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http://dx.doi.org/10.12656/jksht.2015.28.3.134

Effect of Annealing Temperature on the Low Emissivity of TiO2/Ag/TiO2 Films  

Kim, So-young (School of Materials Science and Engineering, University of Ulsan)
Moon, Hyun-joo (School of Materials Science and Engineering, University of Ulsan)
Kim, Daeil (School of Materials Science and Engineering, University of Ulsan)
Publication Information
Journal of the Korean Society for Heat Treatment / v.28, no.3, 2015 , pp. 134-138 More about this Journal
Abstract
Ag intermediated $TiO_2$ films were deposited by RF and DC magnetron sputtering and then vacuum annealed at 100, 200 and $300^{\circ}C$ for 30 minutes to investigate the effect of annealing temperature on the structural and optical properties of the films. For all depositions, the thickness of the $TiO_2$ and Ag films were kept constant at 24 and 15 nm by controlling the deposition time. As-deposited $TiO_2/Ag/TiO_2$ trilayer films have a weak crystalline and an optical reflectance in a near infrared wavelength region of 77.8%, while the films annealed at $300^{\circ}C$ show the polycrystalline structure and an increased mean optical reflectance of 80.4%. From the experimental results, it can be concluded that increasing the annealing temperature enhanced the structural and optical properties of the $TiO_2/Ag/TiO_2$ films.
Keywords
$TiO_2$; Ag; XRD; AFM; Low-emissivity film;
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Times Cited By KSCI : 2  (Citation Analysis)
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