• 제목/요약/키워드: $TiO_2$ Thickness

검색결과 671건 처리시간 0.032초

Two-Dimensional Electron Gas (2DEG) at $Ta_2O_5/SrTiO_3$ Heterointerface

  • Joung, Jin Gwan;Yoo, Kwang Soo;Kim, Jin Sang;Baek, Seung-Hyub
    • 한국진공학회:학술대회논문집
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    • 한국진공학회 2013년도 제44회 동계 정기학술대회 초록집
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    • pp.161-161
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    • 2013
  • Two-dimensional electron gas (2DEG) has been investigated at the heterointerface between two insulating dielectric perovskite oxides, $LaAlO_3$ (LAO)/$SrTiO_3$ (STO). Properties of the 2DEG have attracted an enormous interest in condensed matter physics due to multifunctional properties such as the coexistence of ferromagnetism and superconductivity, as well as the high electron mobility. Here, we have grown $Ta_2O_5$ thin films using pulsed laser deposition on $SrTiO_3$ substrate to investigate the electric properties of the $Ta_2O_5$/STO heterointerface. Our research reveal that the non-polar $Ta_2O_5$/$TiO_2$ heterointerface favors the formation of 2DEG similar to that at the LAO/STO heterointerface. The metallic behavior was found in this heterointerface with the current about $10{\sim}100{\mu}A$ at 5 V by using conventional I-V measurements, when the $Ta_20_5$ film thickness reaches over critical thickness, $d_c{\simeq}2uc$. The finding that electrons was localized at $Ta_2O_5$/STO heterointerface have attracted to be strong and new candidate for nanoscale oxide device applications.

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MOCVD $PbTiO_3$ 박막의 특성에 관한 연구 (A Study on the MOCVD $PbTiO_3$ Thin Films)

  • 송한상;최두진;유광수;정형진;김창은
    • 한국결정성장학회지
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    • 제2권2호
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    • pp.40-52
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    • 1992
  • Titanium-iso-propoxide[$Ti(OC_3H_7)_4$]와 Tetra-ethyl-lead $[Pb({C_2}{H_5})_4]$를 사용한 MOCVD법으로 PbTi$O_3$박막을 55$0^{\circ}C$에서 증착하였다. Ar과 $O_2$를 각각 운반 및 반응기체로 사용하였으며, 열처리에 따른 박막의 두께와 굴절지수의 변화, Xtjs 회절 분석, CV 특성 측정등을 행하였다. 열처리에 따른 CV 특성 측정 결과 PbTi$O_3$는 Si기판과 계면 반응을 하는 것으로 생각되며, X선 회절 분석 결과 $PbTiO_3$의 특성 peak들이 관찰되었다. 열처리 시간 및 온도의 증가에 따라 박막의 두께는 감소하고, 굴절지수는 증가하는 경향을 보여 주었다.

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열처리 온도에 따른 TiO2/Ag/TiO2 박막의 근적외선 반사 특성 변화 (Effect of Annealing Temperature on the Low Emissivity of TiO2/Ag/TiO2 Films)

  • 김소영;문현주;김대일
    • 열처리공학회지
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    • 제28권3호
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    • pp.134-138
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    • 2015
  • Ag intermediated $TiO_2$ films were deposited by RF and DC magnetron sputtering and then vacuum annealed at 100, 200 and $300^{\circ}C$ for 30 minutes to investigate the effect of annealing temperature on the structural and optical properties of the films. For all depositions, the thickness of the $TiO_2$ and Ag films were kept constant at 24 and 15 nm by controlling the deposition time. As-deposited $TiO_2/Ag/TiO_2$ trilayer films have a weak crystalline and an optical reflectance in a near infrared wavelength region of 77.8%, while the films annealed at $300^{\circ}C$ show the polycrystalline structure and an increased mean optical reflectance of 80.4%. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the structural and optical properties of the $TiO_2/Ag/TiO_2$ films.

TiO2 완충층이 IGZO/TiO2 이중층 박막의 전기적, 광학적 성질에 미치는 영향 (Influence of TiO2 Buffer Layer on the Electrical and Optical Properties of IGZO/TiO2 Bi-layered Films)

  • 문현주;김대일
    • 열처리공학회지
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    • 제28권6호
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    • pp.291-295
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    • 2015
  • IGZO single layer and $IGZO/TiO_2$ bi-layered films were deposited on glass substrate at room temperature with radio frequency magnetron sputtering to investigate the effect of $TiO_2$ buffer layer on the electrical and optical properties of the films. For all deposition, the thickness of IGZO and $TiO_2$ Buffer layer was kept at 100 and 5 nm, respectively. In a comparison of figure of merit, IGZO films with a 5-nm-thick $TiO_2$ buffer layer show the higher figure of merit ($8.40{\times}10^{-5}{\Omega}^{-1}$) than that of the IGZO single layer films ($6.23{\times}10^{-5}{\Omega}^{-1}$) due to the enhanced optical transmittance and the decreased sheet resistance of the films. The observed results mean that a 5 nm thick $TiO_2$ buffer layer in the $IGZO/TiO_2$ films results in better electrical and optical performance than conventional IGZO single layer films.

$TiO_2$ 다결정 전극에 의한 광전기 화학변환 (Photoelectrodchemical Conversion by Polycrystalline $TiO_2$ Electrodes)

  • 윤기현;윤상옥
    • 한국세라믹학회지
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    • 제20권1호
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    • pp.31-36
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    • 1983
  • The photoelectrochemical conversion by polycrystalline $TiO_2$ electrodes is effected by applied voltage oxidized $TiO_2$ thickness temperature and concentration of a, P. E. C cell. Anodic current starts at -0.8V in 1N-NaOH solu-tion and photocurrent appears around 420nm frequency. And the emf of the cell drops with the rate of 58.5mV/PH.

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양극산화법으로 제작한 TiO2 나노튜브 박막의 구조 및 광전기화학 특성 분석 (Study on the Structure and Photoelectrochemical Properties of Anodized TiO2 Nanotube Films)

  • 이아름;박상현;김재엽
    • 센서학회지
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    • 제27권4호
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    • pp.264-268
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    • 2018
  • Vertically-aligned $TiO_2$ nanotube electrodes have attracted considerable attention for applications in solar cells, catalysts, and sensors, because of their ideal structure for electron transport and electrolyte diffusion. Here, we prepare vertically-aligned $TiO_2$ nanotube electrodes using a two-step anodization process. The prepared $TiO_2$ nanotube electrodes exhibit uniform pore structures with an inner diameter of ~80-90 nm and wall thickness of ~20-25 nm. In addition, they exhibit an anatase crystal phase after a high-temperature annealing. The annealed $TiO_2$ nanotube electrodes are applied in dye-sensitized solar cells (DSSCs) as photoanodes. The fabricated DSSC exhibits conversion efficiencies of 3.46 and 2.15% with liquid- and gel-type electrolytes, respectively.

$V_2O_5$ 첨가가 $TiO_2$ 세라믹스의 물성에 미치는 효과 (Effects on Properties of $V_2O_5$-added $TiO_2$ Ceramics)

  • 유도현
    • 대한전기학회:학술대회논문집
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    • 대한전기학회 2007년도 학술대회 논문집 전문대학교육위원
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    • pp.138-140
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    • 2007
  • $TiO_2-V_2O_5$ sol was fabricated using sol-gel method and $TiO_2-V_2O_5$ thin films were fabricated using dip-coating method. $V_2O_5$ sol was added 0.01mo1e, 0.03mo1e, 0.05mo1e into $TiO_2$ sol. Viscosity of sol increased fast from about 1,000 minutes and sol began gelation from about 10,000 minutes. As a results of crystalline properties, $V_2O_5$ peaks were not found despite of $V_2O_5$ addition. Endothermic reaction occurred due to evaporation of solvent and dissociation of OH at $80^{\circ}C$. Exothermic reaction occurred due to combustion and oxidation of solvent at $230^{\circ}C$, occurred to combustion and oxidation of alkyl group at $350^{\circ}C$. Thickness of thin films increased $0.1{\sim}0.25{\mu}m$ every a dipping.

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이종접합 SrBi$_2Ta_2O_9$/Pb(Zr,Ti)O$_3$박막 케패시터의 강유전 특성 (Ferroelectric Properties of Hetero-Junction SrBi$_2Ta_2O_9$/Pb(Zr,Ti)O$_3$)

  • 이광배;김종탁
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1997년도 춘계학술대회 논문집
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    • pp.217-221
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    • 1997
  • We have investigated the ferroelectric properties of multi-layered SrBi$_2$Ta$_2$$O_{9}$Pb(Zr,Ti)O$_3$, SBT/PZT, thin film capacitors. Specimens were prepared onto Pt-coated Si wafer by sol-gel method. Ferroelectric properties of these finns could be obtained only for thin SBT layers below 50nm in thickness. The values of dielectric constant and remnant polarization depend mainly on the thickness of SBT layer, which arises from the paraelectric interface layer between SBT and PZT due to the thermal diffusion of Pb. The value of remnant poarization of PZT/SBT is greater than that of SBT, and the plarization fatigue behaviors of PZT/SBT/Pt capacitors are somewhat improved as compared with those of PZT/Pt.t.

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금속유기물증착법에 의한 $La_2Ti_2O_{7}$ 박막의 제조 (Fabrication of $La_2Ti_2O_{7}$ Film by Metalorganic Deposition)

  • 조경호;우동찬;박철우;이희영;남효덕
    • 한국전기전자재료학회:학술대회논문집
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    • 한국전기전자재료학회 1995년도 추계학술대회 논문집
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    • pp.122-125
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    • 1995
  • Using metalorganic deposition technique, $La_2Ti_2O_{7}$ precursor solution was deposited on platinium coated SiO$_2$/SI(100) substrates by spin-coating process. Crystalline and crack-free films of ∼0.2$\mu\textrm{m}$ thickness were successfully fabricated on the above substrate from four different types of $La_2Ti_2O_{7}$ precursor solutions by proper heat treatment in the temperature range of $700^{\circ}C$$1200^{\circ}C$. Microstructure and X-ray diffraction analysis of $La_2Ti_2O_{7}$ thin film showed that the crystallization temperature and the preferred orientation of $La_2Ti_2O_{7}$ thin film were strongly dependent on the precursor used.

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MOCVD법에 의한 TiO2 박막의 제조에 미치는 산소의 영향 (Effects of Oxygen on Preparation of TiO2 Thin Films by MOCVD)

  • 유성욱;박병옥;조상희
    • 한국결정학회지
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    • 제6권2호
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    • pp.111-117
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    • 1995
  • 화학증착법에 의해 TiO2 박막을 Si-wafer(100)위에 제조하였다. Titanium tetraisopropoxide (TTIP)를 출발물질로 하여 200-500℃의 온도범위에서 증착을 행하였다. 증착된 박막의 두께는 Ellipsometry 및 SEM을 사용하여 측정하였으며, 산소의 함량에 따른 증착층의 성분분석은 ESCA를 사용하였다. TiO2 박막의 증착속도는 산소의 함량에 따라 증가하였고, 반응가스인 산소를 공급하지 않았을 때 증착층내에 불순물로 탄소가 존재하였으며, 증착층의 성분은 내부로 갈수록 TiO2에서 Ti로 변하였다. 산소를 600scm 공급하였을 때 증착층내에 소량의 탄소가 존재하였으며, 증착층의 성분은 내부로 갈수록 TiO2에서 TiO, Ti로 됨을 알 수 있었다. 산소를 1200scm공급하였을 때 증착층내에 탄소가 존재하지 않았으며, 증착층 성분은 표면에는 TiO2를 이루나 증착층 내부로 갈수록 Ti복합화합물을 이루고 있었다.

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