}$ thin film to have high dissociation performance for benzene gas it is effective to form anatase and brookite phases compositely in TiO$_{2}$.

• 마이크로전자및패키징학회지
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• 제11권4호
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• pp.55-59
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• 2004

본 논문은 광 활성도가 가장 좋은 아나타제(anatase)상의 광촉매 $TiO_2$분말을 상온에서 aerosol deposition 법을 사용하여 박막을 제조하였다. 이런 제조 방법은 aerosol 분말을 초음속으로 분사하여 기판에 증착시키는 방법으로, 저온에서 박막증착이 가능하여 thermal stress를 줄일 수 있고, 공정 단가를 낮출 수 있다는 장점이 있다. 박막 제조시 aerosol bath의 압력은 500 torr이고, chamber의 압력은 0.4 torr 였다. 이런 압력차는 $0.4 mm{\times}10 mm$의 크기의 노즐을 통해 $TiO_2$ 나노 분말을 초음속으로 가속하여 기판에 증착시켰다. 박막 제조를 위해 사용한 기판은 수질정화에 응용하기 위해 직경 50 mm인 원판 SUS mesh를 사용하였다. $TiO_2$ 분말의 고른 분포를 위해 $TiO_2$ 분말에 함유되어 있는 수분을 제거하고 이차 입자의 생성을 억제하기 위해서 알코올 bath 속에서 90분간 초음파 세척을 한 후 건조하였다. SUS mesh 위에 증착되어 있는 $TiO_2$ 박막의 입자크기를 알아보기 위해 주사 현미경(SEM)으로 분석하였으며, $1 {\mu}m$정도의 입자 크기를 관찰 할 수 있었다. X-ray diffraction (XRD) 분석 결과 aerosol deposition 후에도 분말의 anatase상은 그대로 유지되었으며, 이런 결과는 광촉매 작용을 이용한 수처리용 필터로 활용이 가능하다.

• 한국표면공학회지
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• 제37권6호
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• pp.307-312
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• 2004

Extensive efforts have been made in an attempt to utilize photocatalytic properties of $TiO_2$ in visible range. $TiO_2$ and TiO-N thin films were made by the DC reactive magnetron sputtering method at $300^{\circ}C$. Various gases (Ar, $O_2$ and $N_2$) were used and Ti target was impressed by 0.6 kW-5.8 kW power range. The hysteresis phenomenon of the $TiO_2$ thin film as a function of the discharge voltage characteristic was observed to be higher as applied power increases. That of TiO-N thin film was occurred at the 5.8 kW power. The cross section and surface roughness of thin films were observed by FE-SEM and AFM. Average surface roughness of TiO-N thin film was observed as $15.9\AA$ and that of $TiO_2$ as $13.2\AA$. The crystal phases of both $TiO_2$ and TiO-N thin films were found to be anatase structure. The atomic $\beta$-N (396 eV peak in N 1s XPS) was shown in the rutile crystal of TiO-N and was considered acting as the origin of wavelength shift to the visible light.